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1. 发明授权

US09019469B2 Exposure apparatus, exposure method, method for producing device, and optical part 有权
标题翻译：曝光装置，曝光方法，制造装置的方法和光学部件
公开(公告)号：US09019469B2
公开(公告)日：2015-04-28
申请号：US11639245
申请日：2006-12-15
申请人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
发明人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译：曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。曝光装置（EX）具有用于保持基板（P）的基板台（PT），并且具有疏液平面（30A）的板构件（30）可更换地设置在基板台（PT）上，以防止剩余液体，保持良好的曝光精度。

2. 发明授权

US08711324B2 Exposure method, exposure apparatus, and method for producing device 有权
标题翻译：曝光方法，曝光装置及其制造方法
公开(公告)号：US08711324B2
公开(公告)日：2014-04-29
申请号：US12314823
申请日：2008-12-17
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/70433 , G03F7/7085 , G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： An exposure method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid by using a projection optical system while moving the substrate in a predetermined direction. A temperature distribution of the liquid in a direction intersecting the predetermined direction is measured. A projection state of the image of the pattern is adjusted on the basis of information about the measured temperature distribution. The substrate is exposed to the image of the pattern in the projection state.
摘要翻译：曝光方法通过在沿着预定方向移动基板的同时使用投影光学系统通过液体将图案的图像投影到基板上而曝光基板。测量与预定方向相交的方向的液体的温度分布。基于关于测量的温度分布的信息来调整图案的图像的投影状态。基板在投影状态下暴露于图案的图像。

3. 发明授权

US08294876B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08294876B2
公开(公告)日：2012-10-23
申请号：US11822807
申请日：2007-07-10
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58 , G03B27/32
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. The apparatus also includes a supply mechanism that supplies liquid to a predetermined spatial area which includes a space between the projection optical system and the substrate on the substrate stage, and an adjustment unit that adjusts exposure conditions based on temperature information on the liquid between the projection optical system and the substrate.
摘要翻译：曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。曝光装置包括：基板台，其上安装有基板，其在保持基板的二维平面内移动。该装置还包括供给机构，该供给机构将液体供给到包括投影光学系统与基板台之间的基板之间的空间的预定空间区域，以及调整单元，其基于温度信息调整曝光条件，光学系统和基板。

4. 发明授权

US08054447B2 Exposure apparatus, exposure method, method for producing device, and optical part 有权
标题翻译：曝光装置，曝光方法，制造装置的方法和光学部件
公开(公告)号：US08054447B2
公开(公告)日：2011-11-08
申请号：US10581307
申请日：2004-12-03
申请人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
发明人： Hiroyuki Nagasaka , Hiroaki Takaiwa , Shigeru Hirukawa , Ryuichi Hoshika , Hitoshi Ishizawa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/707 , G03F7/7075
摘要： An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having a liquid repellent flat surface (30A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.
摘要翻译：曝光装置（EX）是通过投影光学系统（PL）和液体（1）将曝光光（EL）照射到基板（P）上来曝光基板（P）的装置。曝光装置（EX）具有用于保持基板（P）的基板台（PT），并且具有疏液平面（30A）的板构件（30）可更换地设置在基板台（PT）上，以防止剩余液体，保持良好的曝光精度。

5. 发明申请

US20110242520A1 OPTICAL PROPERTIES MEASUREMENT METHOD, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光学性能测量方法，曝光方法和器件制造方法
公开(公告)号：US20110242520A1
公开(公告)日：2011-10-06
申请号：US12946944
申请日：2010-11-16
申请人： Junichi KOSUGI , Shigeru HIRUKAWA , Naoto KONDO
发明人： Junichi KOSUGI , Shigeru HIRUKAWA , Naoto KONDO
IPC分类号： G03B27/32 , G01B9/00
CPC分类号： G03F7/706
摘要： An image of a pattern used for measurement formed on a reticle for testing is transferred onto a wafer for testing via a projection optical system, while gradually changing a position in an optical axis direction of the projection optical system. The image of the pattern used for measurement which has been transferred is detected, and an amount corresponding to an expanse of the image of the pattern in a measurement direction is obtained. In this case, four images included in the image of the pattern used for measurement are detected in detection areas, respectively, or in other words, remaining sections except for both ends in a non-measurement direction are detected, and for example, area of the remaining sections is to be obtained as the corresponding amount. Optical properties of the projection optical system are to be obtained, based on the area which has been obtained. Because the area which has been obtained does not have sensitivity to the non-measurement direction, the optical properties of the projection optical system in the measurement direction can be precisely obtained.
摘要翻译：在用于测试的掩模版上形成的用于测量的图案的图像在逐渐改变投影光学系统的光轴方向上的位置的同时，经由投影光学系统被转印到用于测试的晶片上。检测用于测量的图案的图像，并且获得与测量方向上的图案的图像的宽度相对应的量。在这种情况下，分别在检测区域中检测包含在用于测量的图案的图像中的四个图像，或者换句话说，检测除非测量方向两端的剩余部分，例如，剩余的部分将作为相应的金额获得。基于获得的面积，可以获得投影光学系统的光学特性。由于所获得的区域对非测量方向没有敏感度，因此可以精确地获得投影光学系统在测量方向上的光学特性。

6. 发明申请

US20110212389A1 FOCUS TEST MASK, FOCUS MEASUREMENT METHOD, EXPOSURE METHOD AND EXPOSURE APPARATUS 有权
标题翻译：聚焦测试面膜，聚焦测量方法，曝光方法和曝光装置
公开(公告)号：US20110212389A1
公开(公告)日：2011-09-01
申请号：US12940292
申请日：2010-11-05
申请人： Shigeru HIRUKAWA , Shinjiro KONDO
发明人： Shigeru HIRUKAWA , Shinjiro KONDO
IPC分类号： G03F1/00 , G03F7/20 , G03B27/52 , G01J1/00
CPC分类号： G03F9/7026 , G03F1/44 , G03F7/70641
摘要： A focus test reticle for measuring focus information includes an outer pattern. The outer pattern has a line pattern composed of a light shielding film extending in the Y direction, a phase shift portion provided on a side in the +X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the −X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the +X direction of the phase shift portion, and a phase shift portion provided on a side in the −X direction of the transmitting portion. Focus information of a projection optical system is measured at a high measuring reproducibility and a high measuring efficiency.
摘要翻译：用于测量焦点信息的聚焦测试掩模版包括外部图案。外部图案具有由沿Y方向延伸的遮光膜构成的线条图案，设置在线条图案的+ X方向侧并形成为线宽窄于线条图案的相移部分，所述发送部设置在所述线图案的-X方向的一侧，并且形成为具有比所述线图案窄的线宽;发送部，其设置在所述相移部的+ X方向的一侧，部分设置在传送部分的-X方向的一侧。在高测量再现性和高测量效率下测量投影光学系统的聚焦信息。

7. 发明授权

US07911582B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07911582B2
公开(公告)日：2011-03-22
申请号：US12010824
申请日：2008-01-30
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. A supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. A recovery mechanism recovers the liquid and an auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.
摘要翻译：曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。供给机构将液体供给到基板台上的投影光学系统与基板之间的空间。回收机构回收液体，辅助回收机构回收回收机构无法回收的液体。

8. 发明授权

US07483117B2 Exposure method, exposure apparatus, and method for producing device 有权
标题翻译：曝光方法，曝光装置及其制造方法
公开(公告)号：US07483117B2
公开(公告)日：2009-01-27
申请号：US11287317
申请日：2005-11-28
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/70433 , G03F7/7085 , G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： An exposure method forms an immersion area in at least a part of a substrate including a projection area of a projection optical system and projects an image of a mask pattern onto the substrate through liquid between the projection optical system and the substrate. Distribution of the mask pattern is measured (S1) and adjustment is made so that a desired image of the pattern is projected onto the substrate according to distribution of the exposure light incident into the liquid between the projection optical system and the substrate when exposing the substrate (S4 to S6). It is possible to expose the substrate with the pattern accurately regardless of the distribution of the mask pattern.
摘要翻译：曝光方法在包括投影光学系统的投影区域的基板的至少一部分中形成浸没区域，并且通过投影光学系统和基板之间的液体将掩模图案的图像投影到基板上。测量掩模图案的分布（S1），并且进行调整，使得当曝光基板时，根据入射到投影光学系统和基板之间的液体中的曝光光的分布将图案的期望图像投影到基板上（S4〜S6）。无论掩模图案的分布如何，都可以精确地曝光具有图案的基板。

9. 发明申请

US20090015816A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US20090015816A1
公开(公告)日：2009-01-15
申请号：US12232064
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

10. 发明授权

US07391497B2 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
标题翻译：图像形成状态调整系统，曝光方法和曝光装置以及程序和信息存储介质
公开(公告)号：US07391497B2
公开(公告)日：2008-06-24
申请号：US11736134
申请日：2007-04-17
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/52 , G03B27/68
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.
摘要翻译：第二通信服务器经由第一通信服务器获取曝光装置中的调整单元的调整信息和与投影光学系统的图像形成质量（例如波前像差）有关的曝光条件下的调整信息，以及然后基于该信息计算目标曝光条件下的调整单元的最佳调整量。此外，第二通信服务器经由第一通信服务器获取投影光学系统的图像形成质量的调整和实际测量数据的调整信息，然后基于目标曝光条件计算调整单元的最佳调整量信息。并且，第二通信服务器基于计算结果经由第一通信服务器控制曝光装置中的调整单元。

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