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1. 发明申请

US20110212389A1 FOCUS TEST MASK, FOCUS MEASUREMENT METHOD, EXPOSURE METHOD AND EXPOSURE APPARATUS 有权
标题翻译：聚焦测试面膜，聚焦测量方法，曝光方法和曝光装置
公开(公告)号：US20110212389A1
公开(公告)日：2011-09-01
申请号：US12940292
申请日：2010-11-05
申请人： Shigeru HIRUKAWA , Shinjiro KONDO
发明人： Shigeru HIRUKAWA , Shinjiro KONDO
IPC分类号： G03F1/00 , G03F7/20 , G03B27/52 , G01J1/00
CPC分类号： G03F9/7026 , G03F1/44 , G03F7/70641
摘要： A focus test reticle for measuring focus information includes an outer pattern. The outer pattern has a line pattern composed of a light shielding film extending in the Y direction, a phase shift portion provided on a side in the +X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the −X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the +X direction of the phase shift portion, and a phase shift portion provided on a side in the −X direction of the transmitting portion. Focus information of a projection optical system is measured at a high measuring reproducibility and a high measuring efficiency.
摘要翻译：用于测量焦点信息的聚焦测试掩模版包括外部图案。外部图案具有由沿Y方向延伸的遮光膜构成的线条图案，设置在线条图案的+ X方向侧并形成为线宽窄于线条图案的相移部分，所述发送部设置在所述线图案的-X方向的一侧，并且形成为具有比所述线图案窄的线宽;发送部，其设置在所述相移部的+ X方向的一侧，部分设置在传送部分的-X方向的一侧。在高测量再现性和高测量效率下测量投影光学系统的聚焦信息。

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