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1. 发明授权

US07425761B2 Method of manufacturing a dielectric film in a capacitor 失效
标题翻译：制造电容器中的电介质膜的方法
公开(公告)号：US07425761B2
公开(公告)日：2008-09-16
申请号：US11544760
申请日：2006-10-10
申请人： Jae-hyoung Choi , Sung-ho Kang , Jung-hee Chung , Seog-min Lee , Jong-bom Seo , Young-min Kim
发明人： Jae-hyoung Choi , Sung-ho Kang , Jung-hee Chung , Seog-min Lee , Jong-bom Seo , Young-min Kim
IPC分类号： H01L23/12 , H01L23/053
CPC分类号： H01L21/0228 , C23C16/405 , C23C16/45527 , H01L21/02175 , H01L21/3141 , H01L21/31645 , H01L28/40
摘要： A method of manufacturing a dielectric layer for a capacitor including sequentially supplying and purging a first and a second precursor material for a first and a second predetermined amount of time, respectively, in an initial cycle, sequentially supplying and purging the first and the second precursor materials for a third predetermined amount of time, which is shorter than the first and/or second predetermined amount of time, in a post cycle, which follows the initial cycle, and repeating the initial and post cycles to form a dielectric layer having a predetermined thickness.
摘要翻译：一种电容器用电介质层的制造方法，其特征在于，在初始循环中分别顺序地供给和吹扫第一和第二前体材料，分别第一和第二预定量的时间，依次供给和净化所述第一和第二前体在后循环中第三预定时间量的材料，其比第一和/或第二预定量的时间短，其在初始循环之后，并且重复初始和后期循环以形成具有预定的厚度。

2. 发明授权

US09159591B2 Batch type apparatus for manufacturing semiconductor devices 有权
标题翻译：用于制造半导体器件的批式装置
公开(公告)号：US09159591B2
公开(公告)日：2015-10-13
申请号：US13614321
申请日：2012-09-13
申请人： Cheol-Kyu Yang , Seog-Min Lee , Chul-Young Jang , Dong-Min Son , Byung-Ho Ahn , Du-Han Jeon , Yong-Kyu Joo , Sang-Cheol Ha
发明人： Cheol-Kyu Yang , Seog-Min Lee , Chul-Young Jang , Dong-Min Son , Byung-Ho Ahn , Du-Han Jeon , Yong-Kyu Joo , Sang-Cheol Ha
IPC分类号： H01L21/67 , C23C16/455
CPC分类号： H01L21/67017 , C23C16/455 , C23C16/45563 , C23C16/45568 , C23C16/45578 , C23C16/45587 , H01L21/67109
摘要： A batch type apparatus may include a tube; a boat configured to receive a plurality of semiconductor substrates, the boat vertically moved into the tube; a gas nozzle vertically arranged in the tube, the tube having a first portion and a second portion upwardly extended from the first portion; a gas pipe for supplying reaction gases to the gas nozzle, the gas pipe having a horizontal extension and a vertical extension, and the vertical extension extended in the gas nozzle; a fixing member for fixing the first portion of the gas nozzle to the gas pipe, the fixing member having strength higher than that of the gas nozzle; and a clamping member for clamping the gas pipe to the tube. Therefore, breakage of the gas nozzle may be suppressed.
摘要翻译：分批式装置可以包括管; 船，其构造成接收多个半导体衬底，所述船垂直地移动到所述管中; 垂直布置在所述管中的气体喷嘴，所述管具有从所述第一部分向上延伸的第一部分和第二部分; 用于向气体喷嘴提供反应气体的气体管道，气体管道具有水平延伸部和垂直延伸部分，并且在气体喷嘴中延伸的垂直延伸部分; 固定构件，用于将气体喷嘴的第一部分固定到气体管，固定构件的强度高于气体喷嘴的强度; 以及用于将气体管道夹紧到管子的夹紧构件。因此，可以抑制气体喷嘴的破损。

3. 发明申请

US20070099379A1 Method of manufacturing a dielectric film in a capacitor 失效
标题翻译：制造电容器中的电介质膜的方法
公开(公告)号：US20070099379A1
公开(公告)日：2007-05-03
申请号：US11544760
申请日：2006-10-10
申请人： Jae-hyoung Choi , Sung-ho Kang , Jung-hee Chung , Seog-min Lee , Jong-bom Seo , Young-min Kim
发明人： Jae-hyoung Choi , Sung-ho Kang , Jung-hee Chung , Seog-min Lee , Jong-bom Seo , Young-min Kim
IPC分类号： H01L21/336
CPC分类号： H01L21/0228 , C23C16/405 , C23C16/45527 , H01L21/02175 , H01L21/3141 , H01L21/31645 , H01L28/40
摘要： A method of manufacturing a dielectric layer for a capacitor including sequentially supplying and purging a first and a second precursor material for a first and a second predetermined amount of time, respectively, in an initial cycle, sequentially supplying and purging the first and the second precursor materials for a third predetermined amount of time, which is shorter than the first and/or second predetermined amount of time, in a post cycle, which follows the initial cycle, and repeating the initial and post cycles to form a dielectric layer having a predetermined thickness.
摘要翻译：一种电容器用电介质层的制造方法，其特征在于，在初始循环中分别顺序地供给和吹扫第一和第二前体材料，分别第一和第二预定量的时间，依次供给和净化所述第一和第二前体在后循环中第三预定时间量的材料，其比第一和/或第二预定量的时间短，其在初始循环之后，并且重复初始和后期循环以形成具有预定的厚度。

4. 发明授权

US07140384B2 Substrate processing equipment having mass flow controller 有权
标题翻译：具有质量流量控制器的基板加工设备
公开(公告)号：US07140384B2
公开(公告)日：2006-11-28
申请号：US10869968
申请日：2004-06-18
申请人： Sung-Ho Kang , Seog-Min Lee , Sung-Wook Jung , Yong-Suk Kim
发明人： Sung-Ho Kang , Seog-Min Lee , Sung-Wook Jung , Yong-Suk Kim
IPC分类号： G05D7/06
CPC分类号： G05D7/0652 , G01F1/6847 , G01F15/005 , Y10T137/7759 , Y10T137/7761 , Y10T137/87314 , Y10T137/87362 , Y10T137/88062
摘要： A mass flow controller includes a base having a first passage, an inlet portion for introducing fluid into the first passage, an outlet portion for releasing the fluid from the first passage, and a second passage branched from a first upstream portion of the first passage and connected to a second downstream portion of the first passage A mass flow sensor is connected to the first passage between the inlet portion of the base and the first portion of the first passage; A first valve is disposed in-line with the first passage between the first and second portions. The first valve controls the mass flow of the fluid passing through the first passage;. A second valve is disposed in-line with the second passage to opens/close the second passage. A valve controller compares the mass flow measured by the mass flow sensor to a standard flow, and then positions the first valve such that the measured mass flow corresponds to the standard flow.
摘要翻译：质量流量控制器包括具有第一通道的基座，用于将流体引入第一通道的入口部分，用于从第一通道释放流体的出口部分和从第一通道的第一上游部分分支的第二通道，连接到第一通道A的第二下游部分质量流量传感器连接到基座的入口部分和第一通道的第一部分之间的第一通道; 第一阀与第一和第二部分之间的第一通道成一直线设置。第一阀控制通过第一通道的流体的质量流量。第二阀与第二通道成一直线设置以打开/关闭第二通道。阀门控制器将由质量流量传感器测量的质量流量与标准流量进行比较，然后将第一阀门定位，使得测得的质量流量对应于标准流量。

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