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    • 8. 发明授权
    • Non-volatile memory device and method of manufacturing the same
    • 非易失性存储器件及其制造方法
    • US08049269B2
    • 2011-11-01
    • US11898266
    • 2007-09-11
    • Se-Hoon LeeKyu-Charn ParkJeong-Dong Choe
    • Se-Hoon LeeKyu-Charn ParkJeong-Dong Choe
    • H01L29/792H01L29/788H01L21/336H01L21/8247
    • H01L27/115H01L27/11568H01L29/66833H01L29/792H01L29/7926
    • In a non-volatile memory device, active fin structures extending in a first direction may be formed on a substrate. A tunnel insulating layer may be formed on surfaces of the active fin structures and bottom surfaces of trenches that may be defined by the active fin structures. A charge trapping layer and a blocking layer may be sequentially formed on the tunnel insulating layer. A gate electrode structure may include first portions disposed over top surfaces of the active fin structures and second portions vertically spaced apart from portions of the charge trapping layer that may be disposed over the bottom surfaces of the trenches, and may extend in a second direction substantially perpendicular to the first direction. Thus, lateral electron diffusion may be reduced in the charge trapping layer, and thereby the data retention performance and/or reliability of the non-volatile memory device may be improved.
    • 在非易失性存储器件中,可以在衬底上形成沿第一方向延伸的活性鳍结构。 隧道绝缘层可以形成在活动鳍结构和沟槽底表面的表面上,沟槽绝缘层可以由活性鳍结构限定。 电荷俘获层和阻挡层可以顺序形成在隧道绝缘层上。 栅极电极结构可以包括设置在有源鳍结构的顶表面上的第一部分和与可以设置在沟槽的底表面之上的电荷俘获层的部分垂直间隔开的第二部分,并且可以在基本上 垂直于第一方向。 因此,电荷捕捉层中的横向电子扩散可能减少,从而可以提高非易失性存储器件的数据保持性能和/或可靠性。