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1. 发明授权

US08213764B2 Information processing apparatus, method and program 有权
标题翻译：信息处理装置，方法和程序
公开(公告)号：US08213764B2
公开(公告)日：2012-07-03
申请号：US11948569
申请日：2007-11-30
申请人： Tatsuo Kuroiwa , Masachika Sasaki , Satoshi Fujimura , Hisashi Hosaka , Hiroshi Nagatani , Yuki Murata , Satoshi Akagawa , Shigeya Yasui , Yoshiyasu Kubota , Yukiko Sakata , Mitsuo Okumura , Masahide Sumiyoshi , Toshiaki Kusakabe , Masahiro Hara , Masanori Nomura , Satoshi Hiroi , Bin Lin
发明人： Tatsuo Kuroiwa , Masachika Sasaki , Satoshi Fujimura , Hisashi Hosaka , Hiroshi Nagatani , Yuki Murata , Satoshi Akagawa , Shigeya Yasui , Yoshiyasu Kubota , Yukiko Sakata , Mitsuo Okumura , Masahide Sumiyoshi , Toshiaki Kusakabe , Masahiro Hara , Masanori Nomura , Satoshi Hiroi , Bin Lin
IPC分类号： H04N5/932 , H04N5/935
CPC分类号： H04N19/87 , G11B27/28 , G11B27/34
摘要： An information processing apparatus includes area image extracting means for extracting, as a telop image, an area displaying a telop in contents, detecting means for detecting a scene change in images of the contents, recording means for converting an image at the time when a scene change is detected by the detecting means to a thumbnail image and recording the thumbnail image, display control means for controlling to arrange and display a plurality of the thumbnail images and a plurality of the telop images chronologically, and playing means for playing the contents from the position corresponding to the selected thumbnail image or telop image.
摘要翻译：一种信息处理装置，包括区域图像提取装置，用于提取作为字幕图像的内容中显示字幕的区域;检测装置，用于检测内容的图像的场景变化;记录装置，用于在场景通过检测装置检测到缩略图的变化并记录缩略图，显示控制装置用于控制以按时间顺序排列和显示多个缩略图和多个字幕图像;以及播放装置，用于播放来自对应于所选缩略图或字幕图像的位置。

2. 发明申请

US20100289442A1 BRUSHLESS MOTOR POSITION DETECTION DEVICE 有权
标题翻译：无刷马达位置检测装置
公开(公告)号：US20100289442A1
公开(公告)日：2010-11-18
申请号：US12812248
申请日：2009-01-16
申请人： Kenta Hatano , Toshiyuki Umemoto , Naoki Miyamoto , Satoshi Fujimura
发明人： Kenta Hatano , Toshiyuki Umemoto , Naoki Miyamoto , Satoshi Fujimura
IPC分类号： H02K29/08
CPC分类号： H02K29/08 , H02K5/225 , H02K11/215
摘要： A brushless motor position detection device has a set of first Hall elements (main Hall ICs 18 for detecting magnetic pole positions) and a set of second Hall elements (sub-Hall ICs 19 for detecting magnetic pole positions) mounted on a plane facing a magnetic pole position detecting magnet 16 for detecting the position of a rotor 12. They are subjected to offset adjustment and are mounted in such a manner that the difference between the maximum value of the magnetic flux density at the mounting positions of the first Hall elements and the maximum value of the magnetic flux density at the mounting positions of the second Hall elements is held within a prescribed limit (mounted in such a manner as to have the offset of a prescribed machine angle in the circumferential direction) to bring the detection accuracy of the plurality of sets of the Hall elements into agreement.
摘要翻译：无刷电动机位置检测装置具有一组第一霍尔元件（用于检测磁极位置的主霍尔IC 18）和一组安装在面对磁场的平面上的第二霍尔元件（用于检测磁极位置的子霍尔IC 19）用于检测转子12的位置的极位置检测磁铁16.它们经受偏移调整，并且以这样的方式安装，使得第一霍尔元件的安装位置处的磁通密度的最大值与将第二霍尔元件的安装位置处的磁通密度的最大值保持在规定的限度内（以规定的机器角度在圆周方向上偏移的方式安装），以使检测精度多个组合的霍尔元素达成一致。

3. 发明授权

US07501221B2 Positive type resist composition and resist pattern formation method using same 有权
标题翻译：正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法
公开(公告)号：US07501221B2
公开(公告)日：2009-03-10
申请号：US11347167
申请日：2006-02-02
申请人： Takeshi Iwai , Naotaka Kubota , Satoshi Fujimura , Miwa Miyairi , Hideo Hada
发明人： Takeshi Iwai , Naotaka Kubota , Satoshi Fujimura , Miwa Miyairi , Hideo Hada
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, whereinthe component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.
摘要翻译：提供一种正型树脂组合物，其包含（A）树脂组分，其在主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团（B）在暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元酯和衍生自丙烯酸酯的结构单元。根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

4. 发明授权

US07435530B2 Positive type resist composition and resist pattern formation method using same 有权
标题翻译：正型抗蚀剂组合物和使用其的抗蚀剂图案形成方法
公开(公告)号：US07435530B2
公开(公告)日：2008-10-14
申请号：US11621437
申请日：2007-01-09
申请人： Takeshi Iwai , Naotaka Kubota , Satoshi Fujimura , Miwa Miyairi , Hideo Hada
发明人： Takeshi Iwai , Naotaka Kubota , Satoshi Fujimura , Miwa Miyairi , Hideo Hada
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.
摘要翻译：一种正型树脂组合物，其包含（A）树脂组分，其在所述主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团，在碱的作用下，碱的溶解度增加，（B）暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元和衍生自丙烯酸酯的结构单元。根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

5. 发明申请

US20080063975A1 Polymer, Positive Resist Composition and Method for Forming Resist Pattern 有权
标题翻译：聚合物，正电阻组合物和形成抗蚀剂图案的方法
公开(公告)号：US20080063975A1
公开(公告)日：2008-03-13
申请号：US11628172
申请日：2005-06-02
申请人： Masaru Takeshita , Hideo Hada , Ryotaro Hayashi , Takeshi Iwai , Syogo Matsumaru , Satoshi Fujimura
发明人： Masaru Takeshita , Hideo Hada , Ryotaro Hayashi , Takeshi Iwai , Syogo Matsumaru , Satoshi Fujimura
IPC分类号： C08G63/08 , G03F1/00 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0395 , Y10S430/108 , Y10S430/111 , Y10S430/122 , Y10S430/126
摘要： A polymer, a positive resist composition, and a method for forming a resist pattern that are able to form a resist pattern with a high level of resolution and excellent etching resistance. The present invention uses a polymer that contains a structural unit (a1) represented by a general formula (a-1) shown below and a structural unit (a2) represented by a general formula (a-2) shown below, another polymer that contains the structural unit (a1) and a structural unit (a3) represented by a general formula (a-3) shown below, and another polymer that contains the structural unit (a1), the structural unit (a2), and the structural unit (a3).
摘要翻译：聚合物，正性抗蚀剂组合物和形成能够以高分辨率和优异耐蚀刻性形成抗蚀剂图案的抗蚀剂图案的方法。本发明使用含有下述通式（a-1）表示的结构单元（a1）和下述通式（a-2）表示的结构单元（a2）的聚合物，该聚合物含有结构单元（a1）和由下述通式（a-3）表示的结构单元（a3）和含有结构单元（a1），结构单元（a2）和结构单元（ a3）。

6. 发明授权

US07326515B2 Positive type resist composition and resist pattern formation method using same 有权
公开(公告)号：US07326515B2
公开(公告)日：2008-02-05
申请号：US11004798
申请日：2004-12-07
申请人： Takeshi Iwai , Naotaka Kubota , Satoshi Fujimura , Miwa Miyairi , Hideo Hada
发明人： Takeshi Iwai , Naotaka Kubota , Satoshi Fujimura , Miwa Miyairi , Hideo Hada
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.

7. 发明申请

US20070190455A1 POSITIVE TYPE RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD USING SAME 有权
标题翻译：使用相同类型的积极类型抗蚀剂组合物和抗蚀剂图案形成方法
公开(公告)号：US20070190455A1
公开(公告)日：2007-08-16
申请号：US11621437
申请日：2007-01-09
申请人： Takeshi Iwai , Naotaka Kubota , Satoshi Fujimura , Miwa Miyairi , Hideo Hada
发明人： Takeshi Iwai , Naotaka Kubota , Satoshi Fujimura , Miwa Miyairi , Hideo Hada
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an ester side chain section, for which the solubility in alkali increases under the action of acid, (B) an acid generator component which generates acid on exposure, and (C) an organic solvent, wherein the component (A) comprises both a structural unit derived from a methacrylate ester and a structural unit derived from an acrylate ester. According to such a resist composition, a resist pattern can be formed which displays little surface roughness and line edge roughness on etching, and also offers excellent resolution and a wide depth of focus range.
摘要翻译：一种正型树脂组合物，其包含（A）树脂组分，其在所述主链内包含衍生自（甲基）丙烯酸酯的结构单元，并且在酯侧链部分上并入含有多环基团的酸解离的溶解抑制基团，在碱的作用下，碱的溶解度增加，（B）暴露时产生酸的酸产生剂组分和（C）有机溶剂，其中组分（A）包含衍生自甲基丙烯酸酯的结构单元和衍生自丙烯酸酯的结构单元。根据这样的抗蚀剂组合物，可以形成抗蚀剂图案，其在蚀刻时显示出很小的表面粗糙度和线边缘粗糙度，并且还提供优异的分辨率和宽的焦深范围。

8. 发明申请

US20070178394A1 RESIST COMPOSITION 有权
标题翻译：耐腐蚀组合物
公开(公告)号：US20070178394A1
公开(公告)日：2007-08-02
申请号：US11621896
申请日：2007-01-10
申请人： Taku Hirayama , Hideo Hada , Satoshi Fujimura , Takeshi Iwai , Mitsuru Sato , Ryoichi Takasu , Toshikazu Tachikawa , Jun Iwashita , Keita Ishiduka , Tomotaka Yamada , Toshikazu Takayama , Masaaki Yoshida
发明人： Taku Hirayama , Hideo Hada , Satoshi Fujimura , Takeshi Iwai , Mitsuru Sato , Ryoichi Takasu , Toshikazu Tachikawa , Jun Iwashita , Keita Ishiduka , Tomotaka Yamada , Toshikazu Takayama , Masaaki Yoshida
IPC分类号： G03C5/00
CPC分类号： G03F7/70616 , G03F7/0382 , G03F7/0397 , G03F7/70341 , Y10S430/106 , Y10S430/111
摘要： A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.
摘要翻译：提供了相对于在浸没式光刻工艺中使用的溶剂是稳定的并且显示出优异的灵敏度和抗蚀剂图案轮廓的抗蚀剂组合物，以及形成使用这种抗蚀剂组合物的抗蚀剂图案的方法。抗蚀剂组合物是根据预定参数，或是包含含有酸解离的溶解抑制基团并在酸的作用下显示增加的碱溶性的树脂组分（A）的阳性抗蚀剂组合物，酸产生剂组分（B）和有机溶剂（C），其中，成分（A）含有来自含有酸解离性，溶解抑制基团但不含结构单元（a0）的（甲基）丙烯酸酯的结构单元（a1）含有二羧酸的酸酐的单元（a0-1）和含有酚羟基的结构单元（a0-2）。

9. 发明申请

US20060154174A1 Resist composition, multilayer body, and method for forming resist pattern 有权
公开(公告)号：US20060154174A1
公开(公告)日：2006-07-13
申请号：US10563705
申请日：2004-07-07
申请人： Hideo Hada , Kazuhito Sasaki , Satoshi Fujimura , Takeshi Iwai
发明人： Hideo Hada , Kazuhito Sasaki , Satoshi Fujimura , Takeshi Iwai
IPC分类号： G03C1/76
CPC分类号： G03F7/40 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist pattern that use such a resist composition. This resist composition includes a resin component (A) that displays changed alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure. The component (A) contains structural units derived from a (meth)acrylate ester, and exhibits a glass transition temperature that falls within a range from 120 to 170° C.

10. 发明授权

US06982140B2 Positive resist composition and method of forming resist pattern 有权
标题翻译：正型抗蚀剂组合物和形成抗蚀剂图案的方法
公开(公告)号：US06982140B2
公开(公告)日：2006-01-03
申请号：US10466172
申请日：2002-11-29
申请人： Hideo Hada , Satoshi Fujimura , Jun Iwashita
发明人： Hideo Hada , Satoshi Fujimura , Jun Iwashita
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： There is provided a positive type resist composition formed by dissolving (A) a resin component with a unit derived from a (meth)acrylate ester in the principal chain, for which the solubility in alkali increases under the action of acid, and (B) an acid generator component which generates acid on exposure, in an organic solvent component (C), wherein the resin component (A) is a copolymer comprising (a1) a unit derived from a (meth)acrylate ester comprising an acid dissociable, dissolution inhibiting group containing a polycyclic group, (a2) a unit derived from a (meth)acrylate ester comprising a lactone containing monocyclic group or polycyclic group, (a3) a unit derived from a (meth)acrylate ester comprising a hydroxyl group containing polycyclic group, and (a4) a unit derived from a (meth)acrylate ester comprising a polycyclic group which is different from the unit (a1), the unit (a2) and the unit (a3). This composition provides a chemically amplified positive type resist composition which displays excellent resolution, enables the depth of focus range of an isolated resist pattern to be improved, and enables the proximity effect to be suppressed.
摘要翻译：提供一种正型抗蚀剂组合物，其通过将（A）树脂组分与主链中衍生自（甲基）丙烯酸酯的单元溶解，其中在碱的作用下碱的溶解度增加，（B）一种在有机溶剂组分（C）中暴露时产生酸的酸产生剂组分，其中树脂组分（A）是共聚物，其包含（a1）衍生自（甲基）丙烯酸酯的单元，其包含酸解离，溶解抑制含有多环基团的基团，（a2）由含有内酯单体或多环基团的（甲基）丙烯酸酯衍生的单元，（a3）由含有羟基的多环基团的（甲基）丙烯酸酯衍生的单元，和（a4）衍生自包含与单元（a1），单元（a2）和单元（a3）不同的多环基团的（甲基）丙烯酸酯的单元。该组合物提供显示出优异的分辨率的化学放大正型抗蚀剂组合物，能够提高隔离抗蚀剂图案的聚焦范围的深度，并且能够抑制邻近效应。

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