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1. 发明授权

US09962240B2 Dental implant fixture 有权
公开(公告)号：US09962240B2
公开(公告)日：2018-05-08
申请号：US12993142
申请日：2009-05-19
申请人： Sang Oh Park , Byung Kook Kim , Mu Young Park , Tae Gwan Eom , Kyoo Ok Choi
发明人： Sang Oh Park , Byung Kook Kim , Mu Young Park , Tae Gwan Eom , Kyoo Ok Choi
IPC分类号： A61C8/00 , A61B17/86
CPC分类号： A61C8/0022 , A61B17/863 , A61B17/8635 , A61B17/864 , A61C8/0025
摘要： The present invention relates to a dental implant fixture, and more particularly, to a dental implant fixture which rotates about a central axis thereof, and thus is inserted into a bone tissue constituted by a cortical bone and a spongy bone to form an artificial tooth root, wherein the dental implant fixture includes a first portion, a second portion, and a third portion. The first portion is inserted into the cortical bone and has an outer surface with a first screw thread whereon first vertices and first valleys are alternately arranged. The second portion is disposed beneath the first portion and inserted into the spongy bone, has an outer surface with a second screw thread whereon second vertices and second valleys are alternately arranged. The distance between the adjacent second vertices of the second screw thread is larger than the distance between the adjacent first vertices of the first screw thread. The third portion is disposed beneath the second portion, and has an outer surface with a third screw thread whereon third vertices and third valleys are alternately arranged, and a first cutting part which is hollowed such that the first cutting part is closer to the central axis than the third valleys. The lower outer diameter of the second screw thread is smaller than the upper outer diameter of the second screw thread.

2. 发明授权

US07520068B2 Apparatus and method for drying semiconductor substrates 有权
标题翻译：用于干燥半导体衬底的装置和方法
公开(公告)号：US07520068B2
公开(公告)日：2009-04-21
申请号：US10831175
申请日：2004-04-26
申请人： Hun-Jung Yi , Sang-Oh Park
发明人： Hun-Jung Yi , Sang-Oh Park
IPC分类号： F26B25/06
CPC分类号： H01L21/67034
摘要： A drying apparatus and method of drying a wafer including supplying a drying material for drying a wafer and controlling a flow of the drying material to uniformly or substantially dry the wafer. The flow of the drying material may be controlled by a vent unit including at least one part for controlling the flow of the drying material to uniformly or substantially uniformly dry the wafer.
摘要翻译：一种干燥装置和干燥晶片的方法，包括提供用于干燥晶片的干燥材料并控制干燥材料的流动以使晶片均匀或基本干燥。干燥材料的流动可以由包括至少一个部分的排气单元控制，用于控制干燥材料的流动以均匀地或基本均匀地干燥晶片。

3. 发明授权

US07255115B2 Apparatus for cleaning semiconductor wafers 失效
标题翻译：用于清洁半导体晶片的设备
公开(公告)号：US07255115B2
公开(公告)日：2007-08-14
申请号：US10410278
申请日：2003-04-10
申请人： Young-Min Kwon , Chang-Hyeon Nam , Sang-Oh Park , Young-Kwang Myoung , Duk-Min Ahn
发明人： Young-Min Kwon , Chang-Hyeon Nam , Sang-Oh Park , Young-Kwang Myoung , Duk-Min Ahn
IPC分类号： B08B3/00
CPC分类号： H01L21/67057 , B08B3/102 , H01L21/67028 , Y10S134/902
摘要： An apparatus for cleaning semiconductor wafers includes a chamber, a bubbler having a vapor generating part for generating alcohol vapor and a spray pipe for spraying the alcohol vapor into the chamber, a gas supply nozzle for spraying gas into the chamber to dry the wafers, a liquid supply nozzle for supplying cleaning liquid into the chamber and a discharge system. The spray pipe of the bubbler has a liquid retention portion that keeps condensate of the alcohol vapor from issuing into the chamber. The gas supply nozzle has a spray outlet configured to spray the same amount of the drying gas onto all of the wafers in the chamber. The liquid supply nozzle has liquid supply openings only in a side portion thereof so that liquid alcohol will not become trapped therein.
摘要翻译：一种用于清洁半导体晶片的装置，包括：室，具有用于产生醇蒸气的蒸汽发生部分的起泡器和用于将醇蒸气喷射到室中的喷管;用于将气体喷射到室中以干燥晶片的气体供应喷嘴; 用于向清洗室供给清洗液的液体供给喷嘴和排出系统。起泡器的喷管具有液体保持部分，其保持醇蒸汽的冷凝物不会发射到室中。气体供应喷嘴具有喷雾出口，其构造成将相同量的干燥气体喷射到室中的所有晶片上。液体供给喷嘴仅在其侧部具有液体供应开口，使得液态醇不会被捕获在其中。

4. 发明申请

US20070017117A1 APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATE 审中-公开
标题翻译：干燥半导体基板的装置
公开(公告)号：US20070017117A1
公开(公告)日：2007-01-25
申请号：US11458194
申请日：2006-07-18
申请人： Hun-Jung YI , Sang-Oh PARK
发明人： Hun-Jung YI , Sang-Oh PARK
IPC分类号： F26B3/00 , F26B5/04
CPC分类号： H01L21/67034
摘要： An apparatus for drying a substrate is provided. In one embodiment, the apparatus includes a drying room in which a support member for supporting a plurality of wafers is disposed. The apparatus further includes a drying gas-supply element for supplying a drying gas to the substrates supported by the support member. The drying gas-supply element includes nozzles located within the drying room and arranged in a plurality of groups, and supply pipes for supplying a drying gas to the nozzles. Nozzles belonging to a first group are formed such that the density of the openings in a spray port is higher in a front region than in other regions, and nozzles belonging to a second group are formed such that density of openings in a spray port is higher in a rear region than in other regions. Different supply pipes can be connected to nozzles belonging to different groups, and a flow control valve can be installed in each of the supply pipes.
摘要翻译：提供了一种干燥基板的设备。在一个实施例中，该设备包括一个干燥室，其中设置有用于支撑多个晶片的支撑构件。该装置还包括用于将干燥气体供给到由支撑构件支撑的基板的干燥气体供应元件。干燥气体供给元件包括位于干燥室内的喷嘴，并且设置成多组，并且向喷嘴供给干燥气体供给管。形成属于第一组的喷嘴，使得喷嘴中的开口的密度在前区域比在其它区域高，并且形成属于第二组的喷嘴，使得喷嘴中的开口密度更高在后方区域比其他地区。可以将不同的供给管连接到属于不同组的喷嘴，并且可以在每个供应管中安装流量控制阀。

5. 发明申请

US20060027513A1 Wafer guides for processing semiconductor substrates 失效
标题翻译：用于处理半导体衬底的晶片导板
公开(公告)号：US20060027513A1
公开(公告)日：2006-02-09
申请号：US11234033
申请日：2005-09-24
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： A47G19/08
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide used in cleaning and/or drying processes of semiconductor wafers is provided. The wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels. Accordingly, contact areas between the wafers and the wafer guide are reduced to improve a drying efficiency of the wafers.
摘要翻译：提供了用于半导体晶片的清洁和/或干燥处理的晶片引导件。晶片引导件包括水平支撑面板和至少三个垂直面板，其附接在支撑面板的一个表面上。每个垂直面板具有垂直的主体面板和从垂直主体面板的顶面向上延伸的多个突起。突起之间的间隙区域用作保持晶片的槽。当从顶视图观察时，槽的侧壁具有凸形的轮廓，并且当从横切垂直板的横截面视图观察时，槽的底表面也具有凸形轮廓。因此，晶片和晶片引导件之间的接触面积减小，以提高晶片的干燥效率。

6. 发明授权

US06713440B2 Resist and etching by-product removing composition and resist removing method using the same 失效
公开(公告)号：US06713440B2
公开(公告)日：2004-03-30
申请号：US10059150
申请日：2002-01-31
申请人： Dong-jin Park , Kyung-dae Kim , Sang-mun Chon , Jin-ho Hwang , Il-hyun Sohn , Sang-oh Park , Pil-kwon Jun
发明人： Dong-jin Park , Kyung-dae Kim , Sang-mun Chon , Jin-ho Hwang , Il-hyun Sohn , Sang-oh Park , Pil-kwon Jun
IPC分类号： C11D344
CPC分类号： C11D1/526 , C11D11/0047 , G03F7/425
摘要： A resist removing composition having a superior capability for removing a resist, polymer, organometallic polymer and etching by-products such as metal oxide, which does not attack underlying layers exposed to the composition and which does not leave residues after a rinsing step. The resist removing composition contains alkoxy N-hydroxyalkyl alkanamide and a swelling agent.

7. 发明授权

US09722391B2 Laser system 有权
公开(公告)号：US09722391B2
公开(公告)日：2017-08-01
申请号：US13701703
申请日：2011-06-01
申请人： Young Geun Han , Ryun Kyung Kim , Sang Oh Park , Oh Jang Kwon , Su Ho Chu
发明人： Young Geun Han , Ryun Kyung Kim , Sang Oh Park , Oh Jang Kwon , Su Ho Chu
IPC分类号： H01S3/30 , H01S3/067 , H01S3/094 , H01S3/0941 , H01S3/08
CPC分类号： H01S3/06791 , H01S3/0675 , H01S3/0809 , H01S3/094015 , H01S3/094019 , H01S3/094042 , H01S3/094065 , H01S3/0941 , H01S3/09415 , H01S3/10084 , H01S3/1608 , H01S3/2375 , H01S5/12 , H01S5/141 , H01S5/146
摘要： A laser system according to an embodiment of the present invention includes an oscillation unit to generate a laser output, a connection unit to connect the oscillation unit with an optical fiber loop, an amplifying unit to amplify the laser output on the optical fiber loop, a conversion unit disposed on the optical fiber loop to convert pulsed wave laser output into continuous wave laser output, and an output unit disposed between the connection unit and the conversion unit to split a part of the laser output toward the conversion unit. The system for generating a high output pulsed wave laser and converting the pulsed wave laser into a continuous wave laser may be implemented in a simple structure and small size with high stability and high reproducibility. In addition, a high output laser may be obtained. Also, since conversion from the pulsed wave into the continuous wave is easy, both of the high output pulsed wave and the high output continuous wave may be obtained as necessary.

8. 发明申请

US20080216347A1 Apparatus and method for drying semiconductor substrates 审中-公开
标题翻译：用于干燥半导体衬底的装置和方法
公开(公告)号：US20080216347A1
公开(公告)日：2008-09-11
申请号：US12078554
申请日：2008-04-01
申请人： Hun-Jung Yi , Sang-Oh Park
发明人： Hun-Jung Yi , Sang-Oh Park
IPC分类号： F26B3/00
CPC分类号： H01L21/67034
摘要： A drying apparatus and method of drying a wafer including supplying a drying material for drying a wafer and controlling a flow of the drying material to uniformly or substantially uniformly dry the wafer. The flow of the drying material may be controlled by a vent unit including at least one part for controlling the flow of the drying material to uniformly or substantially uniformly dry the wafer.
摘要翻译：一种干燥装置和干燥晶片的方法，包括提供用于干燥晶片的干燥材料并控制干燥材料的流动以均匀或基本均匀地干燥晶片。干燥材料的流动可以由包括至少一个部分的排气单元控制，用于控制干燥材料的流动以均匀地或基本均匀地干燥晶片。

9. 发明申请

US20060260149A1 Wafer guides for processing semiconductor substrates 审中-公开
公开(公告)号：US20060260149A1
公开(公告)日：2006-11-23
申请号：US11492591
申请日：2006-07-25
申请人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
发明人： Pil-Kwon Jun , Sang-oh Park , Yong-Kyun Ko , Hun-Jung Yi
IPC分类号： F26B7/00
CPC分类号： H01L21/67326 , B65D25/103 , H01L21/67057 , Y10S134/902
摘要： A wafer guide includes a horizontal support panel and at least three vertical panels attached on one surface of the support panel. Each of the vertical panels has a vertical body panel and a plurality of protrusions upwardly extended from a top surface of the vertical body panel. Gap regions between the protrusions act as slots for holding wafers. Sidewalls of the slots have a convex shaped profile when viewed from a top view, and bottom surfaces of the slots also have a convex shaped profile when viewed from a cross sectional view that crosses the vertical panels.

10. 发明申请

US20060237033A1 CLEANING APPARATUS AND METHOD 审中-公开
标题翻译：清洁装置和方法
公开(公告)号：US20060237033A1
公开(公告)日：2006-10-26
申请号：US11380286
申请日：2006-04-26
申请人： Hun-Jung Yi , Yang-Koo Lee , Pil-Kwon Jun , Sang-Oh Park , Jai-Young Woo
发明人： Hun-Jung Yi , Yang-Koo Lee , Pil-Kwon Jun , Sang-Oh Park , Jai-Young Woo
IPC分类号： B08B3/00 , C23G1/00
CPC分类号： H01L21/02052 , B08B3/04 , H01L21/67017 , H01L21/67028 , H01L21/67126
摘要： In an embodiment, a cleaning apparatus and method can prevent adsorption of nano-size particles by wafers. The apparatus includes a cleaning chamber for filling with a cleaning solution for cleaning an object and a drying chamber disposed over the cleaning chamber for drying the object by supplying drying fluid from an upper part. It also includes a transferring unit for transferring the object by moving it between the cleaning and drying chambers. Further, it includes a moveable exhaust plate disposed between the drying chamber and the cleaning chamber for dividing the two chambers and for exhausting the drying fluid supplied to the drying chamber. The drying fluid flows in a uniform laminar flow in the drying chamber.
摘要翻译：在一个实施例中，清洁装置和方法可以防止由晶片吸收纳米尺寸的颗粒。该装置包括用于填充用于清洁物体的清洁溶液的清洁室和设置在清洁室上方的干燥室，用于通过从上部供应干燥流体来干燥物体。它还包括用于通过在清洁和干燥室之间移动物体来传送物体的转印单元。此外，其包括设置在干燥室和清洁室之间的可移动排气板，用于分隔两个室并排出供应到干燥室的干燥流体。干燥流体在干燥室中以均匀的层流流动。

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