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1. 发明申请

US20130285275A1 METHOD AND APPARATUS FOR MANUFACTURING MELT-BLOWN FABRIC WEB HAVING RANDOM AND BULKY CHARACTERISTICS 有权
标题翻译：制造具有随机和大容量特征的熔融织物网的方法和装置
公开(公告)号：US20130285275A1
公开(公告)日：2013-10-31
申请号：US13595152
申请日：2012-08-27
申请人： Jung Wook Lee , Gi Won Kim , Hyeon Ho Kim , Won Jin Seo , Dong Uk Lee , Moon Soo Lim , Min Su Kim , Jin Ho Hwang , Ki Wook Yang , In Hee Song
发明人： Jung Wook Lee , Gi Won Kim , Hyeon Ho Kim , Won Jin Seo , Dong Uk Lee , Moon Soo Lim , Min Su Kim , Jin Ho Hwang , Ki Wook Yang , In Hee Song
IPC分类号： D02G1/16 , B29C47/00
CPC分类号： D01D5/0985 , D04H3/16
摘要： Disclosed is a method and apparatus for manufacturing a melt-blown fabric web, by which a melt-blown fabric web having improved filament cohesion and excellent bulky characteristics and sound-absorbing performance is manufactured. The apparatus includes a heat extruder for heating a thermoplastic resin composition and extruding the melted thermoplastic resin, a melt-blown fiber spinner for spinning the extruded thermoplastic resin as a melt-blown fiber in a filament form, a variable gas injector for injecting gas whose injection speed and injection quantity are continuously changed at random to the melt-blown fiber spun from the melt-blown fiber spinner to cause the injected gas to collide with the spun melt-blown fiber, and a collector for collecting the melt-blown fiber, which is spun from the melt-blown fiber spinner and collides with the gas, to form a melt-blown fabric web.
摘要翻译：公开了一种用于制造熔喷织物网的方法和设备，通过该方法和设备制造具有改善的纤维内聚力和优异的膨松特性和吸音性能的熔喷织物网。该设备包括用于加热热塑性树脂组合物并挤出熔融的热塑性树脂的热挤压机，用于将长丝形式的熔喷纤维挤出的热塑性树脂纺丝的熔喷纤维旋转器，用于注入气体的可变气体喷射器喷射速度和喷射量随机地连续地变化为从熔喷纤维旋转器纺出的熔喷纤维，使注入的气体与纺丝熔喷纤维发生碰撞，以及用于收集熔喷纤维的收集器，其从熔喷纤维旋转器纺出并与气体碰撞，形成熔喷织物网。

2. 发明授权

US07376481B2 Methods and control systems for controlling semiconductor device manufacturing processes 有权
标题翻译：用于控制半导体器件制造工艺的方法和控制系统
公开(公告)号：US07376481B2
公开(公告)日：2008-05-20
申请号：US11430571
申请日：2006-05-09
申请人： Jin-ho Hwang , Joo-cheol Han
发明人： Jin-ho Hwang , Joo-cheol Han
IPC分类号： G06F19/00
CPC分类号： H01L21/67253 , B24B37/04 , B24B49/00 , G05B2219/31265 , G05B2219/31407 , H01L22/20
摘要： A method of controlling a semiconductor device manufacturing process for a product which is newly applied and a control system for the same process are provided. According to an embodiment on the control method, a sample process time for a product applied to the semiconductor device manufacturing process for the first time is calculated. The semiconductor device manufacturing process is performed based on the calculated sample process time. Then, a main process time is calculated by applying the stored sample process time to a main process time equation. The semiconductor device manufacturing process can be controlled on the basis of the main process time. The sample process time may be stored in an information storage table.
摘要翻译：提供一种控制新应用的产品的半导体器件制造工艺的方法和用于相同工艺的控制系统。根据控制方法的实施例，计算第一次应用于半导体器件制造过程的产品的样品处理时间。基于计算的样品处理时间执行半导体器件制造过程。然后，通过将存储的采样处理时间应用于主处理时间方程来计算主处理时间。可以在主处理时间的基础上控制半导体器件制造工艺。样本处理时间可以存储在信息存储表中。

3. 发明申请

US20070118244A1 Methods and control systems for controlling semiconductor device manufacturing processes 有权
标题翻译：用于控制半导体器件制造工艺的方法和控制系统
公开(公告)号：US20070118244A1
公开(公告)日：2007-05-24
申请号：US11430571
申请日：2006-05-09
申请人： Jin-ho Hwang , Joo-cheol Han
发明人： Jin-ho Hwang , Joo-cheol Han
IPC分类号： G06F19/00
CPC分类号： H01L21/67253 , B24B37/04 , B24B49/00 , G05B2219/31265 , G05B2219/31407 , H01L22/20
摘要： A method of controlling a semiconductor device manufacturing process for a product which is newly applied and a control system for the same process are provided. According to an embodiment on the control method, a sample process time for a product applied to the semiconductor device manufacturing process for the first time is calculated. The semiconductor device manufacturing process is performed based on the calculated sample process time. Then, a main process time is calculated by applying the stored sample process time to a main process time equation. The semiconductor device manufacturing process can be controlled on the basis of the main process time. The sample process time may be stored in an information storage table.
摘要翻译：提供一种控制新应用的产品的半导体器件制造工艺的方法和用于相同工艺的控制系统。根据控制方法的实施例，计算第一次应用于半导体器件制造过程的产品的样品处理时间。基于计算的样品处理时间执行半导体器件制造过程。然后，通过将存储的采样处理时间应用于主处理时间方程来计算主处理时间。可以在主处理时间的基础上控制半导体器件制造工艺。样本处理时间可以存储在信息存储表中。

4. 发明授权

US07037852B2 Composition for stripping photoresist and method of preparing the same 失效
标题翻译：剥离光刻胶的组合物及其制备方法
公开(公告)号：US07037852B2
公开(公告)日：2006-05-02
申请号：US10384711
申请日：2003-03-11
申请人： Dong-jin Park , Jin-sung Kim , Pil-kwon Jun , Jin-ho Hwang , Il-hyun Sohn
发明人： Dong-jin Park , Jin-sung Kim , Pil-kwon Jun , Jin-ho Hwang , Il-hyun Sohn
IPC分类号： H01L21/461 , B08B6/00 , C09K13/00
CPC分类号： H01L21/02071 , G03F7/422 , G03F7/425 , H01L21/31133
摘要： A composition for stripping photoresist, methods of preparing and forming the same, a method of manufacturing a semiconductor device using the composition, and a method of removing a photoresist pattern from an underlying layer using the composition, where the composition may include an ethoxy N-hydroxyalkyl alkanamide represented by the formula, CH3CH2—O—R3—CO—N—R1R2OH, an alkanolamine and a polar material. Raw materials of alkyl alkoxy alkanoate, represented by a chemical formula of R4—O—R3—COOR5, and alkanolamine, represented by a chemical formula of NHR1R2OH, may be mixed to form a mixture, which is stirred and cooled to obtain the composition. The composition may balance exfoliation and dissolution of photoresist patterns, and may potentially eliminate thread-type residues from remaining on a surface of an underlying layer after removing the photoresist patterns.
摘要翻译：用于剥离光刻胶的组合物，其制备和形成该组合物的方法，使用该组合物制造半导体器件的方法以及使用该组合物从下层除去光致抗蚀剂图案的方法，其中所述组合物可以包括乙氧基N- 由下式表示的羟基烷基链烷酰胺CH 3 3 -OR 3 -CO-NR 1 R＆lt; SUB＆lt; > 2 OH，链烷醇胺和极性材料。烷基烷氧基链烷酸酯的原料，由化学式R 4 -SOR 3 -COOR 5 N表示，链烷醇胺由化学式可以将NHR 1 R 2 OH的配方混合以形成混合物，将其搅拌并冷却以获得组合物。组合物可以平衡光刻胶图案的剥离和溶解，并且可能在去除光致抗蚀剂图案之后可能消除线型残留物残留在下层的表面上。

5. 发明授权

US06713440B2 Resist and etching by-product removing composition and resist removing method using the same 失效
公开(公告)号：US06713440B2
公开(公告)日：2004-03-30
申请号：US10059150
申请日：2002-01-31
申请人： Dong-jin Park , Kyung-dae Kim , Sang-mun Chon , Jin-ho Hwang , Il-hyun Sohn , Sang-oh Park , Pil-kwon Jun
发明人： Dong-jin Park , Kyung-dae Kim , Sang-mun Chon , Jin-ho Hwang , Il-hyun Sohn , Sang-oh Park , Pil-kwon Jun
IPC分类号： C11D344
CPC分类号： C11D1/526 , C11D11/0047 , G03F7/425
摘要： A resist removing composition having a superior capability for removing a resist, polymer, organometallic polymer and etching by-products such as metal oxide, which does not attack underlying layers exposed to the composition and which does not leave residues after a rinsing step. The resist removing composition contains alkoxy N-hydroxyalkyl alkanamide and a swelling agent.

6. 发明授权

US08695675B2 Cargo screen structure 有权
标题翻译：货物屏幕结构
公开(公告)号：US08695675B2
公开(公告)日：2014-04-15
申请号：US13535092
申请日：2012-06-27
申请人： Jae Hwan Kim , Seong Hyeon Lee , Yong Chae Kim , Jae Yong Lee , Moon Gyu Park , Min Ho Cho , Sang Woo Park , Eun Jeong Yang , Hyoung Shin , Ah Sal Moon , Jae Hak Joo , Jin Ho Hwang , Hak Song Lim , Eun Su Jang
发明人： Jae Hwan Kim , Seong Hyeon Lee , Yong Chae Kim , Jae Yong Lee , Moon Gyu Park , Min Ho Cho , Sang Woo Park , Eun Jeong Yang , Hyoung Shin , Ah Sal Moon , Jae Hak Joo , Jin Ho Hwang , Hak Song Lim , Eun Su Jang
IPC分类号： G08B13/08
CPC分类号： B60R5/047 , B60Q3/30
摘要： A cargo screen structure may include a housing mounted at an upper portion of a vehicle luggage room in a horizontal direction, a shaft rotatably provided in the housing, a screen provided on an outer peripheral surface of the shaft and wound and unwound from the housing, and a switch provided in the housing and set to be turned on/off according to a winding amount of the screen around the outer peripheral surface of the shaft.
摘要翻译：货物筛网结构可以包括安装在车辆行李箱的水平方向的上部的壳体，可旋转地设置在壳体中的轴，设置在轴的外周表面上的屏幕，并从壳体中卷绕和展开，以及设置在所述壳体中并根据围绕所述轴的外周面的所述丝网的卷绕量而被设定为开/关的开关。

7. 发明申请

US20130134734A1 Cargo Screen of Vehicle Luggage Room 有权
标题翻译：车载行李箱货柜
公开(公告)号：US20130134734A1
公开(公告)日：2013-05-30
申请号：US13529727
申请日：2012-06-21
申请人： Jae Hwan Kim , Seong Hyeon Lee , Yong Chae Kim , Jae Yong Lee , Moon Gyu Park , Min Ho Cho , Sang Woo Park , Eun Jeong Yang , Hyoung Shin , Ah Sal Moon , Jae Hak Joo , Hoo Taek Cho , Jin Ho Hwang , Hak Song Lim , Eun Su Jang
发明人： Jae Hwan Kim , Seong Hyeon Lee , Yong Chae Kim , Jae Yong Lee , Moon Gyu Park , Min Ho Cho , Sang Woo Park , Eun Jeong Yang , Hyoung Shin , Ah Sal Moon , Jae Hak Joo , Hoo Taek Cho , Jin Ho Hwang , Hak Song Lim , Eun Su Jang
IPC分类号： B60J7/00
CPC分类号： B60R5/045
摘要： A cargo screen of a vehicle luggage room, the cargo screen may include a housing mounted at an upper portion of the vehicle luggage room in a horizontal direction and having a central portion to be foldable, a roller rotatably installed in the housing and having a cut central portion to be foldable, and a screen wound around an outer peripheral surface of the roller in the housing through a cut hole thereof or selectively unwound to the outside of the housing to cover the vehicle luggage room, and having a cut central portion to be foldable.
摘要翻译：货运屏幕可以包括一个在水平方向上安装在车辆行李室的上部并具有可折叠的中心部分的壳体，可旋转地安装在壳体中并且具有切口可折叠的中心部分，以及通过其切割孔卷绕在壳体中的辊的外周表面上的屏幕或者选择性地展开到壳体的外部以覆盖车辆行李室，并且具有切割中心部分可折叠。

8. 发明申请

US20090117320A1 CARPET FOR VEHICLE AND METHOD FOR MANUFACTURING SAME 有权
标题翻译：车辆用地毯及其制造方法
公开(公告)号：US20090117320A1
公开(公告)日：2009-05-07
申请号：US11967503
申请日：2007-12-31
申请人： Jin Ho Hwang
发明人： Jin Ho Hwang
IPC分类号： B32B33/00 , D05C15/00
CPC分类号： B60R13/083 , Y10T428/23929 , Y10T428/23979 , Y10T428/24314 , Y10T428/24322 , Y10T428/24479 , Y10T428/24595 , Y10T428/24603 , Y10T428/24612 , Y10T428/2495 , Y10T428/24992
摘要： Disclosed are a carpet for a vehicle and a method of manufacturing the same. A first material is scored to define a gap. A portion of the first material interior to the gap is compressed, and then folded out of the gap. A second material is adhered to the first material. The second material may be adhered to the compressed portion of the first material. The volume of the compressed portion may be decreased by about half. The first material may be a sound-absorbing material.
摘要翻译：公开了一种用于车辆的地毯及其制造方法。对第一种材料进行刻痕以确定间隙。间隙内部的第一材料的一部分被压缩，然后折叠出间隙。第二材料粘附到第一材料上。第二材料可以粘附到第一材料的压缩部分。压缩部分的体积可以减少大约一半。第一种材料可以是吸音材料。

9. 发明授权

US07223721B2 Resist and etching by-product removing composition and resist removing method using the same 失效
标题翻译：抗蚀剂和蚀刻副产物去除组合物和使用其的抗蚀剂除去方法
公开(公告)号：US07223721B2
公开(公告)日：2007-05-29
申请号：US10739203
申请日：2003-12-19
申请人： Dong-jin Park , Kyung-dae Kim , Sang-mun Chon , Jin-ho Hwang , Il-hyun Sohn , Sang-oh Park , Pil-kwon Jun
发明人： Dong-jin Park , Kyung-dae Kim , Sang-mun Chon , Jin-ho Hwang , Il-hyun Sohn , Sang-oh Park , Pil-kwon Jun
IPC分类号： B08B3/04
CPC分类号： C11D1/526 , C11D11/0047 , G03F7/425
摘要： A resist removing composition having a superior capability for removing a resist, polymer, organometallic polymer and etching by-products such as metal oxide, which does not attack underlying layers exposed to the composition and which does not leave residues after a rinsing step. The resist removing composition contains alkoxy N-hydroxyalkyl alkanamide and a swelling agent.
摘要翻译：抗蚀剂去除组合物具有优异的去除抗蚀剂，聚合物，有机金属聚合物和蚀刻副产物如金属氧化物的能力，其不会侵蚀暴露于组合物的下面的层，并且在冲洗步骤之后不留下残留物。抗蚀剂去除组合物含有烷氧基N-羟烷基烷酰胺和溶胀剂。

10. 发明授权

US06398874B2 Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same 失效
标题翻译：使用烷氧基N-羟烷基烷酰胺作为抗蚀剂除去剂，除去抗蚀剂的组合物，其制备方法和使用其的抗蚀剂除去方法
公开(公告)号：US06398874B2
公开(公告)日：2002-06-04
申请号：US09884992
申请日：2001-06-21
申请人： Dong-jin Park , Jin-ho Hwang , June-ing Gil , Je-eung Park , Sang-mun Chon
发明人： Dong-jin Park , Jin-ho Hwang , June-ing Gil , Je-eung Park , Sang-mun Chon
IPC分类号： B08B304
CPC分类号： G03F7/425
摘要： A resist removing agent and a resist removing composition, having an excellent capability for removing a resist and polymer and which does not attack underlying layers, a method for preparing the same and a resist removing method using the same. The resist removing agent includes alkoxy N-hydroxyalkyl alkanamide. The resist removing composition includes alkoxy N-hydroxyalkyl alkanamide, and at least one compound selected from a group consisting of a polar material having a dipole moment of 3 or greater, an attack inhibitor and alkanolamine. A substrate having the resist thereon is brought into contact with the resist removing agent or resist removing composition to remove the resist.
摘要翻译：抗蚀剂除去剂和抗蚀剂除去组合物，具有优异的去除抗蚀剂和聚合物的能力，不会侵蚀下层，其制备方法和使用其的抗蚀剂除去方法。抗蚀剂去除剂包括烷氧基N-羟烷基烷酰胺。抗蚀剂除去组合物包括烷氧基N-羟基烷基烷酰胺和至少一种选自偶极矩为3或更大的极性材料，攻击抑制剂和链烷醇胺的化合物。使其上具有抗蚀剂的基板与抗蚀剂去除剂或抗蚀剂去除组合物接触以除去抗蚀剂。

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