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1. 发明授权

US11551948B2 Semiconductor manufacturing apparatus 有权
公开(公告)号：US11551948B2
公开(公告)日：2023-01-10
申请号：US16637639
申请日：2018-08-09
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Feibiao Chen , Song Guo
IPC分类号： G11C11/00 , H01L21/67 , B29C45/14 , B29C65/48 , H01L21/677 , H01L21/683 , G11C5/04 , B29L31/34
摘要： A semiconductor manufacturing apparatus, including a chip supply module used for providing a plurality of chips; a load plate supply module including a load plate and a load-plate motion platform used for holding the load plate; a chip transfer-loading module including a chip transfer-loading platform used for suctioning chips. The chip transfer-loading platform is used at a first position for transferring chips from the chip supply module. The chip transfer-loading platform carries the chips to a second position to bond the chips onto a load plate to form a bonding sheet. A packaging module is used for packaging the bonding plate on the load-plate motion platform to form a packaged chip.

2. 发明授权

US11549891B2 Automatic optical inspection device and method 有权
公开(公告)号：US11549891B2
公开(公告)日：2023-01-10
申请号：US16306433
申请日：2017-07-31
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Hailiang Lu , Junwei Jia , Pengli Zhang , Hongji Zhou , Wen Xu , Fan Wang
IPC分类号： G01N21/88 , G01N21/01
摘要： An automatic optical inspection (AOI) device and method are disclosed. The device is adapted to inspect an object under inspection (OUI) (102) carried on a workpiece stage (101) and includes: a plurality of detectors (111, 112) for capturing images of the OUI (102); a plurality of light sources (121, 122) for illuminating the OUI (102) in different illumination modes; and a synchronization controller (140) signal-coupled to both the plurality of detectors (111, 112) and the plurality of light sources (121, 122). The synchronization controller (140) is configured to directly or indirectly control the plurality of detectors (111, 112) and the plurality of light sources (121, 122) based on the position of the OUI (102) so that each of them is individually activated and deactivated according to a timing profile, that each of the detectors (111, 112) is able to capture images of the OUI (102) in an illumination mode provided by a corresponding one of the light sources (121, 122), and that when any one of the light sources (121, 122) is illuminating the OUI (102), only the one of the detectors (111, 112) corresponding to this light source (121, 122) is activated. Through the timing control over the multiple light sources (121, 122) and detectors (111, 112) by the synchronization controller (140), inspection with multiple measurement configurations can be accomplished within a single scan, resulting in a significant improvement in inspection efficiency.

3. 发明授权

US11469121B2 Spin coating device and method 有权
公开(公告)号：US11469121B2
公开(公告)日：2022-10-11
申请号：US16618309
申请日：2018-05-25
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Shiliang Lu , Hang Ran , Yihui Li , Xiaoping Yan , Jun Zhao , Shanshan Chen
IPC分类号： H01L21/67 , H01L21/68 , H01L21/687
摘要： A spin coating device and method. The spin coating device includes a rotatable rotary shaft and sucker fixed on an end portion of the shaft, and an electromagnetic induction device below the sucker which includes an annular magnet fixed below the sucker, coil group formed by a first and second coil, and strip-shaped magnet fixed at the rotary shaft. A base on the sucker has a notch. The unbalanced centrifugal force during rotation of the sucker causes vibration. The electromagnetic induction device enables the centrifugal force generated during rotation of the sucker to be in balance with the magnetic force generated by the electromagnetic induction device to adjust the levelness of the sucker surface. The device does not need manual manipulation, enables the sucker to be more stable, reduces damage to the equipment due to vibration, and improves the effect of photoresist spin-coating while saving time and labor.

4. 发明授权

US10971380B2 De-bonding leveling device and de-bonding method 有权
公开(公告)号：US10971380B2
公开(公告)日：2021-04-06
申请号：US16321682
申请日：2017-07-27
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Yuying Gao , Wei Wei
IPC分类号： B32B43/00 , H01L21/67 , B32B38/10
摘要： A debonding leveling device and a debonding method are for leveling during a process for debonding a first object and a second object. The first and second objects are retained by a first fixation plate (11) and a second fixation plate (21), respectively. The device includes: a mounting plate (30), disposed at an outer side of one of the first (11) and second (21) fixation plates; a connecting rod assembly (40) fixed around a center position of the mounting plate (30), the connecting rod assembly (40) connected to the one of the first (11) and second (21) fixation plates sequentially via a sliding pair (50) and a spherical pair (60) connected to the sliding pair (50); and at least three elastic assemblies (70) disposed between the mounting plate and the one of the first and second fixation plates, each of the elastic assemblies coupled to the mounting plate (30) and the one of the first (11) and second (21) fixation plates. The combination of the spherical pair and the sliding pair allows an adaptation of leveling objects to dynamic changes of the reference, and the elastic assemblies performs a leveling for the leveling objects in real-time based on an orientation of the reference. This entails a simple structure with a reasonable layout, which is easy to use in practice and is particularly helping in dynamic leveling applications without requiring an active control.

5. 发明授权

US10915030B2 Light-spot distribution structure, surface shape measurement method, and method for calculating exposure field-of-view control value 有权
公开(公告)号：US10915030B2
公开(公告)日：2021-02-09
申请号：US16071943
申请日：2017-01-19
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Zhenhui Wang
IPC分类号： G03F7/20 , G03F9/00
摘要： A light spot arrangement, a surface profile measuring method and a method for calculating control data for an exposure field are disclosed. The light spot arrangement includes a plurality of measuring light spots (100) which define at least one set of orthogonal line segments, wherein the measuring light spots (100) lying on the orthogonal line segments radiate outward from a center, with each of the orthogonal line segments defined by at least four measuring light spots. With this light spot arrangement comprising at least one set of orthogonal line segments defined by measuring light spots radiating outward from a center, readings of multiple ones of the light spots (100) can be acquired in real time, and exposure can be performed with real-time focusing and leveling based on a surface profile of the wafer (200) derived from a surface fitting process carried out on the readings.

6. 发明授权

US10907952B2 Optical measurement device and method with improved measurement precision 有权
公开(公告)号：US10907952B2
公开(公告)日：2021-02-02
申请号：US16338636
申请日：2017-09-25
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Yuzhi Li , Bing Xu , Zhiyong Yang , Chang Zhou
IPC分类号： G01B11/00 , G03F7/20 , G01N21/956 , H01L21/68
摘要： An optical measurement device and method are disclosed. A position measurement device is provided with a device for measuring inclinations of an optical detection module (5) and a substrate carrier (6) which are measured during movement of the optical detection unit and the substrate carrier. Calculation and correction can be made according to the inclination data and with reference to displacements of the optical detection module (5) and the substrate carrier (6) and coordinates of their positions. During measurement for a certain point on the substrate, measured data related to the point is corrected by using the device and the method, which improves measurement precision, thus eliminating a large error caused in measurement for a large-sized substrate (9).

7. 发明申请

US20200347926A1 LINEAR MODULE AND OPERATING METHOD THEREOF 审中-公开
公开(公告)号：US20200347926A1
公开(公告)日：2020-11-05
申请号：US16643299
申请日：2018-08-30
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Gang WANG , Junpeng CHEN , Dongliang HUANG
IPC分类号： F16H57/029 , F16H25/20 , F16H57/031 , F16J15/3284
摘要： The present invention provides a linear module, which includes a casing, and a linear transmission device (20). The casing has an internal cavity, in which the linear transmission device (20) is at least partially disposed, and an output opening (31) which extends along a movement direction of the linear transmission device (20) defined on the case. A sealing band (32) is arranged at the output opening (31). The linear module further includes a first rolling mechanism (50) which is moveable in synchronization with the linear transmission device (20) and is arranged on a side of the sealing band (32) which is away from the internal cavity. The first rolling mechanism (50) is in rolling contact with the sealing band (32). This linear module enables high cleanliness and has good sealing performance, high accuracy and high stability.

8. 发明申请

US20200272062A1 VERTICAL CONTROL METHOD FOR USE IN LITHOGRAPHY MACHINE 审中-公开
公开(公告)号：US20200272062A1
公开(公告)日：2020-08-27
申请号：US16494097
申请日：2018-03-14
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Dan CHEN , Xianying WANG , Zhiyong YANG
IPC分类号： G03F7/20
摘要： A method for vertical control of a lithography machine includes step 1, prior to a scanning exposure, controlling vertical measurement sensors to measure workpiece to obtain overall surface profile data of the workpiece; step 2, performing a global leveling based on the overall surface profile data of the workpiece; and step 3, during the scanning exposure of each exposure field, measuring a local surface profile of the workpiece in real time by the vertical measurement sensors and controlling at least one of a mask stage, a workpiece stage and a projection objective to move vertically according to a Z-directional height value, an Rx-directional tilt value and an Ry-directional tilt value corresponding to the local surface profile of the workpiece, to compensate for the local surface profile of the workpiece in real time, so that an upper surface of each exposure field coincides with a reference focal plane for the exposure field. This method enables flexible vertical control with high accuracy by providing multiple control options.

9. 发明申请

US20200173932A1 CHIP DEFECT DETECTION DEVICE AND DETECTION METHOD 审中-公开
公开(公告)号：US20200173932A1
公开(公告)日：2020-06-04
申请号：US16343913
申请日：2017-10-20
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Pengli ZHANG , Hailiang LU , Fan WANG
IPC分类号： G01N21/88 , G01N21/95 , H01L21/66 , G01B9/02
摘要： An apparatus and method for die defect detection are disclosed. The apparatus includes: a light source unit (10) for emitting light of at least two wavelengths; a beam splitter (40) for receiving the light emitted by the light source unit (10) and splitting it into a first portion and a second portion, the first portion of the light reflected by a die (60) surface under inspection and thereby forming a detection beam; a reference unit (70) for receiving the second portion of the light and processing it into a reference beam; and a detection unit (90) for receiving the detection beam and the reference beam. The reference beam crosses the detection beam at an angle and thus produces interference fringes on a sensing surface of the detection unit (90), based on which a defect parameter of the die (60) surface under inspection is determined. This apparatus is capable of measuring a die with improved accuracy and efficiency and is suitable for the measurement of large dies.

10. 发明申请

US20200166856A1 OBJECTIVE LENS PROTECTION DEVICE, OBJECTIVE LENS SYSTEM AND LITHOGRAPHIC DEVICE 审中-公开
公开(公告)号：US20200166856A1
公开(公告)日：2020-05-28
申请号：US16632812
申请日：2018-07-23
申请人： SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
发明人： Xianming LI , Baotong HAO
IPC分类号： G03F7/20 , G02B27/00
摘要： An objective lens protection device, objective lens system and lithographic device. The objective lens protection device includes a main structure provided with, oppositely disposed, an air supply unit and extraction unit. The air supply unit is used to output air. The extraction unit extracts air output by the air supply unit to form at least one layer of air curtain between the air supply unit and extraction unit. The objective lens protection device can effectively control the flow rate of wind discharge, controlling wind in a laminar flow state and ensuring uniform flow field of the air curtain, and can effectively block organic matters volatilized from the bottom up, eliminate opportunity for a direct contact of the organic matters with the lens, and prevent objective lens from contamination by the volatilization of the organic matters of photoresist, thus ensuring the imaging quality of the objective lens.

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