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1. 发明授权

US09114501B2 Polishing pad 有权
标题翻译：抛光垫
公开(公告)号：US09114501B2
公开(公告)日：2015-08-25
申请号：US14232785
申请日：2012-07-12
申请人： Nana Takeuchi , Seiji Fukuda , Ryoji Okuda , Shigetaka Kasai
发明人： Nana Takeuchi , Seiji Fukuda , Ryoji Okuda , Shigetaka Kasai
IPC分类号： B24B37/22 , B24B37/24 , B24B37/26
CPC分类号： B24B37/26 , B24B37/22
摘要： A polishing pad includes at least a cushion layer and a polishing layer including a groove, on a polishing surface, having side surfaces and a bottom surface, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle α with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle β with a plane parallel to the polishing surface, the angle α is larger than 90 degrees, the angle β is not smaller than 85 degrees, and the angle β is smaller than the angle α, a bending point depth is not less than 0.4 mm and not more than 3.0 mm, and the cushion layer has a distortion constant of not less than 7.3×10−6 μm/Pa and not more than 4.4×10−4 μm/Pa.
摘要翻译：抛光垫至少包括缓冲层和在抛光表面上具有凹槽的抛光层，其具有侧表面和底表面，其中至少一个侧表面包括连续延伸到抛光表面的第一侧表面与研磨面形成角度α，和与第一侧面连续地延伸并形成角度的第二侧面; 平面与研磨面平行，角度α大于90度，角度＆bgr; 不小于85度，角度＆bgr; 小于角度α，弯曲深度不小于0.4mm且不大于3.0mm，并且缓冲层的变形常数不小于7.3×10 -6μm/ Pa且不大于4.4× 10-4μm/ Pa。

2. 发明申请

US20140378035A1 POLISHING PAD 审中-公开
标题翻译：抛光垫
公开(公告)号：US20140378035A1
公开(公告)日：2014-12-25
申请号：US14344988
申请日：2012-09-13
申请人： Yohei Noro , Ryoji Okuda , Seiji Fukuda
发明人： Yohei Noro , Ryoji Okuda , Seiji Fukuda
IPC分类号： B24B37/26
CPC分类号： B24B37/26
摘要： A polishing pad for chemical mechanical polishing includes at least a polishing layer whose polishing surface includes a first groove and a second groove, the first and second grooves have side surfaces, which are continuous with the polishing surface, on each edge in a groove width direction, the first groove has an angle of larger than 105 degrees and 150 degrees or smaller, which is formed between the polishing surface and the side surface continuous with the polishing surface, on at least one edge in the groove width direction, and the second groove has an angle of 60 degrees or larger and 105 degrees or smaller, which is formed between the polishing surface and the side surface continuous with the polishing surface, on both of two edges in the groove width direction.
摘要翻译：用于化学机械抛光的抛光垫至少包括其研磨表面包括第一凹槽和第二凹槽的抛光层，所述第一和第二凹槽在凹槽宽度方向上的每个边缘上具有与抛光表面连续的侧表面所述第一凹槽在所述研磨面和与所述研磨面连续的侧面之间形成在所述槽宽方向的至少一个边缘上的大于105度且150度以下的角度，所述第二凹槽在凹槽宽度方向上的两个边缘上都具有在抛光表面和与抛光表面连续的侧表面之间形成的60度或更大且105度或更小的角度。

3. 发明授权

US07214455B2 Photosensitive resin composition and process for producing heat-resistant resin film 有权
标题翻译：感光树脂组合物和耐热树脂膜的制造方法
公开(公告)号：US07214455B2
公开(公告)日：2007-05-08
申请号：US10514812
申请日：2003-05-28
申请人： Kazuto Miyoshi , Ryoji Okuda , Masao Tomikawa
发明人： Kazuto Miyoshi , Ryoji Okuda , Masao Tomikawa
IPC分类号： G03F7/023 , G03F7/30
CPC分类号： G03F7/0048 , G03F7/0233 , G03F7/037 , H01L27/3295 , H01L51/5253
摘要： The present invention is directed to a photosensitive resin composition comprising (a) a resin having a specific structure, (b) a photosensitive agent, and (c) an organic solvent having a boiling point at atmospheric pressure of 100° C. or higher and 140° C. or lower, the content of the component (c) being 50% by weight or more and 100% by weight or less based on the total amount of the organic solvent, and to a process for producing a heat-resistant resin film using the same. According to the present invention, there is provided a photosensitive resin composition which is less likely to cause defects such as transcribed trace and line drawing.
摘要翻译：本发明涉及一种感光性树脂组合物，其包含（a）具有特定结构的树脂，（b）感光剂，和（c）沸点在大气压为100℃以上的有机溶剂， 140℃以下，成分（c）的含量相对于有机溶剂的总量为50重量％以上100重量％以下，耐热性树脂的制造方法电影使用相同。根据本发明，提供了一种不太可能引起诸如转录痕迹和线条画等缺陷的感光性树脂组合物。

4. 发明申请

US20140154962A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20140154962A1
公开(公告)日：2014-06-05
申请号：US14232785
申请日：2012-07-12
申请人： Nana Takeuchi , Seiji Fukuda , Ryoji Okuda , Shigetaka Kasai
发明人： Nana Takeuchi , Seiji Fukuda , Ryoji Okuda , Shigetaka Kasai
IPC分类号： B24B37/26
CPC分类号： B24B37/26 , B24B37/22
摘要： A polishing pad includes at least a cushion layer and a polishing layer including a groove, on a polishing surface, having side surfaces and a bottom surface, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle α with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle β with a plane parallel to the polishing surface, the angle α is larger than 90 degrees, the angle β is not smaller than 85 degrees, and the angle β is smaller than the angle α, a bending point depth is not less than 0.4 mm and not more than 3.0 mm, and the cushion layer has a distortion constant of not less than 7.3×10−6 μm/Pa and not more than 4.4×10−4 μm/Pa.
摘要翻译：抛光垫至少包括缓冲层和在抛光表面上具有凹槽的抛光层，其具有侧表面和底表面，其中至少一个侧表面包括连续延伸到抛光表面的第一侧表面与研磨面形成角度α，和与第一侧面连续地延伸并形成角度的第二侧面; 平面与研磨面平行，角度α大于90度，角度＆bgr; 不小于85度，角度＆bgr; 小于角度α，弯曲深度不小于0.4mm且不大于3.0mm，并且缓冲层的变形常数不小于7.3×10 -6μm/ Pa且不大于4.4× 10-4μm/ Pa。

5. 发明授权

US06929890B2 Positive-type photosensitive resin composition 有权
标题翻译：正型感光性树脂组合物
公开(公告)号：US06929890B2
公开(公告)日：2005-08-16
申请号：US10819177
申请日：2004-04-07
申请人： Kazuto Miyoshi , Ryoji Okuda , Masao Tomikawa
发明人： Kazuto Miyoshi , Ryoji Okuda , Masao Tomikawa
IPC分类号： G03F7/00 , G03F7/022 , G03F7/023 , G03F7/105 , G03F7/30
CPC分类号： G03F7/0226 , G03F7/0007 , G03F7/0233 , G03F7/105
摘要： Disclosed is a positive-type photosensitive resin composition comprising: (a) an alkali-soluble resin; (b) a quinone diazide compound; (c) a heatsensitive compound which colors upon being heated and which shows an absorption maximum at a wavelength of not less than 350 nm and not more than 700 nm; and (d) a compound which does not have an absorption maximum at a wavelength of not less than 350 nm to less than 500 nm, and has an absorption maximum at a wavelength of not less than 500 nm and not more than 750 nm. The composition is preferably used for forming light-blocking separators or black matrices of organic electroluminescent devices and liquid crystal display elements.
摘要翻译：公开了一种正型感光性树脂组合物，其包含：（a）碱溶性树脂; （b）醌二叠氮化合物; （c）加热时着色的热敏化合物，并且在不小于350nm且不大于700nm的波长下显示最大吸收; 和（d）在波长不小于350nm至小于500nm处不具有吸收最大值的化合物，并且在不小于500nm且不大于750nm的波长下具有最大吸收。该组合物优选用于形成有机电致发光器件和液晶显示元件的阻光隔离器或黑色矩阵。

6. 发明授权

US06723484B1 Positive-working photosensitive resin precursor composition 有权
标题翻译：正性感光性树脂前体组合物
公开(公告)号：US06723484B1
公开(公告)日：2004-04-20
申请号：US09567106
申请日：2000-05-08
申请人： Masao Tomikawa , Naoyo Okamoto , Satoshi Yoshida , Ryoji Okuda
发明人： Masao Tomikawa , Naoyo Okamoto , Satoshi Yoshida , Ryoji Okuda
IPC分类号： G03F7023
CPC分类号： G03F7/0233 , C08G73/1025 , C08L79/08
摘要： The present invention relates to a positive-working photosensitive resin precursor composition which is characterized in that it contains (a) polymer in which the chief component comprises structural units of the kind where the bonding between structural units is represented by general formula (1) and (b) photoacid generator, and it can form a pattern by light irradiation and subsequent developing, and the total carboxyl groups contained in said polymer is from 0.02 to 2.0 mmol/g, and it provides a photosensitive resin composition of high sensitivity which can be developed by alkali. (R1 is an organic group of valency from 3 to 8 having at least 2 carbon atoms, R2 is an organic group of valency from 2 to 6 having at least 2 carbon atoms, R3 is hydrogen or an organic group with from 1 to 10 carbons. n is an integer of value from 3 to 100,000, m is 1 or 2, p and q are integers of value from 0 to 4 and p+q>0).
摘要翻译：本发明涉及一种正性感光性树脂前体组合物，其特征在于，其含有（a）主要成分包含结构单元之间的结合由通式（1）表示的结构单元和（b）光致酸发生剂，可以通过光照射和随后的显影形成图案，所述聚合物中所含的总羧基为0.02〜2.0mmol / g，提供高灵敏度的感光性树脂组合物，其可以是（R 1是具有至少2个碳原子的3至8价的有机基团，R 2是具有至少2个碳原子的2至6价的有机基团，R 3 是氢或1〜10个碳的有机基团，n为3〜100,000的整数，m为1或2，p和q为0〜4的整数，p + q> 0）。

7. 发明申请

US20140342646A1 POLISHING PAD 审中-公开
标题翻译：抛光垫
公开(公告)号：US20140342646A1
公开(公告)日：2014-11-20
申请号：US14344192
申请日：2012-09-14
申请人： Tomoyuki Honda , Seiji Fukuda , Ryoji Okuda
发明人： Tomoyuki Honda , Seiji Fukuda , Ryoji Okuda
IPC分类号： B24B37/26 , H01L21/304 , B24B37/20
CPC分类号： B24B37/26 , B24B37/20 , B24B37/22 , H01L21/304
摘要： A polishing pad at least includes a polishing layer, and a cushion layer, in which a plurality of holes is provided in the polishing layer, the holes passing through the polishing layer in a thickness direction, and a plurality of grooves is provided in a polishing surface of the polishing layer, a through hole ratio is from 0.13% or more to 2.1% or less, and angles made by the polishing surface and side surfaces of the groove, which continue to the polishing surface, is from 105 degrees or more to 150 degrees or less.
摘要翻译：抛光垫至少包括抛光层和缓冲层，其中在抛光层中设置有多个孔，沿着厚度方向穿过抛光层的孔和多个槽设置在抛光中抛光层的表面，通孔比为0.13％以上至2.1％以下，并且由研磨面和与研磨面连续的凹槽的侧面形成的角度为105度以上〜 150度以下。

8. 发明申请

US20140170943A1 POLISHING PAD 审中-公开
标题翻译：抛光垫
公开(公告)号：US20140170943A1
公开(公告)日：2014-06-19
申请号：US13978000
申请日：2012-02-08
申请人： Nana Takeuchi , Seiji Fukuda , Ryoji Okuda , Shigetaka Kasai
发明人： Nana Takeuchi , Seiji Fukuda , Ryoji Okuda , Shigetaka Kasai
IPC分类号： B24B37/26
CPC分类号： B24B37/26 , B24B37/22
摘要： A polishing pad comprising at least a polishing layer and a cushion layer, wherein a groove is formed on a polishing surface of the polishing pad, at least one of angles formed by the polishing surface and a side surface of the groove which continues to the polishing surface is 105-150° inclusive, and the cushion layer has a strain constant of 7.3×10−6 to 4.4×10−4 μm/Pa inclusive. The use of the polishing pad can achieve a purpose of preventing the fluctuation in a polishing rate while keeping the polishing rate at a high level.
摘要翻译：一种抛光垫，至少包括抛光层和缓冲层，其中在所述抛光垫的抛光表面上形成有由研磨表面和所述槽的侧表面形成的至少一个角度，所述至少一个角度继续进行抛光表面为105-150°，缓冲层的应变常数为7.3×10 -6〜4.4×10 -4μm/ Pa。抛光垫的使用可以达到在保持抛光速率高的同时防止抛光速度波动的目的。

9. 发明申请

US20140141704A1 POLISHING PAD 审中-公开
标题翻译：抛光垫
公开(公告)号：US20140141704A1
公开(公告)日：2014-05-22
申请号：US14232851
申请日：2012-07-12
申请人： Nana Takeuchi , Seiji Fukuda , Ryoji Okuda
发明人： Nana Takeuchi , Seiji Fukuda , Ryoji Okuda
IPC分类号： B24B37/26
CPC分类号： B24B37/26 , B24B37/16 , B24D11/00
摘要： A polishing pad includes at least a polishing layer including a groove, on a polishing surface, having side surfaces, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle α with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle β with a plane parallel to the polishing surface, the angle α is larger than 95 degrees, the angle β is larger than 95 degrees, and the angle β is smaller than the angle α, and a bending point depth from the polishing surface to a bending point between the first side surface and the second side surface is more than 0.2 mm and not more than 3.0 mm.
摘要翻译：抛光垫至少包括在抛光表面上具有凹槽的抛光层，所述抛光层具有侧表面，其中所述侧表面中的至少一个包括连续延伸到抛光表面的第一侧表面并与抛光形成角度α 表面和连续延伸到第一侧表面并形成角度的第二侧表面; 平面与研磨面平行的角度α大于95度，角度＆bgr; 大于95度，角度＆bgr; 小于角度α，并且从研磨面到第一侧面与第二侧面之间的弯曲点的弯曲点深度大于0.2mm且不大于3.0mm。

10. 发明申请

US20050202337A1 Photosensitive resin composition and method for preparing heat-resistant resin film 有权
标题翻译：感光树脂组合物和制备耐热树脂膜的方法
公开(公告)号：US20050202337A1
公开(公告)日：2005-09-15
申请号：US10514812
申请日：2003-05-28
申请人： Kazuto Miyoshi , Ryoji Okuda , Masao Tomikawa
发明人： Kazuto Miyoshi , Ryoji Okuda , Masao Tomikawa
IPC分类号： G03F7/023 , G03F7/037 , H01L27/32 , G03C1/492
CPC分类号： G03F7/0048 , G03F7/0233 , G03F7/037 , H01L27/3295 , H01L51/5253
摘要： The present invention is directed to a photosensitive resin composition comprising (a) a resin having a specific structure, (b) a photosensitive agent, and (c) an organic solvent having a boiling point at atmospheric pressure of 100° C. or higher and 140° C. or lower, the content of the component (c) being 50% by weight or more and 100% by weight or less based on the total amount of the organic solvent, and to a process for producing a heat-resistant resin film using the same. According to the present invention, there is provided a photosensitive resin composition which is less likely to cause defects such as transcribed trace and line drawing.
摘要翻译：本发明涉及一种感光性树脂组合物，其包含（a）具有特定结构的树脂，（b）感光剂，和（c）沸点在大气压为100℃以上的有机溶剂， 140℃以下，成分（c）的含量相对于有机溶剂的总量为50重量％以上100重量％以下，耐热性树脂的制造方法电影使用相同。根据本发明，提供了一种不太可能引起诸如转录痕迹和线画等缺陷的感光性树脂组合物。

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