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    • 2. 发明申请
    • POLISHING PAD
    • 抛光垫
    • US20140154962A1
    • 2014-06-05
    • US14232785
    • 2012-07-12
    • Nana TakeuchiSeiji FukudaRyoji OkudaShigetaka Kasai
    • Nana TakeuchiSeiji FukudaRyoji OkudaShigetaka Kasai
    • B24B37/26
    • B24B37/26B24B37/22
    • A polishing pad includes at least a cushion layer and a polishing layer including a groove, on a polishing surface, having side surfaces and a bottom surface, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle α with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle β with a plane parallel to the polishing surface, the angle α is larger than 90 degrees, the angle β is not smaller than 85 degrees, and the angle β is smaller than the angle α, a bending point depth is not less than 0.4 mm and not more than 3.0 mm, and the cushion layer has a distortion constant of not less than 7.3×10−6 μm/Pa and not more than 4.4×10−4 μm/Pa.
    • 抛光垫至少包括缓冲层和在抛光表面上具有凹槽的抛光层,其具有侧表面和底表面,其中至少一个侧表面包括连续延伸到抛光表面的第一侧表面 与研磨面形成角度α,和与第一侧面连续地延伸并形成角度的第二侧面; 平面与研磨面平行,角度α大于90度,角度&bgr; 不小于85度,角度&bgr; 小于角度α,弯曲深度不小于0.4mm且不大于3.0mm,并且缓冲层的变形常数不小于7.3×10 -6μm/ Pa且不大于4.4× 10-4μm/ Pa。
    • 3. 发明授权
    • Polishing pad
    • 抛光垫
    • US09114501B2
    • 2015-08-25
    • US14232785
    • 2012-07-12
    • Nana TakeuchiSeiji FukudaRyoji OkudaShigetaka Kasai
    • Nana TakeuchiSeiji FukudaRyoji OkudaShigetaka Kasai
    • B24B37/22B24B37/24B24B37/26
    • B24B37/26B24B37/22
    • A polishing pad includes at least a cushion layer and a polishing layer including a groove, on a polishing surface, having side surfaces and a bottom surface, wherein at least one of the side surfaces includes a first side surface that extends continuously to the polishing surface and forms an angle α with the polishing surface, and a second side surface that extends continuously to the first side surface and forms an angle β with a plane parallel to the polishing surface, the angle α is larger than 90 degrees, the angle β is not smaller than 85 degrees, and the angle β is smaller than the angle α, a bending point depth is not less than 0.4 mm and not more than 3.0 mm, and the cushion layer has a distortion constant of not less than 7.3×10−6 μm/Pa and not more than 4.4×10−4 μm/Pa.
    • 抛光垫至少包括缓冲层和在抛光表面上具有凹槽的抛光层,其具有侧表面和底表面,其中至少一个侧表面包括连续延伸到抛光表面的第一侧表面 与研磨面形成角度α,和与第一侧面连续地延伸并形成角度的第二侧面; 平面与研磨面平行,角度α大于90度,角度&bgr; 不小于85度,角度&bgr; 小于角度α,弯曲深度不小于0.4mm且不大于3.0mm,并且缓冲层的变形常数不小于7.3×10 -6μm/ Pa且不大于4.4× 10-4μm/ Pa。