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1. 发明授权

US07053000B2 System, method and apparatus for constant voltage control of RF generator for optimum operation 有权
标题翻译：射频发生器恒压控制的系统，方法和装置，以实现最佳的运行
公开(公告)号：US07053000B2
公开(公告)日：2006-05-30
申请号：US10359765
申请日：2003-02-06
申请人： Thomas W. Anderson , Robert Knop
发明人： Thomas W. Anderson , Robert Knop
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/67253 , B06B1/0253 , B06B2201/71 , B08B3/12 , H01L21/67057
摘要： A system and method of generating RF includes an RF generator, a variable DC power supply, and a comparator. The RF generator has an RF output coupled to an input of the transducer. The variable DC power supply has a control input and a DC output coupled to the RF generator. The comparator includes a first input coupled to a set point control signal, a second input coupled to the RF generator RF output, and a control signal output coupled to a voltage control input on the variable DC power supply.
摘要翻译：产生RF的系统和方法包括RF发生器，可变直流电源和比较器。 RF发生器具有耦合到换能器的输入的RF输出。可变直流电源具有耦合到RF发生器的控制输入和DC输出。比较器包括耦合到设定点控制信号的第一输入，耦合到RF发生器RF输出的第二输入以及耦合到可变直流电源上的电压控制输入的控制信号输出。

2. 发明授权

US07033845B2 Phase control of megasonic RF generator for optimum operation 有权
标题翻译：超声波发生器的相位控制，以实现最佳运行
公开(公告)号：US07033845B2
公开(公告)日：2006-04-25
申请号：US10360320
申请日：2003-02-06
申请人： Thomas W. Anderson , Robert Knop
发明人： Thomas W. Anderson , Robert Knop
IPC分类号： H01L31/26 , H01L21/66 , B08B6/00 , B08B3/12 , C25F5/00
CPC分类号： H01L21/67253 , B06B1/0253 , B06B2201/71 , B08B3/12 , H01L21/67057 , Y10S134/902
摘要： A system and method of providing RF to a transducer includes an oscillator, an RF generator, and a voltage phase detector. The oscillator has a frequency control input and an RF signal output. The RF generator has an input coupled to the oscillator RF signal output and an RF generator output coupled to the transducer. The voltage phase detector includes a first phase input coupled to the RF signal output of the oscillator, a second phase input coupled to the RF generator output, and a frequency control signal output coupled to the oscillator frequency control voltage input.
摘要翻译：向换能器提供RF的系统和方法包括振荡器，RF发生器和电压相位检测器。振荡器具有频率控制输入和RF信号输出。 RF发生器具有耦合到振荡器RF信号输出的输入端和耦合到换能器的RF发生器输出。电压相位检测器包括耦合到振荡器的RF信号输出的第一相位输入，耦合到RF发生器输出的第二相输入和耦合到振荡器频率控制电压输入的频率控制信号输出。

3. 发明授权

US06508913B2 Gas distribution apparatus for semiconductor processing 有权
标题翻译：用于半导体加工的气体分配装置
公开(公告)号：US06508913B2
公开(公告)日：2003-01-21
申请号：US09983680
申请日：2001-10-25
申请人： Brian K. McMillin , Robert Knop
发明人： Brian K. McMillin , Robert Knop
IPC分类号： C23F100
CPC分类号： H01L21/67253 , C23F4/00 , G05D11/132 , H01L21/67017 , H01L21/67069 , Y10S438/935
摘要： A gas distribution system for processing a semiconductor substrate includes a plurality of gas supplies, a mixing manifold wherein gas from the plurality of gas supplies is mixed together, a plurality of gas supply lines delivering the mixed gas to different zones in the chamber, and a control valve. The gas supply lines include a first gas supply line delivering the mixed gas to a first zone in the chamber and a second gas supply line delivering the mixed gas to a second zone in the chamber. The control valve controls a rate of flow of the mixed gas in the first and/or second gas supply line such that a desired ratio of flow rates of the mixed gas is achieved in the first and second gas supply lines.
摘要翻译：用于处理半导体衬底的气体分配系统包括多个气体供应，其中来自多个气体源的气体混合在一起的混合歧管，将混合气体输送到室中的不同区域的多个气体供应管线，以及控制阀。气体供应管线包括将混合气体输送到室中的第一区域的第一气体供应管线和将混合气体输送到室中的第二区域的第二气体供应管线。控制阀控制第一和/或第二气体供给管线中的混合气体的流量，使得在第一和第二气体供应管线中实现混合气体的所需流量比。

4. 发明授权

US06333272B1 Gas distribution apparatus for semiconductor processing 有权
标题翻译：用于半导体加工的气体分配装置
公开(公告)号：US06333272B1
公开(公告)日：2001-12-25
申请号：US09680319
申请日：2000-10-06
申请人： Brian K. McMillin , Robert Knop
发明人： Brian K. McMillin , Robert Knop
IPC分类号： H01L21302
CPC分类号： H01L21/67253 , C23F4/00 , G05D11/132 , H01L21/67017 , H01L21/67069 , Y10S438/935
摘要： A gas distribution system for processing a semiconductor substrate includes a plurality of gas supplies, a mixing manifold wherein gas from the plurality of gas supplies is mixed together, a plurality of gas supply lines delivering the mixed gas to different zones in the chamber, and a control valve. The gas supply lines include a first gas supply line delivering the mixed gas to a first zone in the chamber and a second gas supply line delivering the mixed gas to a second zone in the chamber. The control valve controls a rate of flow of the mixed gas in the first and/or second gas supply line such that a desired ratio of flow rates of the mixed gas is achieved in the first and second gas supply lines. In a method of using the apparatus, a semiconductor substrate is supplied to the reaction chamber and the substrate is processed by supplying the mixed gas to the first and second zones, the control valve being adjusted such that a rate of flow of the mixed gas in the first and/or second gas supply line provides a desired ratio of flow rates of the mixed gas in the first and second zones.
摘要翻译：用于处理半导体衬底的气体分配系统包括多个气体供应，其中来自多个气体源的气体混合在一起的混合歧管，将混合气体输送到室中的不同区域的多个气体供应管线，以及控制阀。气体供应管线包括将混合气体输送到室中的第一区域的第一气体供应管线和将混合气体输送到室中的第二区域的第二气体供应管线。控制阀控制第一和/或第二气体供给管线中的混合气体的流量，使得在第一和第二气体供应管线中实现混合气体的所需流量比。在使用该装置的方法中，将半导体基板供给到反应室，并且通过将混合气体供给到第一和第二区域来处理基板，调节控制阀使得混合气体的流量第一和/或第二气体供应管线提供混合气体在第一和第二区域中的期望流量比。

5. 发明授权

US07780825B2 Substrate gripper with integrated electrical contacts 有权
标题翻译：带集成电触点的基板夹具
公开(公告)号：US07780825B2
公开(公告)日：2010-08-24
申请号：US11751536
申请日：2007-05-21
申请人： Aleksander Owczarz , Robert Knop , Mike Ravkin , Carl A. Woods
发明人： Aleksander Owczarz , Robert Knop , Mike Ravkin , Carl A. Woods
IPC分类号： C25B9/04
CPC分类号： H01L21/6723 , H01L21/68707 , H01L21/68728 , Y10T29/49002 , Y10T29/49828 , Y10T29/53039 , Y10T29/53265 , Y10T29/53543
摘要： A substrate holding and transporting assembly is disclosed. The substrate holding and transporting assembly includes a base plate and a pair of clamps connected to the base plate in a spaced apart orientation, the spaced apart orientation of the pair of clamps enable support of a substrate with at least two independent points. The substrate holding and transporting assembly also includes an electrode assembly connected to the base plate at a location that is substantially between the pair of clamps. The electrode assembly defined to impart an electrical contact to the substrate when present and held by the pair of clamps.
摘要翻译：公开了一种基板保持和传送组件。基板保持和传送组件包括基板和以间隔方向连接到基板的一对夹具，该对夹具的间隔开的取向使得能够利用至少两个独立点支撑基板。基板保持和传送组件还包括在基本上位于该对夹子之间的位置处连接到基板的电极组件。所述电极组件限定为当存在并由所述一对夹具保持时向所述基板施加电接触。

6. 发明申请

US20080289967A1 SUBSTRATE GRIPPER WITH INTEGRATED ELECTRICAL CONTACTS 有权
标题翻译：带集成电气接触器的基板抓斗
公开(公告)号：US20080289967A1
公开(公告)日：2008-11-27
申请号：US11751536
申请日：2007-05-21
申请人： Aleksander Owczarz , Robert Knop , Mike Ravkin , Carl A. Woods
发明人： Aleksander Owczarz , Robert Knop , Mike Ravkin , Carl A. Woods
IPC分类号： B23K37/04 , C25D7/12
CPC分类号： H01L21/6723 , H01L21/68707 , H01L21/68728 , Y10T29/49002 , Y10T29/49828 , Y10T29/53039 , Y10T29/53265 , Y10T29/53543
摘要： A substrate holding and transporting assembly is disclosed. The substrate holding and transporting assembly includes a base plate and a pair of clamps connected to the base plate in a spaced apart orientation, the spaced apart orientation of the pair of clamps enable support of a substrate with at least two independent points. The substrate holding and transporting assembly also includes an electrode assembly connected to the base plate at a location that is substantially between the pair of clamps. The electrode assembly defined to impart an electrical contact to the substrate when present and held by the pair of clamps.
摘要翻译：公开了一种基板保持和传送组件。基板保持和传送组件包括基板和以间隔方向连接到基板的一对夹具，该对夹具的间隔开的取向使得能够利用至少两个独立点支撑基板。基板保持和传送组件还包括在基本上位于该对夹子之间的位置处连接到基板的电极组件。所述电极组件限定为当存在并由所述一对夹具保持时向所述基板施加电接触。

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