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1. 发明授权

US07684009B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07684009B2
公开(公告)日：2010-03-23
申请号：US11647426
申请日：2006-12-29
申请人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
摘要翻译：一种光刻设备和方法，其中照明系统提供投影光束，图案化系统在其横截面中赋予光束图案，并且投影系统将图案化的光束投射到基板的目标部分上。投影系统包括与衬底间隔开的透镜阵列，使得阵列中的每个透镜将图案化束的一部分聚焦到衬底上。位移系统导致透镜阵列和基板之间的位移。颗粒检测器检测正在接近透镜阵列的基板上的颗粒。响应于颗粒的检测，自由工作距离控制系统增加了透镜阵列和基板之间的间隔。当检测到的颗粒通过透镜阵列时，透镜阵列移动离开基板。因此可以避免对透镜阵列的损坏。

2. 发明授权

US07116398B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07116398B2
公开(公告)日：2006-10-03
申请号：US10972784
申请日：2004-10-26
申请人： Johan Christiaan Gerard Hoefnagels , Peter Spit
发明人： Johan Christiaan Gerard Hoefnagels , Peter Spit
IPC分类号： G03B27/68 , G03B27/42 , G03B27/32 , G02F1/1335 , G03C5/00
CPC分类号： G02F1/1333 , G02F1/1309 , G02F2001/133354 , G03F7/70425 , G03F7/70675 , G03F7/70791
摘要： A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pattern data for the passive plate according to the actual pattern formed on the active plate to ensure that the patterns formed on the active and passive plates correspond closely.
摘要翻译：制造耦合在一起的第一和第二基板的方法，例如平板显示器的有源和无源板。活动板根据标准图案形成并进行检查。然后通过根据形成在有源板上的实际图案修改被动板的图案数据来形成被动板，以确保形成在主动板和被动板上的图案紧密对应。

3. 发明授权

US07375795B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07375795B2
公开(公告)日：2008-05-20
申请号：US11018930
申请日：2004-12-22
申请人： Joeri Lof , Jeroen Fluit , Bernardus Antonius Johannes Luttikhuis , Peter Spit
发明人： Joeri Lof , Jeroen Fluit , Bernardus Antonius Johannes Luttikhuis , Peter Spit
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F7/70291
摘要： Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.
摘要翻译：基板处理装置包括光刻设备，该光刻设备包括用于提供投射辐射束的照明系统，用于使投影光束在其横截面上具有图案的独立可控元件的阵列，以及投影系统，到基板的目标部分上。处理装置还包括布置成输出至少一个不间断长度的基板的基板供给源，以及基板输送系统，其布置成将基板的每个输出的不间断长度从基板供给输送并经过投影系统，使得投影系统能够沿着每个不间断长度的衬底将图案化的光束投影到一系列目标部分上。在某些实施例中，长的基底是从卷筒供应的，但也可以提供一系列单独的片材。

4. 发明申请

US20050145805A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050145805A1
公开(公告)日：2005-07-07
申请号：US10972784
申请日：2004-10-26
申请人： Johan Hoefnagels , Peter Spit
发明人： Johan Hoefnagels , Peter Spit
IPC分类号： G02F1/13 , G02F1/1333 , G02F1/1335 , G03F7/20 , G03F9/00 , G09F9/00 , G09F9/30 , H01J37/08 , H01L21/027
CPC分类号： G02F1/1333 , G02F1/1309 , G02F2001/133354 , G03F7/70425 , G03F7/70675 , G03F7/70791
摘要： A method of manufacturing first and second substrates that are coupled together, e.g., an active and passive plate of a flat panel display. The active plate is formed according to a standard pattern and inspected. The passive plate is then formed by modifying the pattern data for the passive plate according to the actual pattern formed on the active plate to ensure that the patterns formed on the active and passive plates correspond closely.
摘要翻译：制造耦合在一起的第一和第二基板的方法，例如平板显示器的有源和无源板。活动板根据标准图案形成并进行检查。然后通过根据形成在有源板上的实际图案修改被动板的图案数据来形成被动板，以确保形成在主动板和被动板上的图案紧密对应。

5. 发明申请

US20070109510A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070109510A1
公开(公告)日：2007-05-17
申请号：US11647426
申请日：2006-12-29
申请人： Pieter Willem De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter Willem De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
摘要翻译：一种光刻设备和方法，其中照明系统提供投影光束，图案化系统在其横截面中赋予光束图案，并且投影系统将图案化的光束投射到基板的目标部分上。投影系统包括与衬底间隔开的透镜阵列，使得阵列中的每个透镜将图案化束的一部分聚焦到衬底上。位移系统导致透镜阵列和基板之间的位移。颗粒检测器检测正在接近透镜阵列的基板上的颗粒。响应于颗粒的检测，自由工作距离控制系统增加了透镜阵列和基板之间的间隔。当检测到的颗粒通过透镜阵列时，透镜阵列移动离开基板。因此可以避免对透镜阵列的损坏。

6. 发明授权

US07158208B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07158208B2
公开(公告)日：2007-01-02
申请号：US10880435
申请日：2004-06-30
申请人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter Willem Herman De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.

7. 发明申请

US20060132735A1 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US20060132735A1
公开(公告)日：2006-06-22
申请号：US11018930
申请日：2004-12-22
申请人： Joeri Lof , Jeroen Fluit , Bernardus Luttikhuis , Peter Spit
发明人： Joeri Lof , Jeroen Fluit , Bernardus Luttikhuis , Peter Spit
IPC分类号： G03B27/42
CPC分类号： G03F7/70791 , G03F7/70291
摘要： Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.
摘要翻译：基板处理装置包括光刻设备，该光刻设备包括用于提供投射辐射束的照明系统，用于使投影光束在其横截面上具有图案的独立可控元件的阵列，以及投影系统，到基板的目标部分上。处理装置还包括布置成输出至少一个不间断长度的基板的基板供给源，以及基板输送系统，其布置成将基板的每个输出的不间断长度从基板供给输送并经过投影系统，使得投影系统能够沿着每个不间断长度的衬底将图案化的光束投影到一系列目标部分上。在某些实施例中，长的基底是从卷筒供应的，但也可以提供一系列单独的片材。

8. 发明申请

US20060001847A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060001847A1
公开(公告)日：2006-01-05
申请号：US10880435
申请日：2004-06-30
申请人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
发明人： Pieter De Jager , Cheng-Qun Gui , Peter Spit , Eduard Hoeberichts
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam of radiation, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate supported on a substrate table. The projection system comprises an array of lenses located at a spacing from the substrate such that each lens in the array focuses a respective part of the patterned beam onto the substrate. A displacement system causes relative displacement between the lens array and the substrate. A particle detector is positioned to detect particles on the substrate which are approaching the lens array as a result of relative displacement between the lens array and the substrate. A free working distance control system is arranged to increase the spacing between the lens array and the substrate in response to detection of a particle by the detector such that the lens array is moved away from the substrate as relative displacement causes the detected particle to pass the lens array. Thus damage to the lens array as a result of for example scratching by particles carried on the substrate surface can be avoided.
摘要翻译：一种光刻设备和方法，其中照明系统提供投影辐射束，图案化系统将光束赋予其横截面中的图案，并且投影系统将图案化的光束投影到支撑在衬底上的衬底的目标部分上表。投影系统包括位于与衬底间隔的透镜阵列，使得阵列中的每个透镜将图案化束的相应部分聚焦到衬底上。位移系统导致透镜阵列和基底之间的相对位移。定位粒子检测器以检测由于透镜阵列和基底之间的相对位移而正在接近透镜阵列的基底上的颗粒。布置一个自由的工作距离控制系统以响应于检测器检测到的颗粒而增加透镜阵列和基板之间的间距，使得透镜阵列相对于基板移动离开基板，因为相对位移导致检测到的颗粒通过镜头阵列因此，可以避免由于例如由承载在基板表面上的颗粒划伤而导致的透镜阵列的损坏。

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