专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5328360A Heat-treating apparatus 失效
标题翻译：热处理装置
公开(公告)号：US5328360A
公开(公告)日：1994-07-12
申请号：US124547
申请日：1993-09-22
申请人： Osamu Yokokawa
发明人： Osamu Yokokawa
IPC分类号： C30B33/00 , F27D3/12
CPC分类号： C30B33/00
摘要： A heat-treating apparatus comprises a heat-treating portion which performs a required heat treating to a plural number of objects to be treated mounted on a heat-treating boat, a vacuum exhaust system which creates a vacuum inside the heat-treating portion, a load lock chamber which is connected so as to be freely openable and closable with respect to the heat-treating portion, which is filled therein with an inert gas and which is for transporting an object to be treated into and out of the heat-treating portion, and a residual treating gas exhaust system which is connected to the load lock chamber. Furthermore, in this heat-treating apparatus, there are also provided an oxygen concentration detector for detecting an oxygen concentration inside the load lock chamber, a door lock device provided in a vicinity of a maintenance door of the load lock chamber and which regulates opening and closing of the maintenance door, and a door lock control device which releases a lock of the door lock device when the oxygen concentration detector has detected a required oxygen concentration.
摘要翻译：一种热处理装置，其特征在于，具备对多个被处理体进行热处理的热处理部，所述多个待处理物体安装在热处理舟皿上，在所述热处理部内形成真空的真空排气系统，负载锁定室，其被连接成能够相对于热处理部自由地开闭，其中填充有惰性气体，并且用于将待处理物体输送到热处理部分中，以及与负载锁定室连接的残余处理气体排出系统。此外，在该热处理装置中，还设置有用于检测负载锁定室内的氧浓度的氧浓度检测器，设置在负载锁定室的维护门附近并调节开口的门锁装置，关闭维护门;以及门锁控制装置，当氧浓度检测器检测到所需的氧浓度时，释放门锁装置的锁定。

2. 发明授权

US5016567A Apparatus for treatment using gas 失效
标题翻译：使用气体处理的设备
公开(公告)号：US5016567A
公开(公告)日：1991-05-21
申请号：US394929
申请日：1989-08-17
申请人： Katsuhiko Iwabuchi , Osamu Yokokawa , Eiichiro Takanabe
发明人： Katsuhiko Iwabuchi , Osamu Yokokawa , Eiichiro Takanabe
IPC分类号： C23C16/44
CPC分类号： C23C16/4409 , C23C16/44 , C23C16/4401 , Y10S156/912
摘要： A heat treatment apparatus used in the manufacturing of semiconductor devices and the like, for treating with a reaction gas substrates placed in a reaction tube of the apparatus. A support table is provided within the reaction tube, for supporting substrates during a treatment process, and is rotated during each treatment by a motor, via a shaft penetrating the reaction tube. That portion of the reaction tube which is penetrated by the shaft is provided with a journal bearing and a magnetic fluid seal member. The seal member is surrounded by an enclosing space which substantially separates the seal member from the reaction space within the reaction tube, the enclosing space and the reaction space communicating with each other via a narrow passage. During a heat treatment, a shield gas is supplied into the enclosing space, the pressure within the enclosing space being maintained at a higher level than that within the reaction space. As a result, the reaction gas and a gas produced during heat treatment cannot come into contact with the seal member, and thus cannot adversely affect the seal member.
摘要翻译：一种用于制造半导体器件等的热处理装置，用于处理放置在该装置的反应管中的反应气体基板。在反应管内提供支撑台，用于在处理过程中支撑基板，并且通过电动机通过穿过反应管的轴在每次处理期间旋转支撑台。由轴穿透的反应管的该部分设置有轴颈轴承和磁性流体密封构件。密封构件被包围的空间包围，该封闭空间基本上将密封构件与反应管内的反应空间分离，封闭空间和反应空间经由狭窄的通道相互连通。在热处理期间，将保护气体供应到封闭空间中，封闭空间内的压力保持在比反应空间内的压力高的水平。结果，反应气体和热处理时产生的气体不能与密封构件接触，因此不会对密封构件产生不利影响。

3. 发明授权

US5271732A Heat-treating apparatus 失效
标题翻译：热处理装置
公开(公告)号：US5271732A
公开(公告)日：1993-12-21
申请号：US858002
申请日：1992-03-26
申请人： Osamu Yokokawa
发明人： Osamu Yokokawa
IPC分类号： C30B33/00 , F27D3/12
CPC分类号： C30B33/00
摘要： A heat-treating apparatus comprises a heat portion which performs a required heat treating to a plural number of objects to be treated mounted on a heat-treating boat, a vacuum exhaust system which creates a vacuum inside the heat-treating portion, a load lock chamber which is connected so as to be freely openable and closable with respect to the heat-treating portion, which is filled therein with an inert gas and which is for transporting an object to be treated into and out of the heat-treating portion, and a residual treating gas exhaust system which is connected to the load lock chamber. Furthermore, in this heat-treating apparatus, there are also provided an oxygen concentration detector for detecting an oxygen concentration inside the load lock chamber, a door lock device provided in a vicinity of a maintenance door of the load lock chamber and which regulates opening and closing of the maintenance door, and a door lock control device which releases a lock of the door lock device when the oxygen concentration detector has detected a required oxygen concentration.
摘要翻译：一种热处理装置，其特征在于，包括对多个被处理物进行热处理的加热部，所述多个待处理物体被安装在热处理船上，在所述热处理部内产生真空的真空排气系统，室，其相对于热处理部分可自由地打开和关闭，所述热处理部分填充有惰性气体，并且用于将待处理物体输送进出热处理部分;以及残余处理气体排出系统，其连接到负载锁定室。此外，在该热处理装置中，还设置有用于检测负载锁定室内的氧浓度的氧浓度检测器，设置在负载锁定室的维护门附近并调节开口的门锁装置，关闭维护门;以及门锁控制装置，当氧浓度检测器检测到所需的氧浓度时，释放门锁装置的锁定。

4. 发明授权

US5506389A Thermal processing furnace and fabrication method thereof 失效
标题翻译：热加工炉及其制造方法
公开(公告)号：US5506389A
公开(公告)日：1996-04-09
申请号：US337366
申请日：1994-11-08
申请人： Masaru Hidano , Yasuaki Miura , Osamu Yokokawa
发明人： Masaru Hidano , Yasuaki Miura , Osamu Yokokawa
IPC分类号： C23C16/44 , C23C16/46 , C30B25/10 , C30B31/12 , F27D1/00 , H01L21/205 , H01L21/22 , H01L21/324 , F27B5/14 , F27D11/00
CPC分类号： C30B25/10 , C23C16/46 , C30B31/12 , F27D1/0036 , H01L2924/0002
摘要： A thermal processing furnace provided with a helical-shaped heating resistance element along an inner wall surface of a cylindrical insulating member, wherein support members support the heating resistance element that has been divided into a plurality of parts in an axial direction of the insulating member. Each of the support members is formed of a plurality of support pieces that extend in a radially outward direction with respect to the furnace and at a pitch corresponding to that of the heating resistance element, on a base portion positioned on an inner side of the heating resistance element, and tip portions of the support pieces are embedded in the insulating member. Since this enables a simplification of the structure, it is possible to improve the practicability of the process and reduce the fabrication time, with a simple fabrication design, and it is also possible to improve the accuracy of the pitch at which the heating resistance element is arrayed.
摘要翻译：一种热处理炉，沿着圆柱形绝缘构件的内壁表面设置有螺旋形加热电阻元件，其中支撑构件支撑沿绝缘构件的轴向分成多个部分的加热电阻元件。每个支撑构件由多个支撑件形成，所述多个支撑件在位于加热器内侧的基座部分上相对于炉子沿径向向外的方向延伸并且以对应于加热电阻元件的间距延伸电阻元件和支撑片的尖端部分嵌入绝缘构件中。由于能够简化结构，所以可以通过简单的制造设计来提高工艺的实用性并缩短制造时间，并且还可以提高加热电阻元件的间距的精度排列

5. 发明授权

US5422081A Trap device for vapor phase reaction apparatus 失效
标题翻译：气相反应装置捕集装置
公开(公告)号：US5422081A
公开(公告)日：1995-06-06
申请号：US155750
申请日：1993-11-23
申请人： Katsushin Miyagi , Osamu Yokokawa , Yoshitaka Okada , Ichiro Nagasaki , Akira Hashimoto
发明人： Katsushin Miyagi , Osamu Yokokawa , Yoshitaka Okada , Ichiro Nagasaki , Akira Hashimoto
IPC分类号： B01D8/00 , B01D46/12 , B01D46/42 , C23C16/44 , C30B25/14
CPC分类号： C30B25/14 , B01D46/406 , B01D46/4263 , B01D8/00 , C23C16/4412
摘要： A double cylinder shaped multilayer structural member comprising ring shaped thin plate small diameter discs and large diameter discs respectively layered via spacers is disposed in the enclosure vessel of a trap device for a vapor phase reaction apparatus. Gas from the intake opening section of the enclosure vessel is introduced into the outer side space of the multilayer structural member of the enclosure vessel, passes through the spaces between the large diameter discs and also passes through the spaces between the small diameter discs, then exits via the inner side space of the multilayer structural member from the outlet opening section of enclosure vessel to the system exterior. As a result of this construction, in comparison to conventional devices, the collection efficiency of reactive components can be increased, the equipment life extended, and maintenance frequency reduced, thereby providing a trap device for a vapor phase reaction apparatus capable of improving productivity.
摘要翻译：包括环形薄板小直径圆盘和分别通过间隔件层叠的大直径圆盘的双圆筒形多层结构构件设置在用于气相反应装置的捕集装置的封闭容器中。来自封闭容器的进气开口部分的气体被引入到封闭容器的多层结构构件的外侧空间中，通过大直径盘之间的空间并且还穿过小直径盘之间的空间，然后退出通过多层结构构件的内侧空间从封闭容器的出口开口部分到系统外部。作为这种结构的结果，与常规装置相比，可以增加反应性组分的收集效率，延长设备寿命，降低维护频率，从而提供能够提高生产率的气相反应装置的捕集装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式