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    • 2. 发明授权
    • Pattern forming method and pattern forming apparatus in which a substrate and a mold are aligned in an in-plane direction
    • 图案形成方法和图案形成装置,其中基板和模具在面内方向上对齐
    • US08770958B2
    • 2014-07-08
    • US12842118
    • 2010-07-23
    • Nobuhito SuehiraJunichi SekiMasao MajimaAtsunori TerasakiHideki Ina
    • Nobuhito SuehiraJunichi SekiMasao MajimaAtsunori TerasakiHideki Ina
    • B28B17/00
    • G03F9/7084B82Y10/00B82Y40/00G03F7/0002G03F9/7076
    • A pattern forming method for forming an imprinted pattern on a coating material disposed on a substrate with a pattern provided to a mold. The method includes preparing a mold provided with a first surface including a pattern area, a second surface located opposite from the first surface, and an alignment mark provided at a position at which the alignment mark is away from the first surface, contacting the pattern area of the mold with the coating material disposed on the substrate, obtaining information about positions of the mold and the substrate by using the alignment mark and a mark provided to the substrate in a state in which the coating material is disposed on the substrate at a portion where the alignment mark and the substrate are opposite to each other, and effecting alignment of the substrate with the mold in an in-plane direction of the pattern area, on the basis of the information in a state in which the pattern area and the coating material contact each other.
    • 一种图案形成方法,用于在设置在模具上的图案的基板上的涂料上形成印刷图案。 该方法包括制备模具,其具有包括图案区域的第一表面,与第一表面相对的第二表面和设置在对准标记远离第一表面的位置处的对准标记, 的模具,其中涂覆材料设置在基板上,通过使用对准标记和设置在基板上的标记获得关于模具和基板的位置的信息,其中涂布材料设置在基板上的部分 其中所述对准标记和所述基板彼此相对,并且基于所述图案区域和所述涂层的状态的信息,在所述图案区域的面内方向上进行所述基板与所述模具的对准 材料相互接触。
    • 3. 发明授权
    • Imaging apparatus and imaging method using optical coherence tomography
    • 使用光学相干断层扫描的成像设备和成像方法
    • US08760664B2
    • 2014-06-24
    • US12991734
    • 2009-07-06
    • Nobuhito Suehira
    • Nobuhito Suehira
    • G01B11/02G01B9/02
    • A61B3/102A61B3/1025A61B5/0066A61B5/0073A61B5/7257G01N21/4795
    • Provided is an imaging apparatus using Fourier-domain optical coherence tomography, the imaging apparatus removing noises caused by the autocorrelation component of returning light to obtain a high-resolution tomographic image. A first switching unit 17 switches a first state in which returning light 12 is combined with reference light (a state in which the returning light 12 is conducted to a combining unit 22) and a second state different from the first state (a state in which the light path of the returning light 12 is blocked or changed). A controlling unit 18 controls the switching unit 17 to change the first and the second state. A interferometric information acquiring unit 19 acquires interferometric information on the returning light 12 and the reference light 14 using the reference light 14 or the returning light 12 detected by the detecting unit 16 in the second state and the combined light 15.
    • 提供了一种使用傅里叶域光学相干断层摄影的成像装置,该成像装置去除由返回光的自相关分量引起的噪声,以获得高分辨率断层图像。 第一切换单元17将返回光12与参考光(返回光12被传导到组合单元22的状态)和不同于第一状态的第二状态(其中 返回光12的光路被阻挡或改变)。 控制单元18控制切换单元17改变第一和第二状态。 干涉信息获取单元19使用在第二状态下由检测单元16检测的参考光14或返回光12以及组合光15获取关于返回光12和参考光14的干涉信息。
    • 6. 发明申请
    • TOMOGRAPHIC IMAGING APPRATUS AND TOMOGRAPHIC IMAGING METHOD
    • TOMOGRAPHIC IMAGING APPRATUS和TOMOGRAPHIC IMAGING METHOD
    • US20130003076A1
    • 2013-01-03
    • US13634215
    • 2011-03-24
    • Hirofumi YoshidaNobuhito Suehira
    • Hirofumi YoshidaNobuhito Suehira
    • G01B9/02
    • A61B3/1225A61B3/102A61B5/0066A61B5/0068G01B9/02044G01B9/02091
    • A tomographic imaging apparatus includes an irradiation unit configured to irradiate with a plurality of measurement light beams, a sensor configured to convert into an electric signal a plurality of combined light beams via an optical imaging system by making return light beams from an inspection target, which are generated due to the plurality of measurement light beams, interfere with reference light beams, an output unit configured to output light beams of a single wavelength based on a wavelength width of the plurality of measurement light beams, and a generation unit configured to generate a tomographic image from an electric signal acquired by the sensor via the imaging optical system, based on a position of the light beam of the single wavelength on the sensor.
    • 断层成像装置包括被配置为用多个测量光束照射的照射单元,被配置为通过使来自检查对象的返回光束经由光学成像系统将多个组合光转换成电信号的传感器, 由于多个测量光束而产生,与参考光束干涉,输出单元被配置为基于多个测量光束的波长宽度输出单个波长的光束;以及生成单元,被配置为生成 基于传感器上的单个波长的光束的位置,经由成像光学系统由传感器获取的电信号的断层图像。
    • 10. 发明授权
    • Mold, apparatus including mold, pattern transfer apparatus, and pattern forming method
    • 模具,包括模具的装置,图案转印装置和图案形成方法
    • US07927089B2
    • 2011-04-19
    • US11447857
    • 2006-06-07
    • Junichi SekiMasao MajimaNobuhito Suehira
    • Junichi SekiMasao MajimaNobuhito Suehira
    • B29C59/00B29C35/08B28B17/00
    • G03F7/0002B82Y10/00B82Y40/00
    • A deformable mold includes a first surface at which an imprinting pattern is formed. The imprinting pattern (i) is used to imprint a pattern on a substrate and (ii) has a variable size, which varies based on an amount of deformation of the imprinting pattern. A second surface is located opposite from the first surface in a direction of thickness of the mold. A plurality of heat generating members that generate heat have a permeability to ultraviolet light and are disposed at one of (i) the second surface and (ii) between the first surface and the second surface, and the plurality of heat generating members directly contact the mold in order to control the amount of deformation of the imprinting pattern to vary the size of the imprinting pattern. A controller independently controls the plurality of heat generating members and the controller controls at least one of the heat generating members so as to effect anisotropic size correction of the mold in an in-plane direction of the mold.
    • 可变形模具包括形成有压印图案的第一表面。 压印图案(i)用于将图案印刷在基材上,(ii)具有可变尺寸,其基于压印图案的变形量而变化。 第二表面在模具的厚度方向上与第一表面相对。 多个产生热量的发热部件具有对紫外线的透过性,并且设置在(i)第二表面和(ii)第一表面和第二表面之一之间,并且多个发热部件直接接触 模具,以便控制压印图案的变形量以改变压印图案的尺寸。 控制器独立地控制多个发热构件,并且控制器控制至少一个发热构件,以便在模具的面内方向上实现模具的各向异性尺寸校正。