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    • 2. 发明授权
    • Cooling system and cooling method
    • 冷却系统和冷却方式
    • US07036327B1
    • 2006-05-02
    • US10182115
    • 2000-02-01
    • Mikio Kinoshita
    • Mikio Kinoshita
    • F25B15/00
    • F25D7/00B01D1/0094B01D1/26C02F1/04Y02A20/128Y02W10/37
    • A cooling system comprising an evaporation cooling device for evaporating an aqueous solution, a water content providing device for allowing vapor evaporated from impurities-containing water to be absorbed into the aqueous solution, and a circulating device for circulating the aqueous solution between the water content providing device and the evaporation cooling device; and a cooling method characterized by comprising the steps of taking in impurities-containing water, cooling a high-temperature body by evaporating water content in an aqueous solution having a boiling point higher than that of the impurities-containing water, allowing vapor evaporated from the impurities containing water to be absorbed into the aqueous solution concentrated by the cooling step, feeding the aqueous solution diluted in the absorbing step to the cooling step, and discharging the impurities-containing water concentrated in the absorbing step. The aqueous solution circulates between the water content providing device and the aqueous solution desalination device, and no salts move between the aqueous solution and the impurities-containing water, thereby providing a cooling system free from scales.
    • 一种冷却系统,包括用于蒸发水溶液的蒸发冷却装置,用于允许从含杂质水中蒸发的蒸汽被吸收到水溶液中的含水量提供装置,以及用于使水溶液在含水量提供之间循环的循环装置 装置和蒸发冷却装置; 以及一种冷却方法,其特征在于包括以下步骤:摄取含杂质的水,通过蒸发沸点高于含杂质水的水溶液中的水分含量来冷却高温体,从而蒸发 含有被吸收到通过冷却步骤浓缩的水溶液中的水的杂质,将在吸收步骤中稀释的水溶液进料到冷却步骤,以及排出在吸收步骤中浓缩的含杂质水。 水溶液在水分提供装置和水溶液脱盐装置之间循环,在水溶液和含杂质水之间不会移动盐,从而提供无垢的冷却系统。
    • 4. 发明授权
    • Thin film forming apparatus
    • 薄膜成型装置
    • US5133849A
    • 1992-07-28
    • US448740
    • 1989-12-11
    • Mikio KinoshitaWasaburo OhtaTatsuya SatoMasashi Nakazawa
    • Mikio KinoshitaWasaburo OhtaTatsuya SatoMasashi Nakazawa
    • C23C14/00C23C14/32H01J37/32
    • H01J37/32422C23C14/0021C23C14/32
    • An apparatus for forming a thin film has a vacuum container to which an active gas, an inert gas or a mixture thereof is introduced, and a source of evaporation from which a substance is evaporated. A counter electrode is disposed in the vacuum container for holding a substrate for forming a thin film thereon in such a manner as to be opposed to the source of evaporation. A grid is disposed between the source of evaporation and the counter electrode and having openings which allow the evaporated substance to pass therethrough. A filament for thermionic emission is disposed between the grid and the source of evaporation. A target is also disposed between the filament and the source of evaporation for emitting sputtered particles. A power source device establishes predetermined electric potential relationships between the grid, the filament, and the target.
    • 用于形成薄膜的装置具有引入活性气体,惰性气体或其混合物的真空容器和物质蒸发的蒸发源。 对置电极设置在真空容器中,用于保持用于在其上形成薄膜的基板以与蒸发源相对的方式。 在蒸发源和对电极之间设置有栅格,并且具有允许蒸发的物质通过的开口。 用于热电子发射的灯丝设置在电网和蒸发源之间。 在灯丝和蒸发源之间还设置靶,用于发射溅射的颗粒。 电源装置在电网,灯丝和目标之间建立预定的电位关系。
    • 10. 发明授权
    • Thin film deposition system
    • 薄膜沉积系统
    • US5114559A
    • 1992-05-19
    • US587998
    • 1990-09-25
    • Wasaburo OhtaMasashi NakazawaMikio Kinoshita
    • Wasaburo OhtaMasashi NakazawaMikio Kinoshita
    • C23C14/32H01J37/32
    • H01J37/32422C23C14/32
    • A thin film deposition system includes an evacuated casing in which there is introduced an active gas or an inert gas or a mixture thereof. An evaporant carried by an evaporation source in the evacuated casing is evaporated and travels toward a substrate supported on the electrode. A filament for emitting thermions is disposed between the evaporation source and the electrode, and a grid for passing the evaporated material therethrough is disposed between the filament and the electrode. Power supplies are electrically connected to the evacuated casing, the evaporation source, the electrode, the filament, and the grid, for keeping the filament negative in potential with respect to the evacuated casing and the grid. Alternatively, the evacuated casing may not be connected to the power supplies so that the grid is kept positive with respect to the filament. The grid may be of a double-layer structure, with the gas inlet means connected to the grid.
    • 薄膜沉积系统包括抽真空壳体,其中引入活性气体或惰性气体或其混合物。 由真空壳体中的蒸发源携带的蒸发器被蒸发并且朝着支撑在电极上的基板行进。 用于发射热量的灯丝设置在蒸发源和电极之间,并且用于使蒸发的材料通过的栅格设置在灯丝和电极之间。 电源电连接到抽真空的外壳,蒸发源,电极,灯丝和电网,用于将灯丝相对于抽真空的外壳和电网保持为负电位。 或者,抽真空的壳体可以不连接到电源,使得栅格相对于灯丝保持正。 栅格可以是双层结构,其中气体入口装置连接到栅格。