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    • 2. 发明授权
    • Integrated circuit substrate that accommodates lattice mismatch stress
    • 集成电路基板,适应晶格失配应力
    • US06429466B2
    • 2002-08-06
    • US09774199
    • 2001-01-29
    • Yong ChenScott W. CorzineTheodore I. KaminsMichael J. LudowisePierre H. MertzShih-Yuan Wang
    • Yong ChenScott W. CorzineTheodore I. KaminsMichael J. LudowisePierre H. MertzShih-Yuan Wang
    • H01L31072
    • H01L21/7624H01L21/02381H01L21/0245H01L21/02488H01L21/02502H01L21/02538H01L21/0254H01L21/02658H01L21/26533
    • A method for growing a crystalline layer that includes a first material on a growth surface of a crystalline substrate of a second material, wherein the first material and the second material have different lattice constants. A buried layer is generated in the substrate such that the buried layer isolates a layer of the substrate that includes the growth surface from the remainder of the substrate. The second material is then deposited on the growth surface at a growth temperature. The isolated layer of the substrate has a thickness that is less than the thickness at which defects are caused in the crystalline lattice of the first material by the second material crystallizing thereon. The buried layer is sufficiently malleable at the growth temperature to allow the deformation of the lattice of the isolated layer without deforming the remainder of the substrate. The present invention may be utilized for growing III-V semiconducting material layers on silicon substrates. In the case of silicon-based substrates, the buried layer is preferably SiO2 that is sufficiently malleable at the growth temperature to allow the deformation of the isolated substrate layer.
    • 一种用于生长晶体层的方法,其包括在第二材料的晶体衬底的生长表面上的第一材料,其中第一材料和第二材料具有不同的晶格常数。 在衬底中产生掩埋层,使得掩埋层将衬底的包含生长表面的衬底与衬底的其余部分隔离。 然后将第二种材料在生长温度下沉积在生长表面上。 衬底的隔离层的厚度小于在其上结晶第二材料时在第一材料的晶格中产生缺陷的厚度。 掩埋层在生长温度下具有足够的延展性,以允许隔离层的晶格变形,而不使基底的其余部分变形。 本发明可用于在硅衬底上生长III-V半导体材料层。 在硅基基板的情况下,掩埋层优选是在生长温度下足够有韧性的SiO 2,以允许隔离的基底层的变形。
    • 5. 发明授权
    • Contacting scheme for large and small area semiconductor light emitting flip chip devices
    • 大面积和小面积半导体发光倒装芯片器件的接触方案
    • US06828596B2
    • 2004-12-07
    • US10172311
    • 2002-06-13
    • Daniel A. SteigerwaldJerome C. BhatMichael J. Ludowise
    • Daniel A. SteigerwaldJerome C. BhatMichael J. Ludowise
    • H01L3300
    • H01L33/382H01L33/08H01L33/20H01L33/486H01L2224/48247
    • In accordance with the invention, a light emitting device includes a substrate, a layer of first conductivity type overlying the substrate, a light emitting layer overlying the layer of first conductivity type, and a layer of second conductivity type overlying the light emitting layer. A plurality of vias are formed in the layer of second conductivity type, down to the layer of first conductivity type. The vias may be formed by, for example, etching, ion implantation, or selective growth of the layer of second conductivity type. A set of first contacts electrically contacts the layer of first conductivity type through the vias. A second contact electrically contacts the layer of second conductivity type. In some embodiments, the area of the second contact is at least 75% of the area of the device. In some embodiments, the vias are between 2 and 100 microns wide and spaced between 5 and 1000 microns apart.
    • 根据本发明,发光器件包括衬底,覆盖衬底的第一导电类型的层,覆盖第一导电类型的层的发光层和覆盖发光层的第二导电类型的层。 在第二导电类型的层中形成多个通孔,直到第一导电类型的层。 通孔可以通过例如第二导电类型的蚀刻,离子注入或选择性生长来形成。 一组第一触点通过通孔与第一导电类型的层电接触。 第二接触件电接触第二导电类型的层。 在一些实施例中,第二触点的面积为器件面积的至少75%。 在一些实施例中,通孔的宽度为2至100微米,间隔5至1000微米。
    • 6. 发明授权
    • Method for relieving lattice mismatch stress in semiconductor devices
    • 减少半导体器件晶格失配应力的方法
    • US06211095B1
    • 2001-04-03
    • US09221025
    • 1998-12-23
    • Yong ChenScott W. CorzineTheodore I. KaminsMichael J. LudowisePierre H. MertzShih-Yuan Wang
    • Yong ChenScott W. CorzineTheodore I. KaminsMichael J. LudowisePierre H. MertzShih-Yuan Wang
    • H01L2131
    • H01L21/7624H01L21/02381H01L21/0245H01L21/02488H01L21/02502H01L21/02538H01L21/0254H01L21/02658H01L21/26533
    • A method for growing a crystalline layer that includes a first material on a growth surface of a crystalline substrate of a second material, wherein the first material and the second material have different lattice constants. A buried layer is generated in the substrate such that the buried layer isolates a layer of the substrate that includes the growth surface from the remainder of the substrate. The first material is then deposited on the growth surface at a growth temperature. The isolated layer of the substrate has a thickness that is less than the thickness at which defects are caused in the crystalline lattice of the second material by the first material crystallizing thereon. The buried layer is sufficiently malleable at the growth temperature to allow the deformation of the lattice of the isolated layer without deforming the remainder of the substrate. The present invention may be utilized for growing III-V semiconducting material layers on silicon substrates. In the case of silicon-based substrates, the buried layer is preferably SiO2 that is sufficiently malleable at the growth temperature to allow the deformation of the isolated substrate layer.
    • 一种用于生长晶体层的方法,其包括在第二材料的晶体衬底的生长表面上的第一材料,其中第一材料和第二材料具有不同的晶格常数。 在衬底中产生掩埋层,使得掩埋层将衬底的包含生长表面的衬底与衬底的其余部分隔离。 然后在生长温度下将第一种材料沉积在生长表面上。 衬底的隔离层的厚度小于通过第一材料在其上结晶而在第二材料的晶格中引起缺陷的厚度。 掩埋层在生长温度下具有足够的延展性,以允许隔离层的晶格变形,而不使基底的其余部分变形。 本发明可用于在硅衬底上生长III-V半导体材料层。 在硅基基板的情况下,掩埋层优选是在生长温度下足够有韧性的SiO 2,以允许隔离的基底层的变形。
    • 9. 发明申请
    • Four Terminal Monolithic Multijunction Solar Cell
    • 四端子单片多功能太阳能电池
    • US20100263713A1
    • 2010-10-21
    • US12573142
    • 2009-10-04
    • Michael J. Ludowise
    • Michael J. Ludowise
    • H01L31/042H01L31/18
    • H01L31/022425H01L31/02021H01L31/0687H01L31/0725Y02E10/544
    • A monolithic multijunction photovoltaic device is disclosed which comprises two or more photovoltaic cells between two surfaces. Each of the photovoltaic cell materials include a first region exhibiting an excess of a first charge carrier and a second region exhibiting an excess of a second charge carrier. Contacts are connected to the regions of the photovoltaic cells in configurations that allow excess current to be extracted as useful energy. In one embodiment, a first contact is electrically connected to a second region of a first material, a second contact is electrically connected to a first region of the first material, a third contact is electrically connected to a first region of a second material, and a fourth contact is electrically connected to a third material. In other embodiments, the contacts may be positioned on the surfaces of the monolithic device to minimize shadowing.
    • 公开了一种在两个表面之间包括两个或多个光伏电池的单片多结光伏器件。 每个光伏电池材料包括表现出过量的第一电荷载流子的第一区域和表现出过量的第二电荷载流子的第二区域。 接触件以允许作为有用能量提取过量电流的结构连接到光伏电池的区域。 在一个实施例中,第一触点电连接到第一材料的第二区域,第二触点电连接到第一材料的第一区域,第三触点电连接到第二材料的第一区域,以及 第四触点电连接到第三材料。 在其它实施例中,触点可以定位在单片设备的表面上以最小化阴影。