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1. 发明授权

US5123059A Gradation converting circuit employing lookup table 失效
标题翻译：升级转换电路使用LOOKUP表
公开(公告)号：US5123059A
公开(公告)日：1992-06-16
申请号：US249984
申请日：1988-09-27
申请人： Makoto Hirosawa , Masami Aragaki
发明人： Makoto Hirosawa , Masami Aragaki
IPC分类号： H04N1/40 , H04N1/407
CPC分类号： H04N1/4072 , H04N1/40
摘要： A gradation converting circuit for converting digital input data to output data, in accordance with a predetermined input/output relationship. The input and output data is provided as data words having a predetermined number of bits "m". Since the resolution provided in the output by the "m" bits is insufficient for accurately expressing the aforementioned input/output relationship and to satisfy a demand to keep the number of bits at "m", an improved output resolution is obtained by varying the value outputted for any given input data over time such that the average of the outputs is closer to a desired output demanded by the input/output relationship. This is accomplished either by storing, for each input data, a plurality of outputs whose average is equal to the desired predetermined, input/output relationship, or, by outputting for each digital input data a so-called "decimal" value which is indicative of how often a fixed predetermined output value should be increased by one such that the average of the output should approximate the desired output value.

2. 发明授权

US4903138A Method of and apparatus for eliminating interblock distortion due to compressed image data 失效
标题翻译：用于消除压缩图像数据造成的块间失真的方法和装置
公开(公告)号：US4903138A
公开(公告)日：1990-02-20
申请号：US333444
申请日：1989-04-05
申请人： Masami Aragaki
发明人： Masami Aragaki
IPC分类号： G03F3/08 , G06T5/00 , G06T9/00 , H04N1/41 , H04N1/415 , H04N7/133
CPC分类号： H04N19/98 , H04N1/41
摘要： Interblock distortion often appears on a boundary of pixel blocks in a reproduced image produced from compressed image data. The interblock distortion is eliminated by correcting a density distribution in the reproduced image. First, an average density (A.sub.ij) of a selected pixel block (B.sub.ij) is computed. Second, a standard deviation (.sigma..sub.ij) of a density distribution in the selected deviation is computed. If the standard deviation is equal to zero, correction value distributions (.DELTA.f.sub.m, .DELTA.f.sub.n) along a main scanning direction and a subscanning direction are obtained. Finally, corrected density distribution (f.sub.mn) is obtained as a sum of the average density and the correction value distributions.
摘要翻译：在由压缩图像数据产生的再现图像中的像素块的边界上经常出现块间失真。通过校正再现图像中的浓度分布来消除帧间失真。首先，计算出所选择的像素块（Bij）的平均密度（Aij），其次计算所选择的偏差中的密度分布的标准偏差（sigma ij），如果标准偏差等于零，则校正值分布 DELTA fm，DELTA fn）沿主扫描方向和副扫描方向。最后，获得校正密度分布（fmn）作为平均密度和校正值分布之和。

3. 发明授权

US5204738A Method of an apparatus for compressing images data 失效
标题翻译：压缩图像数据的方法
公开(公告)号：US5204738A
公开(公告)日：1993-04-20
申请号：US627739
申请日：1990-12-14
申请人： Masami Aragaki
发明人： Masami Aragaki
IPC分类号： H04N1/41 , G06T9/00 , H04N1/64 , H04N7/26 , H04N7/30 , H04N11/04
CPC分类号： H04N11/044 , H04N1/646 , H04N19/154 , H04N19/60
摘要： An image is conceptually divided into pixel blocks each having a plurality of pixels. RGB image data representing the image are converted into luminance data and color difference data in the NTSC form. Standard deviation values of these data are calculated in each pixel block and are compared with threshold values, so that the pixel blocks are classified into two types. The image data in the pixel blocks of respective types are compressed at different compression rates to obtain image data compressed.

4. 发明授权

US07968465B2 Periodic acid compositions for polishing ruthenium/low K substrates 有权
标题翻译：用于抛光钌/低K衬底的周期酸组合物
公开(公告)号：US07968465B2
公开(公告)日：2011-06-28
申请号：US10568077
申请日：2004-08-12
申请人： Robert J. Small , Haruki Nojo , Kenichi Orui , Steve Masami Aragaki , Atsushi Hayashida
发明人： Robert J. Small , Haruki Nojo , Kenichi Orui , Steve Masami Aragaki , Atsushi Hayashida
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463
摘要： A method of polishing a semiconductor substrate surface having at least one ruthenium feature thereon and at least one dielectric material, wherein the substrate is contacted with an aqueous composition containing from about 0.0005 to about 1 moles/kilogram of periodic acid, from about 0.2% to about 6% % by weight of silica abrasive having an average particle size of about 50 nm or less, and an amine in an amount sufficient to adjust the pH of the composition to between about 2.5 and 7. The removal selectivity of the ruthenium to a. low-K dielectric is greater than 20:1. Advantageously, the substrate further has a tantalum-containing compound, and the polishing rate of the tantalum-containing compound is about the same as the polishing rate of the ruthenium, so that the polishing process is a one-step process.
摘要翻译：一种抛光其上具有至少一个钌特征的半导体衬底表面和至少一种电介质材料的方法，其中所述衬底与含有约0.0005至约1摩尔/千克高碘酸的水性组合物接触，约0.2％至约6重量％的平均粒度为约50nm或更小的二氧化硅磨料，以及足以将组合物的pH调节至约2.5至7的量的胺。钌对于。低K电介质大于20：1。有利的是，基板还含有含钽化合物，并且含钽化合物的抛光速率与钌的抛光速率大致相同，因此抛光过程是一步法。

5. 发明申请

US20080038995A1 Periodic Acid Compositions For Polishing Ruthenium/Low K Substrates 有权
标题翻译：用于抛光钌/低K基板的周期酸组合物
公开(公告)号：US20080038995A1
公开(公告)日：2008-02-14
申请号：US10568077
申请日：2004-08-12
申请人： Robert J. Small , Haruki Nojo , Kenichi Orui , Steve Masami Aragaki , Atsushi Hayashida
发明人： Robert J. Small , Haruki Nojo , Kenichi Orui , Steve Masami Aragaki , Atsushi Hayashida
IPC分类号： B24B1/00
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463
摘要： A method of polishing a semiconductor substrate surface having at least one ruthenium feature thereon and at least one dielectric material, wherein the substrate is contacted with an aqueous composition containing from about 0.0005 to about 1 moles/kilogram of periodic acid, from about 0.2% to about 6% % by weight of silica abrasive having an average particle size of about 50 nm or less, and an amine in an amount sufficient to adjust the pH of the composition to between about 2.5 and 7. The removal selectivity of the ruthenium to a.low-K dielectric is greater than 20:1. Advantageously, the substrate further has a tantalum-containing compound, and the polishing rate of the tantalum-containing compound is about the same as the polishing rate of the ruthenium, so that the polishing process is a one-step process.
摘要翻译：一种抛光其上具有至少一个钌特征的半导体衬底表面和至少一种电介质材料的方法，其中所述衬底与含有约0.0005至约1摩尔/千克高碘酸的水性组合物接触，约0.2％至约6重量％的平均粒度为约50nm或更小的二氧化硅磨料，以及足以将组合物的pH调节至约2.5至7的量的胺。钌对于低K电介质大于20：1。有利的是，基板还含有含钽化合物，并且含钽化合物的抛光速率与钌的抛光速率大致相同，因此抛光过程是一步法。

6. 发明授权

US5187755A Method of and apparatus for compressing image data 失效
标题翻译：用于压缩图像数据的方法和装置
公开(公告)号：US5187755A
公开(公告)日：1993-02-16
申请号：US369423
申请日：1989-06-21
申请人： Masami Aragaki
发明人： Masami Aragaki
IPC分类号： H04N7/26 , H04N7/30
CPC分类号： H04N19/154 , H04N19/124 , H04N19/132 , H04N19/60
摘要： Image data (f.sub.ij) depicting an image in a pixel block are converted by 2-D Discrete Cosine Transformation into transformation coefficients (F.sub.mn or F.sub.mn *). Only a part of the coefficients are employed to form compressed image data (D.sub.t). The selection of the part of the coefficients is executed using code tables (CT). Several groups of code tables are prepared, and one of those groups is selected in the data compression operation in response to a standard deviation (.sigma.) of the image data in the pixel block. When the compressed image data is restored, identification data specifying the selected group in the previous data compression is stored in the restored image data. Then, in the next data compression of the restored image data, the selected group is again selected as a function of the identification data.

7. 发明授权

US4992887A Method of storing and transmitting image data as an image file suitable for an image search 失效
标题翻译：存储和传输图像数据作为适合于图像搜索的图像文件的方法
公开(公告)号：US4992887A
公开(公告)日：1991-02-12
申请号：US306573
申请日：1989-02-03
申请人： Masami Aragaki
发明人： Masami Aragaki
IPC分类号： G09G5/36 , G06F17/30 , G06T1/00 , G06T9/00 , G09G5/00 , H04N1/21 , H04N1/41
CPC分类号： G06T9/00 , G06F17/3028
摘要： An image file consists of a file header, reduced-and-compressed image data, and compressed original image data. The reduced-and-compressed image data is obtained by compressing reduced image data expressing a reduced image of an original image in serial order of bit planes. The reduced image is then reproduced and displayed on an image display for an image search, in place of the original image itself, whereby efficiency in an image search is improved.

8. 发明授权

US08114775B2 Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers 有权
标题翻译：用于具有金属离子氧化剂的化学机械抛光组合物中的二羟基烯醇化合物
公开(公告)号：US08114775B2
公开(公告)日：2012-02-14
申请号：US12352700
申请日：2009-01-13
申请人： Junaid Ahmed Siddiqui , Daniel Hernandez Castillo , Steven Masami Aragaki , Robin Edward Richards
发明人： Junaid Ahmed Siddiqui , Daniel Hernandez Castillo , Steven Masami Aragaki , Robin Edward Richards
IPC分类号： H01L21/302
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/02074 , H01L21/3212 , H01L21/32125
摘要： A chemical mechanical polishing composition contains 1) water, 2) optionally an abrasive material, 3) an oxidizer, preferably a per-type oxidizer, 4) a small amount of soluble metal-ion oxidizer/polishing accelerator, a metal-ion polishing accelerator bound to particles such as to abrasive particles, or both; and 5) at least one of the group selected from a) a small amount of a chelator, b) a small amount of a dihydroxy enolic compound, and c) a small amount of an organic accelerator. Ascorbic acid in an amount less than 800 ppm, preferably between about 100 ppm and 500 ppm, is the preferred dihydroxy enolic compound. The polishing compositions and processes are useful for substantially all metals and metallic compounds found in integrated circuits, but is particularly useful for tungsten. The present invention also pertains to surface-modified colloidal abrasive polishing compositions and associated methods of using these compositions, particularly for chemical mechanical planarization, wherein the slurry comprises low levels of chelating free radical quenchers, non-chelating free radical quenchers, or both.
摘要翻译：化学机械抛光组合物包含1）水，2）任选的研磨材料，3）氧化剂，优选每种型氧化剂，4）少量可溶性金属离子氧化剂/抛光促进剂，金属离子抛光促进剂与颗粒结合，例如磨料颗粒或两者; 和5）选自a）少量螯合剂中的至少一种，b）少量的二羟基烯醇化合物，和c）少量的有机促进剂。少于800ppm，优选在约100ppm和500ppm之间的抗坏血酸是优选的二羟基烯醇化合物。抛光组合物和方法对于在集成电路中发现的基本上所有的金属和金属化合物都是有用的，但对钨尤其有用。本发明还涉及表面改性的胶体研磨抛光组合物以及使用这些组合物，特别是用于化学机械平面化的相关方法，其中浆料包含低水平的螯合自由基猝灭剂，非螯合自由基猝灭剂或二者。

9. 发明授权

US07476620B2 Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers 有权
标题翻译：用于具有金属离子氧化剂的化学机械抛光组合物中的二羟基烯醇化合物
公开(公告)号：US07476620B2
公开(公告)日：2009-01-13
申请号：US11387934
申请日：2006-03-24
申请人： Junaid Ahmed Siddiqui , Daniel Hernandez Castillo , Steven Masami Aragaki , Robin Edward Richards
发明人： Junaid Ahmed Siddiqui , Daniel Hernandez Castillo , Steven Masami Aragaki , Robin Edward Richards
IPC分类号： H01L21/302
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/02074 , H01L21/3212 , H01L21/32125
摘要： A chemical mechanical polishing composition contains 1) water, 2) optionally an abrasive material, 3) an oxidizer, preferably a per-type oxidizer, 4) a small amount of soluble metal-ion oxidizer/polishing accelerator, a metal-ion polishing accelerator bound to particles such as to abrasive particles, or both; and 5) at least one of the group selected from a) a small amount of a chelator, b) a small amount of a dihydroxy enolic compound, and c) a small amount of an organic accelerator. Ascorbic acid in an amount less than 800 ppm, preferably between about 100 ppm and 500 ppm, is the preferred dihydroxy enolic compound. The polishing compositions and processes are useful for substantially all metals and metallic compounds found in integrated circuits, but is particularly useful for tungsten. The present invention also pertains to surface-modified colloidal abrasive polishing compositions and associated methods of using these compositions, particularly for chemical mechanical planarization, wherein the slurry comprises low levels of chelating free radical quenchers, non-chelating free radical quenchers, or both.
摘要翻译：化学机械抛光组合物包含1）水，2）任选的研磨材料，3）氧化剂，优选每种型氧化剂，4）少量可溶性金属离子氧化剂/抛光促进剂，金属离子抛光促进剂与颗粒结合，例如磨料颗粒或两者; 和5）选自a）少量螯合剂中的至少一种，b）少量的二羟基烯醇化合物，和c）少量的有机促进剂。少于800ppm，优选在约100ppm和500ppm之间的抗坏血酸是优选的二羟基烯醇化合物。抛光组合物和方法对于在集成电路中发现的基本上所有的金属和金属化合物都是有用的，但对钨尤其有用。本发明还涉及表面改性的胶体研磨抛光组合物以及使用这些组合物，特别是用于化学机械平面化的相关方法，其中浆料包含低水平的螯合自由基猝灭剂，非螯合自由基猝灭剂或二者。

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