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1. 发明授权

US08104342B2 Process condition measuring device 有权
标题翻译：工艺条件测量装置
公开(公告)号：US08104342B2
公开(公告)日：2012-01-31
申请号：US12034041
申请日：2008-02-20
申请人： Mei H. Sun , Mark Wiltse , Wayne G. Renken , Zachary Reid , Tony DiBiase
发明人： Mei H. Sun , Mark Wiltse , Wayne G. Renken , Zachary Reid , Tony DiBiase
IPC分类号： G01D11/24
CPC分类号： H01L21/67253 , G03F7/70616 , G03F7/7085 , G03F7/70875 , Y10T29/4913
摘要： An instrument for measuring a parameter comprises a substrate, a plurality of sensors carried by and distributed across a surface of the substrate that individually measure the parameter at different positions, an electronic processing component carried by the substrate surface, electrical conductors extending across the surface connected to the sensors and the electronic processing component, and a cover disposed over the sensors, electronic processing component and conductors. The cover and substrate have similar material properties to a production substrate processed by a substrate processing cell. The instrument has approximately the same thickness and/or flatness as the production substrate. The instrument may be subjected a substrate process and one or more parameters may be measured with the instrument during the process. The behavior of a production wafer in the substrate process may be characterized based on measurements of the parameters made with the one or more sensors.
摘要翻译：用于测量参数的仪器包括基板，由基板的表面承载并分布在多个基板表面上的单独测量不同位置处的参数的多个传感器，由基板表面承载的电子处理部件，跨越表面连接的电导体传感器和电子处理部件，以及设置在传感器，电子处理部件和导体上的盖子。盖和基底与由基板处理单元处理的生产基板具有相似的材料特性。仪器具有与生产基底大致相同的厚度和/或平坦度。仪器可以经受衬底工艺，并且可以在过程期间用仪器测量一个或多个参数。可以基于用一个或多个传感器进行的参数的测量来表征生产晶片在衬底工艺中的行为。

2. 发明申请

US20090056441A1 PROCESS CONDITION MEASURING DEVICE 有权
标题翻译：工艺条件测量装置
公开(公告)号：US20090056441A1
公开(公告)日：2009-03-05
申请号：US12034041
申请日：2008-02-20
申请人： Mei H. Sun , Mark Wiltse , Wayne G. Renken , Zachary Reid , Tony DiBiase
发明人： Mei H. Sun , Mark Wiltse , Wayne G. Renken , Zachary Reid , Tony DiBiase
IPC分类号： G01D11/00 , H01L21/66
CPC分类号： H01L21/67253 , G03F7/70616 , G03F7/7085 , G03F7/70875 , Y10T29/4913
摘要： An instrument for measuring a parameter comprises a substrate, a plurality of sensors carried by and distributed across a surface of the substrate that individually measure the parameter at different positions, an electronic processing component carried by the substrate surface, electrical conductors extending across the surface connected to the sensors and the electronic processing component, and a cover disposed over the sensors, electronic processing component and conductors. The cover and substrate have similar material properties to a production substrate processed by a substrate processing cell. The instrument has approximately the same thickness and/or flatness as the production substrate. The instrument may be subjected a substrate process and one or more parameters may be measured with the instrument during the process. The behavior of a production wafer in the substrate process may be characterized based on measurements of the parameters made with the one or more sensors.
摘要翻译：用于测量参数的仪器包括基板，由基板的表面承载并分布在多个基板表面上的单独测量不同位置处的参数的多个传感器，由基板表面承载的电子处理部件，跨越表面连接的电导体传感器和电子处理部件，以及设置在传感器，电子处理部件和导体上的盖子。盖和基底与由基板处理单元处理的生产基板具有相似的材料特性。仪器具有与生产基底大致相同的厚度和/或平坦度。仪器可以经受衬底工艺，并且可以在过程期间用仪器测量一个或多个参数。可以基于用一个或多个传感器进行的参数的测量来表征生产晶片在衬底工艺中的行为。

3. 发明授权

US5851926A Method for etching transistor gates using a hardmask 失效
标题翻译：使用硬掩模蚀刻晶体管栅极的方法
公开(公告)号：US5851926A
公开(公告)日：1998-12-22
申请号：US724383
申请日：1996-10-01
申请人： Ajay Kumar , Jeffrey Chinn , Shashank C. Deshmukh , Weinan Jiang , Rolf Adolf Guenther , Bruce Minaee , Mark Wiltse
发明人： Ajay Kumar , Jeffrey Chinn , Shashank C. Deshmukh , Weinan Jiang , Rolf Adolf Guenther , Bruce Minaee , Mark Wiltse
IPC分类号： H01L21/28 , H01L21/302 , H01L21/3065 , H01L21/3213 , H01L29/78
CPC分类号： H01L21/32135
摘要： An etchant composition of nitrogen trifluoride and chlorine, preferably also including a passivation material such as hydrogen bromide, etches tungsten silicide-polysilicon gate layers with high selectivity to a thin underlying silicon oxide gate oxide layer to form straight wall, perpendicular profiles with low microloading and excellent profile control.
摘要翻译：三氟化氮和氯的蚀刻剂组合物，优选还包括钝化材料如溴化氢，蚀刻钨硅化物 - 多晶硅栅极层，其具有对薄的底层氧化硅栅极氧化物层的高选择性，以形成具有低微载荷的直壁，垂直剖面，优秀的档案控制。

4. 发明授权

US07924408B2 Temperature effects on overlay accuracy 有权
标题翻译：温度对叠加精度的影响
公开(公告)号：US07924408B2
公开(公告)日：2011-04-12
申请号：US11690813
申请日：2007-03-24
申请人： Tony DiBiase , Mei H. Sun , Mark Wiltse
发明人： Tony DiBiase , Mei H. Sun , Mark Wiltse
IPC分类号： G03B27/58 , G03B27/32
CPC分类号： G03F7/70875 , G03F7/70633
摘要： A method for reducing overlay error in a photolithographic process, by providing a substrate having a permanent layer with a first pattern disposed therein, coating the substrate with photoresist, exposing the photoresist to a second pattern, while measuring temperatures at a plurality of different first positions across the substrate, developing the second pattern in the photoresist, measuring overlay errors between the first and second patterns at a plurality of different second positions across the substrate, correlating the overlay errors with temperatures by position on the substrate, determining any relationship indicated between the correlated overlay errors and temperatures, and adjusting at least one temperature controlling aspect of the photolithographic process in response to any relationship determined.
摘要翻译：一种通过提供具有设置在其中的具有第一图案的永久层的基板的衬底，用光致抗蚀剂涂覆衬底，将光致抗蚀剂暴露于第二图案，同时测量多个不同的第一位置处的温度的方法，用于减小光刻工艺中的覆盖误差的方法跨越衬底，在光致抗蚀剂中显影第二图案，测量穿过衬底的多个不同第二位置处的第一和第二图案之间的重叠误差，将重叠误差与衬底上的位置的温度相关联，确定在衬底上指示的任何关系相关重叠误差和温度，以及响应于确定的任何关系调整光刻工艺的至少一个温度控制方面。

5. 发明申请

US20100112845A1 ELECTRICAL ADAPTER FOR A CONNECTOR HAVING A RETENTION LATCH 有权
标题翻译：具有保持锁的连接器的电气适配器
公开(公告)号：US20100112845A1
公开(公告)日：2010-05-06
申请号：US12581437
申请日：2009-10-19
申请人： Bill Lam , Ian Lin , Mark Wiltse
发明人： Bill Lam , Ian Lin , Mark Wiltse
IPC分类号： H01R13/629 , H01R25/00
CPC分类号： H01R13/6275 , H01R13/635 , H01R24/64 , H01R31/06
摘要： An electrical adapter is provided for engaging a connector plug. The adapter comprises a male end, a female end, and a retention member. The male end is disposed at one end of the adapter for connecting the adapter to a female receptacle corresponding to the connector plug. The female end is disposed at another end of the adapter for engaging the connector plug. The female end comprises a top cap having a button disposed thereon. The retention member comprises a holder section, an energy storage section, and an energy release section. The holder section holds the connector plug. The energy storage section stores energy resulting from when the connector plug engages the retention member. When engaged by the button, the energy release section releases the energy stored in the energy storage section such that the connector plug automatically ejects from the adapter.
摘要翻译：提供用于接合连接器插头的电适配器。适配器包括阳端，阴端和保持构件。阳端设置在适配器的一端，用于将适配器连接到对应于连接器插头的阴插座。母端设置在适配器的另一端以接合连接器插头。阴端包括顶盖，其具有设置在其上的按钮。保持构件包括保持器部分，能量存储部分和能量释放部分。保持器部分保持连接器插头。能量存储部分存储当连接器插头与保持构件接合时产生的能量。当通过按钮接合时，能量释放部分释放存储在能量存储部分中的能量，使得连接器插头自动地从适配器弹出。

6. 发明授权

US5893643A Apparatus for measuring pedestal temperature in a semiconductor wafer processing system 失效
标题翻译：用于测量半导体晶片处理系统中基座温度的装置
公开(公告)号：US5893643A
公开(公告)日：1999-04-13
申请号：US824099
申请日：1997-03-25
申请人： Ajay Kumar , Jeffrey Chinn , Shashank C. Deshmukh , Weinan Jiang , Brian Duda , Rolf Guenther , Bruce Minaee , Marco Mombelli , Mark Wiltse
发明人： Ajay Kumar , Jeffrey Chinn , Shashank C. Deshmukh , Weinan Jiang , Brian Duda , Rolf Guenther , Bruce Minaee , Marco Mombelli , Mark Wiltse
IPC分类号： G01J5/02 , G01J5/00 , H01L21/00 , H01L21/205 , H01L21/302 , H01L21/3065 , G01M15/00
CPC分类号： H01L21/67248 , H01L21/67103
摘要： Apparatus for measuring wafer support pedestal temperature in a semiconductor wafer processing system. The apparatus measures infrared energy emitted by the bottom of the pedestal via a tube having one end inserted in a bore through the underside of the cathode pedestal base. The distal end of the tube is coupled to a temperature sensor. Both the tube and temperature sensor are fitted with insulating sleeve adapters to suppress unwanted RF signals from coupling to the sensor.
摘要翻译：用于测量半导体晶片处理系统中的晶片支撑基座温度的装置。该装置测量由基座的底部发射的红外能量，该管的一端通过阴极基座的底面插入孔中。管的远端连接到温度传感器。管和温度传感器均配有绝缘套管适配器，以防止不必要的RF信号与传感器耦合。

7. 发明授权

US07901250B2 Electrical adapter for a connector having a retention latch 有权
标题翻译：具有保持闩锁的连接器的电气适配器
公开(公告)号：US07901250B2
公开(公告)日：2011-03-08
申请号：US12581437
申请日：2009-10-19
申请人： Bill Lam , Ian Lin , Mark Wiltse
发明人： Bill Lam , Ian Lin , Mark Wiltse
IPC分类号： H01R33/94
CPC分类号： H01R13/6275 , H01R13/635 , H01R24/64 , H01R31/06
摘要： An electrical adapter is provided for engaging a connector plug. The adapter comprises a male end, a female end, and a retention member. The male end is disposed at one end of the adapter for connecting the adapter to a female receptacle corresponding to the connector plug. The female end is disposed at another end of the adapter for engaging the connector plug. The female end comprises a top cap having a button disposed thereon. The retention member comprises a holder section, an energy storage section, and an energy release section. The holder section holds the connector plug. The energy storage section stores energy resulting from when the connector plug engages the retention member. When engaged by the button, the energy release section releases the energy stored in the energy storage section such that the connector plug automatically ejects from the adapter.
摘要翻译：提供用于接合连接器插头的电适配器。适配器包括阳端，阴端和保持构件。阳端设置在适配器的一端，用于将适配器连接到对应于连接器插头的阴插座。母端设置在适配器的另一端以接合连接器插头。阴端包括顶盖，其具有设置在其上的按钮。保持构件包括保持器部分，能量存储部分和能量释放部分。保持器部分保持连接器插头。能量存储部分存储当连接器插头与保持构件接合时产生的能量。当通过按钮接合时，能量释放部分释放存储在能量存储部分中的能量，使得连接器插头自动地从适配器弹出。

8. 发明申请

US20100080957A1 Surface Coating 审中-公开
标题翻译：表面涂层
公开(公告)号：US20100080957A1
公开(公告)日：2010-04-01
申请号：US12249597
申请日：2008-10-10
申请人： Jeffrey D. CHINN , Rolf GUENTHER , Mark WILTSE , William Robert ASHURST , Adam ANDERSON
发明人： Jeffrey D. CHINN , Rolf GUENTHER , Mark WILTSE , William Robert ASHURST , Adam ANDERSON
IPC分类号： C23F11/00 , B32B5/16 , B32B9/00 , B32B15/04 , B05D5/00
CPC分类号： B05D5/08 , B05D1/36 , B05D1/60 , B05D5/00 , B05D7/14 , B05D7/52 , B82Y30/00 , C08K3/22 , C08K9/06 , C09D5/086 , C09D7/62 , C09D7/67 , C23C16/45525 , C23C22/03 , C23C22/83 , H05K3/282 , H05K3/284 , H05K2201/0179 , H05K2201/0209 , H05K2201/0257 , H05K2203/1173 , H05K2203/124 , Y10T428/24372 , Y10T428/24405 , Y10T428/24413 , Y10T428/24421 , Y10T428/257 , Y10T428/259 , Y10T428/261 , Y10T428/265 , Y10T428/31504 , Y10T428/31663 , Y10T428/31678
摘要： A corrosion barrier is provided, disposed on a substrate. The corrosion barrier includes a vapor corrosion inhibitor (VCI) material and an anti-wetting barrier having a nano-particle composite structure.
摘要翻译：提供了设置在基板上的腐蚀屏障。腐蚀屏障包括蒸汽腐蚀抑制剂（VCI）材料和具有纳米颗粒复合结构的抗潮湿屏障。

9. 发明申请

US20080204678A1 Temperature effects on overlay accuracy 有权
标题翻译：温度对叠加精度的影响
公开(公告)号：US20080204678A1
公开(公告)日：2008-08-28
申请号：US11690813
申请日：2007-03-24
申请人： Tony DiBiase , Mei H. Sun , Mark Wiltse
发明人： Tony DiBiase , Mei H. Sun , Mark Wiltse
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/70633
摘要： A method for reducing overlay error in a photolithographic process, by providing a substrate having a permanent layer with a first pattern disposed therein, coating the substrate with photoresist, exposing the photoresist to a second pattern, while measuring temperatures at a plurality of different first positions across the substrate, developing the second pattern in the photoresist, measuring overlay errors between the first and second patterns at a plurality of different second positions across the substrate, correlating the overlay errors with temperatures by position on the substrate, determining any relationship indicated between the correlated overlay errors and temperatures, and adjusting at least one temperature controlling aspect of the photolithographic process in response to any relationship determined.
摘要翻译：一种通过提供具有设置在其中的具有第一图案的永久层的基板的衬底，用光致抗蚀剂涂覆衬底，将光致抗蚀剂暴露于第二图案，同时测量多个不同的第一位置处的温度的方法，用于减小光刻工艺中的覆盖误差的方法跨越衬底，在光致抗蚀剂中显影第二图案，测量穿过衬底的多个不同第二位置处的第一和第二图案之间的重叠误差，将重叠误差与衬底上的位置的温度相关联，确定在衬底上指示的任何关系相关重叠误差和温度，以及响应于确定的任何关系调整光刻工艺的至少一个温度控制方面。

10. 发明申请

US20130029433A1 PROCESS CONDITION MEASURING DEVICE 审中-公开
标题翻译：工艺条件测量装置
公开(公告)号：US20130029433A1
公开(公告)日：2013-01-31
申请号：US13361869
申请日：2012-01-30
申请人： Mei H. Sun , Mark Wiltse , Wayne G. Renken , Zachary Reid , Tony Dibiase
发明人： Mei H. Sun , Mark Wiltse , Wayne G. Renken , Zachary Reid , Tony Dibiase
IPC分类号： H01L21/66 , H05K3/30 , G01N27/00 , G01N19/00 , G01N33/00 , G01N21/00
CPC分类号： H01L21/67253 , G03F7/70616 , G03F7/7085 , G03F7/70875 , Y10T29/4913
摘要： An instrument comprises a substrate, a plurality of sensors distributed at positions across the substrate's surface, at least one electronic processing component on the surface, electrical conductors extending across the surface and connected to the sensors and processing component, and a cover disposed over the sensors, processing component and conductors. The cover and substrate have similar material properties to a production substrate. The cover is configured to electromagnetically shield the sensors, conductors, or processing component. The instrument has approximately the same thickness and/or flatness as the production substrate. It is emphasized that this abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
摘要翻译：仪器包括基板，分布在基板表面上的位置处的多个传感器，表面上的至少一个电子处理部件，横跨表面延伸并连接到传感器和处理部件的电导体，以及设置在传感器，处理部件和导体。覆盖物和基材与生产基材具有相似的材料性质。盖被配置为电磁屏蔽传感器，导体或处理部件。仪器具有与生产基底大致相同的厚度和/或平坦度。要强调的是，提供这个摘要是为了符合要求摘要的规则，允许搜索者或其他读者快速确定技术公开内容的主题。提交它的理解是，它不会用于解释或限制权利要求的范围或含义。

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