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1. 发明授权

US08855400B2 Detection of thin lines for selective sensitivity during reticle inspection using processed images 有权
标题翻译：在使用处理图像的掩模版检查期间检测细线以选择灵敏度
公开(公告)号：US08855400B2
公开(公告)日：2014-10-07
申请号：US13473299
申请日：2012-05-16
申请人： Zhengyu Wang , Rui-fang Shi , Lih-Huah Yiin , Bing Li
发明人： Zhengyu Wang , Rui-fang Shi , Lih-Huah Yiin , Bing Li
IPC分类号： G06K9/62
CPC分类号： G06T7/001 , G01N2021/95676 , G03F1/84 , G06T7/13 , G06T7/174 , G06T2207/10016 , G06T2207/10152 , G06T2207/20044 , G06T2207/20161 , G06T2207/20221 , G06T2207/30148
摘要： A detection method for a spot image based thin line detection is disclosed. The method includes a step for generating a band limited spot image from a transmitted and reflected optical image of the mask. The spot image is calibrated to minimize a plurality of optical aberrations from the spot image. The spot image is restored back to a mask image to allow at least one of: a more reliable segmentation between thin line and non-thin line areas on the mask image or a more accurate line width measurement for facilitating segmentation. Thin line features and non-thin lines features are distinguished on the restored mask image. Areas containing thin line features are grown while preventing the thin line growth from encroaching the non-thin line features.
摘要翻译：公开了一种用于基于点图像的细线检测的检测方法。该方法包括从掩模的透射和反射光学图像产生带限定斑点图像的步骤。斑点图像被校准以最小化来自斑点图像的多个光学像差。斑点图像恢复到掩模图像，以允许以下至少一个：掩模图像上的细线和非细线区域之间的更可靠的分割或更准确的线宽度测量以便于分割。在恢复的蒙版图像上区分细线特征和非细线特征。生长包含细线特征的区域，同时防止细线生长侵蚀非细线特征。

2. 发明授权

US08090189B1 Detection of thin line for selective sensitivity during reticle inspection 有权
标题翻译：检测光栅检测期间选择灵敏度的细线
公开(公告)号：US08090189B1
公开(公告)日：2012-01-03
申请号：US12042329
申请日：2008-03-04
申请人： Vinayak Dattatreya Phalke , Ge Cong , Lih-Huah Yiin , Yalin Xiong
发明人： Vinayak Dattatreya Phalke , Ge Cong , Lih-Huah Yiin , Yalin Xiong
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G01N21/956 , G03F1/36 , G06T7/001 , G06T2207/30148
摘要： Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, detection of thin line or sub-resolution assist features may be used for selective sensitivity during photomask inspection. Other embodiments are also described.
摘要翻译：描述与光掩模检查相关的方法和设备。在一个实施例中，可以在光掩模检查期间使用细线或次分辨率辅助特征的检测用于选择性灵敏度。还描述了其它实施例。

3. 发明授权

US07126681B1 Closed region defect detection system 有权
公开(公告)号：US07126681B1
公开(公告)日：2006-10-24
申请号：US10421626
申请日：2003-04-23
申请人： George Q. Chen , Lih-Huah Yiin , Yu Cao
发明人： George Q. Chen , Lih-Huah Yiin , Yu Cao
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/956
摘要： A method and apparatus for inspecting specimens or patterned transmissive substrates, such as photomasks, for unwanted particles and features, particularly those associated with contacts, including irregularly shaped contacts. A specimen is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and/or reflected light collection optics and detectors collect and generate signals representative of the light transmitted by the substrate. The defect identification of the substrate is performed using those transmitted light signals. Defect identification is performed using an inspection algorithm by comparing image feature representations of a test specimen with a reference specimen, and using a boundary computer and flux comparison device to establish tight boundaries around contacts and compute flux differences between the test and reference specimen contacts. Defect sizes are reported as ratio of flux difference, and entire contacts are highlighted for review.

4. 发明申请

US20070035727A1 Closed region defect detection system 有权
标题翻译：闭区缺陷检测系统
公开(公告)号：US20070035727A1
公开(公告)日：2007-02-15
申请号：US11584714
申请日：2006-10-19
申请人： George Chen , Lih-Huah Yiin , Yu Cao
发明人： George Chen , Lih-Huah Yiin , Yu Cao
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/956
摘要： A method and apparatus for inspecting specimens or patterned transmissive substrates, such as photomasks, for unwanted particles and features, particularly those associated with contacts, including irregularly shaped contacts. A specimen is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and/or reflected light collection optics and detectors collect and generate signals representative of the light transmitted by the substrate. The defect identification of the substrate is performed using those transmitted light signals. Defect identification is performed using an inspection algorithm by comparing image feature representations of a test specimen with a reference specimen, and using a boundary computer and flux comparison device to establish tight boundaries around contacts and compute flux differences between the test and reference specimen contacts. Defect sizes are reported as ratio of flux difference, and entire contacts are highlighted for review.
摘要翻译：用于检查样品或图案化的透射基底（例如光掩模）的方法和装置，用于不期望的颗粒和特征，特别是与触点相关联的那些，包括不规则形状的触点。通过由激光扫描系统，单独发射和/或反射光收集光学器件组成的光学系统，激光照射样品，并且检测器收集并产生表示由衬底透射的光的信号。使用这些透射光信号进行衬底的缺陷识别。通过比较测试样本的图像特征表示和参考样本，并使用边界计算机和通量比较装置在接触周围建立紧密的边界并计算测试和参考样本接触之间的通量差，使用检查算法执行缺陷识别。缺陷尺寸报告为通量差的比率，并且整个触点被突出显示以供审查。

5. 发明授权

US07167185B1 Visualization of photomask databases 有权
标题翻译：光掩模数据库的可视化
公开(公告)号：US07167185B1
公开(公告)日：2007-01-23
申请号：US10396228
申请日：2003-03-24
申请人： Lih-Huah Yiin , Yen-Wen Lu , George Q. Chen
发明人： Lih-Huah Yiin , Yen-Wen Lu , George Q. Chen
IPC分类号： G09G5/02
CPC分类号： G03F1/84 , G06T7/0004 , G06T2207/30148
摘要： Faster and more accurate techniques for displaying images are described. The techniques can be applied in various applications that include semiconductor fabrication processes. The invention uses preprocessed images to generate a user-selected image in order to increase the speed of image processing. The invention displays the pixels forming an image using grayscale shading in order to improve the accuracy of displaying the patterns used in photolithography processes. The techniques of the present invention can be used to display images that represent lithography patterns stored within memory devices or to display images captured by inspection or metrology devices.
摘要翻译：描述更快更准确的显示图像的技术。这些技术可以应用于包括半导体制造工艺的各种应用中。本发明使用预处理图像来生成用户选择的图像，以便提高图像处理的速度。本发明使用灰度阴影显示形成图像的像素，以便提高显示在光刻工艺中使用的图案的精度。本发明的技术可以用于显示表示存储在存储器件内的光刻图案的图像，或者显示由检查或计量装置捕获的图像。

6. 发明授权

US07499156B2 Closed region defect detection system 有权
标题翻译：闭区缺陷检测系统
公开(公告)号：US07499156B2
公开(公告)日：2009-03-03
申请号：US11584714
申请日：2006-10-19
申请人： George Q. Chen , Lih-Huah Yiin , Yu Cao
发明人： George Q. Chen , Lih-Huah Yiin , Yu Cao
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/956
摘要： A method and apparatus for inspecting specimens or patterned transmissive substrates, such as photomasks, for unwanted particles and features, particularly those associated with contacts, including irregularly shaped contacts. A specimen is illuminated by a laser through an optical system comprised of a laser scanning system, individual transmitted and/or reflected light collection optics and detectors collect and generate signals representative of the light transmitted by the substrate. The defect identification of the substrate is performed using those transmitted light signals. Defect identification is performed using an inspection algorithm by comparing image feature representations of a test specimen with a reference specimen, and using a boundary computer and flux comparison device to establish tight boundaries around contacts and compute flux differences between the test and reference specimen contacts. Defect sizes are reported as ratio of flux difference, and entire contacts are highlighted for review.
摘要翻译：用于检查样品或图案化的透射基底（例如光掩模）的方法和装置，用于不期望的颗粒和特征，特别是与触点相关联的那些，包括不规则形状的触点。通过由激光扫描系统，单独发射和/或反射光收集光学器件组成的光学系统，激光照射样品，并且检测器收集并产生表示由衬底透射的光的信号。使用这些透射光信号进行衬底的缺陷识别。通过比较测试样本的图像特征表示和参考样本，并使用边界计算机和通量比较装置在接触周围建立紧密的边界并计算测试和参考样本接触之间的通量差，使用检查算法执行缺陷识别。缺陷尺寸报告为通量差的比率，并且整个触点被突出显示以供审查。

7. 发明授权

US07027635B1 Multiple design database layer inspection 有权
标题翻译：多设计数据库层检查
公开(公告)号：US07027635B1
公开(公告)日：2006-04-11
申请号：US10193965
申请日：2002-07-10
申请人： Mark J. Wihl , George Q. Chen , Jun Ye , Lih-Huah Yiin , Pei-Chun Chiang
发明人： Mark J. Wihl , George Q. Chen , Jun Ye , Lih-Huah Yiin , Pei-Chun Chiang
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G03F1/30 , G03F1/50 , G03F1/84 , G06T2207/30148
摘要： Techniques that use the design databases used in each of the expose/etch steps during construction of phase shift masks are described. A model or reference image is rendered, accounting for systematic variations, from the design databases to represent what a layer of the PSM should look like after processing. The reference image is compared to an optically acquired image of a specimen phase shift mask to find defects. The technique of the present invention can be used to inspect EAPSM, APSM and tritone masks. The technique inspects all layers in one pass and is therefore more efficient.
摘要翻译：描述了在构造相移掩模期间使用在每个曝光/蚀刻步骤中使用的设计数据库的技术。渲染来自设计数据库的模型或参考图像，以计算系统的变化，以表示处理后的PSM层的外观。将参考图像与样本相移掩模的光学获取图像进行比较以发现缺陷。本发明的技术可用于检查EAPSM，APSM和三色面罩。该技术在一次通过中检查所有层，因此效率更高。

8. 发明申请

US20130236083A1 DETECTION OF THIN LINES FOR SELECTIVE SENSITIVITY DURING RETICLE INSPECTION USING PROCESSED IMAGES 有权
标题翻译：使用加工图像检测检验期间选择灵敏度的薄线
公开(公告)号：US20130236083A1
公开(公告)日：2013-09-12
申请号：US13473299
申请日：2012-05-16
申请人： Zhengyu Wang , Rui-fang Shi , Lih-Huah Yiin , Bing Li
发明人： Zhengyu Wang , Rui-fang Shi , Lih-Huah Yiin , Bing Li
IPC分类号： G06K9/46
CPC分类号： G06T7/001 , G01N2021/95676 , G03F1/84 , G06T7/13 , G06T7/174 , G06T2207/10016 , G06T2207/10152 , G06T2207/20044 , G06T2207/20161 , G06T2207/20221 , G06T2207/30148
摘要： A detection method for a spot image based thin line detection is disclosed. The method includes a step for generating a band limited spot image from a transmitted and reflected optical image of the mask. The spot image is calibrated to minimize a plurality of optical aberrations from the spot image. The spot image is restored back to a mask image to allow at least one of: a more reliable segmentation between thin line and non-thin line areas on the mask image or a more accurate line width measurement for facilitating segmentation. Thin line features and non-thin lines features are distinguished on the restored mask image. Areas containing thin line features are grown while preventing the thin line growth from encroaching the non-thin line features.
摘要翻译：公开了一种用于基于点图像的细线检测的检测方法。该方法包括从掩模的透射和反射光学图像产生带限定斑点图像的步骤。斑点图像被校准以最小化来自斑点图像的多个光学像差。斑点图像恢复到掩模图像，以允许以下至少一个：掩模图像上的细线和非细线区域之间的更可靠的分割或更准确的线宽度测量以便于分割。在恢复的蒙版图像上区分细线特征和非细线特征。生长包含细线特征的区域，同时防止细线生长侵蚀非细线特征。

9. 发明授权

US07873204B2 Method for detecting lithographically significant defects on reticles 有权
标题翻译：在光罩上检测光刻显着缺陷的方法
公开(公告)号：US07873204B2
公开(公告)日：2011-01-18
申请号：US11622432
申请日：2007-01-11
申请人： Mark J. Wihl , Yalin Xiong , Lih-Huah Yiin
发明人： Mark J. Wihl , Yalin Xiong , Lih-Huah Yiin
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： A method for identifying lithographically significant defects. A photomask is illuminated to produce images that experience different parameters of the reticle as imaged by an inspection tool. Example parameters include a transmission intensity image and a reflection intensity image. The images are processed together to recover a band limited mask pattern associated with the photomask. A model of an exposure lithography system for chip fabrication is adapted to accommodate the band limited mask pattern as an input which is input into the model to obtain an aerial image of the mask pattern that is processed with a photoresist model yielding a resist-modeled image. The resist-modeled image is used to determine if the photomask has lithographically significant defects.
摘要翻译：用于识别光刻显着缺陷的方法。光掩模被照亮以产生经由检查工具成像的掩模版的不同参数的图像。示例性参数包括传输强度图像和反射强度图像。一起处理图像以恢复与光掩模相关联的带限制掩模图案。用于芯片制造的曝光光刻系统的模型适于适应带限制掩模图案作为输入到输入到模型中以获得用光致抗蚀剂模型处理的掩模图案的空间图像，产生抗蚀剂建模图像。使用抗蚀剂建模的图像来确定光掩模是否具有光刻的显着缺陷。

10. 发明申请

US20080170773A1 METHOD FOR DETECTING LITHOGRAPHICALLY SIGNIFICANT DEFECTS ON RETICLES 有权
标题翻译：用于检测反应物上的重要缺陷的方法
公开(公告)号：US20080170773A1
公开(公告)日：2008-07-17
申请号：US11622432
申请日：2007-01-11
申请人： Mark J. Wihl , Yalin Xiong , Lih-Huah Yiin
发明人： Mark J. Wihl , Yalin Xiong , Lih-Huah Yiin
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： A method for identifying lithographically significant defects. A photomask is illuminated to produce images that experience different parameters of the reticle as imaged by an inspection tool. Example parameters include a transmission intensity image and a reflection intensity image. The images are processed together to recover a band limited mask pattern associated with the photomask. A model of an exposure lithography system for chip fabrication is adapted to accommodate the band limited mask pattern as an input which is input into the model to obtain an aerial image of the mask pattern that is processed with a photoresist model yielding a resist-modeled image. The resist-modeled image is used to determine if the photomask has lithographically significant defects.
摘要翻译：用于识别光刻显着缺陷的方法。光掩模被照亮以产生经由检查工具成像的掩模版的不同参数的图像。示例性参数包括传输强度图像和反射强度图像。一起处理图像以恢复与光掩模相关联的带限制掩模图案。用于芯片制造的曝光光刻系统的模型适于适应带限制掩模图案作为输入到输入到模型中以获得用光致抗蚀剂模型处理的掩模图案的空间图像，产生抗蚀剂建模图像。使用抗蚀剂建模的图像来确定光掩模是否具有光刻显着的缺陷。

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