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1. 发明授权

US08090189B1 Detection of thin line for selective sensitivity during reticle inspection 有权
标题翻译：检测光栅检测期间选择灵敏度的细线
公开(公告)号：US08090189B1
公开(公告)日：2012-01-03
申请号：US12042329
申请日：2008-03-04
申请人： Vinayak Dattatreya Phalke , Ge Cong , Lih-Huah Yiin , Yalin Xiong
发明人： Vinayak Dattatreya Phalke , Ge Cong , Lih-Huah Yiin , Yalin Xiong
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G01N21/956 , G03F1/36 , G06T7/001 , G06T2207/30148
摘要： Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, detection of thin line or sub-resolution assist features may be used for selective sensitivity during photomask inspection. Other embodiments are also described.
摘要翻译：描述与光掩模检查相关的方法和设备。在一个实施例中，可以在光掩模检查期间使用细线或次分辨率辅助特征的检测用于选择性灵敏度。还描述了其它实施例。

2. 发明授权

US07873204B2 Method for detecting lithographically significant defects on reticles 有权
标题翻译：在光罩上检测光刻显着缺陷的方法
公开(公告)号：US07873204B2
公开(公告)日：2011-01-18
申请号：US11622432
申请日：2007-01-11
申请人： Mark J. Wihl , Yalin Xiong , Lih-Huah Yiin
发明人： Mark J. Wihl , Yalin Xiong , Lih-Huah Yiin
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： A method for identifying lithographically significant defects. A photomask is illuminated to produce images that experience different parameters of the reticle as imaged by an inspection tool. Example parameters include a transmission intensity image and a reflection intensity image. The images are processed together to recover a band limited mask pattern associated with the photomask. A model of an exposure lithography system for chip fabrication is adapted to accommodate the band limited mask pattern as an input which is input into the model to obtain an aerial image of the mask pattern that is processed with a photoresist model yielding a resist-modeled image. The resist-modeled image is used to determine if the photomask has lithographically significant defects.
摘要翻译：用于识别光刻显着缺陷的方法。光掩模被照亮以产生经由检查工具成像的掩模版的不同参数的图像。示例性参数包括传输强度图像和反射强度图像。一起处理图像以恢复与光掩模相关联的带限制掩模图案。用于芯片制造的曝光光刻系统的模型适于适应带限制掩模图案作为输入到输入到模型中以获得用光致抗蚀剂模型处理的掩模图案的空间图像，产生抗蚀剂建模图像。使用抗蚀剂建模的图像来确定光掩模是否具有光刻的显着缺陷。

3. 发明申请

US20080170773A1 METHOD FOR DETECTING LITHOGRAPHICALLY SIGNIFICANT DEFECTS ON RETICLES 有权
标题翻译：用于检测反应物上的重要缺陷的方法
公开(公告)号：US20080170773A1
公开(公告)日：2008-07-17
申请号：US11622432
申请日：2007-01-11
申请人： Mark J. Wihl , Yalin Xiong , Lih-Huah Yiin
发明人： Mark J. Wihl , Yalin Xiong , Lih-Huah Yiin
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： A method for identifying lithographically significant defects. A photomask is illuminated to produce images that experience different parameters of the reticle as imaged by an inspection tool. Example parameters include a transmission intensity image and a reflection intensity image. The images are processed together to recover a band limited mask pattern associated with the photomask. A model of an exposure lithography system for chip fabrication is adapted to accommodate the band limited mask pattern as an input which is input into the model to obtain an aerial image of the mask pattern that is processed with a photoresist model yielding a resist-modeled image. The resist-modeled image is used to determine if the photomask has lithographically significant defects.
摘要翻译：用于识别光刻显着缺陷的方法。光掩模被照亮以产生经由检查工具成像的掩模版的不同参数的图像。示例性参数包括传输强度图像和反射强度图像。一起处理图像以恢复与光掩模相关联的带限制掩模图案。用于芯片制造的曝光光刻系统的模型适于适应带限制掩模图案作为输入到输入到模型中以获得用光致抗蚀剂模型处理的掩模图案的空间图像，产生抗蚀剂建模图像。使用抗蚀剂建模的图像来确定光掩模是否具有光刻显着的缺陷。

4. 发明授权

US08611637B2 Wafer plane detection of lithographically significant contamination photomask defects 有权
标题翻译：晶圆平面检测光刻显着污染光掩模缺陷
公开(公告)号：US08611637B2
公开(公告)日：2013-12-17
申请号：US12871813
申请日：2010-08-30
申请人： Ruifang Shi , Yalin Xiong
发明人： Ruifang Shi , Yalin Xiong
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： Provided are novel methods and systems for inspecting photomasks to identify lithographically significant contamination defects. Inspection may be performed without a separate reference image provided from a database or another die. Inspection techniques described herein involve capturing one or more test images of a photomask and constructing corresponding test “simulation” images using specific lithographic and/or resist models. These test simulation images simulate printable and/or resist patterns of the inspected photomask. Furthermore, the initial test images are used in parallel operations to generate “synthetic” images. These images represent a defect-free photomask pattern. The synthetic images are then used for generating reference simulation images, which are similar to the test simulation images but are free from lithographically significant contamination defects. Finally, the reference simulation images are compared to the test simulation images to identify the lithographically significant contamination defects on the photomask.
摘要翻译：提供了用于检查光掩模以识别光刻显着的污染缺陷的新颖方法和系统。可以在没有从数据库或另一个芯片提供的单独的参考图像的情况下执行检查。本文描述的检查技术涉及捕获光掩模的一个或多个测试图像，并使用特定光刻和/或抗蚀剂模型构建对应的测试“模拟”图像。这些测试模拟图像模拟被检查光掩模的可打印和/或抗蚀图案。此外，初始测试图像用于并行操作以产生“合成”图像。这些图像表示无缺陷的光掩模图案。然后，合成图像用于产生参考模拟图像，其类似于测试模拟图像，但是没有光刻显着的污染缺陷。最后，将参考模拟图像与测试模拟图像进行比较，以识别光掩模上的光刻显着的污染缺陷。

5. 发明申请

US20110118132A1 Enzymatic Assays Using Umbelliferone Substrates with Cyclodextrins in Droplets of Oil 有权
标题翻译：使用伞形酮底物与环糊精在油滴中的酶检测
公开(公告)号：US20110118132A1
公开(公告)日：2011-05-19
申请号：US13012831
申请日：2011-01-25
申请人： Theodore Winger , Allen E. Eckhardt , Carrie Graham , Ramakrishna Sista , Vamsee K. Pamula , Tong Wang , Yalin Xiong , Ning Wu , Sanjay Saha , Gajendrasinh Balvantsinh Raolji , Raveendra Dayam
发明人： Theodore Winger , Allen E. Eckhardt , Carrie Graham , Ramakrishna Sista , Vamsee K. Pamula , Tong Wang , Yalin Xiong , Ning Wu , Sanjay Saha , Gajendrasinh Balvantsinh Raolji , Raveendra Dayam
IPC分类号： C40B30/00 , C12Q1/00
CPC分类号： C12Q1/00
摘要： The invention is directed to droplet actuator devices and assay methods. The method may include, among other things, a method of conducting enzymatic assays using umbelliferone substrates with cyclodextrins in droplets in oil, the method including incubating a droplet in oil, the droplet preferably comprising an umbelliferone substrate, a sample, and a cyclodextrin compound. The methods may further include a method of substantially eliminating cross-contamination between droplets in enzymatic containing substrate-based bioassays. The method may include immobilization of the enzymatic substrate including forming an inclusion complex with the substrate for stabilizing the substrate within an aqueous environment, wherein the inclusion complex may be formed using cyclodextrins. In yet another embodiment, the invention may provide a method of enhancing hydrolysis of enzymatic substrates. The methods may further include a method of forming an inclusion complex with the substrate for stabilizing the substrate within an aqueous environment, wherein the substrate may be a 4-MU- or HMU containing substrate. The inclusion complex may be formed using cyclodextrin.
摘要翻译：本发明涉及液滴致动器装置和测定方法。该方法尤其可以包括使用具有环糊精的伞形酮底物在油中的液滴进行酶测定的方法，所述方法包括将液滴在油中孵育，所述液滴优选包含伞形酮底物，样品和环糊精化合物。所述方法还可以包括基本上消除含酶底物生物测定中的液滴之间的交叉污染的方法。该方法可以包括固定酶底物，包括与底物形成包合物以使其在水性环境中稳定，其中包合物可以使用环糊精形成。在另一个实施方案中，本发明可提供增强酶底物水解的方法。所述方法还可以包括在水性环境中与基材形成包含配合物以稳定基材的方法，其中所述基材可以是含有4-MU-或HMU的底物。包合物可以使用环糊精形成。

6. 发明授权

US06754379B2 Aligning rectilinear images in 3D through projective registration and calibration 有权
标题翻译：通过投影注册和校准对齐3D中的直线图像
公开(公告)号：US06754379B2
公开(公告)日：2004-06-22
申请号：US10370280
申请日：2003-02-18
申请人： Yalin Xiong , Ken Turkowski
发明人： Yalin Xiong , Ken Turkowski
IPC分类号： G06K900
CPC分类号： G06T15/506 , G06K9/32 , G06K2009/2045 , G06T3/4038 , G06T7/32 , G06T15/503
摘要： An improved apparatus and method for creating high quality virtual reality panoramas is disclosed that yields dramatic improvements during the authoring and projecting cycles, with speeds up to several orders of magnitude faster than prior systems. In a preferred embodiment, a series of rectilinear images taken from a plurality of rows are pairwise registered with one another, and locally optimized using a pairwise objective function (local error function) that minimizes certain parameters in a projective transformation, using an improved iterative procedure. The local error function values for the pairwise registrations are then saved and used to construct a quadratic surface to approximate a global optimization function (global error function). The chain rule is used to avoid the direct evaluation of the global objective function, saving computation. In one embodiment concerning the blending aspect of the present invention, an improved procedure is described that relies on Laplacian and Gaussian pyramids, using a blend mask whose boundaries are determined by the grassfire transform. An improved iterative procedure is disclosed for the blending that also determines at what level of the pyramid to perform blending, and results in low frequency image components being blended over a wider region and high frequency components being blended over a narrower region. Human interaction and input is also provided to allow manual projective registration, initial calibration and feedback in the selection of photos and convergence of the system.
摘要翻译：公开了一种用于创建高质量虚拟现实全景的改进的装置和方法，其在创作和投影周期期间产生显着的改进，其速度比现有系统快达几个数量级。在优选实施例中，从多个行中取出的一系列直线图像彼此成对配准，并且使用使投影变换中的某些参数最小化的成对目标函数（局部误差函数）进行局部优化，使用改进的迭代程序。然后保存成对注册的局部误差函数值，并用于构造二次曲面以近似全局优化函数（全局误差函数）。链规则用于避免对全局目标函数的直接评估，从而节省计算量。在关于本发明的混合方面的一个实施例中，描述了依赖于拉普拉斯算子和高斯金字塔的改进方法，其使用边界由草火变换确定的混合掩模。公开了一种改进的迭代过程，用于混合，其也确定在什么级别的金字塔进行混合，并且导致低频图像分量在较宽区域上混合，并且高频分量被混合在较窄区域上。还提供人工交互和输入，以便在选择照片和系统融合时进行手动投影注册，初始校准和反馈。

7. 发明授权

US06434265B1 Aligning rectilinear images in 3D through projective registration and calibration 有权
标题翻译：通过投影注册和校准对齐3D中的直线图像
公开(公告)号：US06434265B1
公开(公告)日：2002-08-13
申请号：US09160822
申请日：1998-09-25
申请人： Yalin Xiong , Ken Turkowski
发明人： Yalin Xiong , Ken Turkowski
IPC分类号： G06K900
CPC分类号： G06T15/506 , G06K9/32 , G06K2009/2045 , G06T3/4038 , G06T7/32 , G06T15/503
摘要： An improved apparatus and method for creating high quality virtual reality panoramas is disclosed that yields dramatic improvements during the authoring and projecting cycles, with speeds up to several orders of magnitude faster than prior systems. In a preferred embodiment, a series of rectilinear images taken from a plurality of rows are pairwise registered with one another, and locally optimized using a pairwise objective function (local error function) that minimizes certain parameters in a projective transformation, using an improved iterative procedure. The local error function values for the pairwise registrations are then saved and used to construct a quadratic surface to approximate a global optimization function (global error function). The chain rule is used to avoid the direct evaluation of the global objective function, saving computation. In one embodiment concerning the blending aspect of the present invention, an improved procedure is described that relies on Laplacian and Gaussian pyramids, using a blend mask whose boundaries are determined by the grassfire transform. An improved iterative procedure is disclosed for the blending that also determines at what level of the pyramid to perform blending, and results in low frequency image components being blended over a wider region and high frequency components being blended over a narrower region. Human interaction and input is also provided to allow manual projective registration, initial calibration and feedback in the selection of photos and convergence of the system.
摘要翻译：公开了一种用于创建高质量虚拟现实全景的改进的装置和方法，其在创作和投影周期期间产生显着的改进，其速度比现有系统快达几个数量级。在优选实施例中，从多个行中取出的一系列直线图像彼此成对配准，并且使用使投影变换中的某些参数最小化的成对目标函数（局部误差函数）进行局部优化，使用改进的迭代程序。然后保存成对注册的局部误差函数值，并用于构造二次曲面以近似全局优化函数（全局误差函数）。链规则用于避免对全局目标函数的直接评估，从而节省计算量。在关于本发明的混合方面的一个实施例中，描述了依赖于拉普拉斯算子和高斯金字塔的改进方法，其使用边界由草火变换确定的混合掩模。公开了一种改进的迭代过程，用于混合，其也确定在什么级别的金字塔进行混合，并且导致低频图像分量在较宽区域上混合，并且高频分量被混合在较窄区域上。还提供人工交互和输入，以便在选择照片和系统融合时进行手动投影注册，初始校准和反馈。

8. 发明授权

US06359617B1 Blending arbitrary overlaying images into panoramas 有权
标题翻译：将任意叠加图像混合到全景图中
公开(公告)号：US06359617B1
公开(公告)日：2002-03-19
申请号：US09160823
申请日：1998-09-25
申请人： Yalin Xiong
发明人： Yalin Xiong
IPC分类号： G06T1700
CPC分类号： G06T3/4038 , G06T3/0068 , G06T5/50 , G06T7/30 , G06T15/10
摘要： An improved apparatus and method for creating high quality virtual reality panoramas is disclosed that yields dramatic improvements during the authoring and projecting cycles, with speeds up to several orders of magnitude faster than prior systems. In a preferred embodiment, a series of rectilinear images taken from a plurality of rows are pairwise registered with one another, and locally optimized using a pairwise objective function (local error function) that minimizes certain parameters in a projective transformation, using an improved iterative procedure. The local error function values for the pairwise registrations are then saved and used to construct a quadratic surface to approximate a global optimization function (global error function). The chain rule is used to avoid the direct evaluation of the global objective function, saving computation. In one embodiment concerning the blending aspect of the present invention, an improved procedure is described that relies on Laplacian and Gaussian pyramids, using a blend mask whose boundaries are determined by the grassfire transform. An improved iterative procedure is disclosed for the blending that also determines at what level of the pyramid to perform blending, and results in low frequency image components being blended over a wider region and high frequency components being blended over a narrower region. Human interaction and input is also provided to allow manual projective registration, initial calibration and feedback in the selection of photos and convergence of the system.
摘要翻译：公开了一种用于创建高质量虚拟现实全景的改进的装置和方法，其在创作和投影周期期间产生显着的改进，其速度比现有系统快达几个数量级。在优选实施例中，从多个行中取出的一系列直线图像彼此成对配准，并且使用使投影变换中的某些参数最小化的成对目标函数（局部误差函数）进行局部优化，使用改进的迭代程序。然后保存成对注册的局部误差函数值，并用于构造二次曲面以近似全局优化函数（全局误差函数）。链规则用于避免对全局目标函数的直接评估，从而节省计算量。在关于本发明的混合方面的一个实施例中，描述了依赖于拉普拉斯算子和高斯金字塔的改进方法，其使用边界由草火变换确定的混合掩模。公开了一种改进的迭代过程，用于混合，其也确定在什么级别的金字塔进行混合，并且导致低频图像分量在较宽区域上混合，并且高频分量被混合在较窄区域上。还提供人工交互和输入，以便在选择照片和系统融合时进行手动投影注册，初始校准和反馈。

9. 发明申请

US20110299758A1 Wafer Plane Detection of Lithographically Significant Contamination Photomask Defects 有权
标题翻译：晶面平面检测光刻显着污染光掩模缺陷
公开(公告)号：US20110299758A1
公开(公告)日：2011-12-08
申请号：US12871813
申请日：2010-08-30
申请人： Ruifang Shi , Yalin Xiong
发明人： Ruifang Shi , Yalin Xiong
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： Provided are novel methods and systems for inspecting photomasks to identify lithographically significant contamination defects. Inspection may be performed without a separate reference image provided from a database or another die. Inspection techniques described herein involve capturing one or more test images of a photomask and constructing corresponding test “simulation” images using specific lithographic and/or resist models. These test simulation images simulate printable and/or resist patterns of the inspected photomask. Furthermore, the initial test images are used in parallel operations to generate “synthetic” images. These images represent a defect-free photomask pattern. The synthetic images are then used for generating reference simulation images, which are similar to the test simulation images but are free from lithographically significant contamination defects. Finally, the reference simulation images are compared to the test simulation images to identify the lithographically significant contamination defects on the photomask.
摘要翻译：提供了用于检查光掩模以识别光刻显着的污染缺陷的新颖方法和系统。可以在没有从数据库或另一个芯片提供的单独的参考图像的情况下执行检查。本文描述的检查技术涉及捕获光掩模的一个或多个测试图像，并使用特定光刻和/或抗蚀剂模型构建对应的测试“模拟”图像。这些测试模拟图像模拟被检查光掩模的可打印和/或抗蚀图案。此外，初始测试图像用于并行操作以产生“合成”图像。这些图像表示无缺陷的光掩模图案。然后，合成图像用于产生参考模拟图像，其类似于测试模拟图像，但是没有光刻显着的污染缺陷。最后，将参考模拟图像与测试模拟图像进行比较，以识别光掩模上的光刻显着的污染缺陷。

10. 发明授权

US07995832B2 Photomask inspection and verification by lithography image reconstruction using imaging pupil filters 有权
标题翻译：使用成像瞳孔滤光片通过光刻图像重建进行光掩模检查和验证
公开(公告)号：US07995832B2
公开(公告)日：2011-08-09
申请号：US11669014
申请日：2007-01-30
申请人： Yalin Xiong , Rui-Fang Shi
发明人： Yalin Xiong , Rui-Fang Shi
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G01N21/95607 , G03F7/7065 , G03F7/70666
摘要： A method and tool for generating reconstructed images that model the high NA effects of a lithography tool used to image patterns produced by a mask. Comparison of the reconstructed images with reference images characterize the mask. The method involves providing a mask reticle for inspection. Generating matrix values associated with a high NA corrective filter matrix that characterizes a high NA lithography system used to print from the mask. Illuminating the mask to produce a patterned illumination beam that is filtered with filters associated with the high NA corrective filter matrix elements to obtain a plurality of filtered beams that include raw image data that is processed to obtain a reconstructed image that is further processed and compared with reference images to obtain mask characterization information.
摘要翻译：一种用于产生重建图像的方法和工具，其对用于对由掩模产生的图像进行成像的光刻工具的高NA效应进行建模。重建图像与参考图像的比较表征掩模。该方法涉及提供掩模掩模以进行检查。生成与用于从掩模打印的高NA光刻系统的高NA校正滤波器矩阵相关联的矩阵值。照亮掩模以产生图案化照明光束，该图案照明光束用与高NA校正滤波器矩阵元素相关联的滤波器进行滤波，以获得包括原始图像数据的多个滤波光束，该原始图像数据被处理以获得进一步处理并与参考图像以获得掩模表征信息。

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