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1. 发明授权

US09535341B2 Method for a lithographic apparatus 有权
标题翻译：光刻设备的方法
公开(公告)号：US09535341B2
公开(公告)日：2017-01-03
申请号：US12617855
申请日：2009-11-13
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70641 , G03F7/70125 , G03F7/70308 , G03F7/70591 , G03F7/70891
摘要： A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern features.
摘要翻译：描述了一种方法，其包括用具有对称照明模式的辐射束照射图案形成装置图案，图案形成装置图案包括基本上衍射辐射束的辐射的第一图案特征，以及基本上不辐射辐射的第二图案特征使用相位调制元件在基本上衍射的辐射中引入相对于光轴的不对称性，用相位调制元件发射的辐射照射辐射束接收元件，以形成与图案形成装置图案，接收元件图案具有分别与第一和第二图案特征相关的第一和第二接收元件图案特征，以及根据关于第一和第二图案特征的相对位置的位置信息来确定至少指示焦点特性的信息 g元素图案特征。

2. 发明申请

US20100265479A1 DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS 有权
标题翻译：设备制造方法和平面设备
公开(公告)号：US20100265479A1
公开(公告)日：2010-10-21
申请号：US12760247
申请日：2010-04-14
申请人： Laurentius Cornelius DE WINTER , Jozef Maria Finders
发明人： Laurentius Cornelius DE WINTER , Jozef Maria Finders
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70266 , G03F7/70283
摘要： A mask can be used to print a pattern. Due to mask pattern surface topography, an image error may occur, such as an intensity imbalance between adjacent bright lines in the projected pattern. To help alleviate or eliminate the problem of intensity imbalance, the projection system may include an optical phase adjuster constructed and arranged to adjust a phase of an electric field of optical beams of radiation beam traversing the adjuster. A reduction of intensity imbalance is achieved by suitably adjusting the phases of the zeroth, plus first and minus first-order diffracted radiation emanating from the mask pattern. By adjusting the phase differently for different portions of the illumination, the method can be applied such that no decrease of depth of focus due, for example, the 0th order is occurring.
摘要翻译：可以使用掩码打印图案。由于掩模图案表面形貌，可能会出现图像错误，例如投影图案中相邻亮线之间的强度不平衡。为了帮助减轻或消除强度不平衡的问题，投影系统可以包括光学相位调节器，其被构造和布置成调节穿过调节器的辐射束的光束的电场的相位。强度不平衡的减少是通过适当地调整第零阶相加加掩模图形发出的第一和第一级衍射辐射来实现的。通过对照明的不同部分不同地调整相位，可以应用该方法，使得不会发生例如第0次的焦点的降低。

3. 发明申请

US20080170212A1 Device manufacturing method, computer program product and lithographic apparatus 有权
公开(公告)号：US20080170212A1
公开(公告)日：2008-07-17
申请号：US12000189
申请日：2007-12-10
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders , Maria Johanna, Agnes Rubingh
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders , Maria Johanna, Agnes Rubingh
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70258 , G03F7/705
摘要： A method of optimizing adjustable settings of adjustable elements of a projection system in a lithographic apparatus is disclosed that includes determining an object spectrum for a pattern and an illumination arrangement, determining a symmetry of the object spectrum, constructing a merit function for a wavefront in a pupil plane of the projection system with the settings of the adjustable elements as variables with reference to the symmetry, and optimizing the merit function.

4. 发明申请

US20120200838A1 METHOD FOR A LITHOGRAPHIC APPARATUS 失效
标题翻译：一种平面设备的方法
公开(公告)号：US20120200838A1
公开(公告)日：2012-08-09
申请号：US13446811
申请日：2012-04-13
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC分类号： G03B27/52
CPC分类号： G03B27/42 , G03F7/70308
摘要： A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-wavefront having a first focal plane for the lithographic apparatus, and a second phase-wavefront having a second, different focal plane, wherein the transforming comprises: subjecting a phase of a first portion of a first diffracted beam and a phase of a corresponding first portion of a second diffracted beam to a phase change which results in an at least partial formation of the first phase-wavefront, and subjecting a phase of a second portion of the first diffracted beam and a phase of a corresponding second portion of the second diffracted beam to a phase change which results in an at least partial formation of the second phase-wavefront.
摘要翻译：公开了增加光刻设备的焦深的方法。该方法包括使用图案形成装置图案形成衍射的辐射束; 以及将衍射光束的一部分的相位波前变换为具有用于所述光刻设备的第一焦平面的第一相位波前，以及具有第二不同焦平面的第二相位波前，其中所述变换包括：对将第一衍射光束的第一部分的相位和第二衍射光束的对应的第一部分的相位相位改变为导致第一相位波段的至少部分形成，并且使第二部分的相位并且所述第二衍射光束的对应的第二部分的相位变为导致第二相位波前的至少部分形成的相位变化。

5. 发明授权

US09690210B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US09690210B2
公开(公告)日：2017-06-27
申请号：US14234352
申请日：2012-07-20
申请人： Arno Jan Bleeker , Laurentius Cornelius De Winter
发明人： Arno Jan Bleeker , Laurentius Cornelius De Winter
IPC分类号： G03B27/52 , G03B27/54 , G03B27/32 , G03F7/20
CPC分类号： G03F7/70608 , G03F7/70191 , G03F7/70291 , G03F7/70558
摘要： A lithographic apparatus is provided and configured to project a patterned beam of radiation onto a substrate. The apparatus has a measurement system to provide measurement data related to a thickness of a resist layer on the substrate, and a controller to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data.

6. 发明授权

US09280064B2 Lithographic method and apparatus 有权
标题翻译：平版印刷方法和装置
公开(公告)号：US09280064B2
公开(公告)日：2016-03-08
申请号：US13685467
申请日：2012-11-26
申请人： Peter David Engblom , Carsten Andreas Köhler , Frank Staals , Laurentius Cornelius De Winter
发明人： Peter David Engblom , Carsten Andreas Köhler , Frank Staals , Laurentius Cornelius De Winter
IPC分类号： G03F7/20 , G03F1/36 , G03F1/00
CPC分类号： G03F7/70425 , G03F1/144 , G03F1/36 , G03F7/70433 , G03F7/70441
摘要： A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.
摘要翻译：一种使用投影系统将图案从图案形成装置投影到基板上的方法，该方法包括在投影系统中使用光学相位调整装置，对从图案的辅助特征衍射的辐射进行相位修改，相位改变用于减小在基板上的抗蚀剂中暴露的辅助特征图像的尺寸，或者防止辅助特征图像在基板上的抗蚀剂中的印刷，同时保持辅助特征图像对功能的图像增强的贡献模式的特征。

7. 发明授权

US08717540B2 Calculating a laser metric within a lithographic apparatus and method thereof 有权
标题翻译：计算光刻设备内的激光度量及其方法
公开(公告)号：US08717540B2
公开(公告)日：2014-05-06
申请号：US13019365
申请日：2011-02-02
申请人： Carsten Andreas Köhler , Hans Van Der Laan , Frank Staals , Laurentius Cornelius De Winter , Herman Philip Godfried
发明人： Carsten Andreas Köhler , Hans Van Der Laan , Frank Staals , Laurentius Cornelius De Winter , Herman Philip Godfried
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70333 , G03F7/70575
摘要： Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate.
摘要翻译：本发明的实施例涉及光刻设备和方法。光刻方法包括基于从激光发射到光刻设备的激光辐射的光谱以及由光刻设备投影到衬底上的图案的空间图像的表示来计算激光度量，并且使用激光度量修改激光器的操作或调整光刻设备，并将图案投影到基板上。

8. 发明申请

US20130141706A1 LITHOGRAPHIC METHOD AND APPARATUS 有权
标题翻译：光刻方法和装置
公开(公告)号：US20130141706A1
公开(公告)日：2013-06-06
申请号：US13685467
申请日：2012-11-26
申请人： Peter David ENGBLOM , Carsten Andreas KÖHLER , Frank STAALS , Laurentius Cornelius DE WINTER
发明人： Peter David ENGBLOM , Carsten Andreas KÖHLER , Frank STAALS , Laurentius Cornelius DE WINTER
IPC分类号： G03F7/20
CPC分类号： G03F7/70425 , G03F1/144 , G03F1/36 , G03F7/70433 , G03F7/70441
摘要： A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.
摘要翻译：一种使用投影系统将图案从图案形成装置投影到基板上的方法，该方法包括在投影系统中使用光学相位调整装置，对从图案的辅助特征衍射的辐射进行相位修改，相位改变用于减小在基板上的抗蚀剂中暴露的辅助特征图像的尺寸，或者防止辅助特征图像在基板上的抗蚀剂中的印刷，同时保持辅助特征图像对功能的图像增强的贡献模式的特征。

9. 发明授权

US08300212B2 Device manufacturing method and lithographic apparatus 有权
标题翻译：器件制造方法和光刻设备
公开(公告)号：US08300212B2
公开(公告)日：2012-10-30
申请号：US12760247
申请日：2010-04-14
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70266 , G03F7/70283
摘要： A mask can be used to print a pattern. Due to mask pattern surface topography, an image error may occur, such as an intensity imbalance between adjacent bright lines in the projected pattern. To help alleviate or eliminate the problem of intensity imbalance, the projection system may include an optical phase adjuster constructed and arranged to adjust a phase of an electric field of optical beams of radiation beam traversing the adjuster. A reduction of intensity imbalance is achieved by suitably adjusting the phases of the zeroth, plus first and minus first-order diffracted radiation emanating from the mask pattern. By adjusting the phase differently for different portions of the illumination, the method can be applied such that no decrease of depth of focus due, for example, the 0th order is occurring.
摘要翻译：可以使用掩码打印图案。由于掩模图案表面形貌，可能会出现图像错误，例如投影图案中相邻亮线之间的强度不平衡。为了帮助减轻或消除强度不平衡的问题，投影系统可以包括光学相位调节器，其被构造和布置成调节穿过调节器的辐射束的光束的电场的相位。强度不平衡的减少是通过适当地调整第零阶相加加掩模图形发出的第一和第一级衍射辐射来实现的。通过对照明的不同部分不同地调整相位，可以应用该方法，使得不会发生例如第0次的焦点的降低。

10. 发明授权

US08178263B2 Method for a lithographic apparatus 失效
标题翻译：光刻设备的方法
公开(公告)号：US08178263B2
公开(公告)日：2012-05-15
申请号：US12625063
申请日：2009-11-24
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC分类号： G06F9/00 , G03C5/00
CPC分类号： G03B27/42 , G03F7/70308
摘要： A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-wavefront having a first focal plane for the lithographic apparatus, and a second phase-wavefront having a second, different focal plane, wherein the transforming comprises: subjecting a phase of a first portion of a first diffracted beam and a phase of a corresponding first portion of a second diffracted beam to a phase change which results in an at least partial formation of the first phase-wavefront, and subjecting a phase of a second portion of the first diffracted beam and a phase of a corresponding second portion of the second diffracted beam to a phase change which results in an at least partial formation of the second phase-wavefront.
摘要翻译：公开了增加光刻设备的焦深的方法。该方法包括使用图案形成装置图案形成衍射的辐射束; 以及将衍射光束的一部分的相位波前变换为具有用于所述光刻设备的第一焦平面的第一相位波前，以及具有第二不同焦平面的第二相位波前，其中所述变换包括：对将第一衍射光束的第一部分的相位和第二衍射光束的对应的第一部分的相位相位改变为导致第一相位波段的至少部分形成，并且使第二部分的相位并且所述第二衍射光束的对应的第二部分的相位变为导致第二相位波前的至少部分形成的相位变化。

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