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1. 发明申请

US20130078483A1 USE OF MAGNETIC MATERIAL FOR RIE STOP LAYER DURING DAMASCENE MAIN POLE FORMATION 有权
标题翻译：磁性材料在大面积主要形成过程中的停止层的使用
公开(公告)号：US20130078483A1
公开(公告)日：2013-03-28
申请号：US13247883
申请日：2011-09-28
申请人： Yingjian CHEN , Shiwen HUANG , Edward Hin Pong LEE , Mun Hyoun PARK , Kyusik SHIN , Yuming ZHOU
发明人： Yingjian CHEN , Shiwen HUANG , Edward Hin Pong LEE , Mun Hyoun PARK , Kyusik SHIN , Yuming ZHOU
IPC分类号： G11B5/33 , C23F1/02
CPC分类号： G11B5/3116 , G11B5/315 , Y10T428/11 , Y10T428/1171
摘要： A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.
摘要翻译：用于磁盘驱动器的写入头及其制造方法。当在非镶嵌主极制造工艺中使用非磁性反应离子蚀刻（RIE）停止层时，前缘屏蔽和侧面屏蔽层具有磁分离。通过用磁RIE停止层代替非磁性RIE停止层，不需要在主极周围去除RIE停止层。此外，前缘屏蔽和侧屏蔽将磁性地结合在一起而不需要额外的处理，因为前缘屏蔽和侧屏蔽之间将不会有磁性分离。

2. 发明申请

US20120125885A1 PERPENDICULAR WRITE HEAD WITH WRAP AROUND SHIELD AND CONFORMAL SIDE GAP 有权
标题翻译：平头写字头与封面和合适的边缝
公开(公告)号：US20120125885A1
公开(公告)日：2012-05-24
申请号：US12954458
申请日：2010-11-24
申请人： YINGJIAN CHEN , Shiwen Huang , Fenglin Liu , Kyusik Shin
发明人： YINGJIAN CHEN , Shiwen Huang , Fenglin Liu , Kyusik Shin
IPC分类号： G11B21/00
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/23 , G11B5/315 , G11B5/3163
摘要： A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.
摘要翻译：垂直写头，其具有围绕屏蔽的保护层和保形侧间隙。在制造写入头时，前缘屏蔽可以化学机械抛光到基本上均匀的化学机械抛光停止层的水平。由于前缘屏蔽和化学机械抛光停止层用作沟槽RIE的RIE停止，所以可以用LTE / LES形成完全共形的侧屏蔽。

3. 发明申请

US20110151279A1 MAGNETIC WRITE HEAD MANUFACTURED BY AN ENHANCED DAMASCENE PROCESS PRODUCING A TAPERED WRITE POLE WITH A NON-MAGNETIC SPACER AND NON-MAGNETIC BUMP 有权
标题翻译：通过增强的大面积工艺制造的磁性写头，用非磁性间隔器和非磁性块形成带状写入点
公开(公告)号：US20110151279A1
公开(公告)日：2011-06-23
申请号：US12641251
申请日：2009-12-17
申请人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H.P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
发明人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H.P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
IPC分类号： G11B5/33
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/314 , G11B5/3143 , G11B5/3146 , G11B5/315 , Y10T428/11 , Y10T428/1171
摘要： A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
摘要翻译：一种具有锥形后缘并具有磁性层的磁性写头，该磁性层形成在从ABS的凹陷处的写入极的后缘上，该磁性层通过薄的非磁性的方式与写入极的后缘分离层。薄的非磁性层优选地足够薄，使得磁性层可以在从ABS去除的区域中用作写入极的一部分。尾磁屏蔽形成在写极上，并且通过非磁性拖尾间隙层与写极分离。可以在磁性层之上形成非磁性间隔层，以在磁性层和尾部磁屏蔽之间提供额外的间隔。

4. 发明授权

US08547660B2 Magnetic write head manufactured by an enhanced damascene process producing a tapered write pole with a non-magnetic spacer and non-magnetic bump 有权
标题翻译：通过增强的镶嵌工艺制造的磁性写头，其产生具有非磁性间隔物和非磁性凸块的锥形写柱
公开(公告)号：US08547660B2
公开(公告)日：2013-10-01
申请号：US12641251
申请日：2009-12-17
申请人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H. P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
发明人： Donald G. Allen , Amanda Baer , Yingjian Chen , Andrew Chiu , Liubo Hong , Wen-Chien D. Hsiao , Edward H. P. Lee , Fenglin Liu , Aron Pentek , Katalin Pentek , Kyusik Shin , Yi Zheng , Qiping Zhong , Honglin Zhu
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/112 , G11B5/1278 , G11B5/3116 , G11B5/314 , G11B5/3143 , G11B5/3146 , G11B5/315 , Y10T428/11 , Y10T428/1171
摘要： A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
摘要翻译：一种具有锥形后缘并具有磁性层的磁性写头，该磁性层形成在从ABS的凹陷处的写入极的后缘上，该磁性层通过薄的非磁性的方式与写入极的后缘分离层。薄的非磁性层优选地足够薄，使得磁性层可以在从ABS去除的区域中用作写入极的一部分。尾磁屏蔽形成在写极上，并且通过非磁性拖尾间隙层与写极分离。可以在磁性层之上形成非磁性间隔层，以在磁性层和尾部磁屏蔽之间提供额外的间隔。

5. 发明申请

US20130026131A1 Method For Manufacturing Wraparound Shield Write Head Using Hard Masks 有权
标题翻译：使用硬掩模制造绕组屏蔽写头的方法
公开(公告)号：US20130026131A1
公开(公告)日：2013-01-31
申请号：US13193520
申请日：2011-07-28
申请人： Shiwen Huang , Fenglin Liu , Qiping Zhong , Kyusik Shin , Yingjian Chen
发明人： Shiwen Huang , Fenglin Liu , Qiping Zhong , Kyusik Shin , Yingjian Chen
IPC分类号： G11B5/127
CPC分类号： G11B5/3116 , G11B5/3163
摘要： The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
摘要翻译：本公开描述了通过实施三层（三层）硬掩模制造全封装屏蔽镶嵌写头的方法。根据本发明的实施例，在形成写入头期间，各种硬掩模层用于不同的目的。本发明的环绕式屏蔽头表现出改进的物理特性，进一步导致改善的性能特征。根据本发明的硬掩模层的使用允许使用可以比其它工艺中使用的那些方法更加严格地控制的制造工艺。例如，可以使用较小尺寸的光刻技术。此外，在使用CMP工艺不如使用本发明可能的沉积或光刻技术那样不受控制的情况下，对某些CMP工艺的依赖是不必要的。

6. 发明申请

US20120127612A1 PROCESS TO MAKE PMR WRITER WITH LEADING EDGE SHIELD (LES) AND LEADING EDGE TAPER (LET) 有权
公开(公告)号：US20120127612A1
公开(公告)日：2012-05-24
申请号：US12954422
申请日：2010-11-24
申请人： Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
发明人： Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
IPC分类号： G11B5/10 , G01R1/16
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.

7. 发明授权

US08801943B2 Method for manufacturing wraparound shield write head using hard masks 有权
标题翻译：使用硬掩模制造环绕屏蔽写头的方法
公开(公告)号：US08801943B2
公开(公告)日：2014-08-12
申请号：US13193520
申请日：2011-07-28
申请人： Shiwen Huang , Fenglin Liu , Qiping Zhong , Kyusik Shin , Yingjian Chen
发明人： Shiwen Huang , Fenglin Liu , Qiping Zhong , Kyusik Shin , Yingjian Chen
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/3163
摘要： The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
摘要翻译：本公开描述了通过实施三层（三层）硬掩模制造全封装屏蔽镶嵌写头的方法。根据本发明的实施例，在形成写入头期间，各种硬掩模层用于不同的目的。本发明的环绕式屏蔽头表现出改进的物理特性，进一步导致改善的性能特征。根据本发明的硬掩模层的使用允许使用可以比其它工艺中使用的那些方法更加严格地控制的制造工艺。例如，可以使用较小尺寸的光刻技术。此外，在使用CMP工艺不如使用本发明可能的沉积或光刻技术那样不受控制的情况下，对某些CMP工艺的依赖是不必要的。

8. 发明授权

US08508886B2 Use of magnetic material for RIE stop layer during damascene main pole formation 有权
标题翻译：在镶嵌主磁极形成期间使用磁性材料作为RIE停止层
公开(公告)号：US08508886B2
公开(公告)日：2013-08-13
申请号：US13247883
申请日：2011-09-28
申请人： Yingjian Chen , Shiwen Huang , Edward Hin Pong Lee , Mun Hyoun Park , Kyusik Shin , Yuming Zhou
发明人： Yingjian Chen , Shiwen Huang , Edward Hin Pong Lee , Mun Hyoun Park , Kyusik Shin , Yuming Zhou
IPC分类号： G11B5/31
CPC分类号： G11B5/3116 , G11B5/315 , Y10T428/11 , Y10T428/1171
摘要： A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.
摘要翻译：用于磁盘驱动器的写入头及其制造方法。当在非镶嵌主极制造工艺中使用非磁性反应离子蚀刻（RIE）停止层时，前缘屏蔽和侧面屏蔽层具有磁分离。通过用磁RIE停止层代替非磁性RIE停止层，不需要在主极周围去除RIE停止层。此外，前缘屏蔽和侧屏蔽将磁性地结合在一起而不需要额外的处理，因为前缘屏蔽和侧屏蔽之间将不会有磁性分离。

9. 发明授权

US08470186B2 Perpendicular write head with wrap around shield and conformal side gap 有权
标题翻译：垂直写头与环绕屏蔽和保形侧隙
公开(公告)号：US08470186B2
公开(公告)日：2013-06-25
申请号：US12954458
申请日：2010-11-24
申请人： Yingjian Chen , Shiwen Huang , Fenglin Liu , Kyusik Shin
发明人： Yingjian Chen , Shiwen Huang , Fenglin Liu , Kyusik Shin
IPC分类号： B44C1/22
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/23 , G11B5/315 , G11B5/3163
摘要： A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.
摘要翻译：垂直写头，其具有围绕屏蔽的保护层和保形侧间隙。在制造写入头时，前缘屏蔽可以被化学机械抛光到基本上均匀的化学机械抛光停止层的水平。由于前缘屏蔽和化学机械抛光停止层用作沟槽RIE的RIE停止，所以可以用LTE / LES形成完全共形的侧屏蔽。

10. 发明授权

US08400733B2 Process to make PMR writer with leading edge shield (LES) and leading edge taper (LET) 有权
标题翻译：使具有前缘屏蔽（LES）和前缘锥度（LET）的PMR写入器的过程
公开(公告)号：US08400733B2
公开(公告)日：2013-03-19
申请号：US12954422
申请日：2010-11-24
申请人： Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
发明人： Kyusik Shin , Qiping Zhong , Honglin Zhu , Yingjian Chen , Liubo Hong , Fenglin Liu
IPC分类号： G11B5/147
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163
摘要： Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
摘要翻译：提供了具有锥形前缘的前缘屏蔽和锥形磁极的制造方法。前缘屏蔽可以通过利用CMP停止层形成。 CMP停止层可以有助于防止磁性材料的过度抛光。对于具有锥形前缘的锥形磁极，磁性材料沉积在平坦化表面上，形成图案化的抗蚀剂材料，并且暴露的磁性材料被蚀刻以形成磁性材料的至少一个锥形表面。

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