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1. 发明申请

US20070217896A1 Substrate treatment apparatus 失效
标题翻译：基板处理装置
公开(公告)号：US20070217896A1
公开(公告)日：2007-09-20
申请号：US11711124
申请日：2007-02-27
申请人： Ki-Sang Kim , Kyue-Sang Choi , Byong-Kyu Seo , Soon-Chon Park
发明人： Ki-Sang Kim , Kyue-Sang Choi , Byong-Kyu Seo , Soon-Chon Park
IPC分类号： H01L21/677 , B66C23/00 , B05C13/00
CPC分类号： H01L21/67161 , H01L21/67742 , H01L21/67745 , H01L21/67766 , Y10S414/135
摘要： A substrate treatment apparatus is provided. The substrate treatment apparatus includes a process room, a load port in which a container receiving wafers is disposed, and a wafer transfer module disposed between the load port and the process room to transfer the wafers between the load port and the process room. The wafer transfer module includes a first barrier, a second barrier extending from a first end of the first barrier or from a portion near the first end of the first barrier at a predetermined inclined angle with respect to the first barrier, and a third barrier extending from a second end of the first barrier or from a portion near the second end of the first barrier at a predetermined inclined angle. The load portion is provided along the first barrier. The process room includes a plurality of chambers arranged along the second and third barriers.
摘要翻译：提供了一种基板处理装置。基板处理装置包括处理室，其中设置有容纳晶片的容器的负载端口和设置在负载端口和处理室之间的晶片传送模块，以在载体端口和处理室之间传送晶片。晶片传送模块包括第一屏障，从第一屏障的第一端或第一屏障的第一端附近的部分以相对于第一屏障预定的倾斜角延伸的第二屏障，以及第三屏障延伸从第一屏障的第二端或从第一屏障的第二端附近的部分以预定的倾斜角度。负载部分沿着第一屏障设置。处理室包括沿着第二和第三屏障布置的多个室。

2. 发明授权

US06740169B2 Method of reworking a conditioning disk 有权
标题翻译：修理调节盘的方法
公开(公告)号：US06740169B2
公开(公告)日：2004-05-25
申请号：US10453583
申请日：2003-06-04
申请人： Sung-bum Cho , Baik-soon Choi , Jin-sung Kim , Kyue-sang Choi
发明人： Sung-bum Cho , Baik-soon Choi , Jin-sung Kim , Kyue-sang Choi
IPC分类号： C23G102
CPC分类号： B24B53/017 , B24B53/12 , B24D3/06 , B24D7/06 , B24D18/0072 , Y10S438/959
摘要： A conditioning disk and a conditioner for a chemical mechanical polishing (CMP) pad, and a method of fabricating, reworking, and cleaning the conditioning disk, are utilized to improve conditioning efficiency, and to reduce production expenses. The conditioning disk for a CMP pad is divided into regions defined by a size difference of abrasive grains formed on the body surface in each region of the conditioning disk. The method of fabricating the conditioning disk is performed by forming adhesive films for attaching the abrasive grains onto the body surface multiple times. In addition, a used conditioning disk may be reworked by detaching the abrasive grains from the body, and attaching new abrasive grains. A used conditioning disk can also be cleaned of by-products of the conditioning process by a cleaning method using a HF solution or BOE (buffered oxide etch) solution.
摘要翻译：用于化学机械抛光（CMP）垫的调理盘和调节剂以及制造，再加工和清洁调节盘的方法被用于改善调节效率并降低生产成本。用于CMP垫的调节盘被划分为由调节盘的每个区域中的体表面上形成的磨粒的尺寸差定义的区域。制造调节盘的方法是通过形成用于将磨粒附着到体表上多次的粘合剂膜来进行的。此外，可以通过将磨料颗粒从体内分离并附着新的磨料颗粒来改造使用过的调节盘。还可以使用HF溶液或BOE（缓冲氧化物蚀刻）溶液，通过清洗方法清洁所使用的调理盘。

3. 发明授权

US5785929A Waste gas disposal apparatus 失效
标题翻译：废气处理设备
公开(公告)号：US5785929A
公开(公告)日：1998-07-28
申请号：US825225
申请日：1997-03-19
申请人： Hee-duck Kim , Kyue-sang Choi , Jin-man Kim
发明人： Hee-duck Kim , Kyue-sang Choi , Jin-man Kim
IPC分类号： B01D53/46 , B01D45/08 , B01D45/18 , B01D53/34 , B01D53/74 , F23J3/04 , F27D17/00 , B01D50/00
CPC分类号： B01D45/08 , B01D53/34 , B01D53/74
摘要： A waste gas disposal apparatus includes a scraper rotating portion for rotating a scraper configured to simultaneously scrape off fine reactant particles adsorbed to an inner surface of a waste gas collecting unit and a surface of a cone in a collection inducing portion of the collection unit. The scraper is designed to be fixed to a scraper support rod, which is formed coaxially with a cone support rod and rotated through a 360.degree. arc. The fine reactant particle collection efficiency is much higher compared with conventional devices that only rotate through a 180.degree. arc, and must repeatedly reverse directions during scraping operations.
摘要翻译：废气处理装置包括用于旋转刮刀的刮刀旋转部分，其构造成同时刮擦吸附在废气收集单元的内表面上的细小反应物颗粒和收集单元的收集诱导部分中的锥体表面。刮刀被设计成固定到刮刀支撑杆上，刮刀支撑杆与锥形支撑杆同轴地形成并旋转360度弧。与仅旋转180°弧的常规装置相比，反应物微粒的收集效率高得多，并且在刮削操作期间必须重复地反向。

4. 发明授权

US06213856B1 Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk 有权
标题翻译：用于CMP垫的调节器和调节盘，以及制造，再加工和清洁调节盘的方法
公开(公告)号：US06213856B1
公开(公告)日：2001-04-10
申请号：US09293946
申请日：1999-04-19
申请人： Sung-bum Cho , Baik-soon Choi , Jin-sung Kim , Kyue-sang Choi
发明人： Sung-bum Cho , Baik-soon Choi , Jin-sung Kim , Kyue-sang Choi
IPC分类号： B24B2118
CPC分类号： B24B53/017 , B24B53/12 , B24D3/06 , B24D7/06 , B24D18/0072 , Y10S438/959
摘要： A conditioning disk and a conditioner for a chemical mechanical polishing (CMP) pad, and a method of fabricating, reworking, and cleaning the conditioning disk, are utilized to improve conditioning efficiency, and to reduce production expenses. The conditioning disk for a CMP pad is divided into regions defined by a size difference of abrasive grains formed on the body surface in each region of the conditioning disk. The method of fabricating the conditioning disk is performed by forming adhesive films for attaching the abrasive grains onto the body surface multiple times. In addition, a used conditioning disk may be reworked by detaching the abrasive grains from the body, and attaching new abrasive grains. A used conditioning disk can also be cleaned of by-products of the conditioning process by a cleaning method using a HF solution or BOE (buffered oxide etch) solution.
摘要翻译：用于化学机械抛光（CMP）垫的调理盘和调节剂以及制造，再加工和清洁调节盘的方法被用于改善调节效率并降低生产成本。用于CMP垫的调节盘被划分为由调节盘的每个区域中的体表面上形成的磨粒的尺寸差定义的区域。制造调节盘的方法是通过形成用于将磨粒附着到体表上多次的粘合剂膜来进行的。此外，可以通过将磨料颗粒从体内分离并附着新的磨料颗粒来改造使用过的调节盘。还可以使用HF溶液或BOE（缓冲氧化物蚀刻）溶液，通过清洗方法清洁所使用的调理盘。

5. 发明授权

US6150762A Method of manufacturing cathode for plasma etching apparatus using chemical surface treatment with potassium hydroxide (KOH), and cathode manufactured thereby 有权
标题翻译：使用氢氧化钾（KOH）进行化学表面处理的等离子体蚀刻装置的阴极制造方法以及制造阴极的方法
公开(公告)号：US6150762A
公开(公告)日：2000-11-21
申请号：US234496
申请日：1999-01-21
申请人： Jin-sung Kim , Young-gu Lee , Kyoung-man Shim , Kyue-sang Choi
发明人： Jin-sung Kim , Young-gu Lee , Kyoung-man Shim , Kyue-sang Choi
IPC分类号： H05H1/46 , H01J9/14 , H01J17/04 , H01J37/32 , H01L21/302 , H01L21/306 , H01L21/3065 , H01J7/24
CPC分类号： H01J37/32009 , H01J37/32532 , H01J9/14
摘要： A method of manufacturing a cathode for a plasma etching apparatus includes steps for making the inside of holes formed in the cathode and the surface of the cathode a hard surface so as to prevent particle generation while the cathode is in use for etching a wafer. These steps include: a) forming a plurality of holes in a silicon substrate; b) carrying out a physical-surface treatment on the surface of the silicon substrate using slurry; and c) carrying out a chemical-surface treatment for removing protrusions inside the holes formed on the silicon substrate and on the surface of the silicon substrate using potassium hydroxide (KOH). The cathode manufactured by this method has a hard surface formed thereon and inside the holes, and the hard surface has no protrusions. Without protrusions, no particles can be generated from protrusions being etched and loosened during the etching process, so no particles adhere to the wafer being etched.
摘要翻译：制造等离子体蚀刻装置的阴极的方法包括使形成在阴极中的孔的内部和阴极的表面成为硬表面的步骤，以便在阴极用于蚀刻晶片的同时防止产生颗粒。这些步骤包括：a）在硅衬底中形成多个孔; b）使用浆料对硅衬底的表面进行物理表面处理; 以及c）使用氢氧化钾（KOH）进行化学表面处理以去除在硅衬底和硅衬底的表面上形成的孔内的突起。通过该方法制造的阴极具有在其上形成的硬表面和孔内，并且硬表面没有突起。没有突起，在蚀刻过程中不会从被蚀刻和松动的突起产生颗粒，因此没有颗粒粘附到被蚀刻的晶片上。

6. 发明授权

US6023368A Illumination system for use with an optical instrument having an auxiliary magnifying lens 有权
标题翻译：用于具有辅助放大镜的光学仪器的照明系统
公开(公告)号：US6023368A
公开(公告)日：2000-02-08
申请号：US135651
申请日：1998-08-18
申请人： Chang-woo Woo , Hee-duk Kim , Kyue-sang Choi
发明人： Chang-woo Woo , Hee-duk Kim , Kyue-sang Choi
IPC分类号： G02B21/00 , G02B21/06
CPC分类号： G02B21/06
摘要： An optical microscope has an illuminator from which light emanates to illuminate an object under examination, and an auxiliary magnifying lens unit which magnifies an image of the object formed by the light reflecting from the object. A reflective cover is connected to the bottom of the ocular lens unit of the microscope. An auxiliary magnifying unit, made up of the auxiliary magnifying lens mounted in a casing, is disposed within the reflective cover adjacent the bottom of the ocular lens unit. The illuminator is located between the reflective cover and the casing of the auxiliary magnifying unit. The auxiliary magnifying lens is thus shielded from the illuminator. The light emitted from the illuminator is prevented from propagating directly to the auxiliary magnifying lens (along any straight line from the illuminator) or indirectly to the auxiliary magnifying lens via reflection from the inner wall of the reflective cover. Accordingly, a clear image of the object is produced. Furthermore, the reflective cover screws the auxiliary magnifying unit onto the bottom of the ocular lens unit. These components can be easily and quickly assembled and disassembled as the need arises.
摘要翻译：光学显微镜具有发光的光照射器，用于照射被检查物体;以及辅助放大透镜单元，其放大由从物体反射的光形成的物体的图像。反射罩连接到显微镜的镜片单元的底部。辅助放大单元由安装在壳体中的辅助放大镜组成，设置在与眼镜片单元的底部相邻的反射盖内。照明器位于反光罩和辅助放大单元的外壳之间。辅助放大镜因此被遮蔽。防止从照明器发出的光直接传播到辅助放大透镜（沿着照明器的任何直线）或者通过反射罩的内壁的反射间接传播到辅助放大镜。因此，产生物体的清晰图像。此外，反光罩将辅助放大单元螺丝固定在眼镜单元的底部上。根据需要，可以容易且快速地组装和拆卸这些部件。

7. 发明授权

US06903336B2 Polarity exchanger and ion implanter having the same 失效
标题翻译：极性交换器和离子注入机具有相同的特性
公开(公告)号：US06903336B2
公开(公告)日：2005-06-07
申请号：US10730998
申请日：2003-12-10
申请人： Gyeong-Su Keum , Gum-Hyun Shin , Hyung-Sik Hong , Kyue-Sang Choi , Chung-Hun Park
发明人： Gyeong-Su Keum , Gum-Hyun Shin , Hyung-Sik Hong , Kyue-Sang Choi , Chung-Hun Park
IPC分类号： H01J37/30 , H01J37/08 , H01J37/317 , H01J37/313
CPC分类号： H01J37/3171 , H01J37/08
摘要： A polarity exchanger and ion implanter include a stripping canal for passing an ion beam therethrough, a gas supply unit for providing a stripping gas into the stripping canal to change a polarity of the ion beam, a gas circulation unit for circulating the stripping gas, a flow meter for measuring a flow rate of the stripping gas, an ammeter for measuring a driving current applied to the gas circulation unit for operating the gas circulation unit, and a monitoring unit for generating a control signal to control a process for changing the polarity of the ion beam in accordance with the measured flow rate of the stripping gas and the measured driving current. The polarity exchanger and ion implanter having the polarity exchanger may prevent generation of metallic contaminants caused by a flow rate variation of the stripping gas or deterioration of a component of the gas circulation unit.
摘要翻译：极性交换器和离子注入机包括用于使离子束通过的剥离管，用于将汽提气体提供到汽提道中以改变离子束的极性的气体供应单元，用于循环汽提气体的气体循环单元用于测量汽提气体的流量的流量计，用于测量施加到用于操作气体循环单元的气体循环单元的驱动电流的电流表，以及用于产生控制信号以控制改变极性的处理的监视单元离子束根据测得的汽提气体流速和测得的驱动电流。具有极性交换器的极性交换器和离子注入机可以防止由汽提气体的流量变化或气体循环单元的部件的劣化引起的金属污染物的产生。

8. 发明授权

US06494927B2 Conditioner and conditioning disk for a CMP pad, and method of fabricating, reworking, and cleaning conditioning disk 失效
标题翻译：用于CMP垫的调节器和调节盘，以及制造，再加工和清洁调节盘的方法
公开(公告)号：US06494927B2
公开(公告)日：2002-12-17
申请号：US09776732
申请日：2001-02-06
申请人： Sung-bum Cho , Baik-soon Choi , Jin-sung Kim , Kyue-sang Choi
发明人： Sung-bum Cho , Baik-soon Choi , Jin-sung Kim , Kyue-sang Choi
IPC分类号： B24D1800
CPC分类号： B24B53/017 , B24B53/12 , B24D3/06 , B24D7/06 , B24D18/0072 , Y10S438/959
摘要： A conditioning disk and a conditioner for a chemical mechanical polishing (CMP) pad, and a method of fabricating, reworking, and cleaning the conditioning disk, are utilized to improve conditioning efficiency, and to reduce production expenses. The conditioning disk for a CMP pad is divided into regions defined by a size difference of abrasive grains formed on the body surface in each region of the conditioning disk. The method of fabricating the conditioning disk is performed by forming adhesive films for attaching the abrasive grains onto the body surface multiple times. In addition, a used conditioning disk may be reworked by detaching the abrasive grains from the body, and attaching new abrasive grains. A used conditioning disk can also be cleaned of by-products of the conditioning process by a cleaning method using a HF solution or BOE (buffered oxide etch) solution.
摘要翻译：用于化学机械抛光（CMP）垫的调理盘和调节剂以及制造，再加工和清洁调节盘的方法被用于改善调节效率并降低生产成本。用于CMP垫的调节盘被划分为由调节盘的每个区域中的体表面上形成的磨粒的尺寸差定义的区域。制造调节盘的方法是通过形成用于将磨粒附着到体表上多次的粘合剂膜来进行的。此外，可以通过将磨料颗粒从体内分离并附着新的磨料颗粒来改造使用过的调节盘。还可以使用HF溶液或BOE（缓冲氧化物蚀刻）溶液，通过清洗方法清洁所使用的调理盘。

9. 发明授权

US07988812B2 Substrate treatment apparatus 失效
标题翻译：基板处理装置
公开(公告)号：US07988812B2
公开(公告)日：2011-08-02
申请号：US11711124
申请日：2007-02-27
申请人： Ki-Sang Kim , Kyue-Sang Choi , Byong-Kyu Seo , Soon-Chon Park
发明人： Ki-Sang Kim , Kyue-Sang Choi , Byong-Kyu Seo , Soon-Chon Park
IPC分类号： C23F1/00 , C23C16/00 , H01L21/306
CPC分类号： H01L21/67161 , H01L21/67742 , H01L21/67745 , H01L21/67766 , Y10S414/135
摘要： A substrate treatment apparatus is provided. The substrate treatment apparatus includes a process room, a load port in which a container receiving wafers is disposed, and a wafer transfer module disposed between the load port and the process room to transfer the wafers between the load port and the process room. The wafer transfer module includes a first barrier, a second barrier extending from a first end of the first barrier or from a portion near the first end of the first barrier at a predetermined inclined angle with respect to the first barrier, and a third barrier extending from a second end of the first barrier or from a portion near the second end of the first barrier at a predetermined inclined angle. The load portion is provided along the first barrier. The process room includes a plurality of chambers arranged along the second and third barriers.
摘要翻译：提供了一种基板处理装置。基板处理装置包括处理室，其中设置有容纳晶片的容器的负载端口和设置在负载端口和处理室之间的晶片传送模块，以在载体端口和处理室之间传送晶片。晶片传送模块包括第一屏障，从第一屏障的第一端或第一屏障的第一端附近的部分以相对于第一屏障预定的倾斜角延伸的第二屏障，以及第三屏障延伸从第一屏障的第二端或从第一屏障的第二端附近的部分以预定的倾斜角度。负载部分沿着第一屏障设置。处理室包括沿着第二和第三屏障布置的多个室。

10. 发明授权

US06596087B2 Method of cleaning conditioning disk 失效
公开(公告)号：US06596087B2
公开(公告)日：2003-07-22
申请号：US09776733
申请日：2001-02-06
申请人： Sung-bum Cho , Baik-soon Choi , Jin-sung Kim , Kyue-sang Choi
发明人： Sung-bum Cho , Baik-soon Choi , Jin-sung Kim , Kyue-sang Choi
IPC分类号： G23G102
CPC分类号： B24B53/017 , B24B53/12 , B24D3/06 , B24D7/06 , B24D18/0072 , Y10S438/959
摘要： A conditioning disk and a conditioner for a chemical mechanical polishing (CMP) pad, and a method of fabricating, reworking, and cleaning the conditioning disk, are utilized to improve conditioning efficiency, and to reduce production expenses. The conditioning disk for a CMP pad is divided into regions defined by a size difference of abrasive grains formed on the body surface in each region of the conditioning disk. The method of fabricating the conditioning disk is performed by forming adhesive films for attaching the abrasive grains onto the body surface multiple times. In addition, a used conditioning disk may be reworked by detaching the abrasive grains from the body, and attaching new abrasive grains. A used conditioning disk can also be cleaned of by-products of the conditioning process by a cleaning method using a HF solution or BOE (buffered oxide etch) solution.

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