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    • 2. 发明授权
    • Substrate for electrostatic chuck and electrostatic chuck
    • 静电吸盘和静电吸盘用基板
    • US08441772B2
    • 2013-05-14
    • US12910493
    • 2010-10-22
    • Tadayoshi YoshikawaKoki TamagawaNaoto Watanabe
    • Tadayoshi YoshikawaKoki TamagawaNaoto Watanabe
    • H01L21/683H01T23/00H01G7/02H05F3/00G03G15/02
    • H01L21/6833
    • An electrostatic chuck includes a metal base member and an insulating substrate having an opposite surface to an attraction surface joined onto the base member via an adhesive layer. In the substrate, an electrode layer to which a direct current voltage for attraction is applied is embedded in a portion of the substrate, close to the attraction surface. In addition, a plurality of independent RF electrode layers to which different radio frequencies for plasma control are fed, respectively, are embedded in portions of the substrate, at an opposite side of the first electrode layer to the attraction surface. The RF electrode layers are arranged separately in different layers which are not on an identical plane in such a manner as to partially overlap each other in a plan view.
    • 静电卡盘包括金属基部件和绝缘基板,该绝缘基板具有通过粘合剂层接合到基底构件上的吸引表面的相反表面。 在基板中,施加有用于吸引的直流电压的电极层嵌入基板的靠近吸引面的部分。 此外,在第一电极层的与吸引表面相对的一侧的基板的部分分别嵌入多个用于等离子体控制的不同射频的独立RF电极层。 RF电极层分别布置在不在同一平面上的不同层中,以在平面图中彼此部分重叠的方式。
    • 8. 发明申请
    • SUBSTRATE FOR ELECTROSTATIC CHUCK AND ELECTROSTATIC CHUCK
    • 静电卡盘和静电卡盘基座
    • US20110096461A1
    • 2011-04-28
    • US12910493
    • 2010-10-22
    • Tadayoshi YOSHIKAWAKoki TamagawaNaoto Watanabe
    • Tadayoshi YOSHIKAWAKoki TamagawaNaoto Watanabe
    • H01L21/683
    • H01L21/6833
    • An electrostatic chuck includes a metal base member and an insulating substrate having an opposite surface to an attraction surface joined onto the base member via an adhesive layer. In the substrate, an electrode layer to which a direct current voltage for attraction is applied is embedded in a portion of the substrate, close to the attraction surface. In addition, a plurality of independent RF electrode layers to which different radio frequencies for plasma control are fed, respectively, are embedded in portions of the substrate, at an opposite side of the first electrode layer to the attraction surface. The RF electrode layers are arranged separately in different layers which are not on an identical plane in such a manner as to partially overlap each other in a plan view.
    • 静电卡盘包括金属基部件和绝缘基板,该绝缘基板具有通过粘合剂层接合到基底构件上的吸引表面的相反表面。 在基板中,施加有用于吸引的直流电压的电极层嵌入基板的靠近吸引面的部分。 此外,在第一电极层的与吸引表面相对的一侧的基板的部分分别嵌入多个用于等离子体控制的不同射频的独立RF电极层。 RF电极层分别布置在不在同一平面上的不同层中,以在平面图中彼此部分重叠的方式。