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1. 发明授权

US09250539B2 Blind, exposure apparatus having the blind and method of driving the exposure apparatus 有权
标题翻译：具有盲人的盲人曝光装置和驱动曝光装置的方法
公开(公告)号：US09250539B2
公开(公告)日：2016-02-02
申请号：US13438389
申请日：2012-04-03
申请人： Chang-Hoon Kim , Kab-Jong Seo
发明人： Chang-Hoon Kim , Hong-Suk Yoo , Kab-Jong Seo
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/7055 , G03F7/70066
摘要： An exposure apparatus includes a light source, a mask and a blind. The light source is disposed over a substrate. The light source cyclically radiates light. The mask is disposed between the light source and the substrate. The mask includes an exposure region and a peripheral region. The peripheral region surrounds the exposure region. A pattern is formed in the exposure region. A plurality of first alignment marks is disposed in the peripheral region. The blind is disposed between the light source and the mask. The blind includes a blocking plate and an adjusting part. The blocking part may move across the substrate. The blocking plate includes second alignment marks disposed at end portions of the blocking plate, opposite to each other. The adjusting part adjusts a position of the blocking plate.
摘要翻译：曝光装置包括光源，掩模和盲人。光源设置在基板上。光源周期性地辐射光。掩模设置在光源和基板之间。掩模包括曝光区域和周边区域。周边区域围绕曝光区域。在曝光区域中形成图案。多个第一对准标记设置在周边区域中。盲板设置在光源和掩模之间。盲人包括挡板和调节部。阻挡部分可以跨过衬底移动。阻挡板包括设置在阻挡板的彼此相对的端部处的第二对准标记。调节部调整挡板的位置。

2. 发明授权

US09298098B2 Exposure apparatus and method of configuring exposure apparatus 有权
标题翻译：曝光装置及其配置方法
公开(公告)号：US09298098B2
公开(公告)日：2016-03-29
申请号：US13615299
申请日：2012-09-13
申请人： Tsunemitsu Torigoe , Chang Hoon Kim , Kab Jong Seo
发明人： Tsunemitsu Torigoe , Chang Hoon Kim , Kab Jong Seo
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70141 , G03F7/70075
摘要： A light exposer according to an embodiment of the present invention includes an exposure beam generator generating an exposure beam, and a vacuum chamber passing the exposure beam generated by the exposure beam generator and including a first fly eye lens having a plurality of convex lens like fly eyes. The exposure beam generator includes an oscillator including an oscillator pumping chamber, a first prism and a second prism, and a first exposure beam diameter changing lens positioned before the first prism and enlarging a diameter of the exposure beam.
摘要翻译：根据本发明的实施例的曝光器包括产生曝光光束的曝光光束发生器和通过由曝光光束发生器产生的曝光光束的真空室，并且包括具有多个凸透镜的第一复眼透镜，如飞眼睛曝光光束发生器包括振荡器，该振荡器包括振荡器泵浦室，第一棱镜和第二棱镜，以及位于第一棱镜之前并扩大曝光光束直径的第一曝光光束直径变化透镜。

3. 发明授权

US09007564B2 Exposure apparatus including light blocking member with light condensing part 有权
标题翻译：曝光装置包括具有聚光部分的遮光部件
公开(公告)号：US09007564B2
公开(公告)日：2015-04-14
申请号：US13565073
申请日：2012-08-02
申请人： Chang-Hoon Kim , Kab-Jong Seo , Hi-Kuk Lee , Tsunemitsu Torigoe
发明人： Chang-Hoon Kim , Kab-Jong Seo , Hi-Kuk Lee , Tsunemitsu Torigoe
IPC分类号： G03B27/54 , G03B27/32 , G03F7/20
CPC分类号： G03F7/70066 , G03F7/7035 , G03F7/70475
摘要： An exposure apparatus includes an irradiating part which irradiates light, a light blocking member including a light condensing part at a side of the light blocking member, where the light condensing part condenses the light, a mask which is spaced apart from the light blocking member by a first distance, and a transporting part which transports a target substrate in a first direction.
摘要翻译：曝光装置包括照射光的照射部分，在遮光部件的一侧包括聚光部分的遮光部件，其中聚光部分聚光，将与遮光部件间隔开的面罩通过第一距离，以及沿第一方向输送目标基板的输送部。

4. 发明申请

US20130215405A1 EXPOSURE APPARATUS AND METHOD OF CONFIGURING EXPOSURE APPARATUS 有权
标题翻译：曝光装置及配置曝光装置的方法
公开(公告)号：US20130215405A1
公开(公告)日：2013-08-22
申请号：US13615299
申请日：2012-09-13
申请人： Tsunemitsu TORIGOE , Chang Hoon KIM , Kab Jong SEO
发明人： Tsunemitsu TORIGOE , Chang Hoon KIM , Kab Jong SEO
IPC分类号： G03B27/54
CPC分类号： G03F7/70141 , G03F7/70075
摘要： A light exposer according to an embodiment of the present invention includes an exposure beam generator generating an exposure beam, and a vacuum chamber passing the exposure beam generated by the exposure beam generator and including a first fly eye lens having a plurality of convex lens like fly eyes. The exposure beam generator includes an oscillator including an oscillator pumping chamber, a first prism and a second prism, and a first exposure beam diameter changing lens positioned before the first prism and enlarging a diameter of the exposure beam.
摘要翻译：根据本发明的实施例的曝光器包括产生曝光光束的曝光光束发生器和通过由曝光光束发生器产生的曝光光束的真空室，并且包括具有多个凸透镜的第一复眼透镜，如飞眼睛曝光光束发生器包括振荡器，该振荡器包括振荡器泵浦室，第一棱镜和第二棱镜，以及位于第一棱镜之前并扩大曝光光束直径的第一曝光光束直径变化透镜。

5. 发明申请

US20130162965A1 EXPOSURE APPARATUS 有权
标题翻译：曝光装置
公开(公告)号：US20130162965A1
公开(公告)日：2013-06-27
申请号：US13565073
申请日：2012-08-02
申请人： Chang-Hoon KIM , Kab-Jong SEO , Hi-Kuk LEE , Tsunemitsu TORIGOE
发明人： Chang-Hoon KIM , Kab-Jong SEO , Hi-Kuk LEE , Tsunemitsu TORIGOE
IPC分类号： G03B27/54
CPC分类号： G03F7/70066 , G03F7/7035 , G03F7/70475
摘要： An exposure apparatus includes an irradiating part which irradiates light, a light blocking member including a light condensing part at a side of the light blocking member, where the light condensing part condenses the light, a mask which is spaced apart from the light blocking member by a first distance, and a transporting part which transports a target substrate in a first direction.
摘要翻译：曝光装置包括照射光的照射部分，在遮光部件的一侧包括聚光部分的遮光部件，其中聚光部分聚光，将与遮光部件间隔开的面罩通过第一距离，以及沿第一方向输送目标基板的输送部。

6. 发明申请

US20130088700A1 BLIND, EXPOSURE APPARATUS HAVING THE BLIND AND METHOD OF DRIVING THE EXPOSURE APPARATUS 有权
标题翻译：黑色，具有黑色的曝光装置和驱动曝光装置的方法
公开(公告)号：US20130088700A1
公开(公告)日：2013-04-11
申请号：US13438389
申请日：2012-04-03
申请人： Chang-Hoon KIM , Hong-Suk YOO , Kab-Jong SEO
发明人： Chang-Hoon KIM , Hong-Suk YOO , Kab-Jong SEO
IPC分类号： G03F7/20
CPC分类号： G03F7/7055 , G03F7/70066
摘要： An exposure apparatus includes a light source, a mask and a blind. The light source is disposed over a substrate. The light source cyclically radiates light. The mask is disposed between the light source and the substrate. The mask includes an exposure region and a peripheral region. The peripheral region surrounds the exposure region. A pattern is formed in the exposure region. A plurality of first alignment marks is disposed in the peripheral region. The blind is disposed between the light source and the mask. The blind includes a blocking plate and an adjusting part. The blocking part may move across the substrate. The blocking plate includes second alignment marks disposed at end portions of the blocking plate, opposite to each other. The adjusting part adjusts a position of the blocking plate.
摘要翻译：曝光装置包括光源，掩模和盲人。光源设置在基板上。光源周期性地辐射光。掩模设置在光源和基板之间。掩模包括曝光区域和周边区域。周边区域围绕曝光区域。在曝光区域中形成图案。多个第一对准标记设置在周边区域中。盲板设置在光源和掩模之间。盲人包括挡板和调节部。阻挡部分可以跨过衬底移动。阻挡板包括设置在阻挡板的彼此相对的端部处的第二对准标记。调节部调节挡板的位置。

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