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    • 1. 发明授权
    • Method of detecting defects in image sensor, tester for the method, and control signal generator for the method
    • 检测图像传感器缺陷的方法,方法的测试方法以及该方法的控制信号发生器
    • US08587700B2
    • 2013-11-19
    • US12589157
    • 2009-10-19
    • Jun-taek LeeByung-hyun YimKwang-hee LeeJi-hoon Jung
    • Jun-taek LeeByung-hyun YimKwang-hee LeeJi-hoon Jung
    • H04N9/64H04N5/335
    • H04N17/002
    • A method of detecting defects in an image sensor that may occur from a floating diffusion area of the image sensor, a tester using the method, and a control signal generator using the method include a photo diode generating charges corresponding to an image signal; a transmission transistor having a first terminal connected to a the photodiode and a second terminal connected to a floating diffusion area, thereby transmitting the charges generated in the photo diode to the floating diffusion area in response to a charge transmission control signal; and a reset transistor having a first terminal applied by a reset voltage and a second transistor connected to the floating diffusion area, thereby transmitting the reset voltage to the floating diffusion area in response to a reset control signal. The reset transistor is turned on during at least one sampling zone selected between reset level sampling and signal level sampling that are performed with respect to the image sensor.
    • 一种检测图像传感器中的可能从图像传感器的浮动扩散区域发生的缺陷的方法,使用该方法的测试仪和使用该方法的控制信号发生器的方法包括:光电二极管产生与图像信号相对应的电荷; 传输晶体管,其具有连接到光电二极管的第一端子和连接到浮动扩散区域的第二端子,从而响应于电荷传输控制信号将在光电二极管中产生的电荷传输到浮动扩散区域; 以及复位晶体管,其具有通过复位电压施加的第一端子和连接到浮动扩散区域的第二晶体管,从而响应于复位控制信号将复位电压传输到浮动扩散区域。 复位晶体管在相对于图像传感器执行的复位电平采样和信号电平采样之间所选择的至少一个采样区域中导通。
    • 2. 发明授权
    • Image sensor integrated circuit devices including a photo absorption layer
    • 包括光吸收层的图像传感器集成电路器件
    • US07446359B2
    • 2008-11-04
    • US11063025
    • 2005-02-22
    • Jun Taek LeeWoon Phil Yang
    • Jun Taek LeeWoon Phil Yang
    • H01L31/062H01L31/113
    • H01L27/14687H01L27/14603H01L27/14623H01L27/14636
    • Integrated circuit devices include a semiconductor substrate and a sensor array region including a plurality of photoelectric conversion elements arranged in an array on the semiconductor substrate. A plurality of interlayer dielectric layers are on the sensor array region and a plurality of light transmissive regions extend through the plurality of interlayer dielectric layers from respective ones of the plurality of photoelectric conversion elements. A plurality of light reflecting metal elements are between ones of the plurality of interlayer dielectric layers, positioned outside of and between ones of the light transmissive regions. A photo absorption layer is formed on an upper surface of ones of the plurality of metal elements that inhibits reflection of light associated with the photoelectric conversion element of one of the light transmissive regions to another of the light-transmissive regions to limit crosstalk between the plurality of photoelectric conversion elements.
    • 集成电路器件包括半导体衬底和包括在半导体衬底上排列成阵列的多个光电转换元件的传感器阵列区域。 多个层间电介质层位于传感器阵列区域上,并且多个透光区域从多个光电转换元件中的相应的多个光电转换元件延伸穿过多个层间电介质层。 多个光反射金属元件位于多个层间电介质层之间,位于透光区域之间和之间。 在多个金属元件中的一个的上表面上形成光吸收层,其抑制与其中一个透光区域的光电转换元件相关联的光与另一个透光区域的反射,以限制多个金属元件之间的串扰 的光电转换元件。