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    • 3. 发明授权
    • Complementary metal-oxide-silicon (CMOS) image sensor and method of forming the same
    • 互补金属氧化物硅(CMOS)图像传感器及其形成方法
    • US07659563B2
    • 2010-02-09
    • US11592577
    • 2006-11-04
    • Jun-Taek Lee
    • Jun-Taek Lee
    • H01L31/062H01L31/113
    • H01L27/14603H01L27/14609H01L27/14683
    • A complementary metal-oxide silicon (CMOS) image sensor includes a semiconductor layer of a first conductivity type, a plurality of pixels located in the semiconductor layer, a photoelectric converter located in each of the plurality of pixels in the semiconductor layer and includes a region doped with impurities of a second conductivity type. The CMOS image sensor further includes a deep well of a first conductivity type located in a lower position than the photoelectric converter in the semiconductor layer and has a higher impurity concentration than that of the semiconductor layer. The deep well is located only in a portion of each of the plurality of pixels.
    • 互补金属氧化物硅(CMOS)图像传感器包括第一导电类型的半导体层,位于半导体层中的多个像素,位于半导体层中的多个像素中的每一个中的光电转换器, 掺杂有第二导电类型的杂质。 CMOS图像传感器还包括位于比半导体层中的光电转换器更低的位置的第一导电类型的深阱,并且具有比半导体层的杂质浓度更高的杂质浓度。 深阱仅位于多个像素中的每一个的一部分中。