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    • 1. 发明授权
    • Metal-containing compositions and method of making same
    • 含金属的组合物及其制备方法
    • US08709705B2
    • 2014-04-29
    • US13543071
    • 2012-07-06
    • Mangala MalikJoseph J Schwab
    • Mangala MalikJoseph J Schwab
    • G03F7/26
    • C08F4/12C08F4/06C08F4/16
    • The present invention relates to a process for forming metal-containing films by applying a photosensitive metal-containing composition on a substrate, drying the photosensitive metal-containing composition, exposing the photosensitive metal-containing composition to a source of actinic radiation and applying a post-treatment to the metal-containing composition. The process also includes exposing the photosensitive metal-containing composition to a source of actinic radiation through a mask or mold and developing the unexposed portion of the composition. Another embodiment of the invention is a metal-containing film, three-dimensional object or article formed by the process. The invention is useful in producing a directly patterned metal-containing film and a microdevice.
    • 本发明涉及通过将含感光性金属的组合物涂布在基材上,干燥含有感光性金属的组合物,将含有感光性金属的组合物曝露于光化辐射源并施加柱 对含金属组合物的处理。 该方法还包括将含感光金属的组合物暴露于光化辐射源通过掩模或模具并显影组合物的未曝光部分。 本发明的另一个实施方案是通过该方法形成的含金属膜,三维物体或制品。 本发明可用于生产直接图案化的含金属膜和微型设备。
    • 3. 发明授权
    • Metal-containing compositions and method of making same
    • 含金属组合物及其制备方法
    • US07629424B2
    • 2009-12-08
    • US11792739
    • 2006-06-12
    • Mangala MalikJoseph J Schwab
    • Mangala MalikJoseph J Schwab
    • C08F30/04
    • C08J3/28C08F230/04
    • The present invention relates to metal-containing compositions with refractive indices of at least 1.5 comprising a metal-containing precursor unit (MU), a prepolymer unit (PU), and a catalyst or an initiator capable of inducing a combining reaction of ethylenically unsaturated functional groups of the metal-containing precursor unit and reactive functional groups of the prepolymer unit. In another embodiment, the composition comprises MU and a catalyst or initiator capable of inducing a combining reaction of the metal-containing precursor units. Both MU and PU contain additional functional groups, which may be selected to impart compatibility with each other and to produce optically clear films. The metal-containing compositions can be used to produce films or articles having a transmittance of at least 90% and index of refraction in the range of 1.5 to 1.8 in the 400-700 nm range of light and 1.5 to 2.4 in the 150-400 nm range of light.
    • 本发明涉及具有至少1.5的折射率的含金属组合物,其包含含金属的前体单元(MU),预聚物单元(PU),以及能够诱导烯属不饱和官能团的组合反应的催化剂或引发剂 含金属的前体单元的基团和预聚物单元的反应性官能团。 在另一个实施方案中,组合物包含MU和能够诱导含金属的前体单元的组合反应的催化剂或引发剂。 MU和PU都包含另外的官能团,其可以被选择以赋予彼此的相容性并产生光学透明的膜。 含金属的组合物可用于生产具有至少90%的透光率和在400-700nm光范围内的1.5至1.8范围内的折射率和在150-400中的1.5至2.4的膜或制品 nm范围的光。
    • 4. 发明授权
    • Polyhedral oligomeric silsesquinoxanes and polyhedral oligomeric silicates bearing surfactant functionalities
    • 具有表面活性剂功能的多面体低聚硅氧烷喹啉和多面体低聚硅酸盐
    • US07265194B1
    • 2007-09-04
    • US10968370
    • 2004-10-18
    • Joseph D. LichtenhanJoseph J. Schwab
    • Joseph D. LichtenhanJoseph J. Schwab
    • C08G77/38
    • C08G77/04C08G77/382
    • This invention teaches the preparation and compositions of POSS nanostructured chemicals bearing a variety of onium-type surfactants. The surfactants serve as low-cost compatibilizing groups for polyhedral oligomeric silsesquioxane and polyhedral oligomeric silicate nanostructures with man-made polymer and biological systems. Variations of the surfactants also provide reactivity for the nanostructured chemicals with man-made and biological materials. The surfactant bearing nanostructured chemicals are useful as alloying agents is for controlling the structure and bulk physical properties of materials from the nanoscopic length scale. Alternately, the surfactants can be eliminated from the nanostructures to render the formation of nanoscopically dispersed silica particles.
    • 本发明教导了具有各种鎓型表面活性剂的POSS纳米结构化学品的制备和组成。 表面活性剂作为多面体低聚倍半硅氧烷和具有人造聚合物和生物体系的多面体低聚硅酸盐纳米结构的低成本相容性基团。 表面活性剂的变化也为人造和生物材料的纳米结构化学品提供反应性。 具有表面活性剂的纳米结构化学品可用作合金化剂用于从纳米尺度尺度控制材料的结构和体积物理性质。 或者,可以从纳米结构中去除表面活性剂以形成纳米尺度分散的二氧化硅颗粒。
    • 6. 发明授权
    • Reactive grafting and compatibilization of polyhedral oligomeric silsesquioxanes
    • 多面体低聚倍半硅氧烷的反应性接枝和增容
    • US06933345B1
    • 2005-08-23
    • US10351292
    • 2003-01-23
    • Joseph D. LichtenhanFrank J. FeherJoseph J. SchwabSixun Zheng
    • Joseph D. LichtenhanFrank J. FeherJoseph J. SchwabSixun Zheng
    • C08F8/00C08K5/5419C08K7/00C08L83/00
    • B82Y30/00C08K5/5419C08K7/00C08K2201/011C08L2205/14C08L23/10
    • The nanoscopic dimensions of polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) materials ranges from 0.7 nm to 5.0 nm and enables the thermomechanical and physical properties of polymeric materials to be improved by providing nanoscopic reinforcement of polymer chains at a length scale that is not possible by physically smaller aromatic chemical systems or larger fillers and fibers. A simple and cost effective method for incorporating POSS/POS nanoreinforcements onto polymers via the reactive grafting of suitably functionalized POSS/POS entities with polymeric systems amenable to such processes is described. The method teaches that the resulting POSS-grafted-polymers are particularly well suited for alloying agents by nongrafted POSS entitles such as molecular silicas. The successful alloying of POSS-polymers is aided because their interfacial tensions are reduced relative to non-POSS containing systems.
    • 多面体低聚倍半硅氧烷(POSS)和多面体低聚硅酸盐(POS)材料的纳米尺寸范围为0.7nm至5.0nm,并且通过以长度尺度提供聚合物链的纳米级增强,可以改善聚合物材料的热机械和物理性能, 通过物理上较小的芳族化学体系或较大的填料和纤维是不可能的。 描述了通过适当功能化的POSS / POS实体与适合于这种方法的聚合物体系的反应性接枝将POSS / POS纳米增强剂结合到聚合物上的简单且成本有效的方法。 该方法教导得到的POSS接枝聚合物特别适用于通过非接枝POSS权利如分子二氧化硅的合金化剂。 有助于POSS聚合物的成功合金化,因为它们的界面张力相对于不含POSS的体系而降低。
    • 8. 发明授权
    • Nanostructured chemicals as alloying agents in polymers
    • 纳米结构化学品作为聚合物中的合金剂
    • US06716919B2
    • 2004-04-06
    • US09818265
    • 2001-03-26
    • Joseph D. LichtenhanJoseph J. SchwabAndre LeeShawn Phillips
    • Joseph D. LichtenhanJoseph J. SchwabAndre LeeShawn Phillips
    • C08F800
    • B82Y30/00C08K5/5419C08K7/00C08K2201/011C08L2205/14C08L23/10
    • A method of using nanostructured chemicals as alloying agents for the reinforcement of polymer microstructures, including polymer coils, domains, chains, and segments, at the molecular level. Because of their tailorable compatibility with polymers, nanostructured chemicals can be readily and selectively incorporated into polymers by direct blending processes. The incorporation of a nanostructured chemical into a polymer favorably impacts a multitude of polymer physical properties. Properties most favorably improved are time dependent mechanical and thermal properties such as heat distortion, creep, compression set, shrinkage, modulus, hardness and abrasion resistance. In addition to mechanical properties, other physical properties are favorably improved, including lower thermal conductivity, fire resistance, and improved oxygen permeability.
    • 使用纳米结构化学品作为合成剂的方法,用于在分子水平上增强聚合物微结构,包括聚合物线圈,结构域,链和链段。 由于其与聚合物的可兼容的相容性,纳米结构化学品可以通过直接共混方法容易且有选择地并入聚合物中。 将纳米结构化学物质​​掺入聚合物有利地影响了许多聚合物的物理性质。 最有利地改善的性能是时间相关的机械和热性能,如热变形,蠕变,压缩永久变形,收缩率,模量,硬度和耐磨性。 除了机械性能之外,其他物理性能得到有利改善,包括较低的导热性,耐火性和改善的氧气渗透性。
    • 10. 发明申请
    • METAL COMPOSITIONS AND METHODS OF MAKING SAME
    • 金属组合物及其制备方法
    • US20110184139A1
    • 2011-07-28
    • US12737694
    • 2009-06-27
    • Mangala MalikJoseph J. Schwab
    • Mangala MalikJoseph J. Schwab
    • C08F230/04B32B3/10G03F7/20
    • C23C18/14C23C18/06H05K3/105Y10T428/24802
    • The present invention relates to a process for forming metal-containing films by applying a photosensitive metal-containing composition on a substrate, drying the photosensitive metal-containing composition, exposing the photosensitive metal-containing composition to a source of actinic radiation and applying a post- treatment to the metal-containing composition. The process also includes exposing the photosensitive metal-containing composition to a source of actinic radiation through a mask or mold and developing the unexposed portion of the composition. Another embodiment of the invention is a metal-containing film, three-dimensional object or article formed by the process. The invention is useful in producing a directly patterned metal-containing film and a microdevice.
    • 本发明涉及通过将含感光性金属的组合物涂布在基材上,干燥含有感光性金属的组合物,将含有感光性金属的组合物曝露于光化辐射源并施加柱 - 对含金属组合物的处理。 该方法还包括将含感光金属的组合物暴露于光化辐射源通过掩模或模具并显影组合物的未曝光部分。 本发明的另一个实施方案是通过该方法形成的含金属膜,三维物体或制品。 本发明可用于生产直接图案化的含金属膜和微型设备。