专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120100728A1 Systems and methods for forming a time-averaged line image 有权
标题翻译：用于形成时间平均线图像的系统和方法
公开(公告)号：US20120100728A1
公开(公告)日：2012-04-26
申请号：US13199016
申请日：2011-08-17
申请人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
发明人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
IPC分类号： H01L21/268 , G02B26/10
CPC分类号： H01L21/268 , B23K26/0738 , B23K26/352 , B23K26/55
摘要： Systems and methods for forming a time-averaged line image having a relatively high amount of intensity uniformity along its length is disclosed. The method includes forming at an image plane a line image having a first amount of intensity non-uniformity in a long-axis direction and forming a secondary image that at least partially overlaps the primary image. The method also includes scanning the secondary image over at least a portion of the primary image and in the long-axis direction according to a scan profile to form a time-average modified line image having a second amount of intensity non-uniformity in the long-axis direction that is less than the first amount. For laser annealing a semiconductor wafer, the amount of line-image overlap for adjacent scans of a wafer scan path is substantially reduced, thereby increasing wafer throughput.
摘要翻译：公开了用于形成沿着其长度具有相对高的强度均匀度的时间平均线图像的系统和方法。该方法包括在像平面处形成具有长轴方向上的第一强度不均匀量的线图像，并形成与主图像至少部分重叠的二次图像。该方法还包括根据扫描轮廓在主图像的至少一部分和长轴方向上扫描次级图像，以形成具有第二强度不均匀度的时间平均修改线图像 -axis方向小于第一个量。对于半导体晶片的激光退火，晶片扫描路径的相邻扫描的线图像重叠量大幅度减少，从而增加晶片生产量。

2. 发明授权

US08026519B1 Systems and methods for forming a time-averaged line image 有权
标题翻译：用于形成时间平均线图像的系统和方法
公开(公告)号：US08026519B1
公开(公告)日：2011-09-27
申请号：US12925517
申请日：2010-10-22
申请人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
发明人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
IPC分类号： H01L29/04
CPC分类号： H01L21/268 , B23K26/0738 , B23K26/352 , B23K26/55
摘要： Systems and methods for forming a time-averaged line image having a relatively high amount of intensity uniformity along its length is disclosed. The method includes forming at an image plane a line image having a first amount of intensity non-uniformity in a long-axis direction and forming a secondary image that at least partially overlaps the primary image. The method also includes scanning the secondary image over at least a portion of the primary image and in the long-axis direction according to a scan profile to form a time-average modified line image having a second amount of intensity non-uniformity in the long-axis direction that is less than the first amount. For laser annealing a semiconductor wafer, the amount of line-image overlap for adjacent scans of a wafer scan path is substantially reduced, thereby increasing wafer throughput.
摘要翻译：公开了用于形成沿着其长度具有相对高的强度均匀度的时间平均线图像的系统和方法。该方法包括在像平面处形成具有长轴方向上的第一强度不均匀量的线图像，并形成与主图像至少部分重叠的二次图像。该方法还包括根据扫描轮廓在主图像的至少一部分和长轴方向上扫描次级图像，以形成具有第二强度不均匀度的时间平均修改线图像 -axis方向小于第一个量。对于半导体晶片的激光退火，晶片扫描路径的相邻扫描的线图像重叠量大幅度减少，从而增加晶片生产量。

3. 发明授权

US08822353B2 Systems and methods for forming a time-averaged line image 有权
标题翻译：用于形成时间平均线图像的系统和方法
公开(公告)号：US08822353B2
公开(公告)日：2014-09-02
申请号：US13199016
申请日：2011-08-17
申请人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
发明人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
IPC分类号： B23K26/00 , H01L21/268 , B23K26/073
CPC分类号： H01L21/268 , B23K26/0738 , B23K26/352 , B23K26/55
摘要： Systems and methods for forming a time-averaged line image having a relatively high amount of intensity uniformity along its length is disclosed. The method includes forming at an image plane a line image having a first amount of intensity non-uniformity in a long-axis direction and forming a secondary image that at least partially overlaps the primary image. The method also includes scanning the secondary image over at least a portion of the primary image and in the long-axis direction according to a scan profile to form a time-average modified line image having a second amount of intensity non-uniformity in the long-axis direction that is less than the first amount. For laser annealing a semiconductor wafer, the amount of line-image overlap for adjacent scans of a wafer scan path is substantially reduced, thereby increasing wafer throughput.
摘要翻译：公开了用于形成沿着其长度具有相对高的强度均匀度的时间平均线图像的系统和方法。该方法包括在像平面处形成具有长轴方向上的第一强度不均匀量的线图像，并形成与主图像至少部分重叠的二次图像。该方法还包括根据扫描轮廓在主图像的至少一部分和长轴方向上扫描次级图像，以形成具有第二强度不均匀度的时间平均修改线图像 -axis方向小于第一个量。对于半导体晶片的激光退火，晶片扫描路径的相邻扫描的线图像重叠量大幅度减少，从而增加晶片生产量。

4. 发明授权

US08399808B2 Systems and methods for forming a time-averaged line image 有权
标题翻译：用于形成时间平均线图像的系统和方法
公开(公告)号：US08399808B2
公开(公告)日：2013-03-19
申请号：US13136769
申请日：2011-08-10
申请人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
发明人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
IPC分类号： H05B7/18 , H01L21/00
CPC分类号： H01L21/268 , B23K26/03 , B23K26/0608 , B23K26/067 , B23K26/0732 , B23K26/0738 , B23K26/0853 , H01L21/67115 , H01L21/67253
摘要： Systems and methods for forming a time-average line image are disclosed. The method includes forming a line image with a first amount of intensity non-uniformity. The method also includes forming and scanning a secondary image over at least a portion of the line image to form a time-averaged modified line image having a second amount of intensity non-uniformity that is less than the first amount. Wafer emissivity is measured in real time to control the intensity of the secondary image. Temperature is also measured in real time based on the wafer emissivity and reflectivity of the secondary image, and can be used to control the intensity of the secondary image.
摘要翻译：公开了用于形成时间平均线图像的系统和方法。该方法包括形成第一强度不均匀的线图像。该方法还包括在线图像的至少一部分上形成和扫描次级图像以形成具有小于第一量的第二强度不均匀量的时间平均修改线图像。实时测量晶片发射率以控制次级图像的强度。也可以基于晶片的发射率和二次图像的反射率实时测量温度，并且可以用于控制次级图像的强度。

5. 发明申请

US20080137858A1 Single-channel transmission of qubits and classical bits over an optical telecommunications network 审中-公开
标题翻译：光通信网络上的量子位和经典比特的单信道传输
公开(公告)号：US20080137858A1
公开(公告)日：2008-06-12
申请号：US11999151
申请日：2007-12-04
申请人： Robert Gelfond , A. Craig Beal , Audrius Berzanskis , Joseph E. Gortych
发明人： Robert Gelfond , A. Craig Beal , Audrius Berzanskis , Joseph E. Gortych
IPC分类号： H04L9/06
CPC分类号： H04B10/70 , H04L9/0852
摘要： Systems and methods that allow for transmitting qubits and classical signal over the same channel of an optical telecommunications network that includes an optical fiber. The method includes sending the qubits of wavelength λS over a quantum optical path that includes the optical fiber during a time interval ΔT0 when there are no classical optical signals of wavelength λS traveling over the optical fiber. The method also includes sending the classical signals over a classical optical path that includes the optical fiber, wherein the classical signals are sent outside of the time interval ΔT0 to avoid interfering with the qubit transmission. Systems and methods for using the present invention to form quantum key banks for encrypting classical signals sent over the optical telecommunications network are also disclosed.
摘要翻译：允许在包括光纤的光通信网络的相同信道上传输量子位和经典信号的系统和方法。该方法包括：当没有波长λ的经典光信号时，在时间间隔ΔT<0> 0的范围内，在包括光纤的量子光路上发射波长λS S的量子位在光纤上行进的S / S。该方法还包括通过包括光纤的经典光路发送经典信号，其中经典信号被发送到时间间隔DeltaT 0之外，以避免干扰量子位传输。还公开了使用本发明形成用于加密通过光通信网络发送的经典信号的量子密钥库的系统和方法。

6. 发明授权

US06939009B2 Compact work light with high illumination uniformity 失效
标题翻译：紧凑的工作灯具有高照明均匀性
公开(公告)号：US06939009B2
公开(公告)日：2005-09-06
申请号：US10884759
申请日：2004-07-01
申请人： Robert E. Fischer , Joseph E. Gortych
发明人： Robert E. Fischer , Joseph E. Gortych
IPC分类号： G03B21/14 , G03B29/00 , F21L4/00 , F21V7/00 , G03B21/22
CPC分类号： G03B21/208 , F21V5/006 , F21Y2115/10
摘要： A compact work light that generates a light beam having high brightness and high illumination uniformity is disclosed. The work light includes a housing that houses a light source, a light homogenizer and an imaging lens in an operational relationship. The housing is attached to an adjustable mount, which can be attached to a fixed region such as wall, or to a movable support member such as a lamp base. The light source generates light that is uniformized by the light homogenizer. The homogenized light is then imaged by the imaging lens as a highly uniform, bright beam spot having a sharp boundary. The beam spot is formed at a selectable distance from the work light by varying the imaging lens and/or the adjustable mount. The work light is useful for a variety of industrial, professional and personal applications, including but not limited to a reading light, a dentist light, a head lamp, a head light and an optical projector.
摘要翻译：公开了一种紧凑的工作光，其产生具有高亮度和高照度均匀性的光束。工作灯包括容纳光源的壳体，光均化器和具有操作关系的成像透镜。壳体附接到可调节的安装件，其可以附接到诸如壁的固定区域，或者附接到可移动的支撑构件，例如灯座。光源产生由光均化器均匀化的光。然后，通过成像透镜将均匀化的光成像为具有尖锐边界的高度均匀的亮光束点。通过改变成像透镜和/或可调整支架，将光束点形成在距离工作光线可选择的距离处。工作灯对于各种工业，专业和个人应用是有用的，包括但不限于阅读灯，牙医灯，头灯，头灯和光学投影仪。

7. 发明申请

US20120100640A1 Systems and methods for forming a time-averaged line image 有权
标题翻译：用于形成时间平均线图像的系统和方法
公开(公告)号：US20120100640A1
公开(公告)日：2012-04-26
申请号：US13136769
申请日：2011-08-10
申请人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
发明人： Serguei Anikitchev , James T. McWhirter , Joseph E. Gortych
IPC分类号： H01L21/66 , H05B7/18
CPC分类号： H01L21/268 , B23K26/03 , B23K26/0608 , B23K26/067 , B23K26/0732 , B23K26/0738 , B23K26/0853 , H01L21/67115 , H01L21/67253
摘要： Systems and methods for forming a time-average line image are disclosed. The method includes forming a line image with a first amount of intensity non-uniformity. The method also includes forming and scanning a secondary image over at least a portion of the line image to form a time-averaged modified line image having a second amount of intensity non-uniformity that is less than the first amount. Wafer emissivity is measured in real time to control the intensity of the secondary image. Temperature is also measured in real time based on the wafer emissivity and reflectivity of the secondary image, and can be used to control the intensity of the secondary image.
摘要翻译：公开了用于形成时间平均线图像的系统和方法。该方法包括形成第一强度不均匀的线图像。该方法还包括在线图像的至少一部分上形成和扫描次级图像以形成具有小于第一量的第二强度不均匀量的时间平均修改线图像。实时测量晶片发射率以控制次级图像的强度。也可以基于晶片的发射率和二次图像的反射率实时测量温度，并且可以用于控制次级图像的强度。

8. 发明申请

US20090202074A1 QKD station with EMI signature suppression 审中-公开
标题翻译： QKD站具有EMI签名抑制功能
公开(公告)号：US20090202074A1
公开(公告)日：2009-08-13
申请号：US12384968
申请日：2009-04-10
申请人： Alexei Trifonov , Joseph E. Gortych
发明人： Alexei Trifonov , Joseph E. Gortych
IPC分类号： H04K1/00 , H04L9/08 , G06F7/58
CPC分类号： H04L9/0852
摘要： Methods and systems for suppressing the electromagnetic interference (EMI) signature generated by a QKD station are disclosed. One of the methods includes generating two or more modulator drive signals corresponding to two or more of the n possible modulator states of the particular QKD protocol. The modulator drive signals are sent to a random number generation (RNG) unit, which randomly selects one of the two or more modulator drive signals and passes it to the modulator. Another method involves generating two modulator drive signals, wherein the voltage sum is constant. One signal is sent to the modulator while the other is sent to a circuit-terminating element, which can be a second modulator. The method suppresses the EMI signature associated with individual modulation states. This prevents an eavesdropper from gaining information about the modulator states via the EMI signature, which information could otherwise yield information about the exchanged key.
摘要翻译：公开了用于抑制由QKD站产生的电磁干扰（EMI）签名的方法和系统。方法之一包括产生对应于特定QKD协议的n个可能调制器状态中的两个或更多个的两个或更多个调制器驱动信号。调制器驱动信号被发送到随机数生成（RNG）单元，其随机地选择两个或更多个调制器驱动信号中的一个并将其传递给调制器。另一种方法涉及产生两个调制器驱动信号，其中电压和是恒定的。一个信号被发送到调制器，而另一个信号被发送到电路终端元件，其可以是第二调制器。该方法抑制与各个调制状态相关联的EMI签名。这样可以防止窃听者通过EMI签名获得关于调制器状态的信息，哪些信息可能会产生关于所交换的密钥的信息。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式