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    • 4. 发明授权
    • Connector for connecting cable-protecting pipe
    • 连接电缆保护管的连接器
    • US06357188B1
    • 2002-03-19
    • US09602750
    • 2000-06-23
    • Hyang Jae LeeKum Ok HyunChung Ho JeonJoo Han Lee
    • Hyang Jae LeeKum Ok HyunChung Ho JeonJoo Han Lee
    • E04C252
    • E02D29/125E02D29/12E04G15/061H02G9/06
    • According to the present invention, there is provided a connector laid within a manhole wall for connecting cable-protecting pipes, including a body formed with a passage which said pipes can be inserted into, and a fixing member and a coupling member formed on both ends of said body, respectively, to be coupled and fixed each other, wherein said fixing member includes a first fixing protrusion and a first fixing groove formed on an outer surface of said body, respectively, to be located at the same surface as an end surface of said body and a second fixing protrusion and a second fixing groove formed on the outer surface of said body, respectively, to be located apart from the end surface of said body by a thickness of said first fixing protrusion and said first fixing groove. The end of said body formed with said fixing member is provided with a cover for preventing extraneous substance from invading inside of said body. An inner surface of said body is formed with a fixing sill to be inclined outward so that said fixing sill should engage with a slope of an end of said pipe inclined inward.
    • 根据本发明,提供了一种用于连接电缆保护管的人孔壁内的连接器,包括形成有所述管可以插入的通道的主体和形成在两端的连接构件 分别固定在所述本体上,其中所述固定件包括分别形成在所述主体的外表面上的第一固定突起和第一固定槽,所述第一固定突起和第一固定槽位于与端面相同的表面上 以及分别形成在所述主体的外表面上的第二固定突起和第二固定槽,以便通过所述第一固定突起和所述第一固定槽的厚度与所述主体的端面分开。 由所述固定构件形成的所述主体的端部设置有用于防止外来物质侵入所述主体内部的盖。 所述主体的内表面形成有固定框架以向外倾斜,使得所述固定框架应与向内倾斜的所述管道的端部的斜面接合。
    • 5. 发明授权
    • CMP apparatus
    • CMP装置
    • US09421668B2
    • 2016-08-23
    • US14405116
    • 2012-06-07
    • Seh Kwang LeeYoun Chul KimJoo Han LeeJae Kwang ChoiJae Phil Boo
    • Seh Kwang LeeYoun Chul KimJoo Han LeeJae Kwang ChoiJae Phil Boo
    • B24B37/00B24B49/18B24B37/005B24B53/017
    • B24B49/186B24B37/005B24B49/18B24B53/017
    • Provided is a chemical mechanical polishing (CMP) apparatus that includes a swing unit installed apart from a platen, on which a CMP pad to be conditioned is placed, at a predetermined interval, a connector installed on an upper end of the swing unit at one end thereof in a perpendicular direction to the swing unit and pivoting around the swing unit above the CMP pad, a rotator rotatably installed on the other end of the connector, a CMP pad conditioner coupled to the rotator and conditioning the CMP pad when rotated, and a vibration meter installed on the connector and detecting vibrations to measure a vibration acceleration of the CMP pad conditioner, thereby predicting a wear rate of the CMP pad based on the vibration acceleration and a state in which the CMP pad conditioner is installed or being used.
    • 提供了一种化学机械抛光(CMP)装置,其包括摆动单元,该摆动单元以预定间隔安装在其上放置待调理的CMP垫的压板上,安装在摆动单元的上端的连接器 在摆动单元的垂直方向上的端部,并且围绕摆放单元围绕CMP垫旋转,可旋转地安装在连接器的另一端上的旋转器,耦合到旋转体并在旋转时调节CMP垫的CMP垫调节器,以及 安装在连接器上并检测振动以测量CMP垫调节器的振动加速度的振动计,从而基于振动加速度和CMP垫调节器的安装或使用状态来预测CMP垫的磨损率。
    • 10. 发明申请
    • CMP APPARATUS
    • CMP装置
    • US20150140900A1
    • 2015-05-21
    • US14405116
    • 2012-06-07
    • Seh Kwang LeeYoun Chul KimJoo Han LeeJae Kwang ChoiJae Phil Boo
    • Seh Kwang LeeYoun Chul KimJoo Han LeeJae Kwang ChoiJae Phil Boo
    • B24B49/18B24B53/017B24B37/005
    • B24B49/186B24B37/005B24B49/18B24B53/017
    • Provided is a chemical mechanical polishing (CMP) apparatus that includes a swing unit installed apart from a platen, on which a CMP pad to be conditioned is placed, at a predetermined interval, a connector installed on an upper end of the swing unit at one end thereof in a perpendicular direction to the swing unit and pivoting around the swing unit above the CMP pad, a rotator rotatably installed on the other end of the connector, a CMP pad conditioner coupled to the rotator and conditioning the CMP pad when rotated, and a vibration meter installed on the connector and detecting vibrations to measure a vibration acceleration of the CMP pad conditioner, thereby predicting a wear rate of the CMP pad based on the vibration acceleration and a state in which the CMP pad conditioner is installed or being used.
    • 提供了一种化学机械抛光(CMP)装置,其包括摆动单元,该摆动单元以预定间隔安装在其上放置待调理的CMP垫的压板上,安装在摆动单元的上端的连接器 在摆动单元的垂直方向上的端部,并且围绕摆放单元围绕CMP垫旋转,可旋转地安装在连接器的另一端上的旋转器,耦合到旋转体并在旋转时调节CMP垫的CMP垫调节器,以及 安装在连接器上并检测振动以测量CMP垫调节器的振动加速度的振动计,从而基于振动加速度和CMP垫调节器的安装或使用状态来预测CMP垫的磨损率。