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1. 发明授权

US5384464A Process and apparatus for optical near field microlithography 失效
标题翻译：用于光学近场微光刻的工艺和装置
公开(公告)号：US5384464A
公开(公告)日：1995-01-24
申请号：US842184
申请日：1992-05-07
申请人： Frederique De Fornel , Jean-Pierre Goudonnet , James Mantovani
发明人： Frederique De Fornel , Jean-Pierre Goudonnet , James Mantovani
IPC分类号： G03F7/20 , H01J37/304 , H01L21/027
CPC分类号： G03F7/70375 , H01J37/304
摘要： Direct scanning microlithography process of a substrate such as a wafer, by means of an optical and/or electronic beam, for obtaining photomechanical or electromechanical lithography of submicrometric structures at the surface of the substrate, wherein the source of the optical and/or electronic beam used for lithography is kept at an appropriate distance from the substrate by means of a waveguide proximity probe, such as a fiber optic proximity probe capable of measuring rapid variation, depending on the distance, of the intensity of an electromagnetic wave reflected by the substrate within the near field area located at the end of the probe. The invention also concerns microlithography devices using this process.
摘要翻译： PCT No.PCT / FR90 / 00682 Sec。 371日期：1992年5月7日 102（e）日期1992年5月7日PCT提交1990年9月21日PCT公布。出版物WO91 / 04513 日期1991年4月4日。通过光学和/或电子束直接扫描诸如晶片的衬底的微光刻工艺，用于在衬底的表面处获得亚微米结构的光机械或机电光刻，其中源用于光刻的光学和/或电子束通过波导邻近探针（例如光纤接近探测器）保持在离基板适当的距离，光纤接近探头能够根据距离来测量快速变化由位于探头末端的近场区域内的衬底反射的电磁波。本发明还涉及使用该方法的微光刻设备。

2. 发明授权

US5340981A Rear field reflection microscopy process and apparatus 失效
标题翻译：后场反射显微镜工艺及仪器
公开(公告)号：US5340981A
公开(公告)日：1994-08-23
申请号：US835980
申请日：1992-04-27
申请人： Frederique De Fornel , Jean-Pierre Goudonnet , Nathalie Cerre
发明人： Frederique De Fornel , Jean-Pierre Goudonnet , Nathalie Cerre
IPC分类号： G02B21/00 , G01Q60/18 , G03F7/20 , H01J5/16
CPC分类号： G01Q60/22 , B82Y20/00 , B82Y35/00 , G03F7/70383 , B82Y10/00 , Y10S977/862
摘要： Reflection microscopy process and apparatus for examining a surface which enable the injection of highly coherent electromagnetic wave, such as produced by a laser, in a waveguide whose outlet surface is flat and transparent, at least in the zone where propagation mode of the waveguide is emitted. The outlet surface is positioned above the surface to be examined at a chosen distance so that the coupling coefficient between the particular mode of propagation of waveguide and the propagation mode of the electric field of the wave reflected by the surface and guided in return by the waveguide, depends in an essentially exponential way on the distance or can be compared, at least locally, with an exponential variation function, or is rapidly decreasing, depending on the distance, and the surface is scanned with the waveguide. In particular, the field of the invention concerns scanning microscopy, by purely optical elements and with nanometric resolution. The invention can also be used for optical control of the distance between a given surface and an instrument to be moved above this surface, and, in particular, any instrument of the type used for microlithography of integrated circuits.
摘要翻译： PCT No.PCT / FR90 / 00632 Sec。 371日期：1992年4月27日 102（e）日期1992年4月27日PCT提交1990年8月27日PCT公布。公开号WO91 / 03757 日期1991年3月21日。用于检查表面的反射显微镜方法和装置，其使得能够在出口表面是平坦和透明的波导中注射高激光等高度相干的电磁波，至少在发射波导的传播模式。出口表面以选定的距离定位在要检查的表面上方，使得波导的特定传播模式与由表面反射并由波导反射引导的波的电场的传播模式之间的耦合系数取决于距离上的基本指数方式，或者可以至少局部地用指数变化函数进行比较，或者根据距离而快速地减小，并且用波导扫描表面。特别地，本发明的领域涉及扫描显微镜，纯粹的光学元件和纳米分辨率。本发明还可以用于光学控制给定表面和待移动到该表面之上的仪器之间的距离，特别是用于集成电路的微光刻的类型的任何仪器。

3. 发明授权

US5306918A Installation for the study or the transformation of the surface of samples placed in a vacuum or in a controlled atmosphere 失效
标题翻译：安装用于研究或将样品表面置于真空或受控气氛中
公开(公告)号：US5306918A
公开(公告)日：1994-04-26
申请号：US946412
申请日：1992-11-09
申请人： Jean-Pierre Goudonnet , Yvon LaCroute
发明人： Jean-Pierre Goudonnet , Yvon LaCroute
IPC分类号： G01B21/30 , G01N21/27 , G01N27/00 , G01Q30/08 , G01Q30/16 , G01Q60/18 , G02B21/24 , H01J37/20 , H01J37/28 , H01J37/26
CPC分类号： G01Q30/16 , B82Y35/00 , G02B21/24 , H01J37/20 , Y10S977/86 , Y10S977/861 , Y10S977/869 , Y10S977/871 , Y10S977/881 , Y10S977/888
摘要： Installation for the analysis or transformation of the surface of samples placed in a vacuum or controlled atmosphere, including a main enclosure in which is positioned a support plate for at least one device, called SXM, in which a microprobe such as a light or electricity conducting tip is positioned close to the surface of the sample to be examined, whether in the air or in a vacuum. The device is intended for the microscopy, spectroscopy or etching of the sample surface by scanning of the surface by the microprobe. The support plate is equipped with elements for disconnecting it from the main enclosure and with elements for rotating the support plate around a central axis allowing the use of a series of SXM devices fitted into the periphery of the support plate. The main enclosure is completed by a scrubbing enclosure for the surface of the samples and by an introduction and storage enclosure for the samples, which can be handled through the installation by the end of a conveyor rod that can be moved longitudinally and in axial rotation along the alignment axis of the enclosures.
摘要翻译： PCT No.PCT / FR91 / 00378 Sec。 371日期：1993年1月5日 102（e）日期1993年1月5日PCT提交1991年5月7日PCT公布。公开号WO91 / 17429 日期为1991年11月14日。用于分析或转化放置在真空或受控气氛中的样品表面的装置，包括主壳体，其中定位有至少一个称为SXM的装置的支撑板，其中，例如光或电导电尖端定位为接近待检测样品的表面，无论是在空气中还是在真空中。该器件旨在通过微探针扫描表面进行显微镜，光谱或样品表面的蚀刻。支撑板配备有用于将其与主壳体断开的元件以及用于使支撑板围绕中心轴线旋转的元件，允许使用装配在支撑板的周边中的一系列SXM装置。主外壳由用于样品表面的洗涤外壳和样品的引入和存储外壳完成，样品可以通过安装在传送杆端部进行处理，该输送杆可纵向移动并沿轴向旋转外壳的对齐轴。

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