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    • 1. 发明授权
    • Method of making a semiconductor device with self-aligned active, lightly-doped drain, and halo regions
    • 制造具有自对准有源,轻掺杂漏极和卤区的半导体器件的方法
    • US06300205B1
    • 2001-10-09
    • US09193262
    • 1998-11-18
    • H. Jim FulfordJon CheekDerick J. WristersJames Buller
    • H. Jim FulfordJon CheekDerick J. WristersJames Buller
    • H01L21336
    • H01L29/6653H01L21/26586H01L29/1083H01L29/6656H01L29/6659H01L29/7833
    • One method of making a semiconductor device includes forming a gate electrode on a substrate and forming a spacer on a sidewall of the gate electrode. An active region is then formed in the substrate and adjacent to the spacer, but spaced apart from the gate electrode, using a first dopant material. A halo region is formed in the substrate under the spacer and adjacent to the active region using a second dopant material of a conductivity type different than the first dopant material. The halo region may be formed by implanting the second dopant region into the substrate at an angle substantially less than 90° relative to a surface of the substrate. A portion of the spacer is then removed and a lightly-doped region is formed in the substrate adjacent to the active region and the gate electrode and shallower than the halo region using a third dopant material of a same conductivity type as the first dopant material.
    • 制造半导体器件的一种方法包括在衬底上形成栅电极并在栅电极的侧壁上形成间隔物。 然后,使用第一掺杂剂材料,在衬底中形成有源区并与间隔物相邻,但与栅电极间隔开。 使用不同于第一掺杂剂材料的导电类型的第二掺杂剂材料,在间隔物下方的衬底中形成晕圈区域并与有源区相邻。 可以通过相对于衬底的表面以相对小于90°的角度将第二掺杂剂区域注入到衬底中来形成晕圈区域。 然后去除间隔物的一部分,并且使用与第一掺杂剂材料相同的导电类型的第三掺杂剂材料,在邻近有源区和栅电极的衬底中形成轻掺杂区域,并且比晕区浅。
    • 2. 发明授权
    • Crop harvesting rotor
    • 作物收获转子
    • US4060961A
    • 1977-12-06
    • US660613
    • 1976-02-23
    • John Dale AndersonRichard James BullerAllen Thomas Trego
    • John Dale AndersonRichard James BullerAllen Thomas Trego
    • A01D34/535A01D55/20
    • A01D34/535
    • A rotor for crop handling machines has a plurality of double-pivoted, radially-extending arms and structure on the segments of each arm to position the segments such that any radially inwardly directed impact force, such as from stones and other obstructions, causes immediate buckling of the arm about its pivot points instead of fracturing the segments or bending their mounting pins. In one embodiment, each arm is provided with a positive stop between the segments that holds them in a pre-buckled condition such that the tip of the outer segment, with respect to the direction of rotation of the rotor, trails the common plane containing the pivotal axes of the double-pivoted arm. In a second embodiment the individual segments are constructed such that their centers of gravity are laterally offset, with respect to one another, causing the desired trailing relationship of the tip of the outer segment.
    • 用于作物处理机器的转子具有多个双重枢转的径向延伸的臂并且在每个臂的段上结构以定位段,使得任何径向向内的冲击力,例如从石头和其它障碍物引起立即屈曲 的臂绕其枢轴点,而不是压裂段或弯曲其安装销。 在一个实施例中,每个臂在两个段之间设置有一个止挡件,该止挡件将它们保持在预弯曲的状态,使得外部段的尖端相对于转子的旋转方向沿着包含 双转臂的枢轴。 在第二实施例中,各个段被构造成使得它们的重心相对于彼此横向偏移,导致外部段的尖端的期望的拖尾关系。
    • 8. 发明授权
    • Semiconductor device with vertical halo region and methods of manufacture
    • 具有垂直卤区的半导体器件及其制造方法
    • US6114211A
    • 2000-09-05
    • US195336
    • 1998-11-18
    • H. Jim FulfordJon CheekDerick J. WristersJames Buller
    • H. Jim FulfordJon CheekDerick J. WristersJames Buller
    • H01L21/336H01L29/10
    • H01L29/66492H01L29/1083H01L29/6653H01L29/6659
    • One method of forming a semiconductor device includes forming a gate electrode on a substrate and then forming a spacer adjacent to a sidewall of the gate electrode. An active region is formed in the substrate adjacent to the spacer and spaced apart from the gate electrode using a first dopant material of a first conductivity type. A protecting layer is formed over the active region and adjacent to the spacer. At least a portion of the spacer is then removed to form an opening between the protecting layer and the gate electrode. In some instances, the spacer may be formed by independent deposition of two different materials (e.g., silicon nitride and silicon dioxide), one of which can be selectively removed with respect to the other. A lightly-doped region is formed in the substrate adjacent to the gate electrode using a second dopant material of the first conductivity type. This lightly-doped region may be formed, for example, prior to formation of the spacer, between the formation of two portions of the spacer, or after removing at least a portion of the spacer. A halo region is formed through the opening resulting from removing a portion of the spacer. The halo region is deeper in the substrate than the lightly-doped region and is adjacent to the active region. The halo region is formed using a third dopant material of a conductivity type different than the first conductivity type.
    • 形成半导体器件的一种方法包括在衬底上形成栅电极,然后形成与栅电极的侧壁相邻的间隔物。 使用第一导电类型的第一掺杂剂材料,在与衬垫相邻的衬底中形成有源区,并与栅电极间隔开。 保护层形成在有源区上并与隔片相邻。 然后去除间隔物的至少一部分以在保护层和栅电极之间形成开口。 在一些情况下,可以通过独立沉积两种不同材料(例如,氮化硅和二氧化硅)来形成隔离物,其中一种可以相对于另一种材料选择性地去除。 使用第一导电类型的第二掺杂剂材料在与栅电极相邻的衬底中形成轻掺杂区域。 该轻掺杂区域例如可以在形成间隔物之前,在间隔物的两个部分的形成之间或在移除间隔物的至少一部分之后形成。 通过从隔离物的一部分去除而形成的晕圈形成。 卤素区域在衬底中比轻掺杂区域更深,并且与有源区域相邻。 卤素区域是使用不同于第一导电类型的导电类型的第三掺杂剂材料形成的。