专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5788747A Exhaust system for film forming apparatus 失效
标题翻译：成膜装置排气系统
公开(公告)号：US5788747A
公开(公告)日：1998-08-04
申请号：US788702
申请日：1997-01-24
申请人： Takashi Horiuchi , Sensho Kobayashi , Masahide Itoh , Hisashi Gomi
发明人： Takashi Horiuchi , Sensho Kobayashi , Masahide Itoh , Hisashi Gomi
IPC分类号： C23C16/44 , B01D50/00 , H01L21/205 , H01L21/285
CPC分类号： B01D50/00 , Y10S438/905 , Y10S438/909
摘要： An exhaust system for a film forming apparatus including an exhaust pipe passage connected to an exhaust port of the film forming apparatus for forming a film on a object by using vaporized gas of an organic metal compound. The film forming apparatus includes a pressure transfer unit provided for the exhaust pipe passage and arranged to transfer, through the exhaust pipe passage, gas in the film forming apparatus as exhaust gas. A cooling mechanism is provided for the pressure transfer unit and arranged to cool the pressure transfer unit to a temperature lower than a temperature, at which the organic metal compound is decomposed, so as to prevent precipitation of the organic metal compound contained in the exhaust gas introduced into the pressure transfer unit. A removing unit is disposed at an intermediate position of the exhaust pipe passage, downstream from the pressure transfer unit, so as to remove the organic metal compound contained in the exhaust gas which is introduced through the exhaust pipe passage.
摘要翻译：一种用于成膜设备的排气系统，包括连接到成膜设备的排气口的排气管通道，用于通过使用有机金属化合物的气化气体在物体上形成膜。成膜装置包括设置在排气管路上的压力传递单元，其设置成通过排气管道将成膜装置中的气体作为废气传递。为压力传递单元设置冷却机构，将压力传递单元冷却到低于有机金属化合物分解温度的温度，以防止废气中含有的有机金属化合物析出引入压力传送单元。除气单元设置在排气管通道的中间位置，位于压力传送单元的下游，以去除通过排气管通道引入的废气中包含的有机金属化合物。

2. 发明申请

US20070131168A1 Gas Supplying unit and substrate processing apparatus 审中-公开
标题翻译：气体供应单元和基板处理设备
公开(公告)号：US20070131168A1
公开(公告)日：2007-06-14
申请号：US11588423
申请日：2006-10-27
申请人： Hisashi Gomi , Tetsuya Saito , Takashi Kakegawa , Takahisa Mase , Makoto Koizumi , Kunihiro Tada , Satoshi Wakabayashi , Kensaku Narushima , Fang Cheng
发明人： Hisashi Gomi , Tetsuya Saito , Takashi Kakegawa , Takahisa Mase , Makoto Koizumi , Kunihiro Tada , Satoshi Wakabayashi , Kensaku Narushima , Fang Cheng
IPC分类号： C23C16/00
CPC分类号： C23C16/45565 , C23C16/4557 , C23C16/45572 , H01J37/3244 , H01J37/32449
摘要： The invention relates to a gas supplying unit to be arranged to hermetically fit in an opening formed at a ceiling part of a processing container for conducting a process to a substrate. The gas supplying unit includes a plurality of nickel members. A large number of gas-supplying holes is formed at a lower surface of the gas supplying unit, a process gas is adapted to be supplied from the large number of gas-supplying holes into the processing container, and the plurality of nickel members is fixed to each other via an intermediate member for preventing sticking made of a material different from nickel.
摘要翻译：本发明涉及一种气体供应单元，其被设置成气密地装配在形成在处理容器的顶部的开口中，用于对基板进行处理。气体供给单元包括多个镍构件。在气体供给单元的下表面形成有大量的供气孔，处理气体适于从多个供气孔供给到处理容器中，并且多个镍构件被固定通过用于防止由不同于镍的材料制成的粘着的中间构件。

3. 发明授权

US5730804A Process gas supply apparatus 失效
标题翻译：工艺气体供应装置
公开(公告)号：US5730804A
公开(公告)日：1998-03-24
申请号：US772570
申请日：1996-12-26
申请人： Hisashi Gomi , Masahide Itoh , Shimpei Jinnouchi , Towl Ikeda
发明人： Hisashi Gomi , Masahide Itoh , Shimpei Jinnouchi , Towl Ikeda
IPC分类号： B01J4/00 , C23C16/44 , C23C16/448 , C23C16/455 , C23C16/52 , F17C7/04 , H01L21/205 , H01L21/28 , H01L21/285 , H01L21/304 , C23C16/00
CPC分类号： C23C16/4408 , B01J4/00 , C23C16/4407 , C23C16/4481 , C23C16/52 , F17C7/04 , F17C2221/012 , F17C2221/016 , F17C2223/0153 , F17C2227/044 , F17C2250/032 , F17C2250/043 , F17C2250/0636 , F17C2270/0518 , Y02E60/321
摘要： A process gas supply apparatus according to the invention comprises a supply pipe line connecting a supply source containing an organic aluminum metallic compound in a liquid state, to a process device for forming a film on an object using the organic aluminum metallic compound, a force-feed device for force-feeding, through the supply pipe line, the organic aluminum metallic compound contained in the supply source, a vaporizing device provided across the supply pipe line for vaporizing the force-fed organic aluminum metallic compound of the liquid state, a purge gas introduction device connected to the supply pipe line for introducing a pressurized purge gas into the supply pipe line, a solvent introduction device connected to the supply pipe line for introducing into the supply pipe line a solvent for dissolving the organic aluminum metallic compound, an exhaustion device connected to the supply pipe line for exhausting the supply pipe line by a negative pressure, and a control device having a plurality of valves arranged across the supply pipe line, and controlling the flow of fluids flowing through the supply pipe line by opening and closing the valves.
摘要翻译：根据本发明的工艺气体供给装置包括：将含有液态的有机铝金属化合物的供给源与使用有机铝金属化合物在物体上形成膜的处理装置连接的供给管线，用于强制供给的供给装置，通过供给管线，包含在供给源中的有机铝金属化合物，设置在供给管路两侧的用于使强制供给的液态有机铝金属化合物蒸发的蒸发装置，吹扫气体引入装置，连接到供给管线，用于将加压的净化气体引入供给管线;溶剂引入装置，连接到供给管线，用于向供给管线引入用于溶解有机铝金属化合物的溶剂，连接到供给管线的装置，用于通过负压排出供给管线，以及控制装置 e具有跨过供给管线布置的多个阀，并且通过打开和关闭阀来控制流过供给管线的流体的流动。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式