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    • 4. 发明授权
    • Semiconductor light emitting device
    • 半导体发光器件
    • US07863623B2
    • 2011-01-04
    • US12066465
    • 2006-09-12
    • Yoshitaka KinoshitaHidenori Kamei
    • Yoshitaka KinoshitaHidenori Kamei
    • H01L31/0256
    • H01L33/12H01L33/32
    • A semiconductor light emitting device includes a substrate 11 including a group III-V nitride semiconductor; a first-conductivity-type layer 12 formed on the substrate 11, the first-conductivity-type layer including a plurality of group III-V nitride semiconductor layers of first conductivity type; an active layer 13 formed on the first semiconductor layer 12; and a second-conductivity-type layer 14 formed on the active layer 13, the second-conductivity-type layer including a group III-V nitride semiconductor layer of second conductivity type. The first-conductivity-type layer 12 includes an intermediate layer 23 made of Ga1-xInxN (0
    • 半导体发光器件包括:具有III-V族氮化物半导体的衬底11; 形成在基板11上的第一导电型层12,第一导电型层包括多个第一导电类型的III-V族氮化物半导体层; 形成在第一半导体层12上的有源层13; 以及形成在有源层13上的第二导电型层14,第二导电型层包括第二导电类型的III-V族氮化物半导体层。 第一导电型层12包括由Ga1-xInxN(0
    • 7. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING ELEMENT AND WAFER
    • 半导体发光元件和散热片
    • US20090101936A1
    • 2009-04-23
    • US12298664
    • 2007-04-27
    • Hidenori KameiSyuuichi Shinagawa
    • Hidenori KameiSyuuichi Shinagawa
    • H01L33/00
    • H01L33/16H01L33/0095
    • There are provided a semiconductor light emitting element which allows an improvement in light extraction efficiency without increasing the number of fabrication steps, and a wafer. In a semiconductor light emitting element 1 formed by laminating a compound semiconductor layer 3 on a single crystal substrate, and dividing the single crystal substrate into pieces, the side faces 21 to 24 of each of substrate pieces 2 as the divided single crystal substrate are formed such that the side face 21 used as the reference of the substrate piece 2 forms an angle of 15° with respect to the (1-100) plane, and that the side faces 21 to 24 are formed of planes different from cleaved planes of a crystalline structure in the single crystal substrate.
    • 提供了一种半导体发光元件,其允许提高光提取效率而不增加制造步骤的数量和晶片。 在通过在单晶衬底上层叠化合物半导体层3并将单晶衬底分割成块而形成的半导体发光元件1中,形成作为分割单晶衬底的每个衬底片2的侧面21至24 使得用作基板2的基准的侧面21相对于(1-100)面形成15°的角度,并且侧面21至24由与 晶体结构在单晶衬底中。
    • 8. 发明授权
    • Light-emitting device comprising a gallum-nitride-group compound-semiconductor
    • 包含镓氮化物基化合物半导体的发光器件
    • US07002184B2
    • 2006-02-21
    • US11022801
    • 2004-12-28
    • Yasunari OkuHidenori Kamei
    • Yasunari OkuHidenori Kamei
    • H01L33/00
    • H01L33/32B82Y20/00H01S5/34333
    • In the light-emitting gallium-nitride-group compound semiconductor devices using a substrate, the operating voltage is lowered and at the same time the occurrence of crack during crystal growth is suppressed, resulting in an improved manufacturing yield rate. The device includes a stacked structure of an n-type layer, a light-emitting layer and a p-type layer formed in the foregoing order on a substrate, and an n-side electrode formed on the surface of the n-type layer. The n-type layer is a laminate layer composed of, in the order from the substrate, first n-type layer and a second n-type layer having a carrier concentration higher than that of the first n-type layer. As the contact resistance between the n-type layer and the n-side electrode formed thereon is reduced, the operating voltage of a light-emitting device is lowered, and the power consumption decreased.
    • 在使用基板的发光氮化镓族化合物半导体器件中,工作电压降低,同时抑制了晶体生长期间的裂纹的发生,从而提高了制造成品率。 该装置包括在基板上以上述顺序形成的n型层,发光层和p型层的层叠结构,以及形成在n型层的表面上的n侧电极。 n型层是以从衬底的顺序构成第一n型层和具有比第一n型层的载流子浓度高的载流子浓度的第二n型层的层叠层。 随着形成在其上的n型层和n侧电极之间的接触电阻减小,发光器件的工作电压降低,功耗降低。
    • 10. 发明授权
    • Light-emitting device comprising a gallium-nitride-group compound-semiconductor
    • 包含氮化镓族化合物半导体的发光装置
    • US06497944B1
    • 2002-12-24
    • US09219428
    • 1998-12-23
    • Yasunari OkuHidenori Kamei
    • Yasunari OkuHidenori Kamei
    • H01L3300
    • H01L33/32B82Y20/00H01S5/34333Y10S428/917Y10T428/24942Y10T428/2495
    • In the light-emitting gallium-nitride-group compound semiconductor devices using an insulating substrate, the operating voltage is lowered and at the same time the occurrence of cracks during crystal growth is suppressed, resulting in an improved manufacturing yield rate. The device includes a stacked structure of an n-type layer, a light-emitting layer and a p-type layer formed in the foregoing order on an insulating substrate, and an n-side electrode formed on the surface of the n-type layer. The n-type layer is a laminate layer composed of, in the order from the substrate, a first n-type layer and a second n-type layer having a carrier concentration higher than that of the first n-type layer. As the contact resistance between the n-type layer and the n-side electrode formed thereon is reduced, the operating voltage of a light-emitting device is lowered, and the power consumption decreased.
    • 在使用绝缘性基板的发光氮化镓系化合物半导体装置中,工作电压降低,同时抑制了晶体生长期间的裂纹的发生,提高了制造成品率。 该装置包括在绝缘基板上以上述顺序形成的n型层,发光层和p型层的层叠结构,以及形成在n型层的表面上的n侧电极 。 n型层是以从衬底的顺序构成具有比第一n型层的载流子浓度高的载流子浓度的第一n型层和第二n型层的层叠层。 随着形成在其上的n型层和n侧电极之间的接触电阻减小,发光器件的工作电压降低,功耗降低。