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1. 发明授权

US08974606B2 Ex-situ cleaning assembly 有权
标题翻译：异地清洗组件
公开(公告)号：US08974606B2
公开(公告)日：2015-03-10
申请号：US13103965
申请日：2011-05-09
申请人： Gregory Lim , Aaron Francis , Kenneth Williams , Sandeep Mariserla
发明人： Gregory Lim , Aaron Francis , Kenneth Williams , Sandeep Mariserla
IPC分类号： B08B3/00 , H01L21/67 , B08B3/02 , H01L21/677 , H01L21/683 , B05B1/20
CPC分类号： H01L21/67028 , B05B1/20 , B08B3/02 , H01L21/67051 , H01L21/67057 , H01L21/67751 , H01L21/6838
摘要： A cleaning assembly is provided. The cleaning assembly includes a plate having a front surface and a back surface and a manifold affixed to an edge of the plate. The manifold has a plurality of outlets extending therefrom. The plate further includes a plurality of cups extending through the plate. The plurality of cups have an upper body with an outlet extending from the back surface and the plurality of cups have a sealing portion coupled to the upper body and extending from the front surface of the plate. Each outlet of the upper body is coupled to one of the corresponding plurality of outlets of the manifold. The plate also includes a plurality of alignment pins extending from the front surface of the plate. The plurality of alignment pins are configured to support an edge of a substrate, wherein one of the plurality of alignment pins is slidably mounted to the plate. A plurality of guide pins extends the same distance from the back surface.
摘要翻译：提供清洁组件。清洁组件包括具有前表面和后表面的板，以及固定到板的边缘的歧管。歧管具有从其延伸的多个出口。板还包括延伸穿过板的多个杯。多个杯具有具有从后表面延伸的出口的上体，并且多个杯具有联接到上身并且从板的前表面延伸的密封部。上身的每个出口连接到歧管的相应多个出口之一。该板还包括从板的前表面延伸的多个对准销。多个对准销被配置为支撑基板的边缘，其中多个对准销中的一个可滑动地安装到板上。多个导销从后表面延伸相同的距离。

2. 发明授权

US08627835B2 In-situ cleaning assembly 失效
标题翻译：原位清洗组件
公开(公告)号：US08627835B2
公开(公告)日：2014-01-14
申请号：US13086327
申请日：2011-04-13
申请人： Gregory Lim , Aaron Francis , Kenneth Williams
发明人： Gregory Lim , Aaron Francis , Kenneth Williams
IPC分类号： B08B3/00
CPC分类号： H01L21/67057 , H01L21/67051 , H01L21/6719
摘要： A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.
摘要翻译：提供清洁室。清洁室包括容纳卡盘的基座部分和固定到基部的盖子。支撑组件连接到盖，并且支撑组件包括与底板间隔开的顶板，顶板具有限定穿过其中的多个开口，并且底板具有穿过其中限定的多个开口。清洁室包括延伸穿过顶板和底板的多个开口的相应对的多个杯。多个杯被配置为密封衬底的表面，其中多个杯的每个杯独立地由底板支撑。

3. 发明申请

US20130157897A1 METHOD AND APPARATUS FOR MAGNETIC STIRRING 审中-公开
标题翻译：用于磁性搅拌的方法和装置
公开(公告)号：US20130157897A1
公开(公告)日：2013-06-20
申请号：US13327352
申请日：2011-12-15
申请人： Aaron Francis , Gregory Lim
发明人： Aaron Francis , Gregory Lim
IPC分类号： C40B40/00
CPC分类号： B01F13/0818 , B01F13/1022 , B01F15/00454 , B01F15/00733 , B01J19/0046 , B01J2219/00313 , B01J2219/00481
摘要： A system for combinatorially processing a substrate is provided. The system includes a reactor or chemical library having a plurality of chambers defined within the reactor or library, the chambers operable to mix fluids disposed therein. A drive system is disposed below a bottom surface of the reactor. The drive system is operable to rotate a plurality of support plates below the surface of the substrate. The plurality of support plates has a non-circular shape. The non-circular shape of adjacent support plates includes extensions configured to traverse overlapping regions of rotation during rotation of adjacent support plates. Each of the extensions has a magnet disposed thereon.
摘要翻译：提供了一种用于组合处理衬底的系统。该系统包括具有限定在反应器或库内的多个室的反应器或化学库，所述室可操作以混合设置在其中的流体。驱动系统设置在反应器底面的下方。驱动系统可操作以将多个支撑板旋转到基板的表面下方。多个支撑板具有非圆形形状。相邻支撑板的非圆形形状包括构造成在相邻的支撑板的旋转期间横过重叠的旋转区域的延伸部。每个延伸部具有设置在其上的磁体。

4. 发明申请

US20120285493A1 EX-SITU CLEANING ASSEMBLY 有权
标题翻译： EX-SITU清洁装置
公开(公告)号：US20120285493A1
公开(公告)日：2012-11-15
申请号：US13103965
申请日：2011-05-09
申请人： Gregory Lim , Aaron Francis , Kenneth Williams , Sandeep Mariserla
发明人： Gregory Lim , Aaron Francis , Kenneth Williams , Sandeep Mariserla
IPC分类号： B08B3/00
CPC分类号： H01L21/67028 , B05B1/20 , B08B3/02 , H01L21/67051 , H01L21/67057 , H01L21/67751 , H01L21/6838
摘要： A cleaning assembly is provided. The cleaning assembly includes a plate having a front surface and a back surface and a manifold affixed to an edge of the plate. The manifold has a plurality of outlets extending therefrom. The plate further includes a plurality of cups extending through the plate. The plurality of cups have an upper body with an outlet extending from the back surface and the plurality of cups have a sealing portion coupled to the upper body and extending from the front surface of the plate. Each outlet of the upper body is coupled to one of the corresponding plurality of outlets of the manifold. The plate also includes a plurality of alignment pins extending from the front surface of the plate. The plurality of alignment pins are configured to support an edge of a substrate, wherein one of the plurality of alignment pins is slidably mounted to the plate. A plurality of guide pins extends the same distance from the back surface.
摘要翻译：提供清洁组件。清洁组件包括具有前表面和后表面的板，以及固定到板的边缘的歧管。歧管具有从其延伸的多个出口。板还包括延伸穿过板的多个杯。多个杯具有具有从后表面延伸的出口的上体，并且多个杯具有联接到上主体并且从板的前表面延伸的密封部。上身的每个出口连接到歧管的相应多个出口之一。该板还包括从板的前表面延伸的多个对准销。多个对准销被配置为支撑基板的边缘，其中多个对准销中的一个可滑动地安装到板上。多个导销从后表面延伸相同的距离。

5. 发明授权

US08883607B2 Full wafer processing by multiple passes through a combinatorial reactor 有权
标题翻译：通过多次通过组合反应器的全晶片处理
公开(公告)号：US08883607B2
公开(公告)日：2014-11-11
申请号：US13337425
申请日：2011-12-27
申请人： Rajesh Kelekar , Aaron Francis , Gregory Lim
发明人： Rajesh Kelekar , Aaron Francis , Gregory Lim
IPC分类号： H01L21/76
CPC分类号： H01L21/76 , H01L21/02 , H01L21/306 , H01L21/67017
摘要： Overlapping combinatorial processing can offer more processed regions, better particle performance and simpler process equipment. In overlapping combinatorial processing, one or more regions are processed in series with some degrees of overlapping between regions. In some embodiments, overlapping combinatorial processing can be used in conjunction with non-overlapping combinatorial processing and non-combinatorial processing to develop and investigate materials and processes for device processing and manufacturing.
摘要翻译：重叠组合处理可以提供更多的处理区域，更好的粒子性能和更简单的工艺设备。在重叠组合处理中，一个或多个区域与区域之间的一些重叠程度串联处理。在一些实施例中，重叠的组合处理可以结合非重叠的组合处理和非组合处理来使用，以开发和研究用于设备处理和制造的材料和过程。

6. 发明申请

US20130164906A1 FULL WAFER PROCESSING BY MULTIPLE PASSES THROUGH A COMBINATORIAL REACTOR 有权
标题翻译：通过多个通过组合反应器进行全面加工
公开(公告)号：US20130164906A1
公开(公告)日：2013-06-27
申请号：US13337425
申请日：2011-12-27
申请人： Rajesh Kelekar , Aaron Francis , Gregory Lim
发明人： Rajesh Kelekar , Aaron Francis , Gregory Lim
IPC分类号： H01L21/76
CPC分类号： H01L21/76 , H01L21/02 , H01L21/306 , H01L21/67017
摘要： Overlapping combinatorial processing can offer more processed regions, better particle performance and simpler process equipment. In overlapping combinatorial processing, one or more regions are processed in series with some degrees of overlapping between regions. In some embodiments, overlapping combinatorial processing can be used in conjunction with non-overlapping combinatorial processing and non-combinatorial processing to develop and investigate materials and processes for device processing and manufacturing.
摘要翻译：重叠组合处理可以提供更多的处理区域，更好的粒子性能和更简单的工艺设备。在重叠组合处理中，一个或多个区域与区域之间的一些重叠程度串联处理。在一些实施例中，重叠的组合处理可以结合非重叠的组合处理和非组合处理来使用，以开发和研究用于设备处理和制造的材料和过程。

7. 发明申请

US20120260953A1 IN-SITU CLEANING ASSEMBLY 失效
标题翻译：现场清洁装置
公开(公告)号：US20120260953A1
公开(公告)日：2012-10-18
申请号：US13086327
申请日：2011-04-13
申请人： Gregory Lim , Aaron Francis , Kenneth Williams
发明人： Gregory Lim , Aaron Francis , Kenneth Williams
IPC分类号： B08B3/00
CPC分类号： H01L21/67057 , H01L21/67051 , H01L21/6719
摘要： A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.
摘要翻译：提供清洁室。清洁室包括容纳卡盘的基座部分和固定到基部的盖子。支撑组件连接到盖，并且支撑组件包括与底板间隔开的顶板，顶板具有限定穿过其中的多个开口，并且底板具有穿过其中限定的多个开口。清洁室包括延伸穿过顶板和底板的多个开口的相应对的多个杯。多个杯被配置为密封衬底的表面，其中多个杯的每个杯独立地由底板支撑。

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