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    • 4. 发明申请
    • EX-SITU CLEANING ASSEMBLY
    • EX-SITU清洁装置
    • US20120285493A1
    • 2012-11-15
    • US13103965
    • 2011-05-09
    • Gregory LimAaron FrancisKenneth WilliamsSandeep Mariserla
    • Gregory LimAaron FrancisKenneth WilliamsSandeep Mariserla
    • B08B3/00
    • H01L21/67028B05B1/20B08B3/02H01L21/67051H01L21/67057H01L21/67751H01L21/6838
    • A cleaning assembly is provided. The cleaning assembly includes a plate having a front surface and a back surface and a manifold affixed to an edge of the plate. The manifold has a plurality of outlets extending therefrom. The plate further includes a plurality of cups extending through the plate. The plurality of cups have an upper body with an outlet extending from the back surface and the plurality of cups have a sealing portion coupled to the upper body and extending from the front surface of the plate. Each outlet of the upper body is coupled to one of the corresponding plurality of outlets of the manifold. The plate also includes a plurality of alignment pins extending from the front surface of the plate. The plurality of alignment pins are configured to support an edge of a substrate, wherein one of the plurality of alignment pins is slidably mounted to the plate. A plurality of guide pins extends the same distance from the back surface.
    • 提供清洁组件。 清洁组件包括具有前表面和后表面的板,以及固定到板的边缘的歧管。 歧管具有从其延伸的多个出口。 板还包括延伸穿过板的多个杯。 多个杯具有具有从后表面延伸的出口的上体,并且多个杯具有联接到上主体并且从板的前表面延伸的密封部。 上身的每个出口连接到歧管的相应多个出口之一。 该板还包括从板的前表面延伸的多个对准销。 多个对准销被配置为支撑基板的边缘,其中多个对准销中的一个可滑动地安装到板上。 多个导销从后表面延伸相同的距离。
    • 5. 发明授权
    • Ex-situ cleaning assembly
    • 异地清洗组件
    • US08974606B2
    • 2015-03-10
    • US13103965
    • 2011-05-09
    • Gregory LimAaron FrancisKenneth WilliamsSandeep Mariserla
    • Gregory LimAaron FrancisKenneth WilliamsSandeep Mariserla
    • B08B3/00H01L21/67B08B3/02H01L21/677H01L21/683B05B1/20
    • H01L21/67028B05B1/20B08B3/02H01L21/67051H01L21/67057H01L21/67751H01L21/6838
    • A cleaning assembly is provided. The cleaning assembly includes a plate having a front surface and a back surface and a manifold affixed to an edge of the plate. The manifold has a plurality of outlets extending therefrom. The plate further includes a plurality of cups extending through the plate. The plurality of cups have an upper body with an outlet extending from the back surface and the plurality of cups have a sealing portion coupled to the upper body and extending from the front surface of the plate. Each outlet of the upper body is coupled to one of the corresponding plurality of outlets of the manifold. The plate also includes a plurality of alignment pins extending from the front surface of the plate. The plurality of alignment pins are configured to support an edge of a substrate, wherein one of the plurality of alignment pins is slidably mounted to the plate. A plurality of guide pins extends the same distance from the back surface.
    • 提供清洁组件。 清洁组件包括具有前表面和后表面的板,以及固定到板的边缘的歧管。 歧管具有从其延伸的多个出口。 板还包括延伸穿过板的多个杯。 多个杯具有具有从后表面延伸的出口的上体,并且多个杯具有联接到上身并且从板的前表面延伸的密封部。 上身的每个出口连接到歧管的相应多个出口之一。 该板还包括从板的前表面延伸的多个对准销。 多个对准销被配置为支撑基板的边缘,其中多个对准销中的一个可滑动地安装到板上。 多个导销从后表面延伸相同的距离。
    • 6. 发明授权
    • In-situ cleaning assembly
    • 原位清洗组件
    • US08627835B2
    • 2014-01-14
    • US13086327
    • 2011-04-13
    • Gregory LimAaron FrancisKenneth Williams
    • Gregory LimAaron FrancisKenneth Williams
    • B08B3/00
    • H01L21/67057H01L21/67051H01L21/6719
    • A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.
    • 提供清洁室。 清洁室包括容纳卡盘的基座部分和固定到基部的盖子。 支撑组件连接到盖,并且支撑组件包括与底板间隔开的顶板,顶板具有限定穿过其中的多个开口,并且底板具有穿过其中限定的多个开口。 清洁室包括延伸穿过顶板和底板的多个开口的相应对的多个杯。 多个杯被配置为密封衬底的表面,其中多个杯的每个杯独立地由底板支撑。
    • 7. 发明申请
    • IN-SITU CLEANING ASSEMBLY
    • 现场清洁装置
    • US20120260953A1
    • 2012-10-18
    • US13086327
    • 2011-04-13
    • Gregory LimAaron FrancisKenneth Williams
    • Gregory LimAaron FrancisKenneth Williams
    • B08B3/00
    • H01L21/67057H01L21/67051H01L21/6719
    • A cleaning chamber is provided. The cleaning chamber includes a base portion housing a chuck and a lid affixed to the base portion. A support assembly is linked to the lid and the support assembly includes a top plate spaced apart from a bottom plate, the top plate has a plurality of openings defined therethrough and the bottom plate has a plurality of openings defined therethrough. The cleaning chamber includes a plurality of cups extending through corresponding pairs of the plurality of openings of the top plate and the bottom plate. The plurality of cups is configured to seal against a surface of a substrate, wherein each cup of the plurality of cups is independently supported by the bottom plate.
    • 提供清洁室。 清洁室包括容纳卡盘的基座部分和固定到基部的盖子。 支撑组件连接到盖,并且支撑组件包括与底板间隔开的顶板,顶板具有限定穿过其中的多个开口,并且底板具有穿过其中限定的多个开口。 清洁室包括延伸穿过顶板和底板的多个开口的相应对的多个杯。 多个杯被配置为密封衬底的表面,其中多个杯的每个杯独立地由底板支撑。
    • 9. 发明申请
    • No-Contact Wet Processing Tool with Fluid Barrier
    • 无接触湿式加工工具,具有流体屏障
    • US20130025688A1
    • 2013-01-31
    • US13192677
    • 2011-07-28
    • Glen EgamiAaron Francis
    • Glen EgamiAaron Francis
    • B01D47/00
    • H01L21/67051H01L21/6838H01L21/68785Y10T137/0318Y10T137/86035
    • Embodiments of the present invention describe substrate processing tools and methods. The substrate processing tool includes a housing defining a chamber and a substrate support coupled to the housing and configured to support a substrate within the chamber. The substrate has an upper surface with a first portion and a second portion surrounding the first portion. An isolation unit including a body is coupled to the housing and positioned within the chamber above and spaced apart from the first portion of the upper surface of the substrate. The body includes at least one outlet on a lower surface thereof, which is in fluid communication with at least one fluid pump. The at least one fluid pump is configured to drive fluid through the at least one of outlet to form a barrier around the first portion of the upper surface of the substrate.
    • 本发明的实施例描述了基板处理工具和方法。 衬底处理工具包括限定室的壳体和联接到壳体并被配置为支撑腔室内的衬底的衬底支撑件。 衬底具有上表面,其具有第一部分和围绕第一部分的第二部分。 包括主体的隔离单元联接到壳体并且定位在腔室的上方并与衬底的上表面的第一部分间隔开的腔室内。 主体在其下表面上包括至少一个与至少一个流体泵流体连通的出口。 至少一个流体泵构造成驱动流体通过出口中的至少一个,以在基底的上表面的第一部分周围形成屏障。
    • 10. 发明申请
    • SYSTEMS AND METHODS FOR SEALING IN SITE-ISOLATED REACTORS
    • 用于在现场隔离反应器中密封的系统和方法
    • US20110179999A1
    • 2011-07-28
    • US13080441
    • 2011-04-05
    • Kurt H. WeinerAaron Francis
    • Kurt H. WeinerAaron Francis
    • C23C16/00
    • H01L21/67126
    • Substrate processing systems and methods are described for site-isolated processing of substrates. The processing systems include numerous site-isolated reactors (SIRs). The processing systems include a reactor block having a cell array that includes numerous SIRs. A sleeve is coupled to an interior of each of the SIRs. The sleeve includes a compliance device configured to dynamically control a vertical position of the sleeve in the SIR. A sealing system is configured to provide a seal between a region of a substrate and the interior of each of the SIRs. The processing system can include numerous modules that comprise one or more site-isolated reactors (SIRs) configured for one or more of molecular self-assembly and combinatorial processing of substrates.
    • 基板处理系统和方法被描述用于基板的场隔离处理。 处理系统包括许多场地隔离反应器(SIR)。 处理系统包括具有包括大量SIR的单元阵列的反应器块。 套筒连接到每个SIR的内部。 套筒包括配置成在SIR中动态地控制套筒的垂直位置的顺应装置。 密封系统被配置为在衬底的区域和每个SIR的内部之间提供密封。 处理系统可以包括多个模块,其包括被配置用于衬底的分子自组装和组合处理中的一个或多个的一个或多个位置隔离反应器(SIR)。