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1. 发明申请

US20100208272A1 METHOD AND APPARATUS FOR MEASURING SHAPE OR THICKNESS INFORMATION OF A SUBSTRATE 有权
标题翻译：用于测量基板的形状或厚度信息的方法和装置
公开(公告)号：US20100208272A1
公开(公告)日：2010-08-19
申请号：US12388487
申请日：2009-02-18
申请人： Shouhong Tang , George Kren , Dieter Mueller , Brian Haas , Daniel Kavaldjiev
发明人： Shouhong Tang , George Kren , Dieter Mueller , Brian Haas , Daniel Kavaldjiev
IPC分类号： G01B11/02
CPC分类号： G01B9/02021 , G01B9/02027 , G01B9/02057 , G01B9/02072 , G01B9/0209 , G01B11/306
摘要： An interferometer system and method may be used to measure substrate thickness or shape. The system may include two spaced apart reference flats having that form an optical cavity between two parallel reference surfaces. A substrate holder may be configured to place the substrate in the cavity with first and second substrate surfaces substantially parallel with corresponding first and second reference surfaces such that a space between the first or second substrate surface is three millimeters or less from a corresponding one of the reference surfaces or a damping surface. Interferometer devices may be located on diametrically opposite sides of the cavity and optically coupled thereto. The interferometers can map variations in spacing between the substrate surfaces and the reference surfaces, respectively, through interference of light optically coupled to and from to the cavity via the interferometer devices.
摘要翻译：干涉仪系统和方法可用于测量衬底厚度或形状。该系统可以包括两个间隔开的参考平面，其具有在两个平行参考表面之间形成光腔。衬底保持器可以被配置为将衬底放置在空腔中，其中第一和第二衬底表面基本上平行于相应的第一和第二参考表面，使得第一或第二衬底表面之间的空间距离相应的一个参考表面或阻尼表面。干涉仪装置可以位于空腔的径向相对的两侧并与之光耦合。干涉仪可以分别通过经由干涉仪装置光耦合到腔体的光的干涉来映射衬底表面和参考表面之间的间隔的变化。

2. 发明申请

US20070103676A1 Process and Assembly for Non-Destructive Surface Inspections 有权
标题翻译：非破坏性表面检查的过程和装配
公开(公告)号：US20070103676A1
公开(公告)日：2007-05-10
申请号：US11464766
申请日：2006-08-15
申请人： Norbert Marxer , Kenneth Gross , Hubert Altendorfer , George Kren
发明人： Norbert Marxer , Kenneth Gross , Hubert Altendorfer , George Kren
IPC分类号： G01N21/88
CPC分类号： G01N21/9501
摘要： A light beam is directed towards a surface along a direction normal to the surface. The surface is caused to move so that the beam scans the surface along a spiral path. An ellipsoidal mirror is placed with its axis along the surface normal to collect light scattered by the surface and any anomalies at the surface at collection angles away from the surface normal. In some applications, a lens arrangement with its axis along the surface normal is also used to collect the light scattered by the surface and any anomalies. The light scattered by the mirror and lenses may be directed to the same or different detectors. Preferably light scattered by the surface within a first range of collection angles from the axis is detected by a first detector and light scattered by the surface within a second range of collection angles from the axis is detected by a second detector. The two ranges of collection angles are different, with one detector optimized to detect scattering from large particles and defects and the other detector optimized to detect light from small particles and defects.
摘要翻译：光束沿着垂直于表面的方向指向表面。使表面移动，使得光束沿着螺旋路径扫描表面。椭圆镜被放置成其轴线沿着表面法线收集由表面散射的光和表面上的任何异常，其收集角度远离表面法线。在一些应用中，其沿着表面法线的轴的透镜装置也用于收集由表面散射的光和任何异常。由镜子和透镜散射的光可以被引导到相同或不同的检测器。优选地，通过第一检测器检测由表面在从轴的收集角度的第一范围内的表面散射的光，并且由第二检测器检测在距离轴的第二收集角度范围内由表面散射的光。收集角度的两个范围是不同的，一个检测器被优化以检测来自大颗粒和缺陷的散射，并且另一个检测器被优化以检测来自小颗粒和缺陷的光。

3. 发明授权

US06686996B2 Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool 有权
标题翻译：用于双面计量检查工具的扫描，缝合和阻尼测量的方法和装置
公开(公告)号：US06686996B2
公开(公告)日：2004-02-03
申请号：US10165344
申请日：2002-06-07
申请人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
发明人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
IPC分类号： G01N2184
CPC分类号： G01N21/9501 , G01R31/2656 , G01R31/2831
摘要： A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.
摘要翻译：提供了用于检查诸如半导体晶片的样本的系统。该系统使用阻挡装置提供对双面试样的扫描，该阻尼装置滤除不想要的声波和地震振动，包括扫描试样的第一部分的光学装置和用于将试样平移或旋转的平移或旋转装置，光学装置可以扫描样品的剩余部分。该系统还包括用于将扫描拼接在一起的装置，从而提供试样的阻尼和对较小和较便宜的光学元件的需要。

4. 发明授权

US06414752B1 Method and apparatus for scanning, stitching, and damping measurements of a double-sided metrology inspection tool 有权
标题翻译：用于双面计量检查工具的扫描，缝合和阻尼测量的方法和装置
公开(公告)号：US06414752B1
公开(公告)日：2002-07-02
申请号：US09335673
申请日：1999-06-18
申请人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
发明人： Paul J. Sullivan , George Kren , Rodney C. Smedt , Hans J. Hansen , David W. Shortt , Daniel Ivanov Kavaldjiev , Christopher F. Bevis
IPC分类号： G01N2188
CPC分类号： G01N21/9501 , G01R31/2656 , G01R31/2831
摘要： A system for inspecting specimens such as semiconductor wafers is provided. The system provides scanning of dual-sided specimens using a damping arrangement which filters unwanted acoustic and seismic vibration, including an optics arrangement which scans a first portion of the specimen and a translation or rotation arrangement for translating or rotating the specimen to a position where the optics arrangement can scan the remaining portion(s) of the specimen. The system further includes means for stitching the scans together, thereby providing both damping of the specimen and the need for smaller and less expensive optical elements.
摘要翻译：提供了用于检查诸如半导体晶片的样本的系统。该系统使用阻挡装置提供对双面试样的扫描，该阻尼装置滤除不想要的声波和地震振动，包括扫描样品的第一部分的光学装置和用于将样品平移或旋转的平移或旋转装置，光学装置可以扫描样品的剩余部分。该系统还包括用于将扫描拼接在一起的装置，从而提供试样的阻尼和对较小和较便宜的光学元件的需要。

5. 发明授权

US06271916B1 Process and assembly for non-destructive surface inspections 失效
标题翻译：非破坏性表面检查的工艺和组装
公开(公告)号：US06271916B1
公开(公告)日：2001-08-07
申请号：US08770491
申请日：1996-12-20
申请人： Norbert Marxer , Kenneth P. Gross , Hubert Altendorfer , George Kren
发明人： Norbert Marxer , Kenneth P. Gross , Hubert Altendorfer , George Kren
IPC分类号： G01N2188
CPC分类号： G01N21/9501
摘要： A light beam is directed towards a surface along a direction normal to the surface. The surface is caused to move so that the beam scans the surface along a spiral path. An ellipsoidal mirror is placed with its axis along the surface normal to collect light scattered by the surface and any anomalies at the surface at collection angles away from the surface normal. In some applications, a lens arrangement with its axis along the surface normal is also used to collect the light scattered by the surface and any anomalies. The light scattered by the mirror and lenses may be directed to the same or different detectors. Preferably light scattered by the surface within a first range of collection angles from the axis is detected by a first detector and light scattered by the surface within a second range of collection angles from the axis is detected by a second detector. The two ranges of collection angles are different, with one detector optimized to detect scattering from large particles and defects and the other detector optimized to detect light from small particles and defects.
摘要翻译：光束沿着垂直于表面的方向指向表面。使表面移动，使得光束沿着螺旋路径扫描表面。椭圆镜被放置成其轴线沿着表面法线收集由表面散射的光以及在距表面法线的收集角度处的表面上的任何异常。在一些应用中，其沿着表面法线的轴的透镜装置也用于收集由表面散射的光和任何异常。由镜子和透镜散射的光可以被引导到相同或不同的检测器。优选地，通过第一检测器检测由表面在从轴的收集角度的第一范围内的表面散射的光，并且由第二检测器检测在距离轴的第二收集角度范围内由表面散射的光。收集角度的两个范围是不同的，一个检测器被优化以检测来自大颗粒和缺陷的散射，并且另一个检测器被优化以检测来自小颗粒和缺陷的光。

6. 发明授权

US08432944B2 Extending the lifetime of a deep UV laser in a wafer inspection tool 有权
标题翻译：将深紫外线激光器的寿命延长到晶圆检查工具中
公开(公告)号：US08432944B2
公开(公告)日：2013-04-30
申请号：US13153942
申请日：2011-06-06
申请人： Anatoly Romanovsky , George Kren , Bret Whiteside
发明人： Anatoly Romanovsky , George Kren , Bret Whiteside
IPC分类号： H01S3/13
CPC分类号： G02B27/0068 , G01J1/4257 , G01N21/9501 , G02B5/04
摘要： Disclosed herein is a method and apparatus for automatic correction of beam waist position drift in real time, using wafer inspection data taken during normal tool operation. Also disclosed herein is an improved laser astigmatism corrector for use either internal or external to the laser.
摘要翻译：这里公开了一种使用在正常工具操作期间所采用的晶片检查数据来实时自动校正光束腰部位置漂移的方法和装置。本文还公开了一种用于激光器内部或外部的改进的激光像散校正器。

7. 发明授权

US07505144B2 Copper CMP flatness monitor using grazing incidence interferometry 失效
标题翻译：铜CMP平坦度监视器使用掠入射干涉测量
公开(公告)号：US07505144B2
公开(公告)日：2009-03-17
申请号：US10968711
申请日：2004-10-18
申请人： Dieter Mueller , George Kren , Cedric Affentauschegg
发明人： Dieter Mueller , George Kren , Cedric Affentauschegg
IPC分类号： G01B9/02
CPC分类号： G01B11/306 , G01N21/9501
摘要： A system and method for in-line inspection of specimens such as semiconductor wafers is provided. The system provides scanning of sections of specimens having predetermined standardized characteristics using a diffraction grating that widens and passes nth order (n>0) wave fronts to the specimen surface and a reflective surface for the transmitted light beam. Light energy is transmitted in a narrow swath across the portion of the surface having the standardized features. The wavefronts are combined using a second diffraction grating and passed to a camera system having a desired aspect ratio.
摘要翻译：提供了一种用于在线检查诸如半导体晶片的样品的系统和方法。该系统使用将第n阶（n> 0）波阵面加宽并通过到试样表面的衍射光栅和用于透射光束的反射表面，来提供具有预定标准化特征的试样部分的扫描。光能在狭窄的条中穿过具有标准化特征的部分表面。使用第二衍射光栅将波前组合并传递到具有所需纵横比的相机系统。

8. 发明授权

US07417724B1 Wafer inspection systems and methods for analyzing inspection data 有权
标题翻译：晶圆检查系统和检验数据分析方法
公开(公告)号：US07417724B1
公开(公告)日：2008-08-26
申请号：US11746884
申请日：2007-05-10
申请人： Paul Sullivan , George Kren , Eliezer Rosengaus , Patrick Huet , Robinson Piramuthu , Martin Plihal , Yan Xiong
发明人： Paul Sullivan , George Kren , Eliezer Rosengaus , Patrick Huet , Robinson Piramuthu , Martin Plihal , Yan Xiong
IPC分类号： G01N21/88 , G06K9/00
CPC分类号： G01N21/9501 , G01N21/9503 , H01L21/67005 , H01L21/67288
摘要： Wafer inspection systems and methods are provided. One inspection system includes a module measurement cell coupled to a host inspection system by a wafer handler. The module measurement cell is configured to inspect a wafer using one or more modes prior to inspection of the wafer by the host inspection system. The one or more modes include backside inspection, edge inspection, frontside macro defect inspection, or a combination thereof. Another inspection system includes two or more low resolution electronic sensors arranged at multiple viewing angles. The sensors are configured to detect light returned from a wafer substantially simultaneously. A method for analyzing inspection data includes selecting a template corresponding to a support device that contacts a backside of a wafer prior to inspection of the backside of the wafer. The method also includes subtracting data representing the template from inspection data generated by inspection of the backside of the wafer.
摘要翻译：提供晶圆检查系统和方法。一个检查系统包括通过晶片处理器耦合到主机检查系统的模块测量单元。模块测量单元被配置为在主机检查系统检查晶片之前使用一种或多种模式来检查晶片。一种或多种模式包括后侧检查，边缘检查，前侧宏观缺陷检查或其组合。另一种检查系统包括以多个视角布置的两个或多个低分辨率电子传感器。传感器被配置为基本上同时检测从晶片返回的光。用于分析检查数据的方法包括在检查晶片的背面之前选择与支撑装置相对应的模板，所述支撑装置接触晶片的背面。该方法还包括从通过检查晶片的背面产生的检查数据中减去表示模板的数据。

9. 发明授权

US07227628B1 Wafer inspection systems and methods for analyzing inspection data 有权
标题翻译：晶圆检查系统和检验数据分析方法
公开(公告)号：US07227628B1
公开(公告)日：2007-06-05
申请号：US10964585
申请日：2004-10-12
申请人： Paul Sullivan , George Kren , Eliezer Rosengaus , Patrick Huet , Robinson Piramuthu , Martin Plihal , Yan Xiong
发明人： Paul Sullivan , George Kren , Eliezer Rosengaus , Patrick Huet , Robinson Piramuthu , Martin Plihal , Yan Xiong
IPC分类号： G01N21/88 , G06K9/00
CPC分类号： G01N21/9501 , G01N21/9503 , H01L21/67005 , H01L21/67288
摘要： Wafer inspection systems and methods are provided. One inspection system includes a module measurement cell coupled to a host inspection system by a wafer handler. The module measurement cell is configured to inspect a wafer using one or more modes prior to inspection of the wafer by the host inspection system. The one or more modes include backside inspection, edge inspection, frontside macro defect inspection, or a combination thereof. Another inspection system includes two or more low resolution electronic sensors arranged at multiple viewing angles. The sensors are configured to detect light returned from a wafer substantially simultaneously. A method for analyzing inspection data includes selecting a template corresponding to a support device that contacts a backside of a wafer prior to inspection of the backside of the wafer. The method also includes subtracting data representing the template from inspection data generated by inspection of the backside of the wafer.
摘要翻译：提供晶圆检查系统和方法。一个检查系统包括通过晶片处理器耦合到主机检查系统的模块测量单元。模块测量单元被配置为在主机检查系统检查晶片之前使用一种或多种模式来检查晶片。一种或多种模式包括后侧检查，边缘检查，前侧宏观缺陷检查或其组合。另一种检查系统包括以多个视角布置的两个或多个低分辨率电子传感器。传感器被配置为基本上同时检测从晶片返回的光。用于分析检查数据的方法包括在检查晶片的背面之前选择与支撑装置相对应的模板，所述支撑装置接触晶片的背面。该方法还包括从通过检查晶片的背面产生的检查数据中减去表示模板的数据。

10. 发明授权

US5083035A Position location in surface scanning using interval timing between scan marks on test wafers 失效
标题翻译：使用测试晶片上的扫描标记之间的间隔时间来定位表面扫描
公开(公告)号：US5083035A
公开(公告)日：1992-01-21
申请号：US553861
申请日：1990-07-17
申请人： Jiri Pecen , Kenneth P. Gross , Brian Leslie , George Kren
发明人： Jiri Pecen , Kenneth P. Gross , Brian Leslie , George Kren
IPC分类号： G01N21/88 , G01N21/93 , G01N21/94 , G01N21/956 , G02B17/06 , G02B26/10 , G02B27/00 , G03F7/20 , H01L21/268
CPC分类号： G03F7/70483 , G01N21/94 , G02B17/06 , G01N2021/4719 , G01N21/93 , G01N21/95607
摘要： A particle imager and method for imaging particles on surfaces of substrates. A surface is raster scanned by a collimated light beam and particles on the surface are detected by the scattered light caused by the particles. During a scan path the intensity of the scattered light is measured forming intensity traces and location addresses for the detected particles. Data from each scan path is stored in memory. The imager is pre-calibrated with a test wafer having light scattering marker points spaced at known positions thereon. Scanning the test wafer, a clock measures time elapsed from a start position to each marker point. The corresponding elapsed times and known address locations are stored in memory for reference during data collection.
摘要翻译：用于在基底表面上成像颗粒的粒子成像器和方法。通过准直光束对表面进行光栅扫描，并且通过由颗粒引起的散射光来检测表面上的颗粒。在扫描路径期间，测量散射光的强度，形成检测到的颗粒的强度迹线和位置地址。来自每个扫描路径的数据存储在存储器中。使用具有在其上已知位置间隔开的光散射标记点的测试晶片对成像器进行预校准。扫描测试晶片，时钟测量从开始位置到每个标记点的时间。相应的经过时间和已知的地址位置存储在存储器中，以供数据采集期间参考。

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