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1. 发明授权

US06306224B1 Process and device for treatment of sheet objects in a liquid bath 有权
标题翻译：在液体浴中处理片材物体的方法和装置
公开(公告)号：US06306224B1
公开(公告)日：2001-10-23
申请号：US09348303
申请日：1999-07-07
申请人： Gernot Wandel , Fritz Heyer , Berthold Schum
发明人： Gernot Wandel , Fritz Heyer , Berthold Schum
IPC分类号： B08B102
CPC分类号： H05K3/0085 , B65G49/0413
摘要： A process and device for treating sheet objects, especially fragile sheet objects, by rotation through a liquid bath. The objects are disposed in radial slots in a rotating disk, retained therein by a flexible element moving synchronously with the disk, and by a retaining element mounted adjacent the disk and spaced therefrom along its axis of rotation.
摘要翻译：用于通过旋转穿过液槽来处理片材物体，特别是脆弱的片材物体的方法和装置。物体被设置在旋转盘中的径向狭槽中，通过与盘同步移动的柔性元件和通过与盘相邻安装的保持元件沿其旋转轴线间隔开而保持在其中。

2. 发明申请

US20110023942A1 PHOTOVOLTAIC MODULE HAVING IMPROVED CORROSION RESISTANCE AND METHOD OF PRODUCING SAME 审中-公开
标题翻译：具有改善的耐腐蚀性的光伏组件及其生产方法
公开(公告)号：US20110023942A1
公开(公告)日：2011-02-03
申请号：US12844882
申请日：2010-07-28
申请人： Thorsten Soegding , Ulf Dahlmann , Ralf Eiden , Kurt Nattermann , Ingo Schwirtlich , Uwe Fliedner , Fritz Heyer , Ralf Gueldner
发明人： Thorsten Soegding , Ulf Dahlmann , Ralf Eiden , Kurt Nattermann , Ingo Schwirtlich , Uwe Fliedner , Fritz Heyer , Ralf Gueldner
IPC分类号： H01L31/048
CPC分类号： H01L31/0481 , Y02E10/50
摘要： The improved photovoltaic module contains a solar cell made of metallic silicon, which is embedded in at least one embedding material, and a corrosion inhibitor. Preferably the corrosion inhibitor is an organic compound, which has at least one nitrogen atom. As a result, the photovoltaic module according to the present invention has an extended service life, since it withstands corrosive influences.
摘要翻译：改进的光伏组件包含嵌入在至少一种嵌入材料中的金属硅太阳能电池和腐蚀抑制剂。优选地，腐蚀抑制剂是具有至少一个氮原子的有机化合物。结果，根据本发明的光伏模块具有延长的使用寿命，因为它可以承受腐蚀性影响。

3. 发明授权

US06291799B1 Process and arrangement for heat treatment of two-dimensional objects 失效
标题翻译：二维物体热处理工艺及布置
公开(公告)号：US06291799B1
公开(公告)日：2001-09-18
申请号：US09493123
申请日：2000-01-28
申请人： Fritz Heyer , Peter Roth
发明人： Fritz Heyer , Peter Roth
IPC分类号： F27B906
CPC分类号： H01L21/67115 , H01L31/1804 , H01L31/1876 , Y02E10/547 , Y02P70/521
摘要： The invention relates to a process for heat treatment of two-dimensional objects such as semiconductor wafers, for example in the form of silicon wafers, where the objects are arranged on supports and are conveyed through a heating unit, in particular continuously. To achieve a targeted treatment of a two-dimensional object, in particular of a semiconductor component such as a silicon wafer, on one side only, while at the same time achieving a high throughput with incorporation as necessary into a continuous overall manufacturing process, it is proposed that the objects be arranged in full surface contact with the supports, which cover the objects completely or almost completely on their underside and which in turn comprise quartz glass in particular.
摘要翻译：本发明涉及一种用于热处理二维物体的方法，例如半导体晶片，例如以硅晶片的形式，其中物体被布置在支撑件上，并且特别是连续地被输送通过加热单元。为了仅在一侧实现二维物体，特别是半导体元件如硅晶片的目标处理，同时在连续的整个制造过程中根据需要实现高吞吐量，同时并入其中建议物体与支撑体完全表面接触地布置，其在其下侧完全或几乎完全覆盖物体，并且特别地还包括石英玻璃。

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