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    • 8. 发明授权
    • Integrated inductor and method for manufacturing an integrated inductor
    • 用于制造集成电感器的集成电感器和方法
    • US08072042B1
    • 2011-12-06
    • US12949849
    • 2010-11-19
    • Friedrich Kroener
    • Friedrich Kroener
    • H01L27/08H01L21/20
    • H01L28/10H01F41/046H01F2017/0066H01L27/08
    • A method for integrating an inductor into a semiconductor substrate is provided. The method includes providing a semiconductor substrate having a first surface and a second surface and forming at least a first trench and at least two openings in the semiconductor substrate. The first trench and the openings extend from the first surface into the semiconductor substrate, and the first trench has a ring-like shape. A portion of the first trench is arranged between the two openings. The method further includes depositing a magnetically soft material into the first trench to form a ring-like closed magnetisable core structure, depositing a conductive material into the openings to form vias, and forming an electrical cross-connection between the vias.
    • 提供了一种将电感器集成到半导体衬底中的方法。 该方法包括提供具有第一表面和第二表面的半导体衬底,并且在半导体衬底中形成至少第一沟槽和至少两个开口。 第一沟槽和开口从第一表面延伸到半导体衬底中,并且第一沟槽具有环形形状。 第一沟槽的一部分布置在两个开口之间。 所述方法还包括将磁性软材料沉积到所述第一沟槽中以形成环状封闭可磁化芯结构,将导电材料沉积到所述开口中以形成通孔,以及在所述通孔之间形成电交叉连接。