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    • 1. 发明授权
    • Interstage wafer block accumulation
    • 阶段晶片块积累
    • US5201403A
    • 1993-04-13
    • US830800
    • 1992-02-06
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • A21C15/02
    • A21C15/02
    • An interstage wafer block accumulator for a plant for the production and further processing of wafer blocks. In an interstage wafer block accumulator comprising at least one conveyor and a plurality of accumulator units, each of which accommodates one or more wafer blocks and is disposed between a feed station and a delivery station, it is proposed that said accumulator units for the wafer blocks accommodated in each accumulator unit should be consecutively arranged in the direction of travel of the wafer blocks. Each of said accumulator units comprises a separate horizontal conveyor for accommodating and forwarding wafer block stacks, each of which comprises one wafer block or a plurality of superimposed wafer block stacks. The interstage wafer block accumulator may have a plurality of superimposed storage levels. The accumulator units may be consecutively arranged on said plurality of storage levels in the direction of travel of the wafer blocks. In the interstage wafer block accumulator the accumulators may be arranged on one level or on each of a plurality of superimposed storage levels in a plurality of routes, which adjoin at an angle or are parallel to each other.
    • 一种用于生产和进一步加工晶片块的设备的级间晶片块式蓄电池。 在包括至少一个输送机和多个蓄电池单元的级间晶片块蓄能器中,每个蓄电池单元容纳一个或多个晶片块,并且设置在进料站和输送站之间,提出用于晶片块的所述累加器单元 容纳在每个蓄电池单元中应当沿着晶片块的行进方向连续布置。 每个所述蓄压器单元包括用于容纳和转发晶片块堆叠的单独的水平输送器,每个晶片块包括一个晶片块或多个叠加的晶片块堆叠。 级间晶片块累加器可以具有多个叠加的存储电平。 蓄电池单元可以在晶片块的行进方向上连续布置在所述多个存储水平上。 在级间晶片块累加器中,可以将多个叠加的存储器级别中的一个级别或多个叠加的存储器级别中的每一个布置在级间晶片块累加器中,该多个路由以一定角度相邻或彼此平行。
    • 2. 发明授权
    • Process for making rolled wafer cones
    • 轧制晶圆锥的制造工艺
    • US4624855A
    • 1986-11-25
    • US727006
    • 1985-04-25
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • A23G3/02A21B5/00A21B5/02A21D8/00A21D13/00A21D13/08A21C15/02
    • A21B5/026A21C15/025
    • In a process of making a rolled wafer cone from a baked flat wafer blank made from a sugar-containing wafer dough, the baked wafer blank is rolled to form a wafer cone in a winding mold while the wafer blank is still in a soft, deformable state after the baking operation. Thereafter the rolled wafer cone is permitted to harden. In order to ensure the production of wafer cones having consistently exactly the same shape, it is proposed that the wafer cone which is unrestrained at least in part is shortened in the winding mold to a predetermined length while the wafer cone is adapted to be plastically deformed. For this purpose the rolled wafer cone disposed in the winding mold is subjected to a plastic deformation only at one end or only at both ends. The process can be carried out by means of winding devices, which are mounted on a rotary frame and each of which comprises a conical winding core, which is secured to a winding shaft that is displaceable relative to the rotary frame to move the conical winding into and out of the winding mold. In that apparatus each winding device is provided with at least one sizing device, which is associated with the rim of the wafer cone and comprises at least one pressure-applying finger, which is adapted to be introduced between the winding mold and the winding core.
    • 在从含糖晶片面团制成的烘烤的平坦晶片坯料上制造卷状晶片圆锥的过程中,将烘烤的晶片坯料卷起以在卷绕模具中形成晶片锥体,同时晶片坯料仍然是柔软的,可变形的 烘烤后的状态。 此后,轧制的晶圆锥体被允许硬化。 为了确保具有一贯完全相同形状的晶片锥的生产,提出将至少部分无限制的晶圆锥体在卷绕模具中缩短到预定长度,同时晶片锥体适于塑性变形 。 为此,设置在卷绕模具中的轧制晶圆锥体仅在一端或仅在两端受到塑性变形。 该过程可以通过安装在旋转框架上的卷绕装置进行,每个卷绕装置包括圆锥形卷绕芯,其固定到相对于旋转框架可移位的卷轴上,以将锥形卷绕件移动到 并从绕组模具出来。 在该装置中,每个卷绕装置设置有至少一个施胶装置,其与晶圆锥体的边缘相关联,并且包括至少一个施加压力的手指,其适于引入卷绕模具和卷绕芯之间。
    • 4. 发明授权
    • Apparatus for conditioning wafers
    • 晶圆调理装置
    • US4524682A
    • 1985-06-25
    • US558936
    • 1983-12-07
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • A21C15/00A23B4/04
    • A21C15/00
    • Apparatus for conditioning wafers, such as wafer sheets, flat wafers, low hollow wafers and the like comprises an insulated conditioning chamber, which is closed except for a feed opening and a discharge opening, a revolving conveyor, which extends in the conditioning chamber adjacent to the feed opening and the discharge opening and is provided with successive compartments for receiving wafers, and air-guiding passages, which extend along the path of the compartments and are connected to an air-conditioning plant, which is preferably disposed outside the conditioning chamber. The clearance between the supporting elements which have been moved or swung toward each other is substantially one to 5 times, preferably 1.1 to two times, the wall thickness of a flat wafer or once to twice the height of a low hollow wafer. At least one of the two supporting elements rises above the received wafer at least with a projecting portion.
    • 用于调节晶片的装置,例如晶片,平片,低空心晶片等,包括除了进料口和排出口外的绝缘调节室,在调节室中延伸的循环输送器, 进料开口和排出口,并且设置有用于接收晶片的连续隔室和沿着隔室的路径延伸并且连接到空调设备的空气引导通道,空调设备优选地设置在调节室的外部。 相互移动或摆动的支撑元件之间的间隙基本上是平坦晶片的壁厚或一小至低两倍的低空心晶片的1至5倍,优选1.1至2倍。 两个支撑元件中的至少一个至少通过突出部分上升到接收的晶片之上。
    • 5. 发明授权
    • Wafer baking oven
    • 晶圆烤箱
    • US4438685A
    • 1984-03-27
    • US376954
    • 1982-05-11
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • A21B5/02A47J37/00
    • A21B5/02
    • A wafer baking oven for making baked wafers from batter includes an elongated baking chamber with heating elements therein. A thermally insulated enclosure surrounds at least part of the baking chamber. The oven includes a front port adjoining the baking chamber. There are a plurality of baking tongs in the baking chamber, which baking tongs move through the baking chamber and into and out of the front port in a running direction. The baking prongs are openable when in the front port for the removal of baked wafers from the tongs and for charging the baking tongs with batter. The baking tongs are then closed and are moved through the baking chamber in the closed state. The front port includes a charging station for charging the baking tongs with batter and a discharge station for discharging baked wafers along a path. The insulated enclosure includes a pair of lateral walls defining the lateral sides of the baking chamber, a sealing wall defining the top side of the baking chamber and a rear wall defining the rear side of the baking chamber. The baking chamber has a baking chamber exhaust for exhausting gases from the baking chamber. The insulated enclosure substantially completely encloses at least the baking chamber on its two lateral sides, on its ceiling walls, and at its rear wall, with the exception of the baking chamber exhaust. The baking chamber is also substantially completely enclosed at its bottom side.
    • 用于从面糊制造烘烤的晶片的晶片烤箱包括其中具有加热元件的细长烘烤室。 绝热外壳围绕烘烤室的至少一部分。 烘箱包括邻近烘烤室的前端口。 烘烤室中有多个烘烤钳,烘烤钳沿烘烤室移动并沿着运行方向进入和离开前端口。 当在前端口中用于从夹钳中取出烘烤的晶片并且用面糊给烘烤钳充电时,烘烤插脚是可打开的。 烘烤钳然后关闭,并且在关闭状态下移动通过烘烤室。 前端口包括用于向面糊充电烘烤钳的充电站和用于沿着路径排放烘烤的晶片的放电站。 绝缘外壳包括限定烘烤室的侧面的一对侧壁,限定烘烤室的顶侧的密封壁和限定烘烤室后侧的后壁。 烘烤室具有用于从烘烤室排出气体的烘烤室排气口。 绝热外壳基本上完全包围其两个侧面上的烘烤室,其顶壁和除了烘烤室排气之外的其后壁。 烘烤室也在其底侧基本上完全封闭。
    • 7. 发明授权
    • Device and method for producing baked, thin-walled molded articles
    • 用于生产烘烤的薄壁模塑制品的装置和方法
    • US5955129A
    • 1999-09-21
    • US859283
    • 1997-04-19
    • Franz Haas, Sr.Franz Haas, Jr.Johann HaasErich Koletnik
    • Franz Haas, Sr.Franz Haas, Jr.Johann HaasErich Koletnik
    • A21B5/02A47J37/01A21B1/46A21C11/00
    • A21B5/023A21B5/026
    • Disclosed are devices and processes for producing baked thin-walled shaped articles from baking or pouring mixtures which expand during the baking process. The bottom half (18) of a baking mold (16) for producing thin-walled shaped articles is accommodated in the bottom tongs section (13) of a pair of baking tongs (7) and the top half (17) of the baking mold is accommodated in the top tongs section (15) of the tongs (7). The mold halves (17, 18) and tongs sections (13, 15) are provided with stop surfaces (68c, 64d) and sealing surfaces (17a, 18a, 21a, 22a) and are in mutual contact when the baking mold (16) is closed. At least one clamp device (30, 31) is provided to press the mold halves (17, 18, 21, 22) of the closed baking mold (16) together; said clamp device forces at least the two mold halves (17, 18) of the closed baking mold (16) together with a predetermined clamping force during clamping and eliminates at least the play between them. The upper tongs section (15) of the baking tongs (7) can be guided via a lateral guide strut (14) in the lower tongs section (13). With baking tongs which have two-part dies in the lower tongs section, mechanisms can be provided between the baking tongs in the tongs chain in the baking oven to open or close the dies when passing a deviation in the chain.
    • PCT No.PCT / AT95 / 00220 Sec。 371日期1997年04月19日 102(e)日期1997年4月19日PCT提交1995年11月16日PCT公布。 第WO96 / 14750号公报 日期1996年5月23日被公开是用于生产烘烤的薄壁形状制品的装置和方法,其烘烤或浇注混合物在烘烤过程中膨胀。 用于制造薄壁形状制品的烘烤模具(16)的下半部(18)容纳在一对烤钳(7)的底钳部分(13)和烘烤模具的上半部(17) 被容纳在钳子(7)的顶部钳部分(15)中。 模具半部(17,18)和钳部分(13,15)设有止动表面(68c,64d)和密封表面(17a,18a,21a,22a),并且当烘烤模具(16) 关闭了。 提供至少一个夹紧装置(30,31)以将封闭的烘烤模具(16)的半模(17,18,21,22)挤压在一起; 所述夹紧装置在夹紧期间至少将封闭的烘烤模具(16)的两个半模(17,18)与预定的夹紧力一起施加,并且至少消除它们之间的间隙。 烘烤钳(7)的上钳部(15)可以通过下钳部(13)中的侧向引导支柱(14)引导。 在下钳部分具有两部分模具的烘烤钳中,可以在烘烤炉中的钳链中的烘烤钳之间设置机构,以在通过链中的偏差时打开或关闭模具。
    • 9. 发明授权
    • Spreading head for a wafer sheet coating machine
    • 用于晶圆片涂布机的扩展头
    • US4602590A
    • 1986-07-29
    • US682560
    • 1984-12-17
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • A21C9/04A21C15/02
    • A21C9/04
    • A spreading head is provided for a wafer sheet coating machine, which comprises a wafer sheet conveyor, which is optionally adapted to be lowered. The spreading head comprises a rotating spreading roller and a sizing device, which cooperates with said spreading roller to control the thickness of a layer of a spreadable composition as it is transferred by said spreading roller. The spreading roller and the sizing device define a lower boundary of a reservoir, which is adapted to hold said spreadable composition and which is laterally defined by platelike elements. To prevent an escape of spreadable composition from the reservoir along the end faces of the spreading roller, it is proposed to provide at least on each end face of the spreading roller a lateral covering, which extends from the reservoir for the spreadable composition along the periphery of the end face of the spreading roller continuously at least as far as to the point where the layer of the composition transferred is removed from the spreading roller. Said covering may be integral with the adjacent platelike element.
    • 提供了一种用于晶片薄片涂布机的扩展头,其包括可选地降低的晶片输送机。 展开头包括旋转的铺展辊和定型装置,其与所述铺展辊配合,以控制由所述铺展辊传送的可铺展组合物的层的厚度。 铺展辊和施胶装置限定储存器的下边界,其适于保持所述可涂抹的组合物,并且由板状元件横向限定。 为了防止可展开的组合物沿着扩展辊的端面从储存器中逸出,建议至少在扩展辊的每个端面上提供侧面覆盖物,该侧面覆盖物沿着周边从用于可展开组合物的储存器延伸 的延伸辊的端面连续地至少与传播的组合物的层从扩展辊上移开的程度相同。 所述覆盖物可以与相邻的板状元件成一体。
    • 10. 发明授权
    • Baking plate
    • 烘烤板
    • US4503759A
    • 1985-03-12
    • US411556
    • 1982-08-25
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • Franz Haas, Sr.Franz Haas, Jr.Johann Haas
    • A21B3/13A21B5/02A47J37/00
    • A21B5/023
    • A baking plate is provided, which is adapted to cooperate with a second baking plate to define a cavity for receiving dough to be baked. The baking plate has on one side a generally flat dough-treating surface and on the opposite side a rear surface. The rear surface of the baking plate is formed with at least one channel by which the flexural stiffness of the baking plate is reduced. At least one adjustable stressing device is connected to said rear surface of said baking plate on opposite sides of said channel and operable to subject said baking plate to an adjustable initial bending stress in such a manner that said channel is contracted to an adjustable extent transversely to the longitudinal direction of said channel and that an adjustable convex camber is imparted to said dough-treating surface.
    • 提供了一个烘烤板,其适于与第二烘烤板配合以限定用于接收待烘焙面团的空腔。 烘烤板的一侧具有大致平坦的面团处理表面,并且在相对侧上具有后表面。 烘烤板的后表面形成有至少一个通道,通过该通道降低烘烤板的弯曲刚度。 至少一个可调节的应力装置在所述通道的相对侧连接到所述烘烤板的所述后表面,并且可操作以使所述烘烤板以可调节的初始弯曲应力使得所述通道收缩到横向于 所述通道的纵向方向以及可调节的凸起弧度被赋予所述面团处理表面。