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    • 2. 发明授权
    • Thin films of ferroelectric materials and a method for preparing same
    • 铁电材料薄膜及其制备方法
    • US08124251B2
    • 2012-02-28
    • US11333774
    • 2006-01-17
    • Kui YaoShuhui YuFrancis Eng Hock Tay
    • Kui YaoShuhui YuFrancis Eng Hock Tay
    • B32B9/00
    • C23C18/1216C23C18/1241H01L41/1875H01L41/318
    • Thin films of ferroelectric material with a high mole fraction of Pb(A2+1/3B5+2/3)O3 substantially in a perovskite phase, wherein A is zinc or a combination of zinc and magnesium, and B is a valence 5 element such as niobium or tantalum, have been prepared. Typically, the mole fraction of Pb(A2+1/3B5+2/3)O3 in the ferroelectric material is >0.7. The method for preparing the thin films of ferroelectric material comprises providing a precursor solution containing lead, A2+, and B5+; modifying the precursor solution by addition of a polymer species thereto; applying the modified precursor solution to a surface of a substrate and forming a coating thereon; and (d) subjecting the coating to a heat treatment and forming the film in the perovskite phase. Optimal results have been obtained with PEG200 as the polymer species.
    • 基本上在钙钛矿相中具有高摩尔分数的Pb(A2 + 1 / 3B5 + 2/3)O3的铁电材料薄膜,其中A是锌或锌和镁的组合,B是价数5元素 作为铌或钽制备。 通常,铁电材料中Pb(A2 + 1 / 3B5 + 2/3)O3的摩尔分数> 0.7。 制备铁电材料薄膜的方法包括提供含有铅,A2 +和B5 +的前体溶液; 通过向其中加入聚合物物质来改性前体溶液; 将改性的前体溶液施加到基材的表面上并在其上形成涂层; 和(d)对涂层进行热处理,并在钙钛矿相中形成膜。 PEG200作为聚合物种类已获得最佳结果。
    • 3. 发明申请
    • Thin Films of Ferroelectric Materials and a Method for Preparing Same
    • 铁电材料薄膜及其制备方法
    • US20100221415A1
    • 2010-09-02
    • US12773593
    • 2010-05-04
    • Kui YaoShuhui YuFrancis Eng Hock Tay
    • Kui YaoShuhui YuFrancis Eng Hock Tay
    • B05D5/12
    • C23C18/1216C23C18/1241H01L41/1875H01L41/318
    • Thin films of ferroelectric material with a high mole fraction of Pb(A2+1/3B5+2/3)O3 substantially in a perovskite phase, wherein A is zinc or a combination of zinc and magnesium, and B is a valence 5 element such as niobium or tantalum, have been prepared. Typically, the mole fraction of Pb(A2+1/3B5+2/3)O3 in the ferroelectric material is >0.7. The method for preparing the thin films of ferroelectric material comprises providing a precursor solution containing lead, A2+, and B5+; modifying the precursor solution by addition of a polymer species thereto; applying the modified precursor solution to a surface of a substrate and forming a coating thereon; and (d) subjecting the coating to a heat treatment and forming the film in the perovskite phase. Optimal results have been obtained with PEG200 as the polymer species.
    • 基本上在钙钛矿相中具有高摩尔分数的Pb(A2 + 1 / 3B5 + 2/3)O3的铁电材料薄膜,其中A是锌或锌和镁的组合,B是价数5元素 作为铌或钽制备。 通常,铁电材料中Pb(A2 + 1 / 3B5 + 2/3)O3的摩尔分数> 0.7。 制备铁电材料薄膜的方法包括提供含有铅,A2 +和B5 +的前体溶液; 通过向其中加入聚合物物质来改性前体溶液; 将改性的前体溶液施加到基材的表面上并在其上形成涂层; 和(d)对涂层进行热处理,并在钙钛矿相中形成膜。 PEG200作为聚合物种类已获得最佳结果。
    • 5. 发明授权
    • Thin films of ferroelectric materials and a method for preparing same
    • 铁电材料薄膜及其制备方法
    • US08696812B2
    • 2014-04-15
    • US12773593
    • 2010-05-04
    • Kui YaoShuhui YuFrancis Eng Hock Tay
    • Kui YaoShuhui YuFrancis Eng Hock Tay
    • C30B7/00
    • C23C18/1216C23C18/1241H01L41/1875H01L41/318
    • Thin films of ferroelectric material with a high mole fraction of Pb(A2+1/3B5+2/3)O3 substantially in a perovskite phase, wherein A is zinc or a combination of zinc and magnesium, and B is a valence 5 element such as niobium or tantalum, have been prepared. Typically, the mole fraction of Pb(A2+1/3B5+2/3)O3 in the ferroelectric material is >0.7. The method for preparing the thin films of ferroelectric material comprises providing a precursor solution containing lead, A2+, and B5+; modifying the precursor solution by addition of a polymer species thereto; applying the modified precursor solution to a surface of a substrate and forming a coating thereon; and (d) subjecting the coating to a heat treatment and forming the film in the perovskite phase. Optimal results have been obtained with PEG200 as the polymer species.
    • 基本上在钙钛矿相中具有高摩尔分数的Pb(A2 + 1 / 3B5 + 2/3)O3的铁电材料薄膜,其中A是锌或锌和镁的组合,B是价数5元素 作为铌或钽制备。 通常,铁电材料中Pb(A2 + 1 / 3B5 + 2/3)O3的摩尔分数> 0.7。 制备铁电材料薄膜的方法包括提供含有铅,A2 +和B5 +的前体溶液; 通过向其中加入聚合物物质来改性前体溶液; 将改性的前体溶液施加到基材的表面上并在其上形成涂层; 和(d)对涂层进行热处理,并在钙钛矿相中形成膜。 PEG200作为聚合物种类已获得最佳结果。
    • 7. 发明申请
    • Ferroelectric Poly (Vinylidene Fluoride) Film on a Substrate and Method for its Formation
    • 基板上的铁电聚(亚乙烯基氟化物)膜及其形成方法
    • US20090263671A1
    • 2009-10-22
    • US12106685
    • 2008-04-21
    • Kui YaoShuting ChenFrancis Eng Hock Tay
    • Kui YaoShuting ChenFrancis Eng Hock Tay
    • B32B15/082B05D3/02
    • C23C26/02B05D3/0254H01L41/317H01L41/45Y10T428/31678
    • Ferroelectric Poly(vinylidene fluoride) Film on a Substrate and Method for its Formation A method of producing a poly(vinylidene fluoride) (“PVDF”) film on a substrate from a precursor solution is disclosed. The method comprises preparing the precursor solution for the PVDF film and dissolving an additive in the precursor solution, the additive being selected from the group consisting of: a hydrate salt, and a hygroscopic chemical. The PVDF is added to the precursor solution. The PVDF solution is coated on a substrate to form an as-deposited PVDF film which is dried and crystallized at an elevated temperature. The dried and crystallized as-deposited PVDF film is annealed at a further elevated temperature. The further elevated temperature is greater than the elevated temperature but less than a melting point of the as-deposited PVDF film. The additive dehydrates at the further elevated temperature. A corresponding product is also disclosed.
    • 基板上的铁电性聚(偏二氟乙烯)膜及其形成方法公开了从前体溶液在基材上制备聚(偏二氟乙烯)(“PVDF”)膜的方法。 该方法包括制备用于PVDF膜的前体溶液并将添加剂溶解在前体溶液中,添加剂选自:水合物盐和吸湿性化合物。 将PVDF加入到前体溶液中。 将PVDF溶液涂覆在基材上以形成沉积的PVDF膜,其在高温下干燥并结晶。 干燥并结晶沉积的PVDF膜在进一步升高的温度下退火。 进一步升高的温度大于升高的温度但小于沉积的PVDF膜的熔点。 添加剂在进一步升高的温度下脱水。 还公开了相应的产品。