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    • 4. 发明授权
    • Process for forming a reflective surface
    • 用于形成反射表面的工艺
    • US5582863A
    • 1996-12-10
    • US351719
    • 1994-12-08
    • Marcus TextorRoman FuchsVolkmar GillichErich Simon
    • Marcus TextorRoman FuchsVolkmar GillichErich Simon
    • B21B3/00C22C21/12C22F1/04C23C14/00C23C14/02C23C14/06C23C16/00C23C16/02G02B1/10B05D5/06
    • C23C16/0254C22F1/04C23C14/021C23C14/028G02B1/105G02B5/0808G02B5/0858Y10T428/24975Y10T428/265Y10T428/31678
    • A process for forming a reflective surface, comprises the steps of: providing at least a part of at least one unanodized surface which has a peak-to-valley height Ra of equal to or less than 1 micron. The unanodized surface is selected from the group consisting of (1) refined aluminum with a degree of purity equal to or greater than 98.3% by weight aluminum and (2) aluminum alloys with at least one element selected from the group consisting of Si, Mg, Mn, Cu, Zn, Fe. The unanodized surface is in a form selected from the group consisting of rolled foil, rolled sheets, and rolled strips and said unanodized surface is used as a substrate. The process further includes depositing at least two layers from the gas phase on the unanodized surface, wherein the two layers include a ceramic adhesive layer from the gas phase and at least one reflecting layer from the gas phase on said adhesive layer for the reflection of radiation with wavelengths in the optical range. The reflecting layer is selected from the group consisting of aluminum, silver, gold, copper and alloys containing at least one of aluminum, silver, gold and copper.
    • 一种用于形成反射表面的方法,包括以下步骤:提供具有等于或小于1微米的峰 - 谷高度Ra的至少一个未阳光化表面的至少一部分。 未阳极化表面选自(1)纯度等于或大于98.3重量%的铝的精制铝和(2)具有选自Si,Mg中的至少一种元素的铝合金 ,Mn,Cu,Zn,Fe。 未标记的表面是选自轧制箔,轧制板和轧制带的形式,并且所述未阳模化表面用作基板。 该方法还包括在未阳光化表面上从气相沉积至少两层,其中两层包括来自气相的陶瓷粘合剂层和在所述粘合剂层上的来自气相的至少一个反射层,用于反射辐射 波长在光学范围内。 反射层选自铝,银,金,铜和含有铝,银,金和铜中的至少一种的合金。