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    • 2. 发明授权
    • Thin film transistor, display device, and electronic unit
    • 薄膜晶体管,显示装置和电子单元
    • US08378351B2
    • 2013-02-19
    • US13078543
    • 2011-04-01
    • Eri FukumotoYasuhiro TeraiNarihiro Morosawa
    • Eri FukumotoYasuhiro TeraiNarihiro Morosawa
    • H01L29/04
    • H01L29/7869H01L29/517
    • A thin film transistor using oxide semiconductor for a channel, which may be controlled such that threshold voltage is positive and may be improved in reliability is provided. The thin film transistor includes a gate electrode, a pair of source/drain electrodes, an oxide semiconductor layer forming a channel and provided between the gate electrode and the pair of source/drain electrodes, a first insulating film as a gate insulating film provided on the oxide semiconductor layer on a side near the gate electrode, and a second insulating film provided on the oxide semiconductor layer on a side near the pair of source/drain electrodes. One or both of the first insulating film and the second insulating film includes an aluminum oxide having a film density of 2.70 g/cm3 or more and less than 2.79 g/cm3.
    • 提供了使用用于沟道的氧化物半导体的薄膜晶体管,其可以被控制使得阈值电压为正并且可以提高可靠性。 薄膜晶体管包括栅极电极,一对源极/漏极电极,形成沟道的氧化物半导体层,设置在栅极电极和一对源极/漏极电极之间,第一绝缘膜作为栅极绝缘膜设置在 所述氧化物半导体层位于所述栅电极附近的一侧,所述第二绝缘膜设置在所述一对源/漏电极附近的所述氧化物半导体层上。 第一绝缘膜和第二绝缘膜中的一个或两个包括膜密度为2.70g / cm 3以上且小于2.79g / cm 3的氧化铝。
    • 6. 发明申请
    • THIN FILM TRANSISTOR, DISPLAY DEVICE, AND ELECTRONIC UNIT
    • 薄膜晶体管,显示器件和电子单元
    • US20110248270A1
    • 2011-10-13
    • US13078543
    • 2011-04-01
    • Eri FukumotoYasuhiro TeraiNarihiro Morosawa
    • Eri FukumotoYasuhiro TeraiNarihiro Morosawa
    • H01L29/04
    • H01L29/7869H01L29/517
    • A thin film transistor using oxide semiconductor for a channel, which may be controlled such that threshold voltage is positive and may be improved in reliability is provided. The thin film transistor includes a gate electrode, a pair of source/drain electrodes, an oxide semiconductor layer forming a channel and provided between the gate electrode and the pair of source/drain electrodes, a first insulating film as a gate insulating film provided on the oxide semiconductor layer on a side near the gate electrode, and a second insulating film provided on the oxide semiconductor layer on a side near the pair of source/drain electrodes. One or both of the first insulating film and the second insulating film includes an aluminum oxide having a film density of 2.70 g/cm3 or more and less than 2.79 g/cm3.
    • 提供了使用用于沟道的氧化物半导体的薄膜晶体管,其可以被控制使得阈值电压为正并且可以提高可靠性。 薄膜晶体管包括栅极电极,一对源极/漏极电极,形成沟道的氧化物半导体层,设置在栅极电极和一对源极/漏极电极之间,第一绝缘膜作为栅极绝缘膜设置在 所述氧化物半导体层位于所述栅电极附近的一侧,所述第二绝缘膜设置在所述一对源/漏电极附近的所述氧化物半导体层上。 第一绝缘膜和第二绝缘膜中的一个或两个包括膜密度为2.70g / cm 3以上且小于2.79g / cm 3的氧化铝。