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    • 6. 发明授权
    • Thin film transistor and display device
    • 薄膜晶体管和显示装置
    • US08461594B2
    • 2013-06-11
    • US13122307
    • 2009-10-07
    • Narihiro MorosawaYasuhiro TeraiToshiaki Arai
    • Narihiro MorosawaYasuhiro TeraiToshiaki Arai
    • H01L29/04
    • H01L29/7869H01L27/1225H01L27/3211H01L27/3244H01L27/3262
    • Provided are a thin film transistor that is capable of suppressing desorption of oxygen and others from an oxide semiconductor layer, and reducing the time to be taken for film formation, and a display device provided therewith. A gate insulation film 22, a channel protection layer 24, and a passivation film 26 are each in the laminate configuration including a first layer 31 made of aluminum oxide, and a second layer 32 made of an insulation material including silicon (Si). The first and second layers 31 and 32 are disposed one on the other so that the first layer 31 comes on the side of an oxide semiconductor layer 23. The oxide semiconductor layer 23 is sandwiched on both sides by the first layers 31 made of aluminum oxide, thereby suppressing desorption of oxygen and others, and stabilizing the electrical characteristics of a TFT 20. Moreover, since the second layer 32 is made of an insulation material including silicon (Si), the time to be taken for film formation can be reduced compared with a single layer made of aluminum oxide.
    • 提供一种薄膜晶体管,其能够抑制氧等氧化物半导体层的解吸,并减少成膜时间,以及具有该显示装置的显示装置。 栅极绝缘膜22,沟道保护层24和钝化膜26均包括由氧化铝制成的第一层31和由包含硅(Si)的绝缘材料制成的第二层32。 第一层31和第二层32彼此重叠设置,使得第一层31位于氧化物半导体层23的侧面。氧化物半导体层23由两个由氧化铝制成的第一层31夹在两侧 ,从而抑制氧等的解吸,并且稳定TFT20的电特性。此外,由于第二层32由包​​含硅(Si)的绝缘材料制成,因此可以减少用于成膜的时间,比较 具有由氧化铝制成的单层。