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1. 发明申请

US20110192348A1 RF Hollow Cathode Plasma Generator 审中-公开
标题翻译：射频空心阴极等离子体发生器
公开(公告)号：US20110192348A1
公开(公告)日：2011-08-11
申请号：US12701035
申请日：2010-02-05
申请人： Ching-Pei Tseng , Cheng-Chang Hsieh , Chi-Fong Ai , Chia-Cheng Lee , Deng-Lain Lin
发明人： Ching-Pei Tseng , Cheng-Chang Hsieh , Chi-Fong Ai , Chia-Cheng Lee , Deng-Lain Lin
IPC分类号： C23C16/00 , H05H1/24
CPC分类号： C23C16/509 , H01J37/3244 , H01J37/32596
摘要： An RF hollow cathode plasma source consists of a vacuum chamber, a pipe, a hollow cathode, at least two compartments, a conduit and input electrodes. The pipe is inserted into the chamber for introducing working gas into the chamber. The hollow cathode is disposed in the chamber and formed with a large number of apertures. At least two compartments are located below the hollow cathode. Each of the compartments includes small apertures for uniformly spreading the working gas into the apertures of the hollow cathode. The conduit is disposed along two sides of the hollow cathode to circulate cooling water around the hollow cathode. The plural input power leads are arranged near the hollow cathode. The input power leads, the pipe and the conduits are connected to the hollow cathode though the electrically-insulated walls of the grounded vacuum chamber.
摘要翻译： RF空心阴极等离子体源由真空室，管，中空阴极，至少两个隔室，导管和输入电极组成。将管插入腔室中以将工作气体引入腔室。中空阴极设置在室中并形成有大量孔。至少两个隔室位于空心阴极的下面。每个隔室包括用于将工作气体均匀地分散到中空阴极的孔中的小孔。导管沿空心阴极的两侧设置，以将冷却水循环在中空阴极周围。多个输入电源引线设置在中空阴极附近。输入功率引线，管道和导管通过接地真空室的电绝缘壁连接到空心阴极。

2. 发明申请

US20120255492A1 Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus 审中-公开
标题翻译：大面积大气压等离子体增强化学气相沉积装置
公开(公告)号：US20120255492A1
公开(公告)日：2012-10-11
申请号：US13080874
申请日：2011-04-06
申请人： Mien-Win Wu , Ding-Guey Tsai , Hwei-Lang Chang , Deng-Lain Lin , Cheng-Chang Hsieh , Chi-Fong Ai
发明人： Mien-Win Wu , Ding-Guey Tsai , Hwei-Lang Chang , Deng-Lain Lin , Cheng-Chang Hsieh , Chi-Fong Ai
IPC分类号： C23C16/513 , C23C16/458 , C23C16/50 , C23C16/453
CPC分类号： C23C16/545 , C23C16/0245 , C23C16/4401 , C23C16/45512 , C23C16/45565 , C23C16/50 , C23C16/513 , H01J37/32366 , H01J37/3244 , H01J37/32449 , H01J37/32568 , H01J37/32761 , H01J37/32825 , H01J37/32853
摘要： An apparatus provides large area atmospheric pressure plasma enhanced chemical vapor deposition without contaminations in its electrode assembly and deposited films. The apparatus consists of a large area vertical planar nitrogen plasma activation electrode assembly and its high voltage power supply, a large area vertical planar nitrogen plasma deposition electrode assembly and its high voltage power supply, a long-line uniform precursor jet apparatus, a roll-to-roll apparatus for substrate movement, and a sub-atmospheric pressure deposition chamber and its pumping apparatus. Not only can the deposited film contaminations in the electrode assembly interior and the debris of the deposited films from exterior of the electrode assembly and the air aerosols in the deposition chamber be completely prevented, but a large area roll-to-roll uniform deposition can also be achieved to meet a roll-to-roll continuous production, so as to achieve improved film quality, increased production throughput and reduced manufacturing cost.
摘要翻译：一种装置在其电极组件和沉积膜中提供大面积的大气压等离子体增强化学气相沉积而没有污染。该装置由大面积垂直平面氮等离子体激活电极组件及其高压电源，大面积垂直平面氮等离子体沉积电极组件及其高压电源，长线均匀前驱体喷射装置，用于基板移动的滚动装置和次大气压力沉积室及其抽吸装置。不仅可以完全防止电极组件内部的沉积膜污染物和电极组件外部沉积膜的碎屑和沉积室中的空气气溶胶，而且大面积的卷对卷均匀沉积也可以实现卷对卷连续生产，从而达到提高胶片质量，提高生产量和降低制造成本的目的。

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