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    • 4. 发明授权
    • Method of producing organo indium chlorides
    • 生产有机氯化铟的方法
    • US5663390A
    • 1997-09-02
    • US705913
    • 1996-08-29
    • Dean M. Giolando
    • Dean M. Giolando
    • B01J27/125C07F5/00
    • C07F5/00
    • A method for producing organo metal chlorides directly from molten metal. The organo metal chlorides are formed by contacting an organo chloride directly with a metal melt. The preferred method includes the use of indium as the metal and methyl chloride as the organo chloride. The direct contact of the methyl chloride with the indium metal results in the production of dimethyl indium chloride or methyl indium dichloride depending on the contacting time and efficiency of the process. The resulting products are suitable for use as a precursor gas for chemical vapor deposition processes. Additionally, activator compounds such as oxides or halides are optionally added to the metal melt to enhance the reaction rate.
    • 一种从熔融金属直接生产有机金属氯化物的方法。 有机金属氯化物通过直接与金属熔体直接接触有机氯化物而形成。 优选的方法包括使用铟作为金属和氯甲烷作为有机氯化物。 甲基氯与铟金属的直接接触导致二氯化铟或二氯化甲基铟的生产取决于该方法的接触时间和效率。 所得产物适合用作化学气相沉积工艺的前体气体。 此外,活性化合物如氧化物或卤化物任选加入到金属熔体中以提高反应速率。
    • 8. 发明授权
    • Photovoltaic healing of non-uniformities in semiconductor devices
    • 半导体器件中非均匀性的光电愈合
    • US07098058B1
    • 2006-08-29
    • US11035170
    • 2005-01-13
    • Victor G. KarpovYann RoussillonDiana ShvydkaAlvin D. CompaanDean M. Giolando
    • Victor G. KarpovYann RoussillonDiana ShvydkaAlvin D. CompaanDean M. Giolando
    • H01L21/00
    • H01L31/186Y02E10/50Y02P70/521
    • A method of making a photovoltaic device using light energy and a solution to normalize electric potential variations in the device. A semiconductor layer having nonuniformities comprising areas of aberrant electric potential deviating from the electric potential of the top surface of the semiconductor is deposited onto a substrate layer. A solution containing an electrolyte, at least one bonding material, and positive and negative ions is applied over the top surface of the semiconductor. Light energy is applied to generate photovoltage in the semiconductor, causing a redistribution of the ions and the bonding material to the areas of aberrant electric potential. The bonding material selectively bonds to the nonuniformities in a manner such that the electric potential of the nonuniformities is normalized relative to the electric potential of the top surface of the semiconductor layer. A conductive electrode layer is then deposited over the top surface of the semiconductor layer.
    • 一种制造使用光能的光伏器件的方法和使器件的电位变化标准化的方法。 具有包括偏离半导体的顶表面的电位的异常电位的区域的不均匀性的半导体层被沉积到衬底层上。 将包含电解质,至少一种结合材料以及正离子和负离子的溶液施加到半导体的顶表面上。 施加光能以在半导体中产生光电压,导致离子和结合材料再次分布到异常电位的区域。 接合材料以不均匀性的电位相对于半导体层的顶表面的电位标准化的方式选择性地键合到不均匀性。 然后在半导体层的顶表面上沉积导电电极层。
    • 10. 发明授权
    • Method of producing organo indium chlorides
    • 生产有机氯化铟的方法
    • US5817847A
    • 1998-10-06
    • US871934
    • 1997-06-10
    • Dean M. Giolando
    • Dean M. Giolando
    • B01J27/125C07F5/00
    • C07F5/00
    • A method for producing organo metal chlorides directly from molten metal. The organo metal chlorides are formed by contacting an organo chloride directly with a metal melt. The preferred method includes the use of indium as the metal and methyl chloride as the organo chloride. The direct contact of the methyl chloride with the indium metal results in the production of dimethyl indium chloride or methyl indium dichloride depending on the contacting time and efficiency of the process. The resulting products are suitable for use as a precursor gas for chemical vapor deposition processes. Additionally, activator compounds such as oxides or halides are optionally added to the metal melt to enhance the reaction rate.
    • 一种从熔融金属直接生产有机金属氯化物的方法。 有机金属氯化物通过直接与金属熔体直接接触有机氯化物而形成。 优选的方法包括使用铟作为金属和氯甲烷作为有机氯化物。 甲基氯与铟金属的直接接触导致二氯化铟或二氯化甲基铟的生产取决于该方法的接触时间和效率。 所得产物适合用作化学气相沉积工艺的前体气体。 此外,活性化合物如氧化物或卤化物任选加入到金属熔体中以提高反应速率。