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1. 发明授权

US08631757B2 Solution deposition assembly 失效
标题翻译：溶液沉积组装
公开(公告)号：US08631757B2
公开(公告)日：2014-01-21
申请号：US12369524
申请日：2009-02-11
申请人： Yann Roussillon , Jeremy H. Scholz , Addison Shelton , Geoff T. Green , Piyaphant Utthachoo
发明人： Yann Roussillon , Jeremy H. Scholz , Addison Shelton , Geoff T. Green , Piyaphant Utthachoo
IPC分类号： B05C9/14 , B05C3/02 , B05C5/00 , B05B3/00
CPC分类号： H01L31/03928 , B65H20/00 , B65H2301/51214 , C23C18/06 , C23C18/1204 , C23C18/1245 , C23C18/1275 , C23C18/1279 , C23C18/1283 , C23C18/1291 , C25D5/50 , C25D17/00 , C25D17/001 , H01L21/02551 , H01L21/02568 , H01L21/02628 , H01L31/0749 , H01L31/1828 , Y02E10/541 , Y02E10/543
摘要： Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
摘要翻译：提供了用于改进沉积系统的方法和装置。在本发明的一个实施例中，提供了一种与溶液和基底一起使用的沉积系统。该系统包括溶液沉积装置; 至少一个加热室; 用于将溶液保持在所述基底上的至少一个组件; 以及用于卷曲衬底的至少一个边缘以限定能够在衬底上容纳一定体积的溶液的区域的衬底卷曲装置。在本发明的另一实施例中，一种用于衬底的沉积系统，该系统包括溶液沉积设备; 在加热室; 以及至少用于将溶液保持在基底上以允许至少约0.5微米至10mm的深度的组件。

2. 发明授权

US08601973B2 Solution deposition assembly 失效
标题翻译：溶液沉积组装
公开(公告)号：US08601973B2
公开(公告)日：2013-12-10
申请号：US12203117
申请日：2008-09-02
申请人： Yann Roussillon , Piyaphant Utthachoo
发明人： Yann Roussillon , Piyaphant Utthachoo
IPC分类号： B05B7/00 , B05C3/02 , C23C14/00
CPC分类号： H01L31/1828 , C23C18/04 , C23C18/06 , C23C18/1204 , C23C18/1233 , C23C18/1241 , C23C18/1245 , C23C18/1275 , C23C18/1279 , C23C18/1283 , C23C18/1291 , H01L21/02557 , H01L21/02562 , H01L21/02568 , H01L21/02628 , H01L31/0322 , Y02E10/541 , Y02E10/543 , Y02P70/521
摘要： Methods and devices are provided for improved sputtering systems. In one embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
摘要翻译：提供了用于改进溅射系统的方法和装置。在本发明的一个实施例中，一种用于衬底的沉积系统，该系统包括溶液沉积设备; 在加热室; 以及至少用于将溶液保持在基底上以允许至少约0.5微米至10mm的深度的组件。

3. 发明申请

US20100300352A1 SOLUTION DEPOSITION ASSEMBLY 审中-公开
标题翻译：溶液沉积装置
公开(公告)号：US20100300352A1
公开(公告)日：2010-12-02
申请号：US12738392
申请日：2008-10-17
申请人： Yann Roussillon , Piyaphant Utthachoo , Geoffrey T. Green , Addison Shelton , Jeremy H. Scholz
发明人： Yann Roussillon , Piyaphant Utthachoo , Geoffrey T. Green , Addison Shelton , Jeremy H. Scholz
IPC分类号： B05C3/02
CPC分类号： H01L31/03928 , B65H20/00 , B65H2301/51214 , C23C18/06 , C23C18/1204 , C23C18/1245 , C23C18/1275 , C23C18/1279 , C23C18/1283 , C23C18/1291 , C25D5/50 , C25D17/00 , C25D17/001 , H01L21/02551 , H01L21/02568 , H01L21/02628 , H01L31/0749 , H01L31/1828 , Y02E10/541 , Y02E10/543
摘要： Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
摘要翻译：提供了用于改进沉积系统的方法和装置。在本发明的一个实施例中，提供了一种与溶液和基底一起使用的沉积系统。该系统包括溶液沉积装置; 至少一个加热室; 用于将溶液保持在所述基底上的至少一个组件; 以及用于卷曲衬底的至少一个边缘以限定能够在衬底上容纳一定体积的溶液的区域的衬底卷曲装置。在本发明的另一实施例中，一种用于衬底的沉积系统，该系统包括溶液沉积设备; 在加热室; 以及至少用于将溶液保持在基底上以允许至少约0.5微米至10mm的深度的组件。

4. 发明申请

US20080302413A1 FORMATION OF PHOTOVOLTAIC ABSORBER LAYERS ON FOIL SUBSTRATES 审中-公开
标题翻译：在基底上形成光伏吸收层
公开(公告)号：US20080302413A1
公开(公告)日：2008-12-11
申请号：US12060193
申请日：2008-03-31
申请人： Craig Leidholm , Brent Bollman , Yann Roussillon
发明人： Craig Leidholm , Brent Bollman , Yann Roussillon
IPC分类号： B05D5/12 , H01L31/00
CPC分类号： H01L31/18 , H01L31/0322 , H01L31/03928 , Y02E10/541
摘要： An absorber layer of a photovoltaic device may be formed on an aluminum or metallized polymer foil substrate. A nascent absorber layer containing one or more elements of group IB and one or more elements of group IIIA is formed on the substrate. The nascent absorber layer and/or substrate is then rapidly heated from an ambient temperature to an average plateau temperature range of between about 200° C. and about 600° C. and maintained in the average plateau temperature range 1 to 30 minutes after which the temperature is reduced.
摘要翻译：光电器件的吸收层可以形成在铝或金属化的聚合物箔基底上。在衬底上形成包含IB族元素和IIIA族元素的初生吸收层。然后将新生吸收剂层和/或基材从环境温度快速加热至约200℃至约600℃的平均平台温度范围，并保持在平均平台温度范围1至30分钟之后，温度降低。

5. 发明申请

US20100050935A1 Solution Deposition Assembly 失效
标题翻译：解决方案沉积装配
公开(公告)号：US20100050935A1
公开(公告)日：2010-03-04
申请号：US12369524
申请日：2009-02-11
申请人： Yann Roussillon , Jeremy H. Scholz , Addison Shelton , Geoff T. Green , Piyaphant Utthachoo
发明人： Yann Roussillon , Jeremy H. Scholz , Addison Shelton , Geoff T. Green , Piyaphant Utthachoo
IPC分类号： B05C9/14
CPC分类号： H01L31/03928 , B65H20/00 , B65H2301/51214 , C23C18/06 , C23C18/1204 , C23C18/1245 , C23C18/1275 , C23C18/1279 , C23C18/1283 , C23C18/1291 , C25D5/50 , C25D17/00 , C25D17/001 , H01L21/02551 , H01L21/02568 , H01L21/02628 , H01L31/0749 , H01L31/1828 , Y02E10/541 , Y02E10/543
摘要： Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
摘要翻译：提供了用于改进沉积系统的方法和装置。在本发明的一个实施例中，提供了一种与溶液和基底一起使用的沉积系统。该系统包括溶液沉积装置; 至少一个加热室; 用于将溶液保持在所述基底上的至少一个组件; 以及用于卷曲衬底的至少一个边缘以限定能够在衬底上容纳一定体积的溶液的区域的衬底卷曲装置。在本发明的另一实施例中，一种用于衬底的沉积系统，该系统包括溶液沉积设备; 在加热室; 以及至少用于将溶液保持在基底上以允许至少约0.5微米至10mm的深度的组件。

6. 发明申请

US20090120359A1 Solution Deposition Assembly 失效
标题翻译：解决方案沉积装配
公开(公告)号：US20090120359A1
公开(公告)日：2009-05-14
申请号：US12203117
申请日：2008-09-02
申请人： Yann Roussillon , Piyaphant Utthachoo
发明人： Yann Roussillon , Piyaphant Utthachoo
IPC分类号： B05C5/00
CPC分类号： H01L31/1828 , C23C18/04 , C23C18/06 , C23C18/1204 , C23C18/1233 , C23C18/1241 , C23C18/1245 , C23C18/1275 , C23C18/1279 , C23C18/1283 , C23C18/1291 , H01L21/02557 , H01L21/02562 , H01L21/02568 , H01L21/02628 , H01L31/0322 , Y02E10/541 , Y02E10/543 , Y02P70/521
摘要： Methods and devices are provided for improved sputtering systems. In one embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm.
摘要翻译：提供了用于改进溅射系统的方法和装置。在本发明的一个实施例中，一种用于衬底的沉积系统，该系统包括溶液沉积设备; 在加热室; 以及至少用于将溶液保持在基底上以允许至少约0.5微米至10mm的深度的组件。

7. 发明申请

US20090032108A1 FORMATION OF PHOTOVOLTAIC ABSORBER LAYERS ON FOIL SUBSTRATES 审中-公开
标题翻译：在基底上形成光伏吸收层
公开(公告)号：US20090032108A1
公开(公告)日：2009-02-05
申请号：US12060221
申请日：2008-03-31
申请人： Craig Leidholm , Brent Bollman , Yann Roussillon
发明人： Craig Leidholm , Brent Bollman , Yann Roussillon
IPC分类号： H01L31/00 , H01L21/00 , B05D5/12
CPC分类号： H01L31/0322 , H01L31/0392 , H01L31/03925 , H01L31/03928 , Y02E10/541
摘要： An absorber layer of a photovoltaic device may be formed on an aluminum or metallized polymer foil substrate. A nascent absorber layer containing one or more elements of group IB and one or more elements of group IIIA is formed on the substrate. The nascent absorber layer and/or substrate is then rapidly heated from an ambient temperature to an average plateau temperature range of between about 200° C. and about 600° C. and maintained in the average plateau temperature range 1 to 30 minutes after which the temperature is reduced.
摘要翻译：光电器件的吸收层可以形成在铝或金属化的聚合物箔基底上。在衬底上形成包含IB族元素和IIIA族元素的初生吸收层。然后将新生吸收剂层和/或基材从环境温度快速加热至约200℃至约600℃的平均平台温度范围，并保持在平均平台温度范围1至30分钟之后，温度降低。

8. 发明授权

US07098058B1 Photovoltaic healing of non-uniformities in semiconductor devices 有权
标题翻译：半导体器件中非均匀性的光电愈合
公开(公告)号：US07098058B1
公开(公告)日：2006-08-29
申请号：US11035170
申请日：2005-01-13
申请人： Victor G. Karpov , Yann Roussillon , Diana Shvydka , Alvin D. Compaan , Dean M. Giolando
发明人： Victor G. Karpov , Yann Roussillon , Diana Shvydka , Alvin D. Compaan , Dean M. Giolando
IPC分类号： H01L21/00
CPC分类号： H01L31/186 , Y02E10/50 , Y02P70/521
摘要： A method of making a photovoltaic device using light energy and a solution to normalize electric potential variations in the device. A semiconductor layer having nonuniformities comprising areas of aberrant electric potential deviating from the electric potential of the top surface of the semiconductor is deposited onto a substrate layer. A solution containing an electrolyte, at least one bonding material, and positive and negative ions is applied over the top surface of the semiconductor. Light energy is applied to generate photovoltage in the semiconductor, causing a redistribution of the ions and the bonding material to the areas of aberrant electric potential. The bonding material selectively bonds to the nonuniformities in a manner such that the electric potential of the nonuniformities is normalized relative to the electric potential of the top surface of the semiconductor layer. A conductive electrode layer is then deposited over the top surface of the semiconductor layer.
摘要翻译：一种制造使用光能的光伏器件的方法和使器件的电位变化标准化的方法。具有包括偏离半导体的顶表面的电位的异常电位的区域的不均匀性的半导体层被沉积到衬底层上。将包含电解质，至少一种结合材料以及正离子和负离子的溶液施加到半导体的顶表面上。施加光能以在半导体中产生光电压，导致离子和结合材料再次分布到异常电位的区域。接合材料以不均匀性的电位相对于半导体层的顶表面的电位标准化的方式选择性地键合到不均匀性。然后在半导体层的顶表面上沉积导电电极层。

9. 发明申请

US20050257824A1 Photovoltaic cell including capping layer 审中-公开
标题翻译：光伏电池包括封盖层
公开(公告)号：US20050257824A1
公开(公告)日：2005-11-24
申请号：US10851652
申请日：2004-05-24
申请人： Michael Maltby , Dean Giolando , Yann Roussillon
发明人： Michael Maltby , Dean Giolando , Yann Roussillon
IPC分类号： H01L31/00
CPC分类号： H01L31/022466 , H01L31/022425 , H01L31/073 , H01L31/1836 , H01L31/1884 , Y02E10/543 , Y02P70/521
摘要： A photovoltaic cell can include a thin capping layer between a buffer layer and a first semiconductor layer to chemically and electrically isolate the buffer layer from the first semiconductor layer.
摘要翻译：光伏电池可以包括在缓冲层和第一半导体层之间的薄覆层，以化学和电隔离缓冲层与第一半导体层。

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