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1. 发明授权

US4471469A Negative resistance bubble memory and display device 失效
标题翻译：负电阻气泡记忆和显示装置
公开(公告)号：US4471469A
公开(公告)日：1984-09-11
申请号：US435682
申请日：1982-10-18
申请人： David G. Boyers
发明人： David G. Boyers
IPC分类号： G09G3/29 , G11C19/08 , G11C13/04
CPC分类号： G11C19/0858 , G09G3/29 , G11C19/0841
摘要： Disclosed is a memory or display device which includes a shift register having a bubble generator, a bubble propagator, and a bubble annihilator. Front and back glass plates are provided with dielectric-covered, transparent electrodes with the plates being positioned in spaced, parallel alignment. A suitable medium having a bilaterally symmetric V-J characteristic with a current controlled negative resistance region is provided between the plates and in contact with the dielectric covering the transparent electrodes. Bubbles are moved along an asymmetric track in the propagator by modulating voltage on two electrodes on opposing sides of the asymmetric track.
摘要翻译：公开了一种存储器或显示装置，其包括具有气泡发生器，气泡传播器和气泡湮灭器的移位寄存器。前后玻璃板设置有介电覆盖的透明电极，其中板以间隔开的平行对准的方式定位。具有电流控制负电阻区域的具有双向对称V-J特性的合适介质设置在板之间并与覆盖透明电极的电介质接触。气泡通过调制不对称轨道的相对侧上的两个电极上的电压在传播器中沿着不对称轨道移动。

2. 发明授权

US06674054B2 Method and apparatus for heating a gas-solvent solution 失效
标题翻译：用于加热气体溶剂溶液的方法和装置
公开(公告)号：US06674054B2
公开(公告)日：2004-01-06
申请号：US10133275
申请日：2002-04-26
申请人： David G. Boyers
发明人： David G. Boyers
IPC分类号： H05B678
CPC分类号： C03C23/00 , F28D7/106 , F28D7/14 , F28D7/1607
摘要： This invention provides a method of quickly heating a gas-solvent solution from a relatively low temperature T1 to a relatively high temperature T2, such that the gas-solvent solution has a much higher dissolved gas concentration at temperature T2 than could be achieved if the gas-solvent solution had originally been formed at the temperature T2. Various apparatuses are also provided for carrying out the heating method.
摘要翻译：本发明提供了一种将气溶剂溶液从相对低的温度T1快速加热到相对较高的温度T2的方法，使得气体溶剂溶液在温度T2下具有比可以实现的更高的溶解气体浓度溶剂溶液最初在温度T2下形成。还提供了用于进行加热方法的各种装置。

3. 发明授权

US4951304A Focused X-ray source 失效
标题翻译：聚焦X射线源
公开(公告)号：US4951304A
公开(公告)日：1990-08-21
申请号：US378907
申请日：1989-07-12
申请人： Melvin A. Piestrup , David G. Boyers , Cary I. Pincus , Pierre Maccagno
发明人： Melvin A. Piestrup , David G. Boyers , Cary I. Pincus , Pierre Maccagno
IPC分类号： G21K1/06
CPC分类号： G21K1/06 , G21K2201/064
摘要： An intense, relatively inexpensive X-ray source (as compared to a synchrotron emitter) for technological, scientific, and spectroscopic purposes. A conical radiation pattern produced by a single foil or stack of foils is focused by optics to increase the intensity of the radiation at a distance from the conical radiator.
摘要翻译：用于技术，科学和光谱目的的强烈，相对便宜的X射线源（与同步加速器发射器相比）。由单个箔片或箔叠层产生的锥形辐射图案通过光学器件聚焦，以增加与锥形辐射器相距一定距离处的辐射强度。

4. 发明授权

US06982006B1 Method and apparatus for treating a substrate with an ozone-solvent solution 失效
标题翻译：用臭氧溶剂溶液处理底物的方法和设备
公开(公告)号：US06982006B1
公开(公告)日：2006-01-03
申请号：US09693012
申请日：2000-10-19
申请人： David G. Boyers , Jay Theodore Cremer, Jr.
发明人： David G. Boyers , Jay Theodore Cremer, Jr.
IPC分类号： C23G1/02
CPC分类号： H01L21/02071 , A61L2/183 , A61L2202/122 , A61L2202/24 , B08B3/04 , B08B2203/005 , C01B13/10 , G03F7/40 , H01L21/0206 , H01L21/31133 , Y10S134/902
摘要： A general method and apparatus for treating materials at high speed comprises the steps of dissolving a relatively high concentration ozone gas in a solvent at a relatively low predetermined temperature T1 to form an ozone-solvent solution with a relatively high dissolved ozone concentration, and heating either the ozone-water solution or the material to be treated or both, the ozone-solvent solution and the material to be oxidized with a point-of-use heater to quickly increase the temperature to a predetermined higher temperature T2>T1, and applying the ozone-solvent solution to said material(s) whereby the heated ozone-water solution will have a much higher dissolved ozone concentration at said higher temperature, than could be achieved if the ozone gas was initially dissolved in water at said higher temperature.
摘要翻译：用于高速处理材料的一般方法和装置包括以相当低的预定温度T 1将相对高浓度的臭氧气体溶解在溶剂中以形成具有较高的溶解臭氧浓度的臭氧溶剂溶液和加热臭氧水溶液或待处理材料或二者的混合物，臭氧溶剂溶液和用点燃加热器氧化的材料，以将温度快速升高到预定的较高温度T 2> T 1，并将臭氧溶剂溶液施加到所述材料上，由此在所述较高温度下加热的臭氧水溶液将具有高得多的溶解臭氧浓度，如果最初在较高温度下将臭氧气体溶解在水中时可达到的。

5. 发明授权

US5077774A X-ray lithography source 失效
标题翻译： X射线光刻源
公开(公告)号：US5077774A
公开(公告)日：1991-12-31
申请号：US570210
申请日：1990-08-21
申请人： Melvin A. Piestrup , David G. Boyers , Cary Pincus
发明人： Melvin A. Piestrup , David G. Boyers , Cary Pincus
IPC分类号： G03F7/20 , G21K1/06 , G21K5/08 , H01J35/00
CPC分类号： G03F7/70033 , G21K1/06 , G21K5/08 , H01J35/00 , G21K2201/064
摘要： A high-intensity, inexpensive X-ray source for X-ray lithography for the production of integrated circuits. Foil stacks are bombarded with a high-energy electron beam of 25 to 250 MeV to produce a flux of soft X-rays of 500 eV to 3 keV. Methods of increasing the total X-ray power and making the cross section of the X-ray beam uniform are described. Methods of obtaining the desired X-ray-beam field size, optimum frequency spectrum and elminating the neutron flux are all described. A method of obtaining a plurality of station operation is also described which makes the process more efficient and economical. The satisfying of these issues makes transition radiation an exellent moderate-priced X-ray source for lithography.
摘要翻译：用于生产集成电路的X射线光刻的高强度，便宜的X射线源。用25至250MeV的高能电子束轰击箔堆，以产生500eV至3keV的软X射线通量。描述了增加X射线总功率并使X射线束横截面均匀的方法。全部描述了获得期望的X射线束场尺寸，最佳频谱和中和通量的方法。还描述了获得多个站操作的方法，其使得该过程更有效和经济。令人满意的这些问题使过渡辐射成为一种中等价格的X光源，用于光刻。

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