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1. 发明授权

US07345316B2 Wafer level packaging for optoelectronic devices 有权
标题翻译：光电子器件的晶圆级封装
公开(公告)号：US07345316B2
公开(公告)日：2008-03-18
申请号：US09999517
申请日：2001-10-24
申请人： David W. Sherrer , Mindaugus F. Dautargas , Neil Ricks , Dan A. Steinberg
发明人： David W. Sherrer , Mindaugus F. Dautargas , Neil Ricks , Dan A. Steinberg
IPC分类号： H01L29/22 , H01L29/227 , H01L33/00
CPC分类号： G02B6/423 , G02B6/30 , G02B6/3636 , G02B6/3652 , G02B6/3692 , G02B6/4201 , G02B6/4204 , G02B6/421 , G02B6/4232 , G02B6/4243 , G02B6/4251
摘要： An optical device package includes a substrate having an upper surface, a distal end, a proximal end, and distal and proximal longitudinally extending notches co-linearly aligned with each other. A structure is mounted to the substrate and has at least one recessed portion. The structure can be a lid or a frame to which a lid is bonded. An optical fiber is positioned within at least one of the proximal longitudinally extending notch and the distal longitudinally extending notch and within the recessed portion of the structure mounted to the substrate. The optical device package can also include conductive legs extending upwardly from bonding pads on the upper surface of the substrate to facilitate flip mounting of the optical device package onto a circuit board or other such platform.
摘要翻译：光学器件封装包括具有上表面，远端，近端以及彼此共线直线对准的远侧和近端纵向延伸的凹口的衬底。一种结构被安装到基底上并具有至少一个凹进部分。该结构可以是盖子或盖子被结合到其上的框架。光纤被定位在近端纵向延伸凹口和远侧纵向延伸凹口中的至少一个中，并且位于安装到基底的结构的凹陷部分内。光学器件封装还可以包括从衬底的上表面上的焊盘向上延伸的导电腿，以便将光学器件封装翻转安装到电路板或其它这样的平台上。

2. 发明授权

US07251406B2 Optical waveguide termination with vertical and horizontal mode shaping 有权
标题翻译：光波导终端采用垂直和水平模式整形
公开(公告)号：US07251406B2
公开(公告)日：2007-07-31
申请号：US10498182
申请日：2002-12-05
申请人： Hui Luo , Mindaugas F. Dautartas , Dan A. Steinberg , David W. Sherrer
发明人： Hui Luo , Mindaugas F. Dautartas , Dan A. Steinberg , David W. Sherrer
IPC分类号： G02B6/10
CPC分类号： G02B6/1228 , G02B6/14 , G02B6/305
摘要： An optical device is disclosed which includes a single-mode waveguide (700) which supports a first optical mode in a first region and a second optical mode in a second region. The waveguide includes a guiding layer (703) having at least one wing (750) extended outwardly from the guiding layer (703). The guiding layer (703) may desirably have a rib waveguide (706, 707) cross sectional shape at the wings. The wings (750) decrease in width along the length of the guiding layer to convert a rib waveguide mode at the wings to a channel waveguide mode.
摘要翻译：公开了一种光学装置，其包括在第一区域中支持第一光学模式的单模式波导（700）和在第二区域中的第二光学模式。波导包括具有从引导层（703）向外延伸的至少一个翼（750）的引导层（703）。引导层（703）可期望地在翼部具有肋波导（706,707）横截面形状。翼部（750）沿着引导层的长度减小宽度，以将翅膀处的肋波导模式转换为通道波导模式。

3. 发明授权

US07157016B2 Etching process for micromachining crystalline materials and devices fabricated thereby 有权
标题翻译：用于微加工结晶材料的蚀刻工艺和由此制造的器件
公开(公告)号：US07157016B2
公开(公告)日：2007-01-02
申请号：US10860809
申请日：2004-05-24
申请人： Dan A Steinberg
发明人： Dan A Steinberg
IPC分类号： B44C1/22 , B29D11/00 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： B81C1/00547 , B81B2201/047 , B81C1/00 , G02B6/4214
摘要： The present invention relates generally to micromachining. More particularly, the present invention relates to a method for combining directional ion etching and anisotropic wet etching and devices and structures fabricated thereby. The present invention is particularly applicable to silicon micromachining and provides architectures that combine crystallographic surfaces and vertical dry etched surfaces together in the same structure.
摘要翻译：本发明一般涉及微加工。更具体地，本发明涉及用于组合定向离子蚀刻和各向异性湿法蚀刻的方法以及由此制造的器件和结构。本发明特别适用于硅微加工，并且提供将结晶表面和垂直干蚀刻表面组合在同一结构中的结构。

4. 发明授权

US06898029B2 Optical bench with alignment subassembly 失效
标题翻译：具有对准子组件的光学台
公开(公告)号：US06898029B2
公开(公告)日：2005-05-24
申请号：US09988055
申请日：2001-11-16
申请人： Dan A. Steinberg , Mindaugas F. Dautartas , Hui Luo
发明人： Dan A. Steinberg , Mindaugas F. Dautartas , Hui Luo
IPC分类号： G02B6/34 , G02B6/42 , G02B7/02 , D06N7/04 , G02B6/36
CPC分类号： G02B6/4231 , G02B6/29305 , G02B6/29361 , Y10T428/24372
摘要： An optical subassembly which positions an optical device is described. The optical device is mounted on a plurality of spheres or columns placed in predetermined positions in an upper surface of a substrate. The predetermined positions include pits formed in the upper surface of the substrate. The spheres may be the same size or may be of varying sizes. Pits or grooves also may be formed in the optical device. The optical device may be formed with flexure positions to assist in holding it in place on the spheres. Further, the optical device, spheres and substrate may be metallized or formed of metal and the surface tension forces of solder may be utilized to position the optical device.
摘要翻译：描述了定位光学装置的光学子组件。光学装置安装在放置在基板的上表面中的预定位置的多个球体或列上。预定位置包括形成在基板的上表面中的凹坑。球体可以具有相同的尺寸或可以具有不同的尺寸。也可以在光学装置中形成凹坑或凹槽。光学装置可以形成有弯曲位置以有助于将其保持在球体上的适当位置。此外，光学器件，球体和衬底可以金属化或由金属形成，并且可以利用焊料的表面张力来定位光学器件。

5. 发明授权

US06832016B2 Fiber array switch having micromachined front face with roller balls 失效
标题翻译：光纤阵列开关具有微加工前表面与滚球
公开(公告)号：US06832016B2
公开(公告)日：2004-12-14
申请号：US09728896
申请日：2000-12-01
申请人： Dan A Steinberg , David W Sherrer , Mindaugas F Dautartas
发明人： Dan A Steinberg , David W Sherrer , Mindaugas F Dautartas
IPC分类号： G02B626
CPC分类号： G02B6/3508 , G02B6/3546 , G02B6/3568 , G02B6/3582 , G02B6/3839 , G02B6/3841
摘要： An optical fiber switch having two coupled fiber arrays which move in a transverse direction to provide switching action. Each array has a front face and the front faces are nearly in contact. Optical fiber ends are located at the front faces. The front faces of the fiber arrays have transverse grooves in which rolling spheres are disposed. The fiber arrays move by rolling on the spheres. The spheres provide for smooth transverse motion and a fixed distance between optical fiber arrays. The spheres and front face grooves also provide for alignment between the optical fibers.
摘要翻译：一种具有两个耦合的光纤阵列的光纤开关，其在横向上移动以提供切换动作。每个阵列都有一个正面，前面几乎接触。光纤端头位于前面。纤维阵列的前表面具有设置有滚动球体的横向槽。纤维阵列通过在球体上滚动而移动。球体提供平滑的横向运动和光纤阵列之间的固定距离。球体和前面槽还提供光纤之间的对准。

6. 发明授权

US06526204B1 Optical fiber array for preventing flow of glue between fibers and waveguide 有权
标题翻译：用于防止光纤和波导之间胶水流动的光纤阵列
公开(公告)号：US06526204B1
公开(公告)日：2003-02-25
申请号：US09713117
申请日：2000-11-15
申请人： David W Sherrer , Dan A Steinberg , Mindaugas F Dautartas
发明人： David W Sherrer , Dan A Steinberg , Mindaugas F Dautartas
IPC分类号： G02B636
CPC分类号： G02B6/32 , G02B6/30 , G02B6/3636 , G02B6/3652 , G02B6/3692
摘要： An optical fiber array having wick stop grooves in a front face of the array. The wick stop grooves control the movement of liquid adhesive (e.g. UV curable adhesive, solder, sol-gel). Particularly, the wick stop grooves prevent liquid adhesive from flowing between the optical fibers in the array and waveguides of an integrated optic chip. Adhesives disposed in the fiber-waveguide optical path can degrade the performance of optical devices. The wick stop grooves can be cut with a dicing saw, or chemically etched (wet or dry), and can have a wide variety of patterns (e.g., straight lines, circles). In any case, the wick stop grooves must prevent the flow of liquid adhesive between the fibers and waveguides. Alternatively, the wick stop grooves are disposed in an edge of the integrated optic chip. Also, the wick stop grooves can be disposed on the front face of other microoptical devices such as filters and lenslet arrays.
摘要翻译：一种在阵列前表面具有芯阻止凹槽的光纤阵列。芯吸槽控制液体粘合剂（例如UV可固化粘合剂，焊料，溶胶 - 凝胶）的运动。特别地，灯芯止动槽防止液体粘合剂在阵列中的光纤和集成光学芯片的波导之间流动。布置在光纤波导光路中的粘合剂可以降低光学器件的性能。灯芯停止槽可以用切割锯切割，或者化学蚀刻（湿或干），并且可以具有多种图案（例如，直线，圆形）。在任何情况下，芯阻止槽必须防止纤维和波导之间的液体粘合剂的流动。或者，灯芯止动槽设置在集成光学芯片的边缘。此外，灯芯停止槽可以设置在其他微光学装置的前表面上，例如滤光器和小透镜阵列。

7. 发明授权

US07290321B2 Alignment apparatus and method for aligning stacked devices 有权
标题翻译：用于对准堆叠装置的对准装置和方法
公开(公告)号：US07290321B2
公开(公告)日：2007-11-06
申请号：US11500061
申请日：2006-08-07
申请人： Dan A. Steinberg , Mindaugas F. Dautartas , Jasean Rasnake
发明人： Dan A. Steinberg , Mindaugas F. Dautartas , Jasean Rasnake
IPC分类号： B23Q3/00
CPC分类号： G02B6/4231 , G02B6/4204 , G02B6/423 , Y10T29/49133 , Y10T29/49895
摘要： An apparatus for passively aligning first and second substrates having micro-components disposed thereon when the substrates do not include patterned surfaces which face each other. The apparatus includes a first depression which cooperates with an alignment sphere to mechanically engage a corresponding depression disposed on the front surface of the first substrate and a second depression which cooperates with a second alignment sphere to mechanically engage a corresponding depression disposed on the front surface of the second substrate. The first and second depression of the alignment apparatus and the alignment spheres cooperate to passively align micro-components disposed on each of the substrates.
摘要翻译：一种用于在基板不包括彼此面对的图案化表面的情况下被动地对准具有设置在其上的微元件的第一和第二基板的装置。该设备包括与对准球配合以与设置在第一基板的前表面上的对应的凹部机械接合的第一凹陷部以及与第二对准球体配合的第二凹陷部，第二基板。对准装置和对准球的第一和第二凹陷配合以被动地对准布置在每个基底上的微组件。

8. 发明授权

US07255978B2 Multi-level optical structure and method of manufacture 有权
标题翻译：多级光学结构及制造方法
公开(公告)号：US07255978B2
公开(公告)日：2007-08-14
申请号：US09858999
申请日：2001-05-16
申请人： Dan A. Steinberg , David W. Sherrer
发明人： Dan A. Steinberg , David W. Sherrer
IPC分类号： G03F7/26
CPC分类号： G02B6/30 , G02B6/12004 , G02B6/136 , G02B6/138 , G03F1/38 , G03F1/50 , G03F1/60 , Y10T428/26
摘要： A multi-level optical device includes a substrate having a baseline level. At least one feature is disposed at a level above the baseline level. At least one feature is disposed at a level below the baseline level, or in the feature above the baseline level is located at a distance apart from the feature below the baseline level. The distance has an accuracy inn the range of approximately ±0.05 μm to less than approximately ±1.0 μm.A method of fabricating an optical device includes forming at least one feature at a level of above a baseline level of a substrate; and forming at least one feature at a baseline level below the baseline level of the substrate, wherein the feature at a level above the baseline level and the feature at a level below the baseline level are patterned in a single-mask step using a multi-level mask.
摘要翻译：多级光学器件包括具有基准电平的衬底。至少一个特征被设置在高于基线水平的水平上。至少一个特征被布置在低于基准水平的水平处，或者在基线水平以上的特征中位于距离基准水平以下的特征的距离处。该距离的精度范围约为±0.05μm至小于约±1.0μm。一种制造光学器件的方法包括在衬底的基线水平以上的水平上形成至少一个特征; 以及在低于所述基底的基线水平的基线水平处形成至少一个特征，其中，在所述基线水平以上的水平处的所述特征和所述基线水平以下的水平处的特征在单掩模步骤中被图案化，级别面具。

9. 发明授权

US07246953B2 Optical device package 有权
标题翻译：光器件封装
公开(公告)号：US07246953B2
公开(公告)日：2007-07-24
申请号：US11080002
申请日：2005-03-15
申请人： Dan A. Steinberg , David W. Sherrer , Mindaugas F. Dautargas
发明人： Dan A. Steinberg , David W. Sherrer , Mindaugas F. Dautargas
IPC分类号： G02B6/36
CPC分类号： G02B6/421 , G02B6/4201 , G02B6/423 , G02B6/4243 , G02B6/4245 , G02B6/4251 , H01L2224/16225
摘要： An optical device package includes a substrate having a top portion with an a recess for receiving an optical semiconductor component and an elongated linear groove for receiving an optical fiber. The optical fiber is positioned within the groove in said substrate such that the top surface of the optical fiber is substantially at or below the upper surface of the substrate and the optical fiber is operatively aligned with the optical semiconductor component for the transfer of optical signals therebetween. A frame is hermetically sealed to the upper surface of the substrate.
摘要翻译：光学器件封装包括具有顶部的基板，该顶部具有用于接收光学半导体部件的凹部和用于接收光纤的细长直线槽。光纤位于所述基板中的凹槽内，使得光纤的顶表面基本上在基板的上表面上或下方，并且光纤与光半导体部件可操作地对准以在其间传输光信号。框架被密封到基板的上表面。

10. 发明授权

US07198727B2 Etching process for micromachining materials and devices fabricated thereby 有权
标题翻译：用于由其制造的微加工材料和器件的蚀刻工艺
公开(公告)号：US07198727B2
公开(公告)日：2007-04-03
申请号：US11152671
申请日：2005-06-14
申请人： Dan A. Steinberg , Larry J. Rasnake
发明人： Dan A. Steinberg , Larry J. Rasnake
IPC分类号： B44C1/22
CPC分类号： G02B6/3636 , G02B6/136 , G02B6/3652 , G02B6/3692 , G02B6/4206 , G02B6/423 , G02B6/4234 , G02B2006/12176
摘要： The present invention provides an optical microbench having intersecting structures etched into a substrate. In particular, microbenches in accordance with the present invention include structures having a planar surfaces formed along selected crystallographic planes of a single crystal substrate. Two of the structures provided are an etch-stop pit and an anisotropically etched feature disposed adjacent the etch-stop pit. At the point of intersection between the etch-stop pit and the anisotropically etched feature the orientation of the crystallographic planes is maintained. The present invention also provides a method for micromachining a substrate to form an optical microbench. The method comprises the steps of forming an etch-stop pit and forming an anisotropically etched feature adjacent the etch-stop pit. The method may also comprise coating the surfaces of the etch-stop pit with an etch-stop layer.
摘要翻译：本发明提供一种具有蚀刻到衬底中的相交结构的光学微型台。特别地，根据本发明的微型薄片包括具有沿着单晶衬底的选定结晶面形成的平面的结构。提供的两个结构是蚀刻停止凹坑和邻近蚀刻停止凹坑设置的各向异性蚀刻特征。在蚀刻停止凹坑和各向异性蚀刻特征之间的交点处，维持结晶平面的取向。本发明还提供了一种用于微加工基板以形成光学微型台的方法。该方法包括以下步骤：形成蚀刻停止凹坑并在蚀刻停止凹坑附近形成各向异性蚀刻的特征。该方法还可以包括用蚀刻停止层涂覆蚀刻停止凹坑的表面。

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