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1. 发明授权

US08728959B2 Textile digital band and fabricating method thereof 有权
标题翻译：纺织数字带及其制造方法
公开(公告)号：US08728959B2
公开(公告)日：2014-05-20
申请号：US12531676
申请日：2008-06-27
申请人： Gi Soo Chung , Dae Hoon Lee , Jae Sang An
发明人： Gi Soo Chung , Dae Hoon Lee , Jae Sang An
IPC分类号： D03D15/00 , D02G3/00 , H05K9/00 , H05B3/00
CPC分类号： D03D15/00 , D02G3/12 , D02G3/36 , D02G3/441 , D03D1/0088 , D03D3/005 , D03D15/0027 , D03D15/0066 , D10B2101/20 , D10B2401/16 , D10B2501/06 , H05K1/038 , H05K2201/0281 , H05K2201/029 , H05K2201/09809 , Y10T428/2942 , Y10T428/2944 , Y10T428/2947 , Y10T442/3065 , Y10T442/3976
摘要： The present invention relates to a textile digital band which is capable of providing a high-speed communication path with surrounding computing devices, through easy and convenient attachment thereof to a conventional garment, and a fabrication method thereof. For this purpose, disclosed herein is a textile digital band comprising a plurality of warps formed parallel to each other in the first direction, and a plurality of wefts formed parallel to each other in the second direction perpendicular to the first direction, wherein the warp includes at least one digital yarn through which electrical currents can flow.
摘要翻译：本发明涉及一种纺织数字带，其能够通过简单方便地将其连接到常规服装上而与周围的计算设备提供高速通信路径及其制造方法。为此目的，本文公开了一种纺织数字带，其包括在第一方向上彼此平行形成的多个经纱和在垂直于第一方向的第二方向上彼此平行地形成的多个纬纱，其中，经纱包括至少一个电流可流过的数字纱线。

2. 发明授权

US08701578B2 Digital garment using embroidery technology and fabricating method thereof 有权
标题翻译：数字服装采用刺绣技术及其制作方法
公开(公告)号：US08701578B2
公开(公告)日：2014-04-22
申请号：US12919432
申请日：2009-02-12
申请人： Gi Soo Chung , Dae Hoon Lee , Jae Sang An
发明人： Gi Soo Chung , Dae Hoon Lee , Jae Sang An
IPC分类号： D05C17/00
CPC分类号： A41D1/005 , D05C7/00 , D05D2303/00
摘要： Disclosed is a digital garment using embroidery technology. In the digital garment, a digital embroidery pattern is formed on a common garment to provide a communication path, an antenna pattern, etc. The digital garment comprises a garment made of a textile and having one side and the other side opposite to each other, a digital embroidery pattern formed along the inner or outer surface of the garment using embroidery technology to provide a communication path to the garment, a sensor attached to the garment and electrically connected to the digital embroidery pattern to convert physical signals to electrical signals, an arithmetic unit attached to the garment and electrically connected to the digital embroidery pattern to process the electrical signals inputted from the sensor, and a communication module attached to the garment and electrically connected to the digital embroidery pattern to perform wireless communication. Further disclosed is a method for fabricating the digital garment using embroidery technology.
摘要翻译：披露的是使用刺绣技术的数字服装。在数字服装中，数字刺绣图案形成在普通的衣服上以提供通信路径，天线图案等。数字服装包括由纺织品制成的衣服，并且具有彼此相对的一侧和另一侧，使用刺绣技术沿着衣服的内表面或外表面形成的数字刺绣图案，以提供到衣服的通信路径，附接到衣服并电连接到数字刺绣图案以将物理信号转换为电信号的传感器，算术连接到衣服并电连接到数字刺绣图案以处理从传感器输入的电信号的单元，以及连接到衣服并电连接到数字刺绣图案以执行无线通信的通信模块。另外公开了使用刺绣技术制造数字服装的方法。

3. 发明授权

US08568662B2 Plasma reaction apparatus, plasma reaction method using the same, plasma reaction method of persistent gas, and apparatus for decreasing NOx by occlusion catalyst 有权
标题翻译：等离子体反应装置，使用其的等离子体反应方法，持续气体的等离子体反应方法，以及通过堵塞催化剂降低NOx的装置
公开(公告)号：US08568662B2
公开(公告)日：2013-10-29
申请号：US11992077
申请日：2006-10-09
申请人： Dae Hoon Lee , Kwan Tae Kim , Young Hoon Song , Min Suk Cha , Jae Ok Lee , Seock Joon Kim
发明人： Dae Hoon Lee , Kwan Tae Kim , Young Hoon Song , Min Suk Cha , Jae Ok Lee , Seock Joon Kim
IPC分类号： B01J19/08
CPC分类号： B01J19/088 , B01D53/32 , B01D53/8631 , B01D2257/404 , B01D2259/818 , B01J2219/0809 , B01J2219/0824 , B01J2219/083 , B01J2219/0869 , B01J2219/0871 , B01J2219/0883 , H05H1/48
摘要： The present invention relates to a plasma reaction apparatus and a plasma reaction method using the same. More particularly, the present invention relates to a plasma reaction apparatus which is applied to the reforming of fuel by generating rotating arc plasma and using the rotating arc being generated, the chemical treatment of a persistent gas, and the apparatus for decreasing NOx by an occlusion catalyst, and a plasma reaction method using the same. For this purpose, a raw material for a reaction is allowed to flow through an inflow hole in a swirl structure so that the raw material forms a rotating flow to progress. Accordingly, the raw material is sufficiently reacted in a plasma reaction space of a restrictive volume, and a high temperature plasma reaction is more promptly performed. Furthermore, a plasma reaction zone is expanded, prior to discharge, by a broad area chamber formed as the width of an upper part of a furnace is expanded, and plasma being generated is expanded and stayed as a pointed end spaced from an electrode at a predetermined interval is formed at an expanded end. Accordingly, the present invention relates to a plasma reaction apparatus and a plasma reaction method using the same, a plasma reaction method of a persistent gas, and an apparatus decreasing NOx by an occlusion catalyst, all of which are capable of excluding the discontinuity of the plasma reaction zone.
摘要翻译：本发明涉及一种等离子体反应装置及使用其的等离子体反应方法。更具体地，本发明涉及一种等离子体反应装置，其通过产生旋转电弧等离子体并利用所产生的旋转电弧，持续气体的化学处理和通过闭塞来降低NOx的装置应用于燃料重整催化剂和使用其的等离子体反应方法。为此，允许用于反应的原料流过旋流结构中的流入孔，使得原料形成旋转流动进行。因此，原料在限制体积的等离子体反应空间中充分反应，更迅速地进行高温等离子体反应。此外，等离子体反应区在放电之前被扩大，当炉的上部的宽度被扩大时形成的宽区域，并且产生的等离子体膨胀并且作为与电极间隔开的尖端保持在扩展端形成预定间隔。因此，本发明涉及使用其的等离子体反应装置及其等离子体反应方法，持续气体的等离子体反应方法以及通过阻塞催化剂减少NOx的装置，所有这些都能够排除不均匀性等离子体反应区。

4. 发明授权

US08524162B2 Plasma reaction, apparatus for decreasing NOx by occlusion catalyst using the same 有权
标题翻译：等离子体反应，使用该催化剂减少NOx的装置
公开(公告)号：US08524162B2
公开(公告)日：2013-09-03
申请号：US13567481
申请日：2012-08-06
申请人： Dae Hoon Lee , Kwan Tae Kim , Young Hoon Song , Min Suk Cha , Jae Ok Lee , Seock Joon Kim
发明人： Dae Hoon Lee , Kwan Tae Kim , Young Hoon Song , Min Suk Cha , Jae Ok Lee , Seock Joon Kim
IPC分类号： B01J19/08
CPC分类号： B01J19/088 , B01D53/32 , B01D53/8631 , B01D2257/404 , B01D2259/818 , B01J2219/0809 , B01J2219/0824 , B01J2219/083 , B01J2219/0869 , B01J2219/0871 , B01J2219/0883 , H05H1/48
摘要： A plasma reaction apparatus and method applied to reformation of fuel by generating and using rotating arc plasma in a furnace, the chemical treatment of a persistent gas, and the apparatus for decreasing NOx by an occlusion catalyst. A raw material for a reaction is allowed to flow into the furnace through a hole, causing it to flow within the furnace in a continuous swirl. Furthermore, an expanded plasma reaction zone is provided by a wide area chamber which is formed on an upper part of the furnace and has a greater width than that of a lower part of the furnace, and thus a plasma being generated can be expanded by the expanded plasma zone and delayed from flowing out of the furnace by corners of the wide area chamber that is spaced from a plasma inducing electrode therein.
摘要翻译：一种用于通过在炉中产生和使用旋转电弧等离子体来改变燃料的等离子体反应装置和方法，持续气体的化学处理以及通过闭塞催化剂降低NOx的装置。允许反应原料通过孔流入炉中，使其在炉内以连续的涡流流动。此外，扩大的等离子体反应区由形成在炉的上部的宽的区域室提供，并且具有比炉的下部更大的宽度，因此产生的等离子体可以通过扩张的等离子体区域，并且与从其中的等离子体诱导电极间隔开的广域室的角落延迟流出炉外。

5. 发明申请

US20130087287A1 PLASMA REACTOR FOR REMOVAL OF CONTAMINANTS 审中-公开
标题翻译：用于去除污染物的等离子体反应器
公开(公告)号：US20130087287A1
公开(公告)日：2013-04-11
申请号：US13534446
申请日：2012-06-27
申请人： Min HUR , Jae Ok LEE , Woo Seok KANG , Dae-Hoon LEE , Kwan-Tae KIM , Young-Hoon SONG
发明人： Min HUR , Jae Ok LEE , Woo Seok KANG , Dae-Hoon LEE , Kwan-Tae KIM , Young-Hoon SONG
IPC分类号： B05C9/00
CPC分类号： H01J37/32844 , B01D53/32 , B01D53/70 , B01D2257/2047 , B01D2257/2066 , B01D2258/0216 , B01D2259/818 , C23C16/4412 , H01J37/32348 , H01J37/32541 , H01J37/32568 , H01J37/32834 , H05H1/2406 , H05H2001/2462 , H05H2245/1215 , Y02C20/30 , Y02P70/605
摘要： Provided is a plasma reactor for removal of contaminants, which is installed between a process chamber and a vacuum pump and removes contaminants emitted from a process chamber. The plasma reactor includes: at least one dielectric body that forms a plasma generation space therein; a ground electrode connected to at least one end of the dielectric body; and at least one driving electrode fixed to an outer peripheral surface of the dielectric body, and connected to an AC power supply unit to receive an AC driving voltage. The ground electrode has a non-uniform diameter along the lengthwise direction of the plasma reactor.
摘要翻译：提供了一种用于去除污染物的等离子体反应器，其被安装在处理室和真空泵之间并且去除从处理室排出的污染物。等离子体反应器包括：在其中形成等离子体产生空间的至少一个绝缘体; 连接到电介质体的至少一端的接地电极; 以及至少一个驱动电极，其固定到所述电介质体的外周表面，并且连接到AC电源单元以接收AC驱动电压。接地电极沿着等离子体反应器的长度方向具有不均匀的直径。

6. 发明申请

US20110089017A1 PLASMA REACTOR FOR ABATING HAZARDOUS MATERIALS AND DRIVING METHOD THEREOF 有权
标题翻译：用于消除危险材料的等离子体反应器及其驱动方法
公开(公告)号：US20110089017A1
公开(公告)日：2011-04-21
申请号：US12905227
申请日：2010-10-15
申请人： Min HUR , Min-Suk Cha , Young-Hoon Song , Jae-Ok Lee , Dae-Hoon Lee , Kwan-Tae Kim
发明人： Min HUR , Min-Suk Cha , Young-Hoon Song , Jae-Ok Lee , Dae-Hoon Lee , Kwan-Tae Kim
IPC分类号： B01J19/12 , B01J19/08
CPC分类号： H01J37/3255 , B01D53/32 , B01D53/323 , B01D2257/20 , B01D2257/2066 , B01D2257/40 , B01D2257/708 , B01D2258/0216 , B01D2259/818 , H01J37/32091 , H01J37/32348 , H01J37/32541 , H01J37/32834 , H01J37/32844 , H05H1/2406 , H05H2001/2456 , H05H2001/2462 , H05H2245/121 , H05H2245/1215 , Y02C20/30 , Y02P70/605
摘要： The present invention provides a plasma reactor for abating hazardous materials generated in a low-pressure process during a process of manufacturing a display or a semiconductor. A plasma reactor for abating hazardous materials according to an exemplary embodiment of the present invention includes: a first ground electrode and a second ground electrode disposed at a distance from each other; a dielectric fixed between the first ground electrode and the second ground electrode; and at least one driving electrode disposed on an outer surface of the dielectric, being spaced apart from the first ground electrode and the second ground electrode and connected to an AC power supply unit to receive a driving voltage therefrom.
摘要翻译：本发明提供了一种用于在制造显示器或半导体的过程中减轻在低压工艺中产生的有害材料的等离子体反应器。根据本发明的示例性实施例的用于减轻有害材料的等离子体反应器包括：第一接地电极和彼此间隔设置的第二接地电极; 固定在第一接地电极和第二接地电极之间的电介质; 以及设置在电介质的外表面上的至少一个驱动电极，与第一接地电极和第二接地电极间隔开并连接到AC电源单元以从其接收驱动电压。

7. 发明申请

US20100325770A1 DIGITAL GARMENT USING DIGITAL BAND AND FABRICATING METHOD THEREOF 有权
标题翻译：使用数字带的数字服装及其制作方法
公开(公告)号：US20100325770A1
公开(公告)日：2010-12-30
申请号：US12531944
申请日：2008-08-14
申请人： Gi Soo Chung , Dae Hoon Lee , Jae Sang An
发明人： Gi Soo Chung , Dae Hoon Lee , Jae Sang An
IPC分类号： A41D13/00 , B23P19/00
CPC分类号： D03D15/00 , A41D1/00 , D02G3/12 , D02G3/36 , D02G3/441 , D03D1/0088 , D03D3/005 , D03D15/0027 , D03D15/0066 , D10B2101/20 , D10B2401/16 , D10B2501/06 , H05K1/038 , H05K2201/0281 , H05K2201/029 , H05K2201/09809 , H05K2201/10098 , H05K2201/10128 , H05K2201/10151 , Y10S2/901 , Y10S2/902 , Y10T29/49826
摘要： Disclosed is a digital garment that can provide a high-speed communication path by using a digital band that is quickly and easily attachable to a conventional garment (clothes), and a fabricating method thereof. The digital garment includes: a garment formed of textile; a digital band provided along the outside or inside of the garment so as to provide a communication path; a sensor, attached to the garment, being electrically coupled to the digital band, converting a physical signal into an electrical signal; an operation device, attached to the garment, being electrically coupled to the digital band, receiving the electrical signal from the sensor and processing the signal; and a communication module, attached to the garment, being electrically coupled to the digital band so as to perform wireless communication.
摘要翻译：公开了一种数字服装，其可以通过使用快速且容易地附接到常规服装（衣服）的数字频带来提供高速通信路径及其制造方法。数码服装包括：纺织服装; 沿着衣服的外侧或内侧设置的数字带，以提供通信路径; 附接到衣服的传感器电耦合到数字频带，将物理信号转换成电信号; 附接到衣服的操作装置电耦合到数字频带，从传感器接收电信号并处理信号; 以及连接到服装的通信模块，电连接到数字频带，以进行无线通信。

8. 发明授权

US06999148B2 Apparatus, mask, and method for printing alignment layer 有权
公开(公告)号：US06999148B2
公开(公告)日：2006-02-14
申请号：US10271743
申请日：2002-10-17
申请人： Dae Hoon Lee
发明人： Dae Hoon Lee
IPC分类号： G02F1/1337
CPC分类号： G02F1/133711 , G02F1/133723 , G02F1/133784 , G02F1/133788
摘要： An apparatus for printing an alignment layer of a liquid crystal display device includes a dispenser dropping an alignment material, an anilox roll receiving the dropped alignment material, a doctor roll evenly spreading the dropped alignment material coated onto the anilox roll, and a printing roll receiving the alignment material from the anilox roll, and transferring the alignment material onto a substrate, wherein the printing roll has a plurality of masks each having a numerical aperture of about 5% to 25%.

9. 发明授权

US06672522B2 Wind power generating system 失效
标题翻译：风力发电系统
公开(公告)号：US06672522B2
公开(公告)日：2004-01-06
申请号：US10084196
申请日：2002-02-28
申请人： Koo Shik Lee , Dae Hoon Lee
发明人： Koo Shik Lee , Dae Hoon Lee
IPC分类号： F03D500
CPC分类号： F03D5/04 , Y02E10/70
摘要： Disclosed is a wind power generating system. The system comprises moving bodies connected one with another by connectors and repeatedly circulated on a rail of an endless track; sail devices rotatably mounted to the moving bodies and exposed to wind, each sail device having a sail and a mast and including a rotating mechanism for rotating the mast; geared members affixed to one sides of the moving bodies; a generator having a gear which is meshed with the geared members and thereby rotated to allow the generator to generate electricity; direction changing devices located at both turnaround portions of the rail; and sail direction adjusting devices each for adjusting a direction of the sail in conformity with a direction of wind stream.
摘要翻译：公开了一种风力发电系统。该系统包括通过连接器彼此连接并且在循环轨道的轨道上重复循环的移动体; 帆式装置可旋转地安装到移动体并暴露于风中，每个帆装置具有帆和桅杆，并且包括用于旋转桅杆的旋转机构; 固定在移动体一侧的齿轮构件; 发电机，其具有与齿轮构件啮合的齿轮，从而旋转以允许发电机发电; 位于轨道的两个转向部分的方向改变装置; 和风向调整装置，每个用于根据风流的方向调节帆的方向。

10. 发明授权

US6156668A Method for forming a fine pattern in a semiconductor device 有权
标题翻译：在半导体器件中形成精细图案的方法
公开(公告)号：US6156668A
公开(公告)日：2000-12-05
申请号：US294874
申请日：1999-04-20
申请人： Hyung Gi Kim , Myung Soo Kim , Cheol Kyu Bok , Ki Ho Baik , Dae Hoon Lee , Jin Woong Kim , Byung Jun Park
发明人： Hyung Gi Kim , Myung Soo Kim , Cheol Kyu Bok , Ki Ho Baik , Dae Hoon Lee , Jin Woong Kim , Byung Jun Park
IPC分类号： H01L21/302 , G03F7/38 , H01L21/00
CPC分类号： G03F7/38
摘要： A method for forming a fine pattern in a semiconductor device removes roughness from a pattern produced in a fine pattern fabrication process using a silylation process as being one kind of a TSI process, eliminates smoothly a photosensitive film residue caused by a residue silylation layer remained on a-non-pattern area, and increases a margin of a lithography process. To achieve the foregoing, the method performs an etching process with a fluorine/oxygen mixture gas so as to remove a thin oxide film being formed on the non-pattern area after a silylation process, enables an edge portion of a silylation region to be planarized so as to prevent the pattern from becoming rough, and forms a photosensitive film pattern by developing the photosensitive film with oxygen plasma. Thereafter, the photosensitive film residue is etched again with a mixture gas of fluorine/oxygen, thereby increasing a fabrication margin of the fine pattern.
摘要翻译：在半导体器件中形成精细图案的方法从使用硅烷化工艺的精细图案制造工艺中产生的图案中除去粗糙度作为一种TSI工艺，平滑地消除由剩余的甲硅烷基层残留的感光性膜残留物非图案区域，并增加了光刻工艺的余量。为了实现上述目的，该方法用氟/氧混合气体进行蚀刻处理，以便在甲硅烷化过程之后除去在非图案区域上形成的薄氧化膜，使甲硅烷基化区域的边缘部分平坦化以防止图案变粗糙，并且通过用氧等离子体显影感光膜形成感光膜图案。此后，用氟/氧的混合气体再次蚀刻感光性膜残渣，从而增加精细图案的制造余量。

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